JP5117069B2 - 露光装置、及びデバイス製造方法 - Google Patents

露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP5117069B2
JP5117069B2 JP2007044651A JP2007044651A JP5117069B2 JP 5117069 B2 JP5117069 B2 JP 5117069B2 JP 2007044651 A JP2007044651 A JP 2007044651A JP 2007044651 A JP2007044651 A JP 2007044651A JP 5117069 B2 JP5117069 B2 JP 5117069B2
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beams
lens
aligner
blanking
electron
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Japanese (ja)
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JP2008210897A5 (https=
JP2008210897A (ja
Inventor
進 後藤
理 上村
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Canon Inc
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Canon Inc
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  • Electron Sources, Ion Sources (AREA)
JP2007044651A 2007-02-23 2007-02-23 露光装置、及びデバイス製造方法 Expired - Fee Related JP5117069B2 (ja)

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JP2007044651A JP5117069B2 (ja) 2007-02-23 2007-02-23 露光装置、及びデバイス製造方法

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JP2007044651A JP5117069B2 (ja) 2007-02-23 2007-02-23 露光装置、及びデバイス製造方法

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JP2008210897A JP2008210897A (ja) 2008-09-11
JP2008210897A5 JP2008210897A5 (https=) 2010-04-08
JP5117069B2 true JP5117069B2 (ja) 2013-01-09

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6215586B2 (ja) 2012-11-02 2017-10-18 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置
JP6057700B2 (ja) * 2012-12-26 2017-01-11 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005149806A (ja) * 2003-11-12 2005-06-09 Sony Corp 電子ビーム照射装置および電子ビーム照射方法
JP3889743B2 (ja) * 2003-12-05 2007-03-07 株式会社東芝 荷電ビーム描画方法及び描画装置
JP4181533B2 (ja) * 2004-09-09 2008-11-19 株式会社日立ハイテクノロジーズ 電子ビーム描画装置
JP2007019246A (ja) * 2005-07-07 2007-01-25 Canon Inc 電子ビーム装置およびデバイス製造方法

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