JP5032858B2 - フォトレジスト組成物、これを利用した薄膜パターニング方法及びこれを利用した液晶表示パネルの製造方法 - Google Patents
フォトレジスト組成物、これを利用した薄膜パターニング方法及びこれを利用した液晶表示パネルの製造方法 Download PDFInfo
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- JP5032858B2 JP5032858B2 JP2007031707A JP2007031707A JP5032858B2 JP 5032858 B2 JP5032858 B2 JP 5032858B2 JP 2007031707 A JP2007031707 A JP 2007031707A JP 2007031707 A JP2007031707 A JP 2007031707A JP 5032858 B2 JP5032858 B2 JP 5032858B2
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- 229920002126 Acrylic acid copolymer Polymers 0.000 claims description 4
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- 229920003145 methacrylic acid copolymer Polymers 0.000 claims description 4
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- 229920005596 polymer binder Polymers 0.000 claims description 4
- 239000002491 polymer binding agent Substances 0.000 claims description 4
- KOFQUBYAUWJFIT-UHFFFAOYSA-M triphenylsulfanium;hydroxide Chemical compound [OH-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 KOFQUBYAUWJFIT-UHFFFAOYSA-M 0.000 claims description 4
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 claims description 3
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- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
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- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 7
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- HMONIZCCNGYDDJ-UHFFFAOYSA-N ethyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OCC HMONIZCCNGYDDJ-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- ZXONMBCEAFIRDT-UHFFFAOYSA-N ethyl 2-propoxyacetate Chemical compound CCCOCC(=O)OCC ZXONMBCEAFIRDT-UHFFFAOYSA-N 0.000 description 1
- GIRSHSVIZQASRJ-UHFFFAOYSA-N ethyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCC GIRSHSVIZQASRJ-UHFFFAOYSA-N 0.000 description 1
- UKDLORMZNPQILV-UHFFFAOYSA-N ethyl 3-hydroxypropanoate Chemical compound CCOC(=O)CCO UKDLORMZNPQILV-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- LLACVNYOVGHAKH-UHFFFAOYSA-N ethyl 3-propoxypropanoate Chemical compound CCCOCCC(=O)OCC LLACVNYOVGHAKH-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229960000448 lactic acid Drugs 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- BKFQHFFZHGUTEZ-UHFFFAOYSA-N methyl 2-butoxyacetate Chemical compound CCCCOCC(=O)OC BKFQHFFZHGUTEZ-UHFFFAOYSA-N 0.000 description 1
- QBVBLLGAMALJGB-UHFFFAOYSA-N methyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OC QBVBLLGAMALJGB-UHFFFAOYSA-N 0.000 description 1
- PPFNAOBWGRMDLL-UHFFFAOYSA-N methyl 2-ethoxyacetate Chemical compound CCOCC(=O)OC PPFNAOBWGRMDLL-UHFFFAOYSA-N 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- GSJFXBNYJCXDGI-UHFFFAOYSA-N methyl 2-hydroxyacetate Chemical compound COC(=O)CO GSJFXBNYJCXDGI-UHFFFAOYSA-N 0.000 description 1
- AVVSSORVCLNBOS-UHFFFAOYSA-N methyl 2-propoxyacetate Chemical compound CCCOCC(=O)OC AVVSSORVCLNBOS-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- DMHHINXESLPPMV-UHFFFAOYSA-N methyl 3-propoxypropanoate Chemical compound CCCOCCC(=O)OC DMHHINXESLPPMV-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- LVDAGIFABMFXSJ-UHFFFAOYSA-N propyl 2-butoxyacetate Chemical compound CCCCOCC(=O)OCCC LVDAGIFABMFXSJ-UHFFFAOYSA-N 0.000 description 1
- GYOCIFXDRJJHPF-UHFFFAOYSA-N propyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OCCC GYOCIFXDRJJHPF-UHFFFAOYSA-N 0.000 description 1
- GXKPKHWZTLSCIB-UHFFFAOYSA-N propyl 2-ethoxypropanoate Chemical compound CCCOC(=O)C(C)OCC GXKPKHWZTLSCIB-UHFFFAOYSA-N 0.000 description 1
- FIABMSNMLZUWQH-UHFFFAOYSA-N propyl 2-methoxyacetate Chemical compound CCCOC(=O)COC FIABMSNMLZUWQH-UHFFFAOYSA-N 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- BMVTVMIDGMNRRR-UHFFFAOYSA-N propyl 2-propoxyacetate Chemical compound CCCOCC(=O)OCCC BMVTVMIDGMNRRR-UHFFFAOYSA-N 0.000 description 1
- HJIYVZIALQOKQI-UHFFFAOYSA-N propyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCCC HJIYVZIALQOKQI-UHFFFAOYSA-N 0.000 description 1
- IYVPXMGWHZBPIR-UHFFFAOYSA-N propyl 3-ethoxypropanoate Chemical compound CCCOC(=O)CCOCC IYVPXMGWHZBPIR-UHFFFAOYSA-N 0.000 description 1
- KNCDNPMGXGIVOM-UHFFFAOYSA-N propyl 3-hydroxypropanoate Chemical compound CCCOC(=O)CCO KNCDNPMGXGIVOM-UHFFFAOYSA-N 0.000 description 1
- JCMFJIHDWDKYIL-UHFFFAOYSA-N propyl 3-methoxypropanoate Chemical compound CCCOC(=O)CCOC JCMFJIHDWDKYIL-UHFFFAOYSA-N 0.000 description 1
- YTUFRRBSSNRYID-UHFFFAOYSA-N propyl 3-propoxypropanoate Chemical compound CCCOCCC(=O)OCCC YTUFRRBSSNRYID-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L9/00—Rigid pipes
- F16L9/14—Compound tubes, i.e. made of materials not wholly covered by any one of the preceding groups
- F16L9/147—Compound tubes, i.e. made of materials not wholly covered by any one of the preceding groups comprising only layers of metal and plastics with or without reinforcement
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L37/00—Couplings of the quick-acting type
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
下記式(1)
(式中、Rはメチル基を示す。)
からなる単位を少なくとも1つ含むアルカリ可溶性ノボラック系重合体10〜70重量部と、
光酸発生剤0.5〜10重量部と、
下記式(2)
(式中、R1、R2、R3はそれぞれ同一又は異なって、水素原子又はt−ブチルビニルエーテルである。)
で表される化合物を少なくとも1つ含む溶解抑制剤5〜50重量部と、
溶媒10〜90重量部とを含むことを特徴とする。
本発明によるポジ型フォトレジスト組成物は、10〜70重量部のアルカリ可溶性ノボラック系重合体と、0.5〜10重量部の光酸発生剤と、5〜50重量部の溶解抑制剤と、10〜90重量部のフォトレジスト溶媒とを含む。
式(2)において、R1、R2、R3はそれぞれ同一又は異なって、水素原子又はt−ブチルビニルエーテルを示す。
分子量8,000(重量平均分子量(Mw)/数平均分子量(Mn)=1.71)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、光酸発生剤であるオニウム塩系としてジフェニルヨードニウムトリフルオロメタンスルホネート3.0g、溶解抑制剤35g、アミン添加剤であるトリオクチルアミン(TOA)1.0g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
分子量8,000(Mw/Mn=1.71)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、光酸発生剤であるオニウム塩系としてジフェニルヨードニウムトリフルオロメタンスルホネート3.0g、溶解抑制剤25g、アミン添加剤であるトリオクチルアミン(TOA)1.0g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
分子量12,000(Mw/Mn=1.95)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、光酸発生剤であるオニウム塩系としてジフェニルヨードニウムトリフルオロメタンスルホネート3.0g、溶解抑制剤30g、アミン添加剤であるトリオクチルアミン(TOA)1.0g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
分子量12,000(Mw/Mn=1.95)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、光酸発生剤であるオニウム塩系としてジフェニルヨードニウムトリフルオロメタンスルホネート3.0g、溶解抑制剤25g、アミン添加剤であるトリオクチルアミン(TOA)1.0g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
分子量8,000(Mw/Mn=1.71)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、感光性物質である2,3,4−トリヒドロキシベンゾフェノン−1,2−ナフトキノンジアジド−5−スルホン酸エステル25g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
分子量12,000(Mw/Mn=1.95)のメタクレゾール/ホルムアルデヒドノボラック樹脂100g、感光性物質である2,3,4−トリヒドロキシベンゾフェノン−1,2−ナフトキノンジアジド−5−スルホン酸エステル25g、溶媒であるプロピレングリコールメチルエーテルプロピオネート400gの混合物を添加してポジ型フォトレジストを製造した。
4 ブラックマトリクス
6 カラーフィルタ
8 共通電極
10 カラーフィルタ基板
12 下部基板
14 ゲートライン
16 データライン
18 薄膜トランジスタ
20 薄膜トランジスタ基板
22 画素電極
24 液晶
Claims (15)
- 前記アルカリ可溶性ノボラック系重合体は、ヒドロキシ基が含まれるアルカリ可溶性フェノール性重合体バインダー樹脂であり、
前記バインダー樹脂が、オルト−クレゾール、メタ−クレゾール、パラ−クレゾール、2,4−キシレノール、2,5−キシレノール、3,4−キシレノール、3,5−キシレノール及びこれらの混合物からなる群から選択される少なくとも1種のアルデヒドと縮合し得る置換フェノール、ポリ(ビニルフェノール)、ポリ(パラ−ヒドロキシスチレン)、ポリ(パラ−ヒドロキシ−アルファメチルスチレン)、(パラ−ヒドロキシスチレン)、(パラ−ヒドロキシ−アルファメチルスチレン)、アセトキシスチレン、アクリル酸/メタクリル酸共重合体、ヒドロキシフェニルアルキルカルボニル重合体又はノボラック/ポリ(ビニルフェノール)共重合体から形成される請求項1に記載の表示装置用フォトレジスト組成物。 - 前記光酸発生剤が、ジアゾニウム塩、ヨードニウム塩、スルホニウム塩、ジアゾスルホニル化合物、スルホニルオキシイミド、ニトロベンジルスルホネートエステル、オニウム塩系、トリアジン、オキサゾール、オキサジアゾール、チアゾール、フェノール性スルホン酸エステル、ビス−スルホニルメタン、ビス−スルホニルジアゾメタン、トリフェニルスルホニウムトリス(トリフルオロメチルスルホニル)メチド及びジフェニルヨードニウムビス(トリフルオロメチルスルホニル)イミドのいずれか1つの化合物又はこれらの混合物である請求項1に記載の表示装置用フォトレジスト組成物。
- 前記溶解抑制剤は、トリヒドロキシベンゾフェノンとt−ブチルビニルエーテルとをアセトンに溶解させた後、塩基の存在下で常温反応させてt−ブチルビニルエーテルの転換率が60〜95%の化合物である請求項1に記載の表示装置用フォトレジスト組成物。
- アンダーカット現象を防止する塩基性添加剤1〜9.99重量部をさらに含む請求項1〜4のいずれかに記載の表示装置用フォトレジスト組成物。
- 前記塩基性添加剤が、アミン、水酸化アンモニウム、光感性塩基、テトラブチルアンモニウムヒドロキシド、トリエタノールアミン、ジエタノールアミン、トリオクチルアミン、n−オクチルアミン、トリメチルスルホニウムヒドロキシド又はトリフェニルスルホニウムヒドロキシドから形成される請求項5に記載の表示装置用フォトレジスト組成物。
- 基板上に薄膜を形成する工程と、
下記式(1)
(式中、Rはメチル基を示す。)
からなる単位を少なくとも1つ含むアルカリ可溶性ノボラック系重合体10〜70重量部、
光酸発生剤0.5〜10重量部、
下記式(2)
(式中、R1、R2、R3はそれぞれ同一又は異なって、水素原子又はt−ブチルビニルエーテルである。)
で表される化合物を少なくとも1つ含む溶解抑制剤5〜50重量部、溶媒10〜90重量部を含むフォトレジストを前記薄膜上に形成する工程と、
前記フォトレジストを露光及び現像工程でパターニングしてフォトレジストパターンを形成する工程と、
前記フォトレジストパターンをマスクとして利用して前記薄膜をエッチングする工程とを含むことを特徴とする薄膜パターニング方法。 - 前記アルカリ可溶性ノボラック系は、ヒドロキシ基が含まれるアルカリ可溶性フェノール性重合体バインダー樹脂であり、
前記バインダー樹脂が、オルト−クレゾール、メタ−クレゾール、パラ−クレゾール、2,4−キシレノール、2,5−キシレノール、3,4−キシレノール、3,5−キシレノール及びこれらの混合物からなる群から選択させる少なくとも1種のアルデヒドと縮合する置換されたフェノール、ポリ(ビニルフェノール)、ポリ(パラ−ヒドロキシスチレン)、ポリ(パラ−ヒドロキシ−アルファメチルスチレン)、(パラ−ヒドロキシスチレン)、(パラ−ヒドロキシ−アルファメチルスチレン)、アセトキシスチレン、アクリル酸/メタクリル酸共重合体、ヒドロキシフェニルアルキルカルボニル重合体又はノボラック/ポリ(ビニルフェノール)共重合体から形成される請求項7に記載の薄膜パターニング方法。 - 前記光酸発生剤が、ジアゾニウム塩、ヨードニウム塩、スルホニウム塩、ジアゾスルホニル化合物、スルホニルオキシイミド、ニトロベンジルスルホネートエステル、オニウム塩系、トリアジン、オキサゾール、オキサジアゾール、チアゾール、フェノール性スルホン酸エステル、ビス−スルホニルメタン、ビス−スルホニルジアゾメタン、トリフェニルスルホニウムトリス(トリフルオロメチルスルホニル)メチド、及びジフェニルヨードニウムビス(トリフルオロメチルスルホニル)イミドのいずれか1つの化合物又はこれらの混合物から形成される請求項7に記載の薄膜パターニング方法。
- 前記溶解抑制剤は、トリヒドロキシベンゾフェノンとt−ブチルビニルエーテルをとアセトンに溶解させた後、塩基の存在下で常温反応させてt−ブチルビニルエーテルの転換率が60〜95%の化合物である請求項7に記載の薄膜パターニング方法。
- アンダーカット現象を防止する塩基性添加剤1〜9.99重量部をさらに含む請求項7〜10のいずれかに記載の薄膜パターニング方法。
- 前記塩基性添加剤が、アミン、水酸化アンモニウム、光感性塩基、テトラブチルアンモニウムヒドロキシド、トリエタノールアミン、ジエタノールアミン、トリオクチルアミン、n−オクチルアミン、トリメチルスルホニウムヒドロキシド又はトリフェニルスルホニウムヒドロキシドから形成される請求項11に記載の薄膜パターニング方法。
- 下部基板上にゲートライン及びデータラインに接続されるように形成された薄膜トランジスタ、前記薄膜トランジスタを保護する保護膜、前記保護膜上に前記薄膜トランジスタに接続される画素電極を含む薄膜トランジスタ基板を形成する工程と、
前記下部基板と液晶を介して対向する上部基板上に画素領域を区分するブラックマトリクス、前記画素領域に形成されたカラーフィルタ、前記画素電極と共に電界を形成する共通電極を含むカラーフィルタ基板を形成する工程とを含み、
前記薄膜トランジスタ、保護膜、画素電極、ブラックマトリクス、カラーフィルタ、及び共通電極の少なくとも1つが、下記式(1)
(式中、Rはメチル基を示す。)
からなる単位を少なくとも1つ含むアルカリ可溶性ノボラック系重合体10〜70重量部、
光酸発生剤0.5〜10重量部、
下記式(2)
(式中、R1、R2、R3はそれぞれ同一又は異なって、水素原子又はt−ブチルビニルエーテルである。)
で表される化合物を少なくとも1つ含む溶解抑制剤5〜50重量部、溶媒10〜90重量部を含むフォトレジストを利用したパターニング工程により形成されることを特徴とする液晶表示パネルの製造方法。 - アンダーカット現象を防止する塩基性添加剤1〜9.99重量部をさらに含む請求項13に記載の液晶表示パネルの製造方法。
- 前記塩基性添加剤が、アミン、水酸化アンモニウム、光感性塩基、テトラブチルアンモニウムヒドロキシド、トリエタノールアミン、ジエタノールアミン、トリオクチルアミン、n−オクチルアミン、トリメチルスルホニウムヒドロキシド又はトリフェニルスルホニウムヒドロキシドから形成される請求項14に記載の液晶表示パネルの製造方法。
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