JP5226078B2 - 干渉計装置及びその作動方法 - Google Patents
干渉計装置及びその作動方法 Download PDFInfo
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- JP5226078B2 JP5226078B2 JP2010534377A JP2010534377A JP5226078B2 JP 5226078 B2 JP5226078 B2 JP 5226078B2 JP 2010534377 A JP2010534377 A JP 2010534377A JP 2010534377 A JP2010534377 A JP 2010534377A JP 5226078 B2 JP5226078 B2 JP 5226078B2
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- interferometer
- spectrometer
- light source
- absorption
- measurement
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3554—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for determining moisture content
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/023—Controlling conditions in casing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007055665.0 | 2007-11-21 | ||
| DE102007055665A DE102007055665A1 (de) | 2007-11-21 | 2007-11-21 | Interferometeranordnung und Verfahren zu deren Betrieb |
| PCT/EP2008/008341 WO2009065463A1 (de) | 2007-11-21 | 2008-10-01 | Interferometeranordnung und verfahren zu deren betrieb |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011504234A JP2011504234A (ja) | 2011-02-03 |
| JP2011504234A5 JP2011504234A5 (enExample) | 2011-06-23 |
| JP5226078B2 true JP5226078B2 (ja) | 2013-07-03 |
Family
ID=40140038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010534377A Expired - Fee Related JP5226078B2 (ja) | 2007-11-21 | 2008-10-01 | 干渉計装置及びその作動方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8477316B2 (enExample) |
| EP (1) | EP2223038B1 (enExample) |
| JP (1) | JP5226078B2 (enExample) |
| CN (1) | CN101868688B (enExample) |
| DE (1) | DE102007055665A1 (enExample) |
| WO (1) | WO2009065463A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010124723A1 (en) * | 2009-04-28 | 2010-11-04 | Foss Analytical A/S | Optical interferometer |
| JP5933190B2 (ja) | 2010-06-30 | 2016-06-08 | ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングDr. Johannes Heidenhain Gesellschaft Mit Beschrankter Haftung | 光学式距離測定機器 |
| JP5704897B2 (ja) * | 2010-11-11 | 2015-04-22 | キヤノン株式会社 | 干渉計測方法および干渉計測装置 |
| WO2013061417A1 (ja) * | 2011-10-26 | 2013-05-02 | 三菱電機株式会社 | 膜厚測定方法 |
| JP5954979B2 (ja) * | 2011-12-15 | 2016-07-20 | キヤノン株式会社 | 多波長干渉計を有する計測装置 |
| EP2662661A1 (de) | 2012-05-07 | 2013-11-13 | Leica Geosystems AG | Messgerät mit einem Interferometer und einem ein dichtes Linienspektrum definierenden Absorptionsmedium |
| EP2693164A1 (en) * | 2012-08-03 | 2014-02-05 | Universidad Politécnica de Madrid | Interferometric detection method |
| DE102012218890A1 (de) * | 2012-10-17 | 2014-04-17 | Dr. Johannes Heidenhain Gmbh | Absolutes Positionsmessgerät |
| CN103293524B (zh) * | 2013-05-15 | 2015-05-13 | 中国科学院上海光学精密机械研究所 | 迈克尔逊型直视合成孔径激光成像雷达发射机 |
| DE102013213525B3 (de) * | 2013-07-10 | 2014-08-21 | Carl Zeiss Sms Gmbh | Verfahren zum Kalibrieren eines Positionsmeßsystems und Positionsmeßsystem |
| JP2015099116A (ja) * | 2013-11-20 | 2015-05-28 | セイコーエプソン株式会社 | 成分分析装置 |
| US10656401B2 (en) * | 2013-12-09 | 2020-05-19 | Nikon Corporation | Optical apparatus, measuring apparatus, measuring method, screening apparatus, and screening method |
| CN103743708B (zh) * | 2013-12-11 | 2015-11-11 | 浙江理工大学 | 激光合成波长干涉测量空气折射率波动的方法 |
| CN103809167B (zh) * | 2014-01-20 | 2016-08-17 | 浙江大学 | 一种fp干涉型光谱滤波器谐振频率锁定装置及方法 |
| CN103809166B (zh) * | 2014-01-20 | 2016-08-17 | 浙江大学 | 一种迈克尔逊干涉型光谱滤波器谐振频率锁定装置及方法 |
| CN104483022A (zh) * | 2014-11-25 | 2015-04-01 | 北京工业大学 | 基于等效相交镜的迈克尔逊干涉仪的傅里叶变换光谱仪 |
| DE102014226487B4 (de) * | 2014-12-18 | 2017-02-02 | Bruker Optik Gmbh | FTIR-Spektrometer mit Stabilisierung des Referenzlasers über eine natürliche Absorptionslinie |
| CN105606488B (zh) * | 2016-01-11 | 2019-03-08 | 中国科学院上海光学精密机械研究所 | 易调节的气体密度测量系统及其测量方法 |
| CN105674888B (zh) * | 2016-01-27 | 2018-07-06 | 广西科技大学鹿山学院 | 基于光干涉的位移测量装置 |
| CN105674889B (zh) * | 2016-01-27 | 2018-07-06 | 广西科技大学鹿山学院 | 基于光干涉的位移测量方法 |
| JP6279013B2 (ja) * | 2016-05-26 | 2018-02-14 | Ckd株式会社 | 三次元計測装置 |
| WO2018014325A1 (zh) * | 2016-07-22 | 2018-01-25 | 浙江理工大学 | 基于相位调制的双激光单频干涉纳米位移测量装置及方法 |
| US20180081031A1 (en) * | 2016-09-19 | 2018-03-22 | Delphi Technologies, Inc. | Coherent lidar system for automated vehicles |
| CN107339931B (zh) * | 2017-06-29 | 2019-04-16 | 安徽皖仪科技股份有限公司 | 气压调节无运动件干涉仪 |
| CN107843189B (zh) * | 2017-09-30 | 2019-12-27 | 浙江理工大学 | 正弦相位调制干涉仪pgc解调实时归一化修正装置及方法 |
| JP2021526631A (ja) * | 2018-05-18 | 2021-10-07 | ザ リージェンツ オブ ザ ユニバーシティ オブ ミシガン | 周波数変調干渉計のための経路変動監視 |
| CN109782217A (zh) * | 2019-01-25 | 2019-05-21 | 中国人民解放军空军研究院战略预警研究所 | 一种校准机载干涉仪校准值的方法及装置 |
| CN111458310B (zh) * | 2019-09-12 | 2024-08-16 | 艾科感知科技(大连)有限公司 | 基于气体折射率比较技术的原油挥发气检测方法 |
| CN110749549A (zh) * | 2019-11-22 | 2020-02-04 | 山东大学 | 一种恶臭气体成分及浓度监测装置与方法 |
| CN113251943A (zh) * | 2020-02-12 | 2021-08-13 | 三营超精密光电(晋城)有限公司 | 基于光干涉的测量系统及方法 |
| JP2024121186A (ja) * | 2023-02-27 | 2024-09-06 | セイコーエプソン株式会社 | 光学デバイスおよび分光装置 |
| CN117553676B (zh) * | 2023-11-17 | 2024-05-14 | 哈尔滨工业大学 | 基于多目标对向位移测量的外差干涉仪及测量方法 |
| CN118883483A (zh) * | 2024-09-25 | 2024-11-01 | 台州精奥矩阵科技有限公司 | 光谱仪及光谱分析方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3734623A (en) * | 1972-03-01 | 1973-05-22 | Bendix Corp | Interferometer utilizing a tunable laser or similar frequency variable wave energy generator |
| GB9324926D0 (en) * | 1993-12-04 | 1994-01-26 | Renishaw Plc | Combined interferometer and refractometer |
| US5404222A (en) * | 1994-01-14 | 1995-04-04 | Sparta, Inc. | Interferametric measuring system with air turbulence compensation |
| US5674362A (en) * | 1996-02-16 | 1997-10-07 | Callaway Corp. | Method for imparting strength to paper |
| US5764362A (en) | 1996-08-20 | 1998-06-09 | Zygo Corporation | Superheterodyne method and apparatus for measuring the refractive index of air using multiple-pass interferometry |
| JPH10132514A (ja) * | 1996-10-30 | 1998-05-22 | Nikon Corp | 多波長光源装置および該光源装置を備えた光波干渉測定装置 |
| FI982603L (fi) | 1998-12-02 | 2000-06-03 | Leonid Mihaljov | Laser-mittauksen epätarkkuutta pienentävä mittausmenetelmä |
| US6417927B2 (en) * | 1999-04-28 | 2002-07-09 | Zygo Corporation | Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| DE10333772A1 (de) * | 2002-08-07 | 2004-02-26 | Dr. Johannes Heidenhain Gmbh | Interferenzielle Positionsmesseinrichtung |
| US7268888B2 (en) * | 2002-11-04 | 2007-09-11 | Zygo Corporation | Compensation of refractivity perturbations in an interferometer path |
| US7256893B2 (en) * | 2003-06-26 | 2007-08-14 | Cymer, Inc. | Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser |
| CN2819171Y (zh) * | 2005-05-23 | 2006-09-20 | 电子科技大学 | 一种光纤法珀传感器波分频分复用系统 |
| WO2008073454A2 (en) * | 2006-12-11 | 2008-06-19 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
-
2007
- 2007-11-21 DE DE102007055665A patent/DE102007055665A1/de not_active Withdrawn
-
2008
- 2008-10-01 EP EP08802747.9A patent/EP2223038B1/de active Active
- 2008-10-01 US US12/743,964 patent/US8477316B2/en not_active Expired - Fee Related
- 2008-10-01 CN CN2008801170549A patent/CN101868688B/zh not_active Expired - Fee Related
- 2008-10-01 JP JP2010534377A patent/JP5226078B2/ja not_active Expired - Fee Related
- 2008-10-01 WO PCT/EP2008/008341 patent/WO2009065463A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP2223038B1 (de) | 2016-12-14 |
| CN101868688A (zh) | 2010-10-20 |
| US8477316B2 (en) | 2013-07-02 |
| EP2223038A1 (de) | 2010-09-01 |
| DE102007055665A1 (de) | 2009-05-28 |
| CN101868688B (zh) | 2013-03-06 |
| JP2011504234A (ja) | 2011-02-03 |
| WO2009065463A1 (de) | 2009-05-28 |
| US20100268499A1 (en) | 2010-10-21 |
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