WO2012017812A3 - 真空分析装置 - Google Patents

真空分析装置 Download PDF

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Publication number
WO2012017812A3
WO2012017812A3 PCT/JP2011/066299 JP2011066299W WO2012017812A3 WO 2012017812 A3 WO2012017812 A3 WO 2012017812A3 JP 2011066299 W JP2011066299 W JP 2011066299W WO 2012017812 A3 WO2012017812 A3 WO 2012017812A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
flow rate
atmosphere
open
pressure detection
Prior art date
Application number
PCT/JP2011/066299
Other languages
English (en)
French (fr)
Other versions
WO2012017812A2 (ja
Inventor
智仁 中野
Original Assignee
株式会社 島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社 島津製作所 filed Critical 株式会社 島津製作所
Priority to US13/813,875 priority Critical patent/US9214327B2/en
Publication of WO2012017812A2 publication Critical patent/WO2012017812A2/ja
Publication of WO2012017812A3 publication Critical patent/WO2012017812A3/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/24—Vacuum systems, e.g. maintaining desired pressures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/004—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn
    • H01J49/0045—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction
    • H01J49/005—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction by collision with gas, e.g. by introducing gas or by accelerating ions with an electric field

Abstract

【課題】大気開放路（１０２）末端から反応室（３）に大気ガスを混入させない真空分析装置を提供する。 【解決手段】真空反応室（３）と、ガス源（４）と、反応室（３）に出口端が接続された流量制御用抵抗管（１１）と、流量制御用抵抗管（１１）の上流に配置された圧力検出手段（１４）と、圧力検出手段（１４）の検出値が所定値になるよう流量制御用抵抗管（１１）から出るガス量を調節する流量調節手段（７）と、流量調節手段（７）と圧力検出手段（１４）の間でガスを分岐し、スプリット用抵抗管（１０３）を備えるスプリット流路（１０１）と、流量調節手段（７）と圧力検出手段（１４）の間で上流から流れるガスを分岐して大気中に放出する大気開放路（１０２）と、大気開放路（１０２）に設けられたバルブ（１０４）とを有する真空分析装置で、バルブ（１０４）の直下にスプリット流路（１０１）を接続する。ガスがバルブ（１０４）下流に流入するため大気開放バルブ（１０４）開放時に大気ガスが拡散によって混入するのを防ぐことができる。
PCT/JP2011/066299 2010-08-05 2011-07-19 真空分析装置 WO2012017812A2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/813,875 US9214327B2 (en) 2010-08-05 2011-07-19 Vacuum analyzer utilizing resistance tubes to control the flow rate through a vacuum reaction chamber

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-175904 2010-08-05
JP2010175904A JP5304749B2 (ja) 2010-08-05 2010-08-05 真空分析装置

Publications (2)

Publication Number Publication Date
WO2012017812A2 WO2012017812A2 (ja) 2012-02-09
WO2012017812A3 true WO2012017812A3 (ja) 2012-03-29

Family

ID=45559887

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2011/066299 WO2012017812A2 (ja) 2010-08-05 2011-07-19 真空分析装置

Country Status (3)

Country Link
US (1) US9214327B2 (ja)
JP (1) JP5304749B2 (ja)
WO (1) WO2012017812A2 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102983054B (zh) * 2012-11-05 2015-09-02 聚光科技(杭州)股份有限公司 应用在质谱仪中的减压装置及方法
US9343277B2 (en) * 2012-12-20 2016-05-17 Dh Technologies Development Pte. Ltd. Parsing events during MS3 experiments
JP6180828B2 (ja) * 2013-07-05 2017-08-16 株式会社日立ハイテクノロジーズ 質量分析装置及び質量分析装置の制御方法
GB2540365B (en) * 2015-07-14 2019-12-11 Thermo Fisher Scient Bremen Gmbh Control of gas flow
GB2557670B (en) * 2016-12-15 2020-04-15 Thermo Fisher Scient Bremen Gmbh Improved gas flow control

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009174994A (ja) * 2008-01-24 2009-08-06 Shimadzu Corp 質量分析システム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000019165A (ja) * 1998-06-30 2000-01-21 Shimadzu Corp ガスクロマトグラフ装置
JP3876554B2 (ja) * 1998-11-25 2007-01-31 株式会社日立製作所 化学物質のモニタ方法及びモニタ装置並びにそれを用いた燃焼炉
US6833028B1 (en) * 2001-02-09 2004-12-21 The Scatter Works Inc. Particle deposition system with enhanced speed and diameter accuracy
US20020189947A1 (en) * 2001-06-13 2002-12-19 Eksigent Technologies Llp Electroosmotic flow controller
US6761770B2 (en) * 2001-08-24 2004-07-13 Aviza Technology Inc. Atmospheric pressure wafer processing reactor having an internal pressure control system and method
JP4162138B2 (ja) * 2003-10-27 2008-10-08 株式会社リガク 昇温脱離ガス分析装置
US20050108996A1 (en) * 2003-11-26 2005-05-26 Latham Steven R. Filter system for an electronic equipment enclosure
US7140847B2 (en) * 2004-08-11 2006-11-28 The Boc Group, Inc. Integrated high vacuum pumping system
JP2006266854A (ja) * 2005-03-23 2006-10-05 Shinku Jikkenshitsu:Kk 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置
JP5226438B2 (ja) * 2008-09-10 2013-07-03 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び基板処理方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009174994A (ja) * 2008-01-24 2009-08-06 Shimadzu Corp 質量分析システム

Also Published As

Publication number Publication date
US9214327B2 (en) 2015-12-15
JP5304749B2 (ja) 2013-10-02
WO2012017812A2 (ja) 2012-02-09
JP2012038483A (ja) 2012-02-23
US20130134306A1 (en) 2013-05-30

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