JP5015552B2 - パターン修正装置 - Google Patents

パターン修正装置 Download PDF

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Publication number
JP5015552B2
JP5015552B2 JP2006302897A JP2006302897A JP5015552B2 JP 5015552 B2 JP5015552 B2 JP 5015552B2 JP 2006302897 A JP2006302897 A JP 2006302897A JP 2006302897 A JP2006302897 A JP 2006302897A JP 5015552 B2 JP5015552 B2 JP 5015552B2
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JP
Japan
Prior art keywords
correction
application
liquid
pattern
target position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006302897A
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English (en)
Japanese (ja)
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JP2008122448A (ja
Inventor
博明 大庭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTN Corp
Original Assignee
NTN Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NTN Corp filed Critical NTN Corp
Priority to JP2006302897A priority Critical patent/JP5015552B2/ja
Priority to TW96137418A priority patent/TWI392595B/zh
Priority to CN2007101669821A priority patent/CN101178538B/zh
Publication of JP2008122448A publication Critical patent/JP2008122448A/ja
Application granted granted Critical
Publication of JP5015552B2 publication Critical patent/JP5015552B2/ja
Expired - Fee Related legal-status Critical Current
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00—Technologies for solid waste management
    • Y02W30/50—Reuse, recycling or recovery technologies
    • Y02W30/82—Recycling of waste of electrical or electronic equipment [WEEE]

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  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Gas-Filled Discharge Tubes (AREA)
JP2006302897A 2006-11-08 2006-11-08 パターン修正装置 Expired - Fee Related JP5015552B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006302897A JP5015552B2 (ja) 2006-11-08 2006-11-08 パターン修正装置
TW96137418A TWI392595B (zh) 2006-11-08 2007-10-05 Pattern correction device
CN2007101669821A CN101178538B (zh) 2006-11-08 2007-11-07 图案修改装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006302897A JP5015552B2 (ja) 2006-11-08 2006-11-08 パターン修正装置

Publications (2)

Publication Number Publication Date
JP2008122448A JP2008122448A (ja) 2008-05-29
JP5015552B2 true JP5015552B2 (ja) 2012-08-29

Family

ID=39404838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006302897A Expired - Fee Related JP5015552B2 (ja) 2006-11-08 2006-11-08 パターン修正装置

Country Status (3)

Country Link
JP (1) JP5015552B2 (zh)
CN (1) CN101178538B (zh)
TW (1) TWI392595B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104279958B (zh) * 2014-10-24 2017-07-21 西安诺瓦电子科技有限公司 用于指导校正的led显示装置空间位置检测方法及系统
CN105068323A (zh) * 2015-08-11 2015-11-18 武汉华星光电技术有限公司 一种配向膜印刷补正方法及系统
CN109016864B (zh) * 2018-09-11 2020-02-21 大连理工大学 一种精准定位静电打印系统和方法
JP6999526B2 (ja) * 2018-09-21 2022-01-18 Ntn株式会社 液状材料塗布装置
CN112230508B (zh) * 2020-10-30 2024-05-17 上海华力微电子有限公司 光学邻近修正方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08122802A (ja) * 1994-10-24 1996-05-17 Sharp Corp 液晶表示パネルの自動修正方法
JP3413164B2 (ja) * 1995-04-20 2003-06-03 キヤノン株式会社 カラーフィルタの製造方法及び製造装置及び液晶表示装置の製造方法及び液晶表示装置を備えた装置の製造方法
JPH0948135A (ja) * 1995-08-04 1997-02-18 Canon Inc カラーフィルタ製造装置および方法ならびにカラーフィルタ
JP2997642B2 (ja) * 1996-02-29 2000-01-11 エヌティエヌ株式会社 欠陥修正装置
TW333631B (en) * 1996-02-29 1998-06-11 Ntn Kk Modification method and apparatus of defects
JP4341324B2 (ja) * 2003-08-01 2009-10-07 株式会社日立プラントテクノロジー 液晶パネルの製造方法及びペースト塗布装置
JP4410042B2 (ja) * 2004-06-28 2010-02-03 Ｎｔｎ株式会社 微細パターン修正装置
JP2006130460A (ja) * 2004-11-09 2006-05-25 Ntn Corp 微細パターン修正装置
JP4767567B2 (ja) * 2005-03-28 2011-09-07 Ｎｔｎ株式会社 パターン修正装置
JP2007061695A (ja) * 2005-08-30 2007-03-15 Sharp Corp 薄膜の修正方法及び修正装置
JP2007334213A (ja) * 2006-06-19 2007-12-27 Ntn Corp パターン欠陥修正装置およびパターン欠陥修正方法

Also Published As

Publication number Publication date
TW200821167A (en) 2008-05-16
CN101178538B (zh) 2012-02-22
JP2008122448A (ja) 2008-05-29
CN101178538A (zh) 2008-05-14
TWI392595B (zh) 2013-04-11

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