JP5110610B2 - 耐摩耗性チェーン - Google Patents
耐摩耗性チェーン Download PDFInfo
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- JP5110610B2 JP5110610B2 JP2009507387A JP2009507387A JP5110610B2 JP 5110610 B2 JP5110610 B2 JP 5110610B2 JP 2009507387 A JP2009507387 A JP 2009507387A JP 2009507387 A JP2009507387 A JP 2009507387A JP 5110610 B2 JP5110610 B2 JP 5110610B2
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- vanadium
- vanadium carbide
- wear
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- 238000005299 abrasion Methods 0.000 title 1
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 claims description 81
- 239000013078 crystal Substances 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 21
- 238000009792 diffusion process Methods 0.000 claims description 15
- 229910052720 vanadium Inorganic materials 0.000 claims description 15
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910000831 Steel Inorganic materials 0.000 claims description 8
- 239000010959 steel Substances 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 230000035515 penetration Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 24
- 239000002245 particle Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 230000008520 organization Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 229910000628 Ferrovanadium Inorganic materials 0.000 description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- PNXOJQQRXBVKEX-UHFFFAOYSA-N iron vanadium Chemical compound [V].[Fe] PNXOJQQRXBVKEX-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000005475 siliconizing Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000677 High-carbon steel Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000016571 aggressive behavior Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000010705 motor oil Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 102220005308 rs33960931 Human genes 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
- C23C10/14—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases more than one element being diffused in one step
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
- C23C10/16—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases more than one element being diffused in more than one step
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
- C23C10/34—Embedding in a powder mixture, i.e. pack cementation
- C23C10/52—Embedding in a powder mixture, i.e. pack cementation more than one element being diffused in one step
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C12/00—Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces
- C23C12/02—Diffusion in one step
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16G—BELTS, CABLES, OR ROPES, PREDOMINANTLY USED FOR DRIVING PURPOSES; CHAINS; FITTINGS PREDOMINANTLY USED THEREFOR
- F16G13/00—Chains
- F16G13/02—Driving-chains
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Rolling Contact Bearings (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Valve-Gear Or Valve Arrangements (AREA)
Description
前記硬化層は、前記バナジウム炭化物の結晶粒内にシリコン(Si)を含有するアモルファス構造からなる第2相が存在してなり、かつ前記バナジウム炭化物の代表的な結晶粒径が1[μm]以下、望ましくは500[nm]以下であることを特徴とする。
かつ該拡散浸透処理に際して、シリコン含有微細化剤が添加されてなる。
i.本発明に係るピンの表面硬化層は、バナジウム炭化物(V8C7)の単層からなり、該VC結晶は、従来のものに比して大幅に微細化されている(VC粒度500nm以下)。
ii.バナジウム炭化物(VC)の結晶粒内に微細な第2相が分散しており、該第2相は、シリコン(Si)を含有するアモルファス構造からなる。
Claims (3)
- 相対的に回動して軸受部を構成するピンとリンクプレート又はピンとブシュの少なくともいずれか一方のチェーン構成要素が、鋼材からなる母材の表面にバナジウム炭化物を有する硬化層が形成されてなる、耐摩耗性チェーンにおいて、
前記硬化層は、前記バナジウム炭化物の結晶粒内にシリコンを含有するアモルファス構造からなる第2相が存在してなり、かつ前記バナジウム炭化物の結晶粒径が1[μm]以下であることを特徴とする、
耐摩耗性チェーン。 - 前記バナジウム炭化物は、バナジウムと炭素の外に、0.05〜0.5[重量%]のシリコンを含有してなる、
請求項1記載の耐摩耗性チェーン。 - 前記チェーン構成要素が、鋼からなる母材を、バナジウムを有する気体雰囲気中にて所定温度で拡散浸透処理することにより形成され、
かつ該拡散浸透処理に際して、シリコン含有微細化剤が添加されてなる、
請求項1又は2記載の耐摩耗性チェーン。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/057607 WO2008120401A1 (ja) | 2007-03-29 | 2007-03-29 | 耐摩耗性チェーン |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008120401A1 JPWO2008120401A1 (ja) | 2010-07-15 |
JP5110610B2 true JP5110610B2 (ja) | 2012-12-26 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009507387A Active JP5110610B2 (ja) | 2007-03-29 | 2007-03-29 | 耐摩耗性チェーン |
Country Status (6)
Country | Link |
---|---|
US (1) | US8932164B2 (ja) |
JP (1) | JP5110610B2 (ja) |
CN (1) | CN101663503B (ja) |
DE (1) | DE112007003413B4 (ja) |
GB (1) | GB2459630B (ja) |
WO (1) | WO2008120401A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101892369B (zh) * | 2010-05-11 | 2012-07-25 | 青岛征和工业有限公司 | 发动机链条强化处理方法 |
JP6118144B2 (ja) * | 2013-03-14 | 2017-04-19 | ボーグワーナー インコーポレーテッド | 耐摩耗性を有するチェーン用ピンの製造方法 |
JP5608280B1 (ja) * | 2013-10-21 | 2014-10-15 | 大同工業株式会社 | チェーン用軸受部、その製造方法、及びそれを用いたチェーン |
DE102016009814A1 (de) * | 2015-09-09 | 2017-03-09 | Sram Deutschland Gmbh | Rollenketten-Innenlasche |
DE102018103319A1 (de) * | 2018-02-14 | 2019-08-14 | Iwis Motorsysteme Gmbh & Co. Kg | Metallbauteil |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004360755A (ja) * | 2003-06-03 | 2004-12-24 | Daido Kogyo Co Ltd | チェーン用ピン及びその製造方法 |
JP2005290435A (ja) * | 2004-03-31 | 2005-10-20 | Borg Warner Morse Tec Japan Kk | チェーン用ピンおよびその製造方法 |
JP2005299800A (ja) * | 2004-04-12 | 2005-10-27 | Tsubakimoto Chain Co | サイレントチェーン |
JP2006336056A (ja) * | 2005-05-31 | 2006-12-14 | Nippon Karoraizu Kogyo Kk | 耐摩耗性鋼製部品およびその製造方法 |
Family Cites Families (15)
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US2755199A (en) * | 1951-02-19 | 1956-07-17 | Kellogg M W Co | Hard coated composite and method of forming |
US3475161A (en) * | 1967-03-14 | 1969-10-28 | Howmet Corp | Method of forming cemented carbide coatings on metal surfaces by employing volatile,organic liquid solvents and organic binders |
US4451508A (en) * | 1982-06-28 | 1984-05-29 | Union Carbide Corporation | Hard facing of metal substrates using material containing VC and improved flux compositions therefor |
JPS6237679A (ja) | 1985-08-08 | 1987-02-18 | 松下電器産業株式会社 | 雰囲気電気炉 |
US4714632A (en) * | 1985-12-11 | 1987-12-22 | Air Products And Chemicals, Inc. | Method of producing silicon diffusion coatings on metal articles |
US5560839A (en) * | 1994-06-27 | 1996-10-01 | Valenite Inc. | Methods of preparing cemented metal carbide substrates for deposition of adherent diamond coatings and products made therefrom |
US5908486A (en) * | 1996-04-26 | 1999-06-01 | Lockheed Martin Idaho Technologies Company | Strengthening of metallic alloys with nanometer-size oxide dispersions |
JP3199225B2 (ja) * | 1996-12-12 | 2001-08-13 | 株式会社椿本チエイン | サイレントチェーン |
US6124564A (en) * | 1998-01-23 | 2000-09-26 | Smith International, Inc. | Hardfacing compositions and hardfacing coatings formed by pulsed plasma-transferred arc |
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AU2001296005A1 (en) * | 2000-10-23 | 2002-05-15 | National Institute Of Advanced Industrial Science And Technology | Composite structure and method for manufacture thereof |
JP2003127094A (ja) | 2001-07-30 | 2003-05-08 | Heidelberger Druckmas Ag | 紙葉状刷本に種々の穴あけパターンを製作する装置 |
JP3656844B2 (ja) * | 2002-07-23 | 2005-06-08 | 株式会社椿本チエイン | 自動車エンジン用タイミングチェーン |
JP3659963B2 (ja) * | 2003-10-28 | 2005-06-15 | 株式会社椿本チエイン | 自動車エンジン用タイミングチェーン |
WO2007111301A1 (ja) * | 2006-03-28 | 2007-10-04 | Kyocera Corporation | 表面被覆工具 |
-
2007
- 2007-03-29 JP JP2009507387A patent/JP5110610B2/ja active Active
- 2007-03-29 DE DE200711003413 patent/DE112007003413B4/de active Active
- 2007-03-29 CN CN2007800523623A patent/CN101663503B/zh active Active
- 2007-03-29 GB GB0916110A patent/GB2459630B/en active Active
- 2007-03-29 US US12/532,795 patent/US8932164B2/en active Active
- 2007-03-29 WO PCT/JP2007/057607 patent/WO2008120401A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004360755A (ja) * | 2003-06-03 | 2004-12-24 | Daido Kogyo Co Ltd | チェーン用ピン及びその製造方法 |
JP2005290435A (ja) * | 2004-03-31 | 2005-10-20 | Borg Warner Morse Tec Japan Kk | チェーン用ピンおよびその製造方法 |
JP2005299800A (ja) * | 2004-04-12 | 2005-10-27 | Tsubakimoto Chain Co | サイレントチェーン |
JP2006336056A (ja) * | 2005-05-31 | 2006-12-14 | Nippon Karoraizu Kogyo Kk | 耐摩耗性鋼製部品およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101663503A (zh) | 2010-03-03 |
US8932164B2 (en) | 2015-01-13 |
GB2459630A (en) | 2009-11-04 |
GB2459630B (en) | 2011-09-28 |
GB0916110D0 (en) | 2009-10-28 |
US20100120567A1 (en) | 2010-05-13 |
DE112007003413T5 (de) | 2010-04-22 |
DE112007003413B4 (de) | 2014-08-14 |
WO2008120401A1 (ja) | 2008-10-09 |
GB2459630A9 (en) | 2010-02-24 |
JPWO2008120401A1 (ja) | 2010-07-15 |
CN101663503B (zh) | 2011-04-13 |
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