JP5241922B2 - 走査電子顕微鏡 - Google Patents

走査電子顕微鏡

Info

Publication number
JP5241922B2
JP5241922B2 JP2011524643A JP2011524643A JP5241922B2 JP 5241922 B2 JP5241922 B2 JP 5241922B2 JP 2011524643 A JP2011524643 A JP 2011524643A JP 2011524643 A JP2011524643 A JP 2011524643A JP 5241922 B2 JP5241922 B2 JP 5241922B2
Authority
JP
Japan
Prior art keywords
electron microscope
scanning electron
bottom plate
main body
damper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011524643A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2011013323A1 (ja
Inventor
智久 大瀧
雅彦 安島
祐博 伊東
満 大沼
章 小町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2011524643A priority Critical patent/JP5241922B2/ja
Publication of JPWO2011013323A1 publication Critical patent/JPWO2011013323A1/ja
Application granted granted Critical
Publication of JP5241922B2 publication Critical patent/JP5241922B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2011524643A 2009-07-30 2010-07-20 走査電子顕微鏡 Active JP5241922B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011524643A JP5241922B2 (ja) 2009-07-30 2010-07-20 走査電子顕微鏡

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009177196 2009-07-30
JP2009177196 2009-07-30
PCT/JP2010/004636 WO2011013323A1 (ja) 2009-07-30 2010-07-20 走査電子顕微鏡
JP2011524643A JP5241922B2 (ja) 2009-07-30 2010-07-20 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
JPWO2011013323A1 JPWO2011013323A1 (ja) 2013-01-07
JP5241922B2 true JP5241922B2 (ja) 2013-07-17

Family

ID=43528997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011524643A Active JP5241922B2 (ja) 2009-07-30 2010-07-20 走査電子顕微鏡

Country Status (7)

Country Link
US (1) US8809782B2 (cg-RX-API-DMAC7.html)
JP (1) JP5241922B2 (cg-RX-API-DMAC7.html)
KR (1) KR101364289B1 (cg-RX-API-DMAC7.html)
CN (1) CN102473577B (cg-RX-API-DMAC7.html)
DE (1) DE112010003102B4 (cg-RX-API-DMAC7.html)
IN (1) IN2012DN00837A (cg-RX-API-DMAC7.html)
WO (1) WO2011013323A1 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10008361B2 (en) 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
JP6633986B2 (ja) 2016-07-20 2020-01-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005077498A (ja) * 2003-08-28 2005-03-24 Ricoh Co Ltd 画像形成装置
JP2006079870A (ja) * 2004-09-08 2006-03-23 Hitachi High-Technologies Corp 荷電粒子線装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2106378C3 (de) * 1971-02-05 1974-06-20 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Korpuskularstrahlmikroskop, insbesondere Elektronenmikroskop, mit einem schwingungsfähigen Fundament
GB1400389A (en) * 1971-06-23 1975-07-16 Ass Elect Ind Arrangements for supporting a mass with vibration isolation
DE2540594C2 (de) * 1975-09-09 1977-11-03 Siemens AG, 1000 Berlin und 8000 München Korpuskularstrahlmikroskop, insbesondere Elektronenmikroskop, mit einem schwingungsgedämpften Sockel
JPS611U (ja) 1984-06-06 1986-01-06 フジタ工業株式会社 埋め込み金物測定ゲ−ジ
JPH0624124Y2 (ja) * 1989-06-09 1994-06-22 日本電子株式会社 走査電子顕微鏡
JPH0845462A (ja) * 1994-07-27 1996-02-16 Topcon Corp 搬送装置を備えた走査型電子顕微鏡
US5559329A (en) * 1994-08-31 1996-09-24 Touchstone Research Laboratory, Ltd. Scanning electron microscope fiber push-out apparatus and method
EP0767320B1 (en) * 1995-10-04 2004-01-21 Ebara Corporation Vibration damping apparatus
AU1691899A (en) * 1997-12-26 1999-07-19 Nikon Corporation Exposure apparatus, method of producing the apparatus, and exposure method, and device and method of manufacturing the device
US6246190B1 (en) * 1999-07-30 2001-06-12 Etec Systems, Inc. Integrated electron gun and electronics module
JP2004176851A (ja) * 2002-11-28 2004-06-24 Fujikura Rubber Ltd 除振台
CN1518049A (zh) * 2003-01-28 2004-08-04 ������������ʽ���� 电子显微镜
JP2004253374A (ja) * 2003-01-28 2004-09-09 Hitachi Ltd 電子顕微鏡
JP2005010059A (ja) * 2003-06-20 2005-01-13 Jeol Ltd 走査形プローブ顕微鏡

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005077498A (ja) * 2003-08-28 2005-03-24 Ricoh Co Ltd 画像形成装置
JP2006079870A (ja) * 2004-09-08 2006-03-23 Hitachi High-Technologies Corp 荷電粒子線装置

Also Published As

Publication number Publication date
IN2012DN00837A (cg-RX-API-DMAC7.html) 2015-06-26
CN102473577B (zh) 2015-05-06
CN102473577A (zh) 2012-05-23
JPWO2011013323A1 (ja) 2013-01-07
DE112010003102T5 (de) 2012-10-04
US20120127299A1 (en) 2012-05-24
KR20120047923A (ko) 2012-05-14
KR101364289B1 (ko) 2014-02-18
DE112010003102B4 (de) 2019-11-28
US8809782B2 (en) 2014-08-19
WO2011013323A1 (ja) 2011-02-03

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