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Priority claimed from JP4235496Aexternal-prioritypatent/JPH0961296A/en
Priority claimed from JP4344196Aexternal-prioritypatent/JP2997642B2/en
Priority claimed from JP7606296Aexternal-prioritypatent/JP3338285B2/en
Priority claimed from JP7606396Aexternal-prioritypatent/JPH09265007A/en
Priority claimed from JP10665496Aexternal-prioritypatent/JPH09292621A/en
Application filed by Ntn KkfiledCriticalNtn Kk
Application grantedgrantedCritical
Publication of TW333631BpublicationCriticalpatent/TW333631B/en
Application Of Or Painting With Fluid Materials
(AREA)
Preparing Plates And Mask In Photomechanical Process
(AREA)
Abstract
A modification method of defects used to modify the defects forming on the patterns of substrate which includes: steps of expand the defect portion; steps of eliminating the necessary defect portions; steps of using modification liquid to paint the defect portions or the above eliminated portions.
TW085114535A1996-02-291996-11-25Modification method and apparatus of defects
TW333631B
(en)