JP5294877B2 - ヒドロキシベンゾフェノン誘導体 - Google Patents

ヒドロキシベンゾフェノン誘導体 Download PDF

Info

Publication number
JP5294877B2
JP5294877B2 JP2008553748A JP2008553748A JP5294877B2 JP 5294877 B2 JP5294877 B2 JP 5294877B2 JP 2008553748 A JP2008553748 A JP 2008553748A JP 2008553748 A JP2008553748 A JP 2008553748A JP 5294877 B2 JP5294877 B2 JP 5294877B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
formula
products
hair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008553748A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009526015A (ja
JP2009526015A5 (enExample
Inventor
ハース，ユルグ
ミュラー，ステファン
エーリス，トーマス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2009526015A publication Critical patent/JP2009526015A/ja
Publication of JP2009526015A5 publication Critical patent/JP2009526015A5/ja
Application granted granted Critical
Publication of JP5294877B2 publication Critical patent/JP5294877B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/58—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing atoms other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur or phosphorus
    • A61K8/585—Organosilicon compounds
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
    • A61Q17/04—Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage

Landscapes

  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Dermatology (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Cosmetics (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
JP2008553748A 2006-02-09 2007-02-06 ヒドロキシベンゾフェノン誘導体 Expired - Fee Related JP5294877B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06101454 2006-02-09
EP06101454.4 2006-02-09
PCT/EP2007/051117 WO2007090832A1 (en) 2006-02-09 2007-02-06 Hydroxybenzophenone derivatives

Publications (3)

Publication Number Publication Date
JP2009526015A JP2009526015A (ja) 2009-07-16
JP2009526015A5 JP2009526015A5 (enExample) 2010-03-11
JP5294877B2 true JP5294877B2 (ja) 2013-09-18

Family

ID=36010871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008553748A Expired - Fee Related JP5294877B2 (ja) 2006-02-09 2007-02-06 ヒドロキシベンゾフェノン誘導体

Country Status (6)

Country Link
US (1) US7999128B2 (enExample)
EP (1) EP1981895B1 (enExample)
JP (1) JP5294877B2 (enExample)
ES (1) ES2584204T3 (enExample)
GB (1) GB2435041A (enExample)
WO (1) WO2007090832A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007024343A1 (de) * 2007-05-22 2008-11-27 Beiersdorf Ag Kosmetische Zubereitung mit polymerem UV-Filter und Metalloxiden
AR100211A1 (es) * 2014-05-19 2016-09-21 Interquim Sa Procedimiento para la preparación de un polímero fotoprotector progresivo de organosilicio; polímero fotoprotector progresivo de organosilicio, su uso, composición que lo comprende, monómero precursor, procedimientos para la preparación de dicho monómero precursor
WO2025072721A1 (en) * 2023-09-28 2025-04-03 Uvageless Llc Compositions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2938047A (en) 1958-11-13 1960-05-24 Union Carbide Corp Carbobenzophenoneoxyalkyl siloxanes and their preparation
US4042613A (en) 1974-04-23 1977-08-16 Dai Nippon Printing Co., Ltd. Benzophenone derivatives and their preparation and application
US4495360A (en) * 1982-04-30 1985-01-22 General Electric Company Ultraviolet light absorbing agents, method for making, compositions and articles containing same
US5270426A (en) * 1990-01-22 1993-12-14 Shin-Etsu Chemical Co., Ltd. Organosilicon compound
JPH03287588A (ja) * 1990-04-02 1991-12-18 Shiseido Co Ltd ベンゾフェノン誘導体、紫外線吸収剤及び皮膚外用剤
FR2684551B1 (fr) 1991-12-05 1995-04-21 Oreal Huile cosmetique filtrante contenant une silicone filtre et un melange d'une silicone volatile et d'une huile de silicone ou d'une gomme de silicone et emulsion cosmetique filtrante contenant une telle huile.
ES2179091T3 (es) 1994-02-10 2003-01-16 Ciba Sc Holding Ag Barniz de proteccion para madera.
US6071052A (en) 1997-06-30 2000-06-06 Lok-Mor, Inc. Extended height lock nut
FR2782516B1 (fr) * 1998-08-21 2001-09-07 Oreal Procede de photostabilisation de filtres solaires derives du dibenzoylmethane, compositions cosmetiques filtrantes photostabilisees ainsi obtenues et leurs utilisation
DE19917906A1 (de) * 1999-04-20 2000-10-26 Basf Ag Verwendung von aminosubstituierten Hydroxybenzophenonen als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen
DE10011317A1 (de) 2000-03-10 2001-09-13 Basf Ag Verwendung von aminosubstituierten Hydroxybenzophenonen als Lichtschutzmittel und Stabilisatoren für nicht lenbendes organisches Material
DE10012408A1 (de) 2000-03-15 2001-09-20 Basf Ag Verwendung von Lichtschutzmittelkombinationen, die als wesentlichen Bestandteil aminosubstituierte Hydroxybenzophenone enthalten als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen
DE10143963A1 (de) 2001-09-07 2003-03-27 Basf Ag Kosmetische und dermatologische Zubereitungen in Form von W/O-Emulsionen, enthaltend ein aminosubstituiertes Hydroxybenzophenon
DE10155963A1 (de) 2001-11-09 2003-05-22 Beiersdorf Ag Kosmetische und dermatologische Lichtschutzformulierungen mit einem Gehalt an Hydroxybenzophenonen, Triazin- und/oder Benzotriazol-Derivaten
KR100929303B1 (ko) 2002-04-12 2009-11-27 디에스엠 아이피 어셋츠 비.브이. 아미노 하이드록시벤조페논의 유기실리콘 유도체 및 이의 화장품 제조에서 ｕｖ-ａ 필터로서의 용도
MX271169B (es) * 2002-12-12 2009-10-23 Ciba Sc Holding Ag Derivados de hidroxifenil-benzofenona sustituidos con amino.
KR101264456B1 (ko) * 2005-05-31 2013-05-14 디에스엠 아이피 어셋츠 비.브이. 새로운 폴리실록세인 자외선차단제

Also Published As

Publication number Publication date
EP1981895B1 (en) 2016-04-27
GB2435041A9 (en) 2007-08-15
US20090220439A1 (en) 2009-09-03
WO2007090832A1 (en) 2007-08-16
JP2009526015A (ja) 2009-07-16
US7999128B2 (en) 2011-08-16
GB0702326D0 (en) 2007-03-21
ES2584204T3 (es) 2016-09-26
EP1981895A1 (en) 2008-10-22
GB2435041A (en) 2007-08-15

Similar Documents

Publication Publication Date Title
JP5099559B2 (ja) メロシアニン誘導体
JP4566907B2 (ja) アミノ置換ヒドロキシフェニルベンゾフェノン誘導体
KR101433142B1 (ko) 트리아진 유도체
JP5078611B2 (ja) メロシアニン誘導体
KR101538527B1 (ko) 나노스케일 ｕｖ 흡수제의 제조
EP0507692B1 (fr) Dérivés s-triaziniques portant des substituants benzylidène camphre, leur procédé de préparation, compositions cosmétiques filtrantes les contenant et leur utilisation pour protéger la peau et les cheveux du rayonnement ultraviolet
JPH08504184A (ja) Ａ紫外線濾光剤とベンゾトリアゾールシリコーン型ポリマー濾光剤とを含有する光安定性の濾光用香粧品組成物
DK1868984T3 (en) BENZOIC ACID ESTER COMPOUNDS, COMPOSITIONS, APPLICATIONS AND PROCEDURES
JP5384826B2 (ja) 光安定性の化粧用又は皮膚科学用組成物
EP0368717A1 (fr) Dérivés de la 5-benzylidène 3-oxa cyclopentanone, leur procédé de préparation et leur utilisation dans des compositions cosmétiques pour la protection de la peau et des cheveux contre le rayonnement solaire
JP2011517321A (ja) 二量体ベンジリデンマロネート類
JP5362574B2 (ja) メロシアニン誘導体
WO2010136360A2 (en) Benzylidene malonates
WO2009101321A2 (fr) Composés cationiques tensioactifs, leur utilisation comme conditionneur, procédé de traitement cosmétique, et compositions cosmétiques ou pharmaceutiques les comprenant
JP2009526015A (ja) ヒドロキシベンゾフェノン誘導体
EP0370868B1 (fr) Utilisation de diorganopolysiloxanes modifiés comme anti-oxydants en cosmétique ou en dermatologie
JP5588676B2 (ja) 紫外線の悪影響からヒト又は動物の皮膚又は毛髪を保護するためのアミノフェニルベンゾトリアゾール誘導体の使用及びその化粧品組成物。
EP1642893B1 (fr) Composés s-triazine possédant deux substituants choisis parmi des groupes para-aminobenzalmalonate et para-aminobenzalmalonamide encombrés et un substituant aminobenzoate, compositions, utilisations
JPH07330779A (ja) 有機ケイ素基を有するベンザルマロネート誘導体及びその製造法並びにこれを含有する紫外線吸収剤及び化粧料

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100122

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100122

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120828

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120829

AA91 Notification that invitation to amend document was cancelled

Free format text: JAPANESE INTERMEDIATE CODE: A971091

Effective date: 20120911

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120926

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121226

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20121226

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130529

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130611

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5294877

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees