JP5080274B2 - バッフル部材を備える蒸発源 - Google Patents

バッフル部材を備える蒸発源 Download PDF

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Publication number
JP5080274B2
JP5080274B2 JP2007550538A JP2007550538A JP5080274B2 JP 5080274 B2 JP5080274 B2 JP 5080274B2 JP 2007550538 A JP2007550538 A JP 2007550538A JP 2007550538 A JP2007550538 A JP 2007550538A JP 5080274 B2 JP5080274 B2 JP 5080274B2
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Japan
Prior art keywords
evaporation source
organic material
boat
bis
baffle member
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Expired - Lifetime
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JP2007550538A
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English (en)
Japanese (ja)
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JP2008527174A5 (enExample
JP2008527174A (ja
Inventor
レイ フリーマン，デニス
ピーター レデン，ニール
Original Assignee
グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー
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Publication of JP2008527174A5 publication Critical patent/JP2008527174A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2007550538A 2005-01-11 2006-01-06 バッフル部材を備える蒸発源 Expired - Lifetime JP5080274B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/032,899 US7166169B2 (en) 2005-01-11 2005-01-11 Vaporization source with baffle
US11/032,899 2005-01-11
PCT/US2006/000665 WO2006076287A1 (en) 2005-01-11 2006-01-06 Vaporization source with baffle

Publications (3)

Publication Number Publication Date
JP2008527174A JP2008527174A (ja) 2008-07-24
JP2008527174A5 JP2008527174A5 (enExample) 2009-02-05
JP5080274B2 true JP5080274B2 (ja) 2012-11-21

Family

ID=36230767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007550538A Expired - Lifetime JP5080274B2 (ja) 2005-01-11 2006-01-06 バッフル部材を備える蒸発源

Country Status (4)

Country Link
US (1) US7166169B2 (enExample)
JP (1) JP5080274B2 (enExample)
KR (1) KR101200862B1 (enExample)
WO (1) WO2006076287A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7364772B2 (en) * 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
US8512806B2 (en) 2008-08-12 2013-08-20 Momentive Performance Materials Inc. Large volume evaporation source
US20110195187A1 (en) * 2010-02-10 2011-08-11 Apple Inc. Direct liquid vaporization for oleophobic coatings
JP2012132049A (ja) * 2010-12-20 2012-07-12 Mitsubishi Heavy Ind Ltd 真空蒸着装置及び真空蒸着方法
US8715779B2 (en) 2011-06-24 2014-05-06 Apple Inc. Enhanced glass impact durability through application of thin films

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US99860A (en) * 1870-02-15 Improved apparatus for generating illuminating-gas
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
US2447789A (en) * 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
JPS5943876A (ja) 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発源
US4551303A (en) * 1982-09-04 1985-11-05 Konishiroku Photo Industry Co., Ltd. Method of using an evaporation source
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
JPH05139882A (ja) * 1991-11-20 1993-06-08 Hitachi Ltd 分子線源
DE4204938C1 (enExample) * 1992-02-19 1993-06-24 Leybold Ag, 6450 Hanau, De
JP3502261B2 (ja) * 1998-05-11 2004-03-02 松下電器産業株式会社 樹脂薄膜の製造方法
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
US20030015140A1 (en) * 2001-04-26 2003-01-23 Eastman Kodak Company Physical vapor deposition of organic layers using tubular sources for making organic light-emitting devices
US7099457B2 (en) * 2001-07-17 2006-08-29 Comverse Ltd. Personal ring tone message indicator
TW519852B (en) 2001-10-18 2003-02-01 Opto Tech Corp Organic light emitting device capable of projecting white light source and its manufacturing method
US20030101937A1 (en) 2001-11-28 2003-06-05 Eastman Kodak Company Thermal physical vapor deposition source for making an organic light-emitting device
KR100467805B1 (ko) 2002-01-22 2005-01-24 학교법인연세대학교 박막두께분포를 조절 가능한 선형 및 평면형 증발원
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
WO2003079420A1 (en) 2002-03-19 2003-09-25 Innovex. Inc. Evaporation source for deposition process and insulation fixing plate, and heating wire winding plate and method for fixing heating wire
KR100889758B1 (ko) * 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
US6717358B1 (en) * 2002-10-09 2004-04-06 Eastman Kodak Company Cascaded organic electroluminescent devices with improved voltage stability
WO2004060026A1 (ja) 2002-12-26 2004-07-15 Semiconductor Energy Laboratory Co., Ltd. 有機発光素子
US20050051097A1 (en) * 2003-09-08 2005-03-10 Jan Koninckx Covering assembly for crucible used for evaporation of raw materials
US7364772B2 (en) 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
CN101847653B (zh) 2004-05-21 2013-08-28 株式会社半导体能源研究所 发光元件及使用该元件的发光装置

Also Published As

Publication number Publication date
JP2008527174A (ja) 2008-07-24
KR101200862B1 (ko) 2012-11-13
WO2006076287A1 (en) 2006-07-20
US20060150915A1 (en) 2006-07-13
KR20070093416A (ko) 2007-09-18
US7166169B2 (en) 2007-01-23

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