JP5263204B2 - X線検査装置およびx線検査方法 - Google Patents
X線検査装置およびx線検査方法 Download PDFInfo
- Publication number
- JP5263204B2 JP5263204B2 JP2010057524A JP2010057524A JP5263204B2 JP 5263204 B2 JP5263204 B2 JP 5263204B2 JP 2010057524 A JP2010057524 A JP 2010057524A JP 2010057524 A JP2010057524 A JP 2010057524A JP 5263204 B2 JP5263204 B2 JP 5263204B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- ray detector
- imaging
- detector
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007689 inspection Methods 0.000 title claims abstract description 493
- 238000000034 method Methods 0.000 title claims description 228
- 238000003384 imaging method Methods 0.000 claims abstract description 352
- 230000007246 mechanism Effects 0.000 claims abstract description 107
- 230000008569 process Effects 0.000 claims description 112
- 238000001514 detection method Methods 0.000 claims description 35
- 230000033001 locomotion Effects 0.000 description 117
- 238000004364 calculation method Methods 0.000 description 107
- 230000000007 visual effect Effects 0.000 description 82
- 238000013170 computed tomography imaging Methods 0.000 description 77
- 238000010894 electron beam technology Methods 0.000 description 49
- 238000010586 diagram Methods 0.000 description 44
- 238000012546 transfer Methods 0.000 description 42
- 238000012545 processing Methods 0.000 description 36
- 238000004458 analytical method Methods 0.000 description 19
- 238000012986 modification Methods 0.000 description 17
- 230000004048 modification Effects 0.000 description 17
- 238000011960 computer-aided design Methods 0.000 description 16
- 238000009826 distribution Methods 0.000 description 14
- 238000013461 design Methods 0.000 description 12
- 230000005540 biological transmission Effects 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 238000002591 computed tomography Methods 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 230000001678 irradiating effect Effects 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 238000004846 x-ray emission Methods 0.000 description 6
- 238000013519 translation Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000004904 shortening Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000003325 tomography Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000002247 constant time method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 230000017105 transposition Effects 0.000 description 1
Images
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010057524A JP5263204B2 (ja) | 2010-03-15 | 2010-03-15 | X線検査装置およびx線検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010057524A JP5263204B2 (ja) | 2010-03-15 | 2010-03-15 | X線検査装置およびx線検査方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007337572A Division JP5167810B2 (ja) | 2007-12-27 | 2007-12-27 | X線検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010133982A JP2010133982A (ja) | 2010-06-17 |
| JP2010133982A5 JP2010133982A5 (enExample) | 2012-10-11 |
| JP5263204B2 true JP5263204B2 (ja) | 2013-08-14 |
Family
ID=42345361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010057524A Active JP5263204B2 (ja) | 2010-03-15 | 2010-03-15 | X線検査装置およびx線検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5263204B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015072338A1 (ja) | 2013-11-14 | 2015-05-21 | オムロン株式会社 | データ構造、ライブラリ作成装置、電子機器分析装置、ライブラリ提供システム |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9561008B2 (en) | 2010-12-28 | 2017-02-07 | General Electric Company | Method of displaying image |
| KR102097508B1 (ko) * | 2018-04-11 | 2020-04-06 | 한국원자력연구원 | 비파괴 검사 장치 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03186710A (ja) * | 1989-12-18 | 1991-08-14 | Hitachi Ltd | X線断層撮影方法とその装置並びにx線発生用ターゲット |
| JPH0855887A (ja) * | 1994-08-10 | 1996-02-27 | Toshiba Corp | ラミノグラフ |
| JPH11133200A (ja) * | 1997-10-30 | 1999-05-21 | Nippon Telegr & Teleph Corp <Ntt> | X線走査顕微方法及び顕微鏡 |
| JPH11326242A (ja) * | 1998-05-18 | 1999-11-26 | Matsushita Electric Ind Co Ltd | X線検査装置 |
| JP2000046760A (ja) * | 1998-05-29 | 2000-02-18 | Shimadzu Corp | X線断層面検査装置 |
| JP4590702B2 (ja) * | 2000-08-31 | 2010-12-01 | パナソニック株式会社 | X線検査装置 |
| JP2006162335A (ja) * | 2004-12-03 | 2006-06-22 | Nagoya Electric Works Co Ltd | X線検査装置、x線検査方法およびx線検査プログラム |
-
2010
- 2010-03-15 JP JP2010057524A patent/JP5263204B2/ja active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015072338A1 (ja) | 2013-11-14 | 2015-05-21 | オムロン株式会社 | データ構造、ライブラリ作成装置、電子機器分析装置、ライブラリ提供システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010133982A (ja) | 2010-06-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101207613B1 (ko) | X선 검사 장치 및 x선 검사 방법 | |
| JP5104956B2 (ja) | X線検査装置およびx線検査方法 | |
| JP5104962B2 (ja) | X線検査方法およびx線検査装置 | |
| JP5444718B2 (ja) | 検査方法、検査装置および検査用プログラム | |
| US7680242B2 (en) | X-ray examination method and X-ray examination apparatus | |
| EP2587450B1 (en) | Method and apparatus for generating a three-dimensional model of a region of interest using an imaging system | |
| JP5167810B2 (ja) | X線検査装置 | |
| JP2009515152A (ja) | X線断層合成用の装置 | |
| JP2008224606A (ja) | X線検査装置およびx線検査装置を用いたx線検査方法 | |
| JP5177236B2 (ja) | X線検査方法およびx線検査装置 | |
| JP5580220B2 (ja) | 放射線検査装置、放射線検査方法 | |
| JP5263204B2 (ja) | X線検査装置およびx線検査方法 | |
| JP5115574B2 (ja) | X線検査装置およびx線検査方法 | |
| JP5569061B2 (ja) | X線検査方法、x線検査装置およびx線検査プログラム | |
| JP5167882B2 (ja) | X線検査装置およびx線検査方法 | |
| JP5125297B2 (ja) | X線検査装置およびx線検査方法 | |
| WO2016021031A1 (ja) | X線装置および構造物の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20101210 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120824 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120911 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121107 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130402 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130415 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5263204 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |