JP5063057B2 - Aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, electrode material for electrolytic capacitor, and aluminum electrolytic capacitor - Google Patents

Aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, electrode material for electrolytic capacitor, and aluminum electrolytic capacitor Download PDF

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JP5063057B2
JP5063057B2 JP2006222044A JP2006222044A JP5063057B2 JP 5063057 B2 JP5063057 B2 JP 5063057B2 JP 2006222044 A JP2006222044 A JP 2006222044A JP 2006222044 A JP2006222044 A JP 2006222044A JP 5063057 B2 JP5063057 B2 JP 5063057B2
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敏 穂積
智明 山ノ井
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Showa Denko KK
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Description

この発明は、電解コンデンサ電極用アルミニウム材、電解コンデンサ用電極材の製造方法、電解コンデンサ用電極材ならびにアルミニウム電解コンデンサに関する。   The present invention relates to an aluminum material for electrolytic capacitor electrodes, a method for producing an electrode material for electrolytic capacitors, an electrode material for electrolytic capacitors, and an aluminum electrolytic capacitor.

なお、この明細書において、「アルミニウム」の語はアルミニウム及びその合金の両者を含む意味で用い、またアルミニウム材には少なくともアルミニウム箔、アルミニウム板及びこれらの成形体が含まれる。   In this specification, the term “aluminum” is used to include both aluminum and its alloys, and the aluminum material includes at least an aluminum foil, an aluminum plate, and a molded body thereof.

アルミニウム電解コンデンサの電極として一般に用いられるアルミニウム材は、拡面率を高めて静電容量を大きくするために、電気化学的あるいは化学的エッチング処理が施される。このエッチング処理により形成されるエッチピットを高密度かつ均一に発生させて拡面率を高め、静電容量の増大を図るための種々の方法が提案されており、その一つとしてアルミニウム材における主要不純物元素であるFe、Si、Cuの含有量制限に加えて、これら以外の各種元素を添加しその含有量を制限する方法が知られている。例えば、Ti、V、Cr、Mn、Zr、Na、Ga、Mgの含有量を制限する方法(例えば特許文献1)や、Ti、V、Zrを適宜添加する方法(例えば特許文献2)が開示されている。
特許第3370246号公報 特開2001−155970号公報
An aluminum material generally used as an electrode of an aluminum electrolytic capacitor is subjected to an electrochemical or chemical etching treatment in order to increase the surface expansion ratio and increase the capacitance. Various methods have been proposed to increase the surface expansion ratio and increase the capacitance by generating etch pits formed by this etching process with high density and uniformity. In addition to limiting the contents of impurity elements Fe, Si, and Cu, a method of adding various elements other than these and limiting the contents is known. For example, a method for limiting the content of Ti, V, Cr, Mn, Zr, Na, Ga, and Mg (for example, Patent Document 1) and a method for appropriately adding Ti, V, and Zr (for example, Patent Document 2) are disclosed. Has been.
Japanese Patent No. 3370246 JP 2001-155970 A

しかしながら、上述した特許文献に記載された方法では、アルミニウム材に対しエッチピットを高密度かつ均一に発生させることには限界があり、昨今の電解コンデンサの高静電容量化の要求に対して十分に応え得るものではなかった。   However, in the method described in the above-mentioned patent document, there is a limit to the generation of etch pits with high density and uniformity in an aluminum material, which is sufficient for the recent demand for higher capacitance of electrolytic capacitors. It was not something that could respond.

この発明は、このような実情に鑑みてなされたものであって、エッチピットを高密度かつ均一に発生させて拡面率を高め、静電容量の増大を図ることができる電解コンデンサ電極用アルミニウム材、電解コンデンサ用電極材の製造方法、電解コンデンサ用電極材ならびにアルミニウム電解コンデンサの提供を目的とする。   The present invention has been made in view of such a situation, and is an aluminum for an electrolytic capacitor electrode that can increase etch area by increasing the density and uniformity of etch pits, thereby increasing the capacitance. An object of the present invention is to provide an electrode material for an electrolytic capacitor, an electrode material for an electrolytic capacitor, and an aluminum electrolytic capacitor.

前記目的を達成するために、この発明の電解コンデンサ電極用アルミニウム材は、下記(1)〜(9)に記載された構成を有する。   In order to achieve the object, the aluminum material for electrolytic capacitor electrodes of the present invention has a configuration described in the following (1) to (9).

(1)アルミニウム純度が99.9質量%以上であり、Tiを0.0005質量%を超え0.0025質量%以下、Znを0.0004質量%以上0.006質量%以下含有し、かつ不純物として、Gaが0.002質量%以下、Vが0.001質量%以下、Zrが0.001質量%以下、Crが0.001質量%以下にそれぞれ規制されてなる電解コンデンサ電極用アルミニウム材。   (1) Aluminum purity is 99.9 mass% or more, Ti is over 0.0005 mass% and 0.0025 mass% or less, Zn is 0.0004 mass% or more and 0.006 mass% or less, and Ga is 0.002 mass% or less, V Is an aluminum material for an electrolytic capacitor electrode, which is regulated to 0.001% by mass or less, Zr to 0.001% by mass or less, and Cr to 0.001% by mass or less.

(2)アルミニウム純度が99.9質量%以上であり、Tiを0.0005質量%を超え0.0025質量%以下、Znを0.0004質量%以上0.006質量%以下含有し、さらにSi含有量が0.0003質量%以上0.008質量%以下、Fe含有量が0.0005質量%以上0.008質量%以下、Cu含有量が0.001質量%以上0.008質量%以下、Pb含有量が0.00002質量%以上0.0003質量%以下を含有し、不純物として、Gaが0.002質量%以下、Vが0.001質量%以下、Zrが0.001質量%以下、Crが0.001質量%以下にそれぞれ規制され、かつ前記元素以外の不純物元素がそれぞれ0.0005質量%以下に規制されてなる電解コンデンサ電極用アルミニウム材。   (2) Aluminum purity is 99.9% by mass or more, Ti is over 0.0005% by mass and 0.0025% by mass or less, Zn is 0.0004% by mass to 0.006% by mass and Si content is 0.0003% by mass to 0.008% by mass Hereinafter, Fe content is 0.0005 mass% or more and 0.008 mass% or less, Cu content is 0.001 mass% or more and 0.008 mass% or less, Pb content is 0.00002 mass% or more and 0.0003 mass% or less, and Ga is 0.002 as impurities. Electrolytic capacitor electrode formed by mass% or less, V is 0.001 mass% or less, Zr is 0.001 mass% or less, Cr is regulated to 0.001 mass% or less, and impurity elements other than the elements are regulated to 0.0005 mass% or less. Aluminum material.

(3)Ti含有量とZn含有量の関係が、図1で示すTi含有量(X軸)、Zn含有量(Y軸)を座標軸とした座標系において点A、B、C、D、E、Fを結ぶ線によって囲まれる領域(線上を含む)を満足する請求項1または2に記載の電解コンデンサ電極用アルミニウム材。   (3) The relationship between Ti content and Zn content is point A, B, C, D, E in the coordinate system with the Ti content (X axis) and Zn content (Y axis) shown in FIG. The aluminum material for electrolytic capacitor electrodes according to claim 1 or 2, which satisfies a region (including on the line) surrounded by a line connecting F and F.

(4)Bを0.00001質量%以上0.0002質量%以下含有する前項1〜3のいずれか1項に記載の電解コンデンサ電極用アルミニウム材。   (4) The aluminum material for electrolytic capacitor electrodes as recited in any one of the aforementioned Items 1 to 3, containing B in an amount of 0.00001% by mass to 0.0002% by mass.

(5)前項1〜4のいずれか1項に記載されたアルミニウム材に、エッチングを実施する工程を含むことを特徴とする電解コンデンサ用電極材の製造方法。   (5) The manufacturing method of the electrode material for electrolytic capacitors characterized by including the process of etching in the aluminum material described in any one of the preceding clauses 1-4.

(6)エッチングの少なくとも一部が直流電解エッチングである前項5に記載の電解コンデンサ用電極材の製造方法。   (6) The method for producing an electrode material for an electrolytic capacitor as described in 5 above, wherein at least a part of the etching is direct current electrolytic etching.

(7)前項5または前項6に記載の製造方法によって製造されたアルミニウム電解コンデンサ用電極材。   (7) An electrode material for an aluminum electrolytic capacitor produced by the production method according to the above item 5 or 6.

(8)陽極材として用いられる前項7に記載のアルミニウム電解コンデンサ用電極材。   (8) The electrode material for an aluminum electrolytic capacitor as described in 7 above, which is used as an anode material.

(9)電極材として前項5または前項6に記載の製造方法によって製造された電解コンデンサ用電極材が用いられていることを特徴とするアルミニウム電解コンデンサ。   (9) An aluminum electrolytic capacitor characterized in that the electrode material for an electrolytic capacitor produced by the production method according to the above item 5 or 6 is used as the electrode material.

前項(1)の発明に係る電解コンデンサ電極用アルミニウム材によれば、アルミニウム純度が99.9質量%以上であり、Tiを0.0005質量%を超え0.0025質量%以下、Znを0.0004質量%以上0.006質量%以下含有し、かつ不純物として、Gaが0.002質量%以下、Vが0.001質量%以下、Zrが0.001質量%以下、Crが0.001質量%以下にそれぞれ規制されてなるから、エッチピットを高密度かつ均一に発生させ拡面率を高めることにより静電容量の増大を図ることができる。   According to the aluminum material for electrolytic capacitor electrodes according to the invention of (1) above, the aluminum purity is 99.9% by mass or more, Ti exceeds 0.0005% by mass and 0.0025% by mass or less, Zn is 0.0004% by mass or more and 0.006% by mass or less. Contained and as impurities, Ga is 0.002% by mass or less, V is 0.001% by mass or less, Zr is 0.001% by mass or less, and Cr is 0.001% by mass or less. The capacitance can be increased by increasing the area expansion ratio.

前項(2)の発明に係る電解コンデンサ電極用アルミニウム材によれば、アルミニウム純度が99.9質量%以上であり、Tiを0.0005質量%を超え0.0025質量%以下、Znを0.0004質量%以上0.006質量%以下含有し、さらにSi含有量が0.0003質量%以上0.008質量%以下、Fe含有量が0.0005質量%以上0.008質量%以下、Cu含有量が0.001質量%以上0.008質量%以下、Pb含有量が0.00002質量%以上0.0003質量%以下を含有し、不純物として、Gaが0.002質量%以下、Vが0.001質量%以下、Zrが0.001質量%以下、Crが0.001質量%以下にそれぞれ規制され、かつ前記元素以外の不純物元素がそれぞれ0.0005質量%以下に規制されてなるから、エッチピットをさらに高密度かつ均一に発生させ拡面率を高めることができ、さらに静電容量の増大を図ることができる。   According to the aluminum material for electrolytic capacitor electrodes according to the invention of (2) above, the aluminum purity is 99.9% by mass or more, Ti exceeds 0.0005% by mass and 0.0025% by mass or less, Zn is 0.0004% by mass or more and 0.006% by mass or less. Si content is 0.0003 mass% or more and 0.008 mass% or less, Fe content is 0.0005 mass% or more and 0.008 mass% or less, Cu content is 0.001 mass% or more and 0.008 mass% or less, Pb content is 0.00002 mass% More than 0.0003% by mass, impurities as Ga are 0.002% by mass or less, V is 0.001% by mass or less, Zr is 0.001% by mass or less, Cr is 0.001% by mass or less, and impurities other than the above elements Since each element is regulated to 0.0005% by mass or less, etch pits can be generated with higher density and uniformity to increase the area expansion ratio and to further increase the capacitance.

前項(3)の発明に係る電解コンデンサ電極用アルミニウム材によれば、Ti含有量とZn含有量の関係が、図1で示すTi含有量(X軸)、Zn含有量(Y軸)を座標軸とした座標系において点A、B、C、D、E、Fを結ぶ線によって囲まれる領域(線上を含む)を満足するから、エッチピットをさらに高密度かつ均一に発生させ拡面率を高めることができ、さらに静電容量の増大を図ることができる。   According to the aluminum material for electrolytic capacitor electrodes according to the invention of (3), the relationship between the Ti content and the Zn content is based on the Ti content (X axis) and the Zn content (Y axis) shown in FIG. In this coordinate system, the area surrounded by the line connecting points A, B, C, D, E, and F (including the area on the line) is satisfied, so that etch pits are generated with higher density and uniformity to increase the area expansion ratio. In addition, the capacitance can be increased.

前項(4)の発明に係る電解コンデンサ電極用アルミニウム材によれば、Bを0.00001質量%以上0.0002質量%以下含有するから、エッチピットを尚一層均一に発生させ拡面率を高めることができ、尚一層の静電容量の増大を図ることができる。   According to the aluminum material for electrolytic capacitor electrodes according to the invention of the preceding item (4), since B is contained in an amount of 0.00001% by mass or more and 0.0002% by mass or less, etch pits can be generated even more uniformly and the surface expansion rate can be increased. Further, the capacitance can be further increased.

前項(5)の発明に係る電解コンデンサ用電極材の製造方法によれば、前項1〜4のいずれか1項に記載されたアルミニウム材に、エッチングを実施する工程を含むことにより、大きな静電容量を有する電解コンデンサ用電極材を製造することができる。   According to the method for manufacturing an electrode material for an electrolytic capacitor according to the invention of (5), the aluminum material described in any one of items 1 to 4 includes a step of performing etching, thereby increasing the electrostatic capacity. An electrode material for electrolytic capacitors having a capacity can be manufactured.

前項(6)の発明に係る電解コンデンサ用電極材の製造方法によれば、エッチングの少なくとも一部が直流電解エッチングであるから、さらに大きな静電容量を有する電解コンデンサ用電極材を製造することができる。   According to the method for producing an electrode material for an electrolytic capacitor according to the invention of the preceding item (6), since at least a part of the etching is direct current electrolytic etching, an electrode material for an electrolytic capacitor having a larger capacitance can be produced. it can.

前項(7)の発明に係るアルミニウム電解コンデンサ電極用電極材は、前項5または前項6に記載の製造方法によって製造されたものであるから、大きな静電容量を有するものとなしうる。   Since the electrode material for an aluminum electrolytic capacitor electrode according to the invention of item (7) is manufactured by the manufacturing method according to item 5 or item 6, it can be considered to have a large capacitance.

前項(8)の発明に係るアルミニウム電解コンデンサ電極用電極材は、大きな静電容量を有する陽極材として用いることができる。   The electrode material for an aluminum electrolytic capacitor electrode according to the invention of (8) above can be used as an anode material having a large capacitance.

前項(9)の発明に係るアルミニウム電解コンデンサは、電極材として前項5または前項6に記載の製造方法によって製造された電解コンデンサ用電極材が用いられていることから、大きな静電容量を有するものととなし得る。   The aluminum electrolytic capacitor according to the invention of the preceding item (9) has a large capacitance because the electrode material for an electrolytic capacitor manufactured by the manufacturing method of the preceding item 5 or 6 is used as an electrode material. You can do it.

本発明に係る電解コンデンサ電極用アルミニウム材において、各元素の添加の意義および含有量の限定理由は次の通りである。   In the aluminum material for electrolytic capacitor electrodes according to the present invention, the significance of addition of each element and the reason for limiting the content are as follows.

[アルミニウム純度]
アルミニウム純度は99.9質量%以上が好ましく、99.9質量%未満ではエッチング時にエッチピットの集中や過溶解が生じ易くなり、大きな静電容量を得ることができない。さらに好ましいアルミニウム純度は99.96質量%以上であり、99.98質量%以上はなお一層好ましい。
[Aluminum purity]
The aluminum purity is preferably 99.9% by mass or more, and if it is less than 99.9% by mass, etch pit concentration or over-dissolution tends to occur during etching, and a large electrostatic capacity cannot be obtained. The aluminum purity is more preferably 99.96% by mass or more, and even more preferably 99.98% by mass or more.

[Ti含有量]
Tiはエッチピット発生を促進させる効果があり、その含有量は0.0005質量%を超え0.0025質量%以下が好ましい。Ti含有量が0.0005質量%以下ではエッチピット発生を促進する効果は小さく、静電容量を増大させる効果は小さい。望ましくは0.00065質量%以上であり、0.0008質量%以上がさらに望ましい。一方、0.0025質量%を超えて含有されると、エッチピットの集中による局部溶解が起こりやすく、静電容量の低下を引き起こす恐れがある。望ましくは0.0022質量%以下であり、0.0018質量%以下がさらに望ましい。
[Ti content]
Ti has an effect of promoting the generation of etch pits, and its content is preferably more than 0.0005 mass% and 0.0025 mass% or less. When the Ti content is 0.0005% by mass or less, the effect of promoting the generation of etch pits is small, and the effect of increasing the capacitance is small. Desirably, it is 0.00065 mass% or more, and more desirably 0.0008 mass% or more. On the other hand, when the content exceeds 0.0025% by mass, local dissolution due to concentration of etch pits is likely to occur, which may cause a decrease in capacitance. Desirably, it is 0.0022 mass% or less, and more desirably 0.0018 mass% or less.

[Zn含有量]
Znはアルミニウム素地の電位を僅かに卑にすることにより、エッチング反応の進行を促進する効果があり、その含有量は0.0004質量%以上、0.006質量%以下が好ましい。Zn含有量が0.0004質量%未満ではエッチング反応の進行を促進する効果は小さく、静電容量を増大させる効果は小さい。望ましくは0.0006質量%以上である。一方、0.006質量%を超えて含有されると、エッチング反応が過度に進行してしまうため、静電容量の低下を引き起こす恐れがある。望ましくは0.0045質量%以下であり、0.0036質量%以下がさらに望ましい。
[Zn content]
Zn has the effect of promoting the progress of the etching reaction by slightly lowering the potential of the aluminum substrate, and its content is preferably 0.0004 mass% or more and 0.006 mass% or less. When the Zn content is less than 0.0004 mass%, the effect of promoting the progress of the etching reaction is small, and the effect of increasing the capacitance is small. Desirably, it is 0.0006 mass% or more. On the other hand, if the content exceeds 0.006% by mass, the etching reaction proceeds excessively, which may cause a decrease in capacitance. Desirably, it is 0.0045 mass% or less, and more desirably 0.0036 mass% or less.

[Ti含有量とZn含有量との関係]
Ti含有量とZn含有量の関係が、図1で示すTi含有量(X軸)とZn含有量(Y軸)を座標軸とした座標系(Ti含有量質量%、Zn含有量質量%)において、点A(0.0005質量%、0.0004質量%)、点B(0.0015質量%、0.0004質量%)、点C(0.0025質量%、0.0007質量%)、点D(0.0025質量%、0.006質量%)、点E(0.0018質量%、0.006質量%)、点F(0.0005質量%、0.0016質量%)によって囲まれる領域(線上を含む)を満たすのが望ましい。この条件により、前記アルミニウム材のエッチング過程におけるTi、Znの効果がさらに助長され、静電容量の増大に寄与する。
[Relationship between Ti content and Zn content]
The relationship between the Ti content and the Zn content is shown in FIG. 1 in the coordinate system (Ti content mass%, Zn content mass%) with the Ti content (X axis) and the Zn content (Y axis) as coordinate axes. , Point A (0.0005 mass%, 0.0004 mass%), point B (0.0015 mass%, 0.0004 mass%), point C (0.0025 mass%, 0.0007 mass%), point D (0.0025 mass%, 0.006 mass%), point It is desirable to fill a region (including a line) surrounded by E (0.0018 mass%, 0.006 mass%) and point F (0.0005 mass%, 0.0016 mass%). This condition further promotes the effects of Ti and Zn in the etching process of the aluminum material, and contributes to an increase in capacitance.

[Ga含有量]
不純物であるGaはアルミニウム素地の溶解性を増大させ、さらに含有量が多くなるに従い局部溶解性が強くなるため、過剰に含有するとエッチピットの集中による静電容量の低下を引き起こしてしまう。従って、含有量は0.002質量%以下に規制されるのが好ましい。特に0.0015質量%以下に規制されるのが望ましく、0.0010質量%以下がさらに望ましい。
[Ga content]
Ga, which is an impurity, increases the solubility of the aluminum substrate, and as the content increases, the local solubility becomes stronger. Therefore, when it is excessively contained, the capacitance decreases due to the concentration of etch pits. Therefore, the content is preferably regulated to 0.002% by mass or less. In particular, the content is preferably controlled to 0.0015% by mass or less, and more preferably 0.0010% by mass or less.

[V、Zr、Cr含有量]
不純物であるV、Zr、Crは、Tiとともに含有されると過度にエッチピットが発生し、エッチピットの結合を引き起こすため、静電容量の増大を妨げてしまう。よってそれぞれの含有量は0.001質量%以下に規制されるのがが好ましい。特に、それぞれ0.0005質量%以下に規制されるのが望ましく、VとZrとCr の総和で0.0012質量%以下とするのがさらに望ましい。
[V, Zr, Cr content]
When impurities such as V, Zr, and Cr are contained together with Ti, etch pits are excessively generated, which causes bond of etch pits, thus preventing an increase in capacitance. Therefore, the content of each is preferably regulated to 0.001% by mass or less. In particular, it is desirable that the amount is regulated to 0.0005% by mass or less, and the total of V, Zr, and Cr is more preferably 0.0012% by mass or less.

[Si含有量]
Siはアルミニウム材の立方体方位の形成に影響を及ぼす元素であり、その含有量は0.0003質量%以上0.008質量%以下が好ましい。Si含有量が0.0003質量%未満だと結晶粒の粗大化が起こり、立方体方位占有率が低下し静電容量は低下する。望ましくは0.0006質量%以上とするのが良く、さらに0.0008質量%以上が望ましい。一方、Si含有量が0.008質量%を超えると立方体方位の成長が妨げられるため、立方体方位占有率が低下し静電容量は低下する。望ましくは0.006質量%以下とするのが良く、さらに0.004質量%以下が望ましい。
[Si content]
Si is an element that affects the formation of the cubic orientation of the aluminum material, and its content is preferably 0.0003 mass% or more and 0.008 mass% or less. When the Si content is less than 0.0003 mass%, the crystal grains become coarse, the cube orientation occupancy decreases, and the capacitance decreases. Desirably, the content is 0.0006% by mass or more, and more desirably 0.0008% by mass or more. On the other hand, if the Si content exceeds 0.008% by mass, the growth of the cube orientation is hindered, so that the cube orientation occupancy decreases and the capacitance decreases. Desirably, it is 0.006 mass% or less, and further 0.004 mass% or less is desirable.

[Fe含有量]
Feはアルミニウム材の立方体方位の形成やエッチングにおける溶解性に影響を及ぼす元素であり、その含有量は0.0005質量%以上0.008質量%以下が好ましい。Fe含有量が0.0005質量%未満だと結晶粒の粗大化が起こり、立方体方位占有率が低下し静電容量は低下する。望ましくは0.0008質量%以上とするのがよい。一方、0.008質量%を超えて含有されると、立方体方位の成長が妨げられるため立方体方位占有率が低下するとともに、過溶解が生じるため拡面率の低下を引き起こし、静電容量は低下する。望ましくは0.006質量%以下とするのが良く、さらに0.004質量%以下が望ましい。
[Fe content]
Fe is an element that affects the solubility of the aluminum material in the cubic orientation and etching, and its content is preferably 0.0005 mass% or more and 0.008 mass% or less. When the Fe content is less than 0.0005% by mass, the crystal grains become coarse, the cube orientation occupation ratio decreases, and the capacitance decreases. Desirably, it is 0.0008 mass% or more. On the other hand, when the content exceeds 0.008% by mass, the growth of the cube orientation is hindered, so that the cube orientation occupancy decreases, and over-dissolution occurs, causing a decrease in the surface expansion ratio, and the capacitance decreases. Desirably, it is 0.006 mass% or less, and further 0.004 mass% or less is desirable.

[Cu含有量]
Cuはアルミニウムに固溶することにより、アルミニウム材の溶解性を増してエッチピットの発生ならびに成長を促進し、静電容量を増大させる効果があり、このためその含有量は0.001質量%以上0.008質量%以下が好ましい。Cu含有量が0.001質量%未満だとアルミニウムの溶解性を増す効果は小さく、静電容量の増大に対する寄与は小さい。望ましくは0.002質量%以上であり、さらに0.003質量%以上が望ましい。一方、0.008質量%を超えて含有されると過溶解が生じるため拡面率の低下を引き起こし、静電容量は低下する。望ましくは0.007質量%以下であり、さらに0.006質量%以下が望ましい。
[Cu content]
Cu has the effect of increasing the solubility of the aluminum material, promoting the generation and growth of etch pits, and increasing the capacitance by dissolving in aluminum, so the content is 0.001% by mass or more and 0.008% by mass. % Or less is preferable. If the Cu content is less than 0.001% by mass, the effect of increasing the solubility of aluminum is small, and the contribution to the increase in capacitance is small. Desirably, it is 0.002 mass% or more, and further desirably 0.003 mass% or more. On the other hand, if the content exceeds 0.008% by mass, over-dissolution occurs, causing a reduction in the area expansion ratio, and the capacitance decreases. Desirably, it is 0.007 mass% or less, and further 0.006 mass% or less is desirable.

[Pb含有量]
Pbは、最終焼鈍時に箔表面に濃化し、エッチング初期のエッチピット発生を促進し、静電容量を増大させる効果があり、その含有量は0.00002質量%以上0.0003質量%以下とするのが好ましい。Pb含有量が0.00002質量%未満だとエッチピット発生を促進する効果に乏しく、さらにエッチピット発生が不均一となり、静電容量の増大に対する寄与は小さい。望ましくは0.00003質量%以上とするのが良く、さらに0.00004質量%以上が望ましい。一方、上限値の0.0003質量%を超えるとアルミニウム材表面の溶解が激しくなりエッチピット発生を阻害するため、却って静電容量は低下する。望ましくは0.0002質量%以下であり、さらに0.00012質量%以下が望ましい。
[Pb content]
Pb has the effect of concentrating on the foil surface during final annealing, promoting the generation of etch pits at the initial stage of etching, and increasing the capacitance, and its content is preferably 0.00002 mass% or more and 0.0003 mass% or less. When the Pb content is less than 0.00002% by mass, the effect of promoting the generation of etch pits is poor, and the generation of etch pits becomes non-uniform, and the contribution to the increase in capacitance is small. Desirably, the content is 0.00003% by mass or more, and more desirably 0.00004% by mass or more. On the other hand, if the upper limit of 0.0003% by mass is exceeded, dissolution of the aluminum material surface becomes violent and inhibits the generation of etch pits. Desirably, it is 0.0002 mass% or less, and further desirably 0.00012 mass% or less.

[B含有量]
Bは、最終焼鈍時に箔表面に濃化し、エッチング初期のエッチピット発生に寄与するが、過剰に存在するとエッチング初期のエッチピット発生が不均一になり、さらにTiと化合物を形成し局部溶解を引き起こす可能性が高いため、その含有量は0.0002質量%以下とするのが好ましい。望ましくは0.0001質量%以下である。一方、含有量の下限値は0.00001質量%とするのが好ましい。0.00001質量%未満では特性面で問題はないが、使用する原料の純度を非常に高くしなければならず、製造コストが顕著に高くなるため、生産を考えた場合適当ではない。
[B content]
B concentrates on the foil surface during the final annealing and contributes to the generation of etch pits at the beginning of etching, but if it exists in excess, the generation of etch pits at the beginning of etching becomes non-uniform and further forms a compound with Ti to cause local dissolution. Since the possibility is high, the content is preferably 0.0002% by mass or less. Desirably, it is 0.0001 mass% or less. On the other hand, the lower limit of the content is preferably 0.00001% by mass. If it is less than 0.00001% by mass, there is no problem in characteristics, but the purity of the raw material to be used has to be very high, and the production cost is remarkably high.

[その他不純物元素]
前記Ti、Zn、Ga、V、Zr、Cr、Si、Fe、Cu、Pb、B以外の不純物元素については、各々0.0005質量%以下に規制するのが、拡面率の低下ひいては静電容量の低下を引き起こす過溶解を防止する観点から好ましい。
[Other impurity elements]
Impurity elements other than Ti, Zn, Ga, V, Zr, Cr, Si, Fe, Cu, Pb, and B are limited to 0.0005% by mass or less, respectively. It is preferable from the viewpoint of preventing overdissolution that causes a decrease.

また、本発明に係る電解コンデンサ電極用アルミニウム材の厚さは限定されない。箔と称される200μm以下のものも、それ以上の厚いものも本発明に含まれる。   Moreover, the thickness of the aluminum material for electrolytic capacitor electrodes according to the present invention is not limited. Those having a thickness of 200 μm or less, referred to as foil, and those having a thickness larger than that are also included in the present invention.

なお、本発明に係る電解コンデンサ電極用アルミニウム材の製造方法は特に限定されることはなく、鋳塊の製造、熱間圧延、冷間圧延、洗浄、焼鈍など周知の方法、条件に基づいて行えばよい。鋳塊を熱間圧延する前には、鋳塊表面を除去する面削工程や、均質化処理を行っても良い。また冷間圧延の途中に中間焼鈍を実施してもよい。さらに圧延工程の途中や圧延終了後、焼鈍工程の前後において、アルミニウム材の端部をトリミングする工程やアルミニウム材を幅方向に分割する工程、或いはこれら両方を同時に行う工程を入れて良い。   In addition, the manufacturing method of the aluminum material for electrolytic capacitor electrodes according to the present invention is not particularly limited, and is performed based on well-known methods and conditions such as ingot manufacturing, hot rolling, cold rolling, cleaning, and annealing. Just do it. Before hot rolling the ingot, a chamfering process for removing the ingot surface or a homogenization treatment may be performed. Further, intermediate annealing may be performed during the cold rolling. Further, a step of trimming the end of the aluminum material, a step of dividing the aluminum material in the width direction, or a step of simultaneously performing both in the middle of the rolling process or after the end of the rolling process may be included.

本発明に係る電解コンデンサ電極用アルミニウム材は、拡面率向上のためのエッチングが施されて、電解コンデンサ用電極材として使用される。エッチング処理条件は特に限定されないが、エッチングの少なくとも一部が直流電解エッチングであることが好ましい。   The aluminum material for electrolytic capacitor electrodes according to the present invention is used as an electrode material for electrolytic capacitors after being etched for improving the surface expansion ratio. The etching treatment conditions are not particularly limited, but it is preferable that at least a part of the etching is direct current electrolytic etching.

本発明によって製造されたアルミニウム材は、陰極材としても陽極材としても用いることができるが、特にエッチング後の化成処理によって耐電圧性皮膜を形成させても大きい実効面積を有する点で陽極材に適している。さらに、陽極材のうちでも、中圧用及び高圧用電解コンデンサ電極材に適している。   The aluminum material produced according to the present invention can be used as a cathode material or an anode material. However, the aluminum material can be used as an anode material in that it has a large effective area even when a voltage-resistant film is formed by a chemical conversion treatment after etching. Is suitable. Furthermore, among anode materials, it is suitable for medium and high pressure electrolytic capacitor electrode materials.

また、この電極材を用いた電解コンデンサは大きな静電容量を実現できる。電解コンデンサの種類や製造方法は特に限定されることはないが、例えば、それぞれリードタブが電気的に接続された陽極材と陰極材とをセパレータを介して巻回または積層したコンデンサ素子に、駆動用電解液を含浸して、アルミニウム電解コンデンサとする製造方法を挙げることができる。   Moreover, the electrolytic capacitor using this electrode material can realize a large capacitance. The type and manufacturing method of the electrolytic capacitor are not particularly limited. For example, a capacitor element in which an anode material and a cathode material each having a lead tab electrically connected thereto are wound or laminated via a separator is used for driving. The manufacturing method which impregnates electrolyte solution and uses it as an aluminum electrolytic capacitor can be mentioned.

以下に本発明の具体的実施例について説明する。   Specific examples of the present invention will be described below.

アルミニウム材の製造に際しては、まず、小型ブックモールドにて表1、表2及び表3に示す組成のアルミニウム鋳塊を作製した。そしてこれらの鋳塊に周知の常法により均質化処理、面削、熱間圧延、冷間圧延、及び冷間圧延途中の中間焼鈍を実施し、厚さ110μmの箔とした。その後、脱脂洗浄を行った後、不活性ガス中で520℃、5時間の条件で焼鈍を行った。   In producing the aluminum material, first, aluminum ingots having the compositions shown in Table 1, Table 2 and Table 3 were prepared using a small book mold. These ingots were subjected to homogenization treatment, chamfering, hot rolling, cold rolling, and intermediate annealing in the middle of cold rolling by a well-known ordinary method to obtain a foil having a thickness of 110 μm. Thereafter, after degreasing and cleaning, annealing was performed in an inert gas at 520 ° C. for 5 hours.

次に、それぞれのアルミニウム材の静電容量を以下の方法により測定した。まず、1mol/lの塩酸と3.5mol/lの硫酸を含む液温75℃の水溶液に浸漬した後、電流密度:0.2A/cm2で直流電解エッチング処理を施した。直流電解エッチング処理後のアルミニウム材をさらに前記組成の塩酸−硫酸混合液に90℃にて360秒間浸漬し、前記直流電解エッチング処理により形成されたエッチングピット径を太くするケミカルエッチング処理を施した。 Next, the electrostatic capacity of each aluminum material was measured by the following method. First, it was immersed in an aqueous solution containing 1 mol / l hydrochloric acid and 3.5 mol / l sulfuric acid at a liquid temperature of 75 ° C. and then subjected to direct current electrolytic etching at a current density of 0.2 A / cm 2 . The aluminum material after the direct current electrolytic etching treatment was further immersed in a hydrochloric acid-sulfuric acid mixed solution having the above composition at 90 ° C. for 360 seconds, and a chemical etching treatment for increasing the diameter of the etching pit formed by the direct current electrolytic etching treatment was performed.

エッチング処理されたアルミニウム材を、化成電圧270VにてEIAJ規格に従い化成処理を施し、静電容量を測定した。   The etched aluminum material was subjected to chemical conversion treatment at a chemical conversion voltage of 270 V in accordance with EIAJ standards, and the capacitance was measured.

測定されたそれぞれのアルミニウム材の静電容量を、比較例1の静電容量を100としたときの相対容量値で表1、表2及び表3に示す。   The measured capacitance of each aluminum material is shown in Table 1, Table 2, and Table 3 as relative capacitance values when the capacitance of Comparative Example 1 is 100.

Figure 0005063057
Figure 0005063057

Figure 0005063057
Figure 0005063057

Figure 0005063057
Figure 0005063057

表1、表2及び表3の結果が示すように、本発明の実施例であるNo1〜37は、比較例No1〜10に較べて、高い静電容量が得られることが確認できた。   As the results of Tables 1, 2 and 3 show, it was confirmed that Nos. 1 to 37, which are examples of the present invention, have higher capacitance than Comparative Examples No. 1 to 10.

Ti含有量とZn含有量の関係を示すグラフである。It is a graph which shows the relationship between Ti content and Zn content.

Claims (7)

アルミニウム純度が99.9質量%以上であり、Tiを0.0005質量%を超え0.0025質量%以下、Znを0.0004質量%以上0.006質量%以下、Bを0.00001質量%以上0.0002質量%以下含有し、さらにSiを0.0003質量%以上0.008質量%以下、Feを0.0005質量%以上0.008質量%以下、Cuを0.001質量%以上0.008質量%以下、Pbを0.00002質量%以上0.0003質量%以下含有し、不純物として、Gaが0.002質量%以下、Vが0.001質量%以下、Zrが0.001質量%以下、Crが0.001質量%以下にそれぞれ規制され、かつ前記元素以外の不純物元素がそれぞれ0.0005質量%以下に規制されてなる電解コンデンサ電極用アルミニウム材。 Aluminum purity is 99.9% by mass or more, Ti is over 0.0005% by mass and 0.0025% by mass or less, Zn is 0.0004% by mass to 0.006% by mass , B is 0.00001% by mass to 0.0002% by mass, and Si is 0.0003% by mass. Containing 0.0005 mass% or more and 0.008 mass% or less of Fe, 0.001 mass% or more and 0.008 mass% or less of Cu, 0.00002 mass% or more and 0.0003 mass% or less of Pb , and Ga as an impurity, 0.002 mass % % Or less, V is 0.001 mass% or less, Zr is 0.001 mass% or less, Cr is regulated to 0.001 mass% or less , and impurity elements other than the above elements are regulated to 0.0005 mass% or less, respectively . Aluminum material. Ti含有量とZn含有量の関係が、図1で示すTi含有量(X軸)、Zn含有量(Y軸)を座標軸とした座標系において点A、B、C、D、E、Fを結ぶ線によって囲まれる領域(線上を含む)を満足する請求項1に記載の電解コンデンサ電極用アルミニウム材。
The relationship between the Ti content and the Zn content is expressed by points A, B, C, D, E, and F in the coordinate system with the Ti content (X axis) and the Zn content (Y axis) shown in FIG. The aluminum material for electrolytic capacitor electrodes according to claim 1 , which satisfies a region (including on the line) surrounded by connecting lines.
請求項1または2に記載されたアルミニウム材に、エッチングを実施する工程を含むことを特徴とする電解コンデンサ用電極材の製造方法。The manufacturing method of the electrode material for electrolytic capacitors characterized by including the process of etching in the aluminum material described in Claim 1 or 2. エッチングの少なくとも一部が直流電解エッチングである請求項3に記載の電解コンデンサ用電極材の製造方法。The method for producing an electrode material for an electrolytic capacitor according to claim 3, wherein at least a part of the etching is direct current electrolytic etching. 請求項3または請求項4に記載の製造方法によって製造されたアルミニウム電解コンデンサ用電極材。The electrode material for aluminum electrolytic capacitors manufactured by the manufacturing method of Claim 3 or Claim 4. 陽極材として用いられる請求項5に記載のアルミニウム電解コンデンサ用電極材。The electrode material for an aluminum electrolytic capacitor according to claim 5, which is used as an anode material. 電極材として請求項3または請求項4に記載の製造方法によって製造された電解コンデンサ用電極材が用いられていることを特徴とするアルミニウム電解コンデンサ。An aluminum electrolytic capacitor characterized in that an electrode material for an electrolytic capacitor produced by the production method according to claim 3 or 4 is used as an electrode material.
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