JP5073566B2 - 発光装置の作製方法 - Google Patents

発光装置の作製方法 Download PDF

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Publication number
JP5073566B2
JP5073566B2 JP2008107455A JP2008107455A JP5073566B2 JP 5073566 B2 JP5073566 B2 JP 5073566B2 JP 2008107455 A JP2008107455 A JP 2008107455A JP 2008107455 A JP2008107455 A JP 2008107455A JP 5073566 B2 JP5073566 B2 JP 5073566B2
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JP
Japan
Prior art keywords
substrate
layer
light
organic compound
electrode
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Expired - Fee Related
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JP2008107455A
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English (en)
Japanese (ja)
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JP2008293963A5 (https=
JP2008293963A (ja
Inventor
浩平 横山
寿雄 池田
陽輔 佐藤
智哉 青山
隆広 井辺
吉晴 平形
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2008107455A priority Critical patent/JP5073566B2/ja
Publication of JP2008293963A publication Critical patent/JP2008293963A/ja
Publication of JP2008293963A5 publication Critical patent/JP2008293963A5/ja
Application granted granted Critical
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Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/15—Hole transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
    • H10K50/13—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light comprising stacked EL layers within one EL unit
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/6875—Shapes or dispositions thereof being on a metallic substrate, e.g. insulated metal substrates [IMS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
JP2008107455A 2007-04-27 2008-04-17 発光装置の作製方法 Expired - Fee Related JP5073566B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008107455A JP5073566B2 (ja) 2007-04-27 2008-04-17 発光装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007119084 2007-04-27
JP2007119084 2007-04-27
JP2008107455A JP5073566B2 (ja) 2007-04-27 2008-04-17 発光装置の作製方法

Publications (3)

Publication Number Publication Date
JP2008293963A JP2008293963A (ja) 2008-12-04
JP2008293963A5 JP2008293963A5 (https=) 2011-05-12
JP5073566B2 true JP5073566B2 (ja) 2012-11-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008107455A Expired - Fee Related JP5073566B2 (ja) 2007-04-27 2008-04-17 発光装置の作製方法

Country Status (3)

Country Link
US (1) US8367152B2 (https=)
JP (1) JP5073566B2 (https=)
KR (1) KR101424791B1 (https=)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8405971B2 (en) 2007-12-18 2013-03-26 Teradyne, Inc. Disk drive transport, clamping and testing
US8451608B2 (en) 2008-04-17 2013-05-28 Teradyne, Inc. Temperature control within storage device testing systems
US8466699B2 (en) 2009-07-15 2013-06-18 Teradyne, Inc. Heating storage devices in a testing system
US8482915B2 (en) 2008-04-17 2013-07-09 Teradyne, Inc. Temperature control within disk drive testing systems
US8547123B2 (en) 2009-07-15 2013-10-01 Teradyne, Inc. Storage device testing system with a conductive heating assembly
US8628239B2 (en) 2009-07-15 2014-01-14 Teradyne, Inc. Storage device temperature sensing
US8655482B2 (en) 2008-04-17 2014-02-18 Teradyne, Inc. Enclosed operating area for storage device testing systems
US8687356B2 (en) 2010-02-02 2014-04-01 Teradyne, Inc. Storage device testing system cooling
US8687349B2 (en) 2010-07-21 2014-04-01 Teradyne, Inc. Bulk transfer of storage devices using manual loading
US8712580B2 (en) 2008-04-17 2014-04-29 Teradyne, Inc. Transferring storage devices within storage device testing systems
US10775408B2 (en) 2018-08-20 2020-09-15 Teradyne, Inc. System for testing devices inside of carriers
US10845410B2 (en) 2017-08-28 2020-11-24 Teradyne, Inc. Automated test system having orthogonal robots
US10948534B2 (en) 2017-08-28 2021-03-16 Teradyne, Inc. Automated test system employing robotics
WO2022125505A1 (en) * 2020-12-07 2022-06-16 Lumileds Llc Pixelated wavelength-conversion layer

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI477195B (zh) * 2007-04-27 2015-03-11 Semiconductor Energy Lab 發光裝置的製造方法
KR101689519B1 (ko) * 2007-12-26 2016-12-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법
JP5416987B2 (ja) 2008-02-29 2014-02-12 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
JP2009231277A (ja) * 2008-02-29 2009-10-08 Semiconductor Energy Lab Co Ltd 製造装置
JP5238544B2 (ja) * 2008-03-07 2013-07-17 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
US8409672B2 (en) * 2008-04-24 2013-04-02 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device
US8405909B2 (en) * 2008-05-09 2013-03-26 Semiconductor Energy Laboratories Co., Ltd. Deposition donor substrate and deposition method using the same
DE102008054435A1 (de) * 2008-12-09 2010-06-10 Universität Zu Köln Organische Leuchtdiode mit optischem Resonator nebst Herstellungsverfahren
KR101563914B1 (ko) 2009-03-04 2015-10-28 제록스 코포레이션 구조화 유기 필름
KR101570535B1 (ko) * 2009-05-12 2015-11-20 엘지디스플레이 주식회사 유기발광다이오드 표시장치의 제조방법
DE102009041324A1 (de) * 2009-09-15 2011-03-24 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Herstellung von organischen photoaktiven Bauelementen, insbesondere von organischen Leuchtdioden
JP5747022B2 (ja) 2010-03-18 2015-07-08 株式会社半導体エネルギー研究所 成膜方法及び成膜用基板の作製方法
US8951816B2 (en) 2010-03-18 2015-02-10 Semiconductor Energy Laboratory Co., Ltd. Film forming method
US8815352B2 (en) 2010-03-18 2014-08-26 Semiconductor Energy Laboratory Co., Ltd. Film forming method and method for manufacturing film-formation substrate
US9567425B2 (en) 2010-06-15 2017-02-14 Xerox Corporation Periodic structured organic films
US8257889B2 (en) 2010-07-28 2012-09-04 Xerox Corporation Imaging members comprising capped structured organic film compositions
US8318892B2 (en) 2010-07-28 2012-11-27 Xerox Corporation Capped structured organic film compositions
US8697322B2 (en) 2010-07-28 2014-04-15 Xerox Corporation Imaging members comprising structured organic films
US8119315B1 (en) 2010-08-12 2012-02-21 Xerox Corporation Imaging members for ink-based digital printing comprising structured organic films
US8119314B1 (en) 2010-08-12 2012-02-21 Xerox Corporation Imaging devices comprising structured organic films
JP5621624B2 (ja) * 2011-01-28 2014-11-12 ソニー株式会社 蒸発源およびこれを用いた蒸着装置ならびに蒸着方法
US8759473B2 (en) 2011-03-08 2014-06-24 Xerox Corporation High mobility periodic structured organic films
US8247142B1 (en) 2011-06-30 2012-08-21 Xerox Corporation Fluorinated structured organic film compositions
US8353574B1 (en) 2011-06-30 2013-01-15 Xerox Corporation Ink jet faceplate coatings comprising structured organic films
US8410016B2 (en) 2011-07-13 2013-04-02 Xerox Corporation Application of porous structured organic films for gas storage
US8377999B2 (en) 2011-07-13 2013-02-19 Xerox Corporation Porous structured organic film compositions
US8313560B1 (en) 2011-07-13 2012-11-20 Xerox Corporation Application of porous structured organic films for gas separation
US8372566B1 (en) 2011-09-27 2013-02-12 Xerox Corporation Fluorinated structured organic film photoreceptor layers
US8460844B2 (en) 2011-09-27 2013-06-11 Xerox Corporation Robust photoreceptor surface layer
WO2013096543A1 (en) * 2011-12-20 2013-06-27 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same
US8529997B2 (en) 2012-01-17 2013-09-10 Xerox Corporation Methods for preparing structured organic film micro-features by inkjet printing
KR101951029B1 (ko) * 2012-06-13 2019-04-26 삼성디스플레이 주식회사 증착용 마스크 및 이를 이용한 유기 발광 표시장치의 제조방법
US8765340B2 (en) 2012-08-10 2014-07-01 Xerox Corporation Fluorinated structured organic film photoreceptor layers containing fluorinated secondary components
US8906462B2 (en) 2013-03-14 2014-12-09 Xerox Corporation Melt formulation process for preparing structured organic films

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4325885A1 (de) * 1993-08-02 1995-02-09 Basf Ag Elektrolumineszierende Anordnung
JP2848207B2 (ja) 1993-09-17 1999-01-20 凸版印刷株式会社 有機薄膜ｅｌ素子
US5688551A (en) * 1995-11-13 1997-11-18 Eastman Kodak Company Method of forming an organic electroluminescent display panel
KR100195175B1 (ko) 1996-12-23 1999-06-15 손욱 유기전자발광소자 유기박막용 도너필름, 이를 이용한 유기전자발광소자의 제조방법 및 그 방법에 따라 제조된 유기전자발광소자
US5904961A (en) * 1997-01-24 1999-05-18 Eastman Kodak Company Method of depositing organic layers in organic light emitting devices
JPH118069A (ja) 1997-02-17 1999-01-12 Nippon Steel Corp 有機エレクトロルミネッセンス素子およびその製造方法
US5937272A (en) * 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
US7090890B1 (en) * 1998-04-13 2006-08-15 The Trustees Of Princeton University Modification of polymer optoelectronic properties after film formation by impurity addition or removal
US6114088A (en) * 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
US6242152B1 (en) * 2000-05-03 2001-06-05 3M Innovative Properties Thermal transfer of crosslinked materials from a donor to a receptor
US6855384B1 (en) * 2000-09-15 2005-02-15 3M Innovative Properties Company Selective thermal transfer of light emitting polymer blends
US6699597B2 (en) * 2001-08-16 2004-03-02 3M Innovative Properties Company Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein
GB0204989D0 (en) * 2002-03-04 2002-04-17 Opsys Ltd Phosphorescent compositions and organic light emitting devices containing them
JP4381821B2 (ja) * 2002-03-09 2009-12-09 シーディーティー オックスフォード リミテッド 重合組成物及びそれを含む有機発光装置
TWI336905B (en) * 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
JP4401665B2 (ja) * 2003-03-20 2010-01-20 株式会社半導体エネルギー研究所 電界発光素子
US7033711B2 (en) * 2003-07-16 2006-04-25 Eastman Kodak Company Aperture ratio or resolution of an OLED device by limiting the edge taper region
KR100611145B1 (ko) * 2003-11-25 2006-08-09 삼성에스디아이 주식회사 풀칼라 유기 전계 발광 소자용 도너 필름, 도너 필름의제조 방법 및 이 도너 필름을 사용한 풀칼라 유기 전계발광 소자
KR100611767B1 (ko) * 2004-08-30 2006-08-10 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 그 필름을 사용하여 제조되는유기 전계 발광 소자의 제조 방법
KR100667069B1 (ko) * 2004-10-19 2007-01-10 삼성에스디아이 주식회사 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법
WO2006045085A1 (en) 2004-10-20 2006-04-27 E.I. Dupont De Nemours And Company Donor element for thermal transfer
KR20060109373A (ko) * 2005-04-15 2006-10-20 삼성전기주식회사 유기전자소자 제조방법
JP2006309995A (ja) * 2005-04-27 2006-11-09 Sony Corp 転写用基板および表示装置の製造方法ならびに表示装置

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8549912B2 (en) 2007-12-18 2013-10-08 Teradyne, Inc. Disk drive transport, clamping and testing
US8405971B2 (en) 2007-12-18 2013-03-26 Teradyne, Inc. Disk drive transport, clamping and testing
US8467180B2 (en) 2007-12-18 2013-06-18 Teradyne, Inc. Disk drive transport, clamping and testing
US8655482B2 (en) 2008-04-17 2014-02-18 Teradyne, Inc. Enclosed operating area for storage device testing systems
US8712580B2 (en) 2008-04-17 2014-04-29 Teradyne, Inc. Transferring storage devices within storage device testing systems
US8451608B2 (en) 2008-04-17 2013-05-28 Teradyne, Inc. Temperature control within storage device testing systems
US8482915B2 (en) 2008-04-17 2013-07-09 Teradyne, Inc. Temperature control within disk drive testing systems
US8547123B2 (en) 2009-07-15 2013-10-01 Teradyne, Inc. Storage device testing system with a conductive heating assembly
US8466699B2 (en) 2009-07-15 2013-06-18 Teradyne, Inc. Heating storage devices in a testing system
US8628239B2 (en) 2009-07-15 2014-01-14 Teradyne, Inc. Storage device temperature sensing
US8687356B2 (en) 2010-02-02 2014-04-01 Teradyne, Inc. Storage device testing system cooling
US8687349B2 (en) 2010-07-21 2014-04-01 Teradyne, Inc. Bulk transfer of storage devices using manual loading
US10845410B2 (en) 2017-08-28 2020-11-24 Teradyne, Inc. Automated test system having orthogonal robots
US10948534B2 (en) 2017-08-28 2021-03-16 Teradyne, Inc. Automated test system employing robotics
US10775408B2 (en) 2018-08-20 2020-09-15 Teradyne, Inc. System for testing devices inside of carriers
WO2022125505A1 (en) * 2020-12-07 2022-06-16 Lumileds Llc Pixelated wavelength-conversion layer
US11881542B2 (en) 2020-12-07 2024-01-23 Lumileds Llc Pixelated wavelength-conversion layer

Also Published As

Publication number Publication date
KR101424791B1 (ko) 2014-07-31
KR20080096376A (ko) 2008-10-30
JP2008293963A (ja) 2008-12-04
US8367152B2 (en) 2013-02-05
US20080268135A1 (en) 2008-10-30

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