JP5080274B2 - バッフル部材を備える蒸発源 - Google Patents
バッフル部材を備える蒸発源 Download PDFInfo
- Publication number
- JP5080274B2 JP5080274B2 JP2007550538A JP2007550538A JP5080274B2 JP 5080274 B2 JP5080274 B2 JP 5080274B2 JP 2007550538 A JP2007550538 A JP 2007550538A JP 2007550538 A JP2007550538 A JP 2007550538A JP 5080274 B2 JP5080274 B2 JP 5080274B2
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- JP
- Japan
- Prior art keywords
- evaporation source
- organic material
- boat
- bis
- baffle member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Description
a)有機材料を収容するキャビティを有するボートと;
b)互いに離れた複数の開口部を持っていて上記ボートを閉じさせる開口プレートと;
c)上記キャビティの中にあって上記開口プレートと上記有機材料の間に設けられた加熱素子と;
d)上記加熱素子と接触していて、その加熱素子からのエネルギーを吸収する少なくとも3つの面を備え、第1の面はエネルギーを上記開口プレートへと向かわせ、第2の面と第3の面はエネルギーを上記ボートの壁部と上記有機材料へと向かわせるバッフル部材とを備える蒸発源によって達成される。
1,1-ビス(4-ジ-p-トリルアミノフェニル)シクロヘキサン;
1,1-ビス(4-ジ-p-トリルアミノフェニル)-4-フェニルシクロヘキサン;
N,N,N',N'-テトラフェニル-4,4'"-ジアミノ-1,1':4',1":4",1'"-クアテルフェニル;
ビス(4-ジメチルアミノ-2-メチルフェニル)フェニルメタン;
1,4-ビス[2-[4-[N,N-ジ(p-トリル)アミノ]フェニル]ビニル]ベンゼン(BDTAPVB);
N,N,N',N'-テトラ-p-トリル-4,4'-ジアミノビフェニル;
N,N,N',N'-テトラフェニル-4,4'-ジアミノビフェニル;
N,N,N',N'-テトラ-1-ナフチル-4,4'-ジアミノビフェニル;
N,N,N',N'-テトラ-2-ナフチル-4,4'-ジアミノビフェニル;
N-フェニルカルバゾール;
4,4'-ビス[N-(1-ナフチル)-N-フェニルアミノ]ビフェニル(NPB);
4,4'-ビス[N-(1-ナフチル)-N-(2-ナフチル)アミノ]ビフェニル(TNB);
4,4'-ビス[N-(1-ナフチル)-N-フェニルアミノ]-p-テルフェニル;
4,4'-ビス[N-(2-ナフチル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(3-アセナフテニル)-N-フェニルアミノ]ビフェニル;
1,5-ビス[N-(1-ナフチル)-N-フェニルアミノ]ナフタレン;
4,4'-ビス[N-(9-アントリル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(1-アントリル)-N-フェニルアミノ]-p-テルフェニル;
4,4'-ビス[N-(2-フェナントリル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(8-フルオランテニル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(2-ピレニル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(2-ナフタセニル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(2-ペリレニル)-N-フェニルアミノ]ビフェニル;
4,4'-ビス[N-(1-コロネニル)-N-フェニルアミノ]ビフェニル;
2,6-ビス(ジ-p-トリルアミノ)ナフタレン;
2,6-ビス[ジ-(1-ナフチル)アミノ]ナフタレン;
2,6-ビス[N-(1-ナフチル)-N-(2-ナフチル)アミノ]ナフタレン;
N,N,N',N'-テトラ(2-ナフチル)-4,4"-ジアミノ-p-テルフェニル;
4,4'-ビス{N-フェニル-N-[4-(1-ナフチル)-フェニル]アミノ}ビフェニル;
2,6-ビス[N,N-ジ(2-ナフチル)アミノ]フルオレン;
4,4',4"-トリス[(3-メチルフェニル)フェニルアミノ]トリフェニルアミン(MTDATA);
4,4'-ビス[N-(3-メチルフェニル)-N-フェニルアミノ]ビフェニル(TPD)。
CO-1:アルミニウムトリスオキシン[別名、トリス(8-キノリノラト)アルミニウム(III)]
CO-2:マグネシウムビスオキシン[別名、ビス(8-キノリノラト)マグネシウム(II)]
CO-3:ビス[ベンゾ{f}-8-キノリノラト]亜鉛(II)
CO-4:ビス(2-メチル-8-キノリノラト)アルミニウム(III)-μ-オキソ-ビス(2-メチル-8-キノリノラト)アルミニウム(III)
CO-5:インジウムトリスオキシン[別名、トリス(8-キノリノラト)インジウム]
CO-6:アルミニウムトリス(5-メチルオキシン)[別名、トリス(5-メチル-8-キノリノラト)アルミニウム(III)]
CO-7:リチウムオキシン[別名、(8-キノリノラト)リチウム(I)]
CO-8:ガリウムオキシン[別名、トリス(8-キノリノラト)ガリウム(III)]
CO-9:ジルコニウムオキシン[別名、テトラ(8-キノリノラト)ジルコニウム(IV)]
15 キャビティ
20 ボート
25 有機材料
30 ボートの壁部
40 開口プレート
45 開口部
50 加熱素子
60 上部
65 距離
70 バッフル部材
75 第1の面
80 第2の面
85 第3の面
90 クランプ手段
95 ガイド
100 支柱
105 蒸気の通路
110 開放端にされたカラー
115 閉鎖端にされたカラー
120 面
125 面
Claims (1)
- 有機材料を堆積させるための蒸発源であって、
a)有機材料を収容するキャビティを有するボートと;
b)互いに離れた複数の開口部を持っていて上記ボートを閉じさせる開口プレートと;
c)上記キャビティの中にあって上記開口プレートと上記有機材料の間に設けられた加熱素子と;
d)上記加熱素子と接触していて、その加熱素子からのエネルギーを吸収する少なくとも3つの面を備え、第1の面はエネルギーを上記開口プレートへと向かわせ、第2の面と第3の面はエネルギーを上記ボートの壁部と上記有機材料へと向かわせるように三角形の周辺部を有するバッフル部材と
を備える蒸発源。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/032,899 | 2005-01-11 | ||
US11/032,899 US7166169B2 (en) | 2005-01-11 | 2005-01-11 | Vaporization source with baffle |
PCT/US2006/000665 WO2006076287A1 (en) | 2005-01-11 | 2006-01-06 | Vaporization source with baffle |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008527174A JP2008527174A (ja) | 2008-07-24 |
JP2008527174A5 JP2008527174A5 (ja) | 2009-02-05 |
JP5080274B2 true JP5080274B2 (ja) | 2012-11-21 |
Family
ID=36230767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007550538A Active JP5080274B2 (ja) | 2005-01-11 | 2006-01-06 | バッフル部材を備える蒸発源 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7166169B2 (ja) |
JP (1) | JP5080274B2 (ja) |
KR (1) | KR101200862B1 (ja) |
WO (1) | WO2006076287A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7364772B2 (en) * | 2004-03-22 | 2008-04-29 | Eastman Kodak Company | Method for coating an organic layer onto a substrate in a vacuum chamber |
US8512806B2 (en) | 2008-08-12 | 2013-08-20 | Momentive Performance Materials Inc. | Large volume evaporation source |
US20110195187A1 (en) * | 2010-02-10 | 2011-08-11 | Apple Inc. | Direct liquid vaporization for oleophobic coatings |
JP2012132049A (ja) * | 2010-12-20 | 2012-07-12 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置及び真空蒸着方法 |
US8715779B2 (en) | 2011-06-24 | 2014-05-06 | Apple Inc. | Enhanced glass impact durability through application of thin films |
Family Cites Families (27)
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---|---|---|---|---|
US99860A (en) * | 1870-02-15 | Improved apparatus for generating illuminating-gas | ||
US2440135A (en) * | 1944-08-04 | 1948-04-20 | Alexander Paul | Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers |
US2447789A (en) | 1945-03-23 | 1948-08-24 | Polaroid Corp | Evaporating crucible for coating apparatus |
US4551303A (en) * | 1982-09-04 | 1985-11-05 | Konishiroku Photo Industry Co., Ltd. | Method of using an evaporation source |
JPS5943876A (ja) | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発源 |
US4885211A (en) | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
JPH05139882A (ja) * | 1991-11-20 | 1993-06-08 | Hitachi Ltd | 分子線源 |
DE4204938C1 (ja) * | 1992-02-19 | 1993-06-24 | Leybold Ag, 6450 Hanau, De | |
JP3502261B2 (ja) * | 1998-05-11 | 2004-03-02 | 松下電器産業株式会社 | 樹脂薄膜の製造方法 |
JP2000068055A (ja) | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機el素子用蒸発源、この有機el素子用蒸発源を用いた有機el素子の製造装置および製造方法 |
US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
US6237529B1 (en) * | 2000-03-03 | 2001-05-29 | Eastman Kodak Company | Source for thermal physical vapor deposition of organic electroluminescent layers |
US20030015140A1 (en) * | 2001-04-26 | 2003-01-23 | Eastman Kodak Company | Physical vapor deposition of organic layers using tubular sources for making organic light-emitting devices |
US7099457B2 (en) * | 2001-07-17 | 2006-08-29 | Comverse Ltd. | Personal ring tone message indicator |
TW519852B (en) | 2001-10-18 | 2003-02-01 | Opto Tech Corp | Organic light emitting device capable of projecting white light source and its manufacturing method |
US20030101937A1 (en) | 2001-11-28 | 2003-06-05 | Eastman Kodak Company | Thermal physical vapor deposition source for making an organic light-emitting device |
KR100467805B1 (ko) | 2002-01-22 | 2005-01-24 | 학교법인연세대학교 | 박막두께분포를 조절 가능한 선형 및 평면형 증발원 |
US20030168013A1 (en) * | 2002-03-08 | 2003-09-11 | Eastman Kodak Company | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device |
WO2003079420A1 (en) | 2002-03-19 | 2003-09-25 | Innovex. Inc. | Evaporation source for deposition process and insulation fixing plate, and heating wire winding plate and method for fixing heating wire |
KR100889758B1 (ko) * | 2002-09-03 | 2009-03-20 | 삼성모바일디스플레이주식회사 | 유기박막 형성장치의 가열용기 |
US6717358B1 (en) | 2002-10-09 | 2004-04-06 | Eastman Kodak Company | Cascaded organic electroluminescent devices with improved voltage stability |
JP4519652B2 (ja) | 2002-12-26 | 2010-08-04 | 株式会社半導体エネルギー研究所 | 有機発光素子 |
US20050051097A1 (en) * | 2003-09-08 | 2005-03-10 | Jan Koninckx | Covering assembly for crucible used for evaporation of raw materials |
US7364772B2 (en) | 2004-03-22 | 2008-04-29 | Eastman Kodak Company | Method for coating an organic layer onto a substrate in a vacuum chamber |
CN101847653B (zh) | 2004-05-21 | 2013-08-28 | 株式会社半导体能源研究所 | 发光元件及使用该元件的发光装置 |
-
2005
- 2005-01-11 US US11/032,899 patent/US7166169B2/en active Active
-
2006
- 2006-01-06 JP JP2007550538A patent/JP5080274B2/ja active Active
- 2006-01-06 KR KR1020077015731A patent/KR101200862B1/ko active IP Right Grant
- 2006-01-06 WO PCT/US2006/000665 patent/WO2006076287A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US7166169B2 (en) | 2007-01-23 |
KR20070093416A (ko) | 2007-09-18 |
KR101200862B1 (ko) | 2012-11-13 |
US20060150915A1 (en) | 2006-07-13 |
JP2008527174A (ja) | 2008-07-24 |
WO2006076287A1 (en) | 2006-07-20 |
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