JP5232927B2 - 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法 - Google Patents
投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法 Download PDFInfo
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- JP5232927B2 JP5232927B2 JP2012128371A JP2012128371A JP5232927B2 JP 5232927 B2 JP5232927 B2 JP 5232927B2 JP 2012128371 A JP2012128371 A JP 2012128371A JP 2012128371 A JP2012128371 A JP 2012128371A JP 5232927 B2 JP5232927 B2 JP 5232927B2
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- illumination
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- facet
- pupil
- evaluation function
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- 238000005286 illumination Methods 0.000 title claims description 220
- 210000001747 pupil Anatomy 0.000 title claims description 137
- 230000003287 optical effect Effects 0.000 title claims description 74
- 238000000034 method Methods 0.000 title claims description 47
- 238000011156 evaluation Methods 0.000 claims description 81
- 238000003384 imaging method Methods 0.000 claims description 37
- 230000001419 dependent effect Effects 0.000 claims description 11
- 230000004075 alteration Effects 0.000 claims description 8
- 238000002310 reflectometry Methods 0.000 claims description 5
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- 230000005855 radiation Effects 0.000 description 6
- 238000009304 pastoral farming Methods 0.000 description 5
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- 238000013461 design Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
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- 230000006978 adaptation Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000001393 microlithography Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000002922 simulated annealing Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
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- 230000009897 systematic effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE201110076145 DE102011076145B4 (de) | 2011-05-19 | 2011-05-19 | Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik |
DE102011076145.4 | 2011-05-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012244184A JP2012244184A (ja) | 2012-12-10 |
JP5232927B2 true JP5232927B2 (ja) | 2013-07-10 |
Family
ID=47087971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012128371A Active JP5232927B2 (ja) | 2011-05-19 | 2012-05-18 | 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5232927B2 (de) |
DE (1) | DE102011076145B4 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012208064A1 (de) * | 2012-05-15 | 2013-11-21 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithographie |
DE102012220596A1 (de) * | 2012-11-13 | 2014-05-15 | Carl Zeiss Smt Gmbh | Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik |
DE102013202948A1 (de) * | 2013-02-22 | 2014-09-11 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür |
DE102013218131A1 (de) * | 2013-09-11 | 2015-03-12 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie |
DE102013218749A1 (de) * | 2013-09-18 | 2015-03-19 | Carl Zeiss Smt Gmbh | Beleuchtungssystem sowie Beleuchtungsoptik für die EUV-Projektionslithografie |
DE102014203188A1 (de) | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage |
DE102016202736A1 (de) | 2015-04-17 | 2016-05-25 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine Projektionsbelichtungsanlage |
DE102015208514A1 (de) | 2015-05-07 | 2016-11-10 | Carl Zeiss Smt Gmbh | Facettenspiegel für die EUV-Projektionslithografie sowie Beleuchtungsoptik mit einem derartigen Facettenspiegel |
DE102016222033A1 (de) | 2016-11-10 | 2016-12-29 | Carl Zeiss Smt Gmbh | Verfahren zur Zuordnung von Feldfacetten zu Pupillenfacetten zur Schaffung von Beleuchtungslicht-Ausleuchtungskanälen in einem Be-leuchtungssystem in einer EUV-Projektionsbelichtungsanlage |
DE102017200663A1 (de) | 2017-01-17 | 2017-03-02 | Carl Zeiss Smt Gmbh | Verfahren zur Zuordnung von Ausgangs-Kippwinkeln von kippbaren Feldfacetten eines Feldfacettenspiegels für eine Projektionsbelich-tungsanlage für die Projektionslithografie |
DE102018201457A1 (de) | 2018-01-31 | 2019-08-01 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
JP2022530217A (ja) | 2019-04-29 | 2022-06-28 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 照明光をeuvリソグラフィのための投影露光システムの物体視野内へ案内するための測定照明光学ユニット |
DE102019206057A1 (de) | 2019-04-29 | 2019-06-19 | Carl Zeiss Smt Gmbh | Mess-Beleuchtungsoptik zur Führung von Beleuchtungslicht in ein Objektfeld einer Projektionsbelichtungsanlage für die EUV-Lithografie |
DE102020200158A1 (de) | 2020-01-09 | 2021-07-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10329141B4 (de) | 2003-06-27 | 2008-10-23 | Carl Zeiss Smt Ag | Faltungsgeometrien für EUV-Beleuchtungssysteme |
DE10138313A1 (de) | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
DE10053587A1 (de) | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
DE10219514A1 (de) | 2002-04-30 | 2003-11-13 | Zeiss Carl Smt Ag | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
SG116510A1 (de) * | 2002-11-12 | 2005-11-28 | ||
DE102006036064A1 (de) | 2006-08-02 | 2008-02-07 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm |
DE102006059024A1 (de) | 2006-12-14 | 2008-06-19 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil |
JP4989279B2 (ja) * | 2007-04-05 | 2012-08-01 | 株式会社東芝 | パラメータ値調整方法、半導体装置製造方法およびプログラム |
DE102008007449A1 (de) * | 2008-02-01 | 2009-08-13 | Carl Zeiss Smt Ag | Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie |
NL1036771A1 (nl) * | 2008-04-22 | 2009-10-26 | Asml Netherlands Bv | Illumination System and Lithographic Method. |
DE102008001511A1 (de) * | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
DE102008002749A1 (de) * | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
DE102008049586A1 (de) | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
DE102009032194A1 (de) | 2008-10-16 | 2010-04-22 | Carl Zeiss Smt Ag | Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels |
KR101769157B1 (ko) * | 2008-10-20 | 2017-08-17 | 칼 짜이스 에스엠테 게엠베하 | 방사선 빔 안내를 위한 광학 모듈 |
DE102009006685A1 (de) * | 2009-01-29 | 2010-08-05 | Carl Zeiss Smt Ag | Beleuchtungssystem für die Mikro-Lithographie |
WO2010099807A1 (de) * | 2009-03-06 | 2010-09-10 | Carl Zeiss Smt Ag | Beleuchtungsoptik sowie optische systeme für die mikrolithographie |
DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
-
2011
- 2011-05-19 DE DE201110076145 patent/DE102011076145B4/de not_active Expired - Fee Related
-
2012
- 2012-05-18 JP JP2012128371A patent/JP5232927B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
DE102011076145B4 (de) | 2013-04-11 |
DE102011076145A8 (de) | 2013-02-07 |
DE102011076145A1 (de) | 2012-11-22 |
JP2012244184A (ja) | 2012-12-10 |
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