JP5261637B2 - 回路装置の製造方法 - Google Patents
回路装置の製造方法 Download PDFInfo
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- JP5261637B2 JP5261637B2 JP2007249558A JP2007249558A JP5261637B2 JP 5261637 B2 JP5261637 B2 JP 5261637B2 JP 2007249558 A JP2007249558 A JP 2007249558A JP 2007249558 A JP2007249558 A JP 2007249558A JP 5261637 B2 JP5261637 B2 JP 5261637B2
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- insulating layer
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- metal substrate
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- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 79
- 239000002184 metal Substances 0.000 claims description 79
- 239000000758 substrate Substances 0.000 claims description 51
- 229920005989 resin Polymers 0.000 claims description 25
- 239000011347 resin Substances 0.000 claims description 25
- 229910001111 Fine metal Inorganic materials 0.000 claims description 15
- 239000000945 filler Substances 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000010407 anodic oxide Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 74
- 238000000034 method Methods 0.000 description 42
- 238000007789 sealing Methods 0.000 description 22
- 239000010949 copper Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000007769 metal material Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- -1 containing these Chemical compound 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010397 one-hybrid screening Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
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- Insulated Metal Substrates For Printed Circuits (AREA)
- Laser Beam Processing (AREA)
Description
本形態では、図1および図2を参照して、本発明の製造方法により製造される回路装置の一例として混成集積回路装置10の構造を説明する。
<第2の実施の形態:混成集積回路装置の製造方法>
次に、図3から図9を参照して、上記した構成の混成集積回路装置の製造方法を説明する。
本工程では、先ず、金属基板19Bの上面を被覆する絶縁層12を部分的に除去して開口部20を設ける。
本工程では、エンドミル27を使用して、開口部20の底部に金属基板19Bの金属材料を露出させる。図7(A)は本工程を示す断面図であり、図7(B)および図7(C)は開口部20の部分を拡大した断面図である。また、図8はエンドミルが摩耗した状態を示す画像である。
本工程では、次に、導電パターンと金属基板19Bとを電気的に接続する。図9(A)は本工程を示す断面図であり、図9(B)は開口部20の付近を拡大した断面図である。
11 回路基板
11A 第1傾斜面
11B 第2傾斜面
12 絶縁層
13 導電パターン
13A、13B、13C パッド
14 封止樹脂
15A 制御素子
15B、15C パワー素子
15D チップ素子
17、17A 金属細線
20 開口部
21 酸化膜
22 レーザー
22A 円走査
22B ラスター走査
23 レーザー
23A 円走査
23B ラスター走査
25 リード
26 ヒートシンク
27 エンドミル
28 酸化膜
32 ユニット
Claims (2)
- フィラーを含む樹脂からなる絶縁層により上面が被覆され、前記絶縁層の上面に導電パターンが形成された金属基板を用意する工程と、
前記絶縁層を部分的に除去した開口部から前記金属基板を露出させる工程と、
金属細線を経由して前記金属基板と前記導電パターンとを電気的に接続する工程と、を備え、
前記金属基板を露出させる工程は、
レーザーを照射することにより前記絶縁層を除去して開口部を設け、前記金属基板の上面を被覆する陽極酸化膜または酸化膜を前記開口部に露出させる工程と、
エンドミルを用いて前記開口部に露出する前記陽極酸化膜または前記酸化膜を除去する工程と、を備え、
前記レーザーを照射する工程では、
前記開口部の周辺部では、前記レーザーを前記開口部の周縁部に沿って円状に走査させ、
前記開口部の中心部では、前記レーザーを直線的に走査させることを特徴とする回路装置の製造方法。 - 前記電気的に接続する工程では、
前記開口部の前記レーザーが直線的に走査された領域に、前記金属細線が接続されることを特徴とする請求項1に記載の回路装置の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007249558A JP5261637B2 (ja) | 2007-09-26 | 2007-09-26 | 回路装置の製造方法 |
Applications Claiming Priority (1)
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JP2007249558A JP5261637B2 (ja) | 2007-09-26 | 2007-09-26 | 回路装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009081282A JP2009081282A (ja) | 2009-04-16 |
JP5261637B2 true JP5261637B2 (ja) | 2013-08-14 |
Family
ID=40655817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007249558A Expired - Fee Related JP5261637B2 (ja) | 2007-09-26 | 2007-09-26 | 回路装置の製造方法 |
Country Status (1)
Country | Link |
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JP (1) | JP5261637B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112189382A (zh) * | 2018-05-23 | 2021-01-05 | 住友电木株式会社 | 电路基板的制造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06124053A (ja) * | 1992-10-12 | 1994-05-06 | Fuji Electric Co Ltd | 電子写真感光体の製造方法 |
JPH0722720A (ja) * | 1993-06-29 | 1995-01-24 | Mitsui Toatsu Chem Inc | 電子回路パッケージ |
JP3633167B2 (ja) * | 1996-12-26 | 2005-03-30 | イビデン株式会社 | プリント配線板の洗浄方法 |
JP2000124567A (ja) * | 1998-10-14 | 2000-04-28 | Denki Kagaku Kogyo Kk | 金属ベース回路基板とその製造方法 |
JP2005005445A (ja) * | 2003-06-11 | 2005-01-06 | Sanyo Electric Co Ltd | 混成集積回路装置 |
JP4085925B2 (ja) * | 2003-08-07 | 2008-05-14 | 株式会社デンソー | プリント基板の製造方法 |
JP2005191148A (ja) * | 2003-12-24 | 2005-07-14 | Sanyo Electric Co Ltd | 混成集積回路装置およびその製造方法 |
JP2006019361A (ja) * | 2004-06-30 | 2006-01-19 | Sanyo Electric Co Ltd | 回路装置およびその製造方法 |
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2007
- 2007-09-26 JP JP2007249558A patent/JP5261637B2/ja not_active Expired - Fee Related
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JP2009081282A (ja) | 2009-04-16 |
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