JP5010706B2 - タンタルの回収方法 - Google Patents
タンタルの回収方法 Download PDFInfo
- Publication number
- JP5010706B2 JP5010706B2 JP2010084726A JP2010084726A JP5010706B2 JP 5010706 B2 JP5010706 B2 JP 5010706B2 JP 2010084726 A JP2010084726 A JP 2010084726A JP 2010084726 A JP2010084726 A JP 2010084726A JP 5010706 B2 JP5010706 B2 JP 5010706B2
- Authority
- JP
- Japan
- Prior art keywords
- tantalum
- treatment
- sintered body
- acid
- capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052715 tantalum Inorganic materials 0.000 title claims description 237
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims description 234
- 238000000034 method Methods 0.000 title claims description 101
- 238000011084 recovery Methods 0.000 title description 23
- 239000003990 capacitor Substances 0.000 claims description 82
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 58
- 239000002699 waste material Substances 0.000 claims description 51
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 45
- 238000010306 acid treatment Methods 0.000 claims description 43
- 239000003513 alkali Substances 0.000 claims description 41
- 239000011572 manganese Substances 0.000 claims description 28
- 229910052748 manganese Inorganic materials 0.000 claims description 22
- 229910052787 antimony Inorganic materials 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 19
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 18
- 229910052698 phosphorus Inorganic materials 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 13
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 9
- 239000011574 phosphorus Substances 0.000 claims description 9
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 7
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 5
- 229920005989 resin Polymers 0.000 description 34
- 239000011347 resin Substances 0.000 description 34
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 28
- 230000005484 gravity Effects 0.000 description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 25
- 239000010949 copper Substances 0.000 description 24
- 239000012535 impurity Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 21
- 239000011133 lead Substances 0.000 description 20
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 19
- 239000011135 tin Substances 0.000 description 19
- 238000004458 analytical method Methods 0.000 description 17
- 229910052742 iron Inorganic materials 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- 229910052802 copper Inorganic materials 0.000 description 15
- 239000002585 base Substances 0.000 description 14
- 229910052718 tin Inorganic materials 0.000 description 14
- 239000000470 constituent Substances 0.000 description 13
- 229910052759 nickel Inorganic materials 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
- 238000007873 sieving Methods 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 229910001936 tantalum oxide Inorganic materials 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 238000009616 inductively coupled plasma Methods 0.000 description 5
- 229910052745 lead Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 5
- 229910021607 Silver chloride Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004993 emission spectroscopy Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000006148 magnetic separator Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000000638 solvent extraction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003481 tantalum Chemical class 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000007885 magnetic separation Methods 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- -1 electrodes Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000012764 semi-quantitative analysis Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/04—Extraction of metal compounds from ores or concentrates by wet processes by leaching
- C22B3/06—Extraction of metal compounds from ores or concentrates by wet processes by leaching in inorganic acid solutions, e.g. with acids generated in situ; in inorganic salt solutions other than ammonium salt solutions
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/04—Extraction of metal compounds from ores or concentrates by wet processes by leaching
- C22B3/06—Extraction of metal compounds from ores or concentrates by wet processes by leaching in inorganic acid solutions, e.g. with acids generated in situ; in inorganic salt solutions other than ammonium salt solutions
- C22B3/10—Hydrochloric acid, other halogenated acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/04—Extraction of metal compounds from ores or concentrates by wet processes by leaching
- C22B3/12—Extraction of metal compounds from ores or concentrates by wet processes by leaching in inorganic alkaline solutions
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/006—Wet processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Processing Of Solid Wastes (AREA)
Description
電極のリード線にFeやNi、Sn、Pbが使用されたものである。この金属ケース型タンタルコンデンサの構成成分について、分析した結果を表7に示す。
Claims (6)
- タンタル含有廃棄物からタンタルを回収するタンタルの回収方法において、
タンタル含有廃棄物は、マンガンおよび/またはアンチモンを含むとともにリンを含有し、タンタルコンデンサから取り出したタンタル焼結体を含むものであり、
当該タンタル含有廃棄物を、塩酸を含む酸により酸処理し、
その後、水酸化ナトリウムまたは水酸化カリウムによりアルカリ処理をして、タンタルを回収することを特徴とするタンタルの回収方法。 - タンタル焼結体は、タンタル含有率が50wt%以上である請求項1に記載のタンタルの回収方法。
- 酸処理は、塩酸濃度3mol/L〜12mol/L、液温40℃〜100℃、処理時間0.5時間〜50時間である請求項1または請求項2に記載のタンタルの回収方法。
- アルカリ処理は、水酸化ナトリウム濃度5wt%〜15wt%、液温60℃〜100℃、処理時間0.5時間〜1時間である請求項1〜請求項3いずれかに記載のタンタルの回収方法。
- タンタル含有廃棄物から回収されるタンタルは酸化物或いは金属である請求項1〜請求項4いずれかに記載のタンタルの回収方法。
- タンタル含有廃棄物の前処理として、焙焼温度400〜500℃、焙焼時間1〜5時間の焙焼処理を行う請求項1〜請求項5いずれかに記載のタンタルの回収方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010084726A JP5010706B2 (ja) | 2010-04-01 | 2010-04-01 | タンタルの回収方法 |
DE201111101153 DE112011101153T5 (de) | 2010-04-01 | 2011-03-24 | Verfahren zur Rückgewinnung von Tantal |
US13/635,890 US8852317B2 (en) | 2010-04-01 | 2011-03-24 | Method for recovering tantalum |
PCT/JP2011/057119 WO2011125510A1 (ja) | 2010-04-01 | 2011-03-24 | タンタルの回収方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010084726A JP5010706B2 (ja) | 2010-04-01 | 2010-04-01 | タンタルの回収方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011214110A JP2011214110A (ja) | 2011-10-27 |
JP5010706B2 true JP5010706B2 (ja) | 2012-08-29 |
Family
ID=44762464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010084726A Active JP5010706B2 (ja) | 2010-04-01 | 2010-04-01 | タンタルの回収方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8852317B2 (ja) |
JP (1) | JP5010706B2 (ja) |
DE (1) | DE112011101153T5 (ja) |
WO (1) | WO2011125510A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110129569A (zh) * | 2019-05-27 | 2019-08-16 | 上海第二工业大学 | 一种湿法回收废旧陶瓷电容器中多种有价金属的方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012132962A1 (ja) * | 2011-03-31 | 2012-10-04 | 三井金属鉱業株式会社 | タンタル回収方法 |
CN103194604B (zh) * | 2012-01-06 | 2014-09-17 | 深圳市格林美高新技术股份有限公司 | 废旧钽电容器中回收钽、银、锰的方法 |
WO2013145872A1 (ja) * | 2012-03-28 | 2013-10-03 | 独立行政法人産業技術総合研究所 | 磁選機 |
JP5988242B2 (ja) * | 2012-07-30 | 2016-09-07 | 国立研究開発法人産業技術総合研究所 | 小型電気製品の識別方法及び選別装置 |
CN106048231B (zh) * | 2016-07-14 | 2018-06-08 | 上海交通大学 | 废旧钽电容器中回收钽、银、镍和铁的方法 |
CN108480647B (zh) * | 2018-01-23 | 2022-01-18 | 珠海纳金科技有限公司 | 一种纳米银颗粒废液的回收利用方法 |
TWI705142B (zh) * | 2019-11-20 | 2020-09-21 | 大葉大學 | 廢鉭電容器回收銀、鉭之方法 |
KR102328333B1 (ko) * | 2021-04-23 | 2021-11-18 | 주식회사 에스알씨 | 폐기물에서 유가금속을 회수하는 리사이클링 시스템 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH515996A (de) * | 1968-06-06 | 1971-11-30 | Starck Hermann C Fa | Verfahren zur Herstellung von hochreinem Niob und/oder Tantal |
JPS6012408B2 (ja) | 1976-06-24 | 1985-04-01 | 新日本製鐵株式会社 | 金属または合金の脱リン方法 |
JPS6475632A (en) * | 1987-09-18 | 1989-03-22 | Tosoh Corp | Recovering method for tantalum from scrap tantalum |
US4988487A (en) * | 1989-10-24 | 1991-01-29 | Gte Laboratories Incorporated | Process for recovering metal values such as scandium, iron and manganese from an industrial waste sludge |
US6323055B1 (en) * | 1998-05-27 | 2001-11-27 | The Alta Group, Inc. | Tantalum sputtering target and method of manufacture |
JP3586104B2 (ja) * | 1998-06-29 | 2004-11-10 | 三井金属鉱業株式会社 | タンタル酸化物含有スラッジからの高純度タンタル酸化物の製造方法 |
JP3709979B2 (ja) | 2001-05-02 | 2005-10-26 | 三井金属鉱業株式会社 | タンタル、ニオブ等の採取精製に用いる原料溶液の製造方法 |
JP2002363662A (ja) * | 2001-06-01 | 2002-12-18 | Nikko Materials Co Ltd | 高純度タンタルの回収方法並びに高純度タンタルスパッタリングターゲット及び該スパッタリングターゲットにより形成された薄膜 |
JP2004002927A (ja) * | 2002-05-31 | 2004-01-08 | Mitsui Mining & Smelting Co Ltd | 超硬質合金スクラップの処理方法 |
JP4949960B2 (ja) * | 2007-07-27 | 2012-06-13 | Dowaホールディングス株式会社 | 酸化タンタルの製造方法 |
WO2009052007A1 (en) * | 2007-10-15 | 2009-04-23 | Hi-Temp Specialty Metals, Inc. | Method for the production of tantalum powder using reclaimed scrap as source material |
JP5270934B2 (ja) | 2008-03-14 | 2013-08-21 | Dowaエコシステム株式会社 | 電子基板からのタンタルの回収方法 |
-
2010
- 2010-04-01 JP JP2010084726A patent/JP5010706B2/ja active Active
-
2011
- 2011-03-24 WO PCT/JP2011/057119 patent/WO2011125510A1/ja active Application Filing
- 2011-03-24 US US13/635,890 patent/US8852317B2/en active Active
- 2011-03-24 DE DE201111101153 patent/DE112011101153T5/de not_active Ceased
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110129569A (zh) * | 2019-05-27 | 2019-08-16 | 上海第二工业大学 | 一种湿法回收废旧陶瓷电容器中多种有价金属的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2011214110A (ja) | 2011-10-27 |
US8852317B2 (en) | 2014-10-07 |
DE112011101153T5 (de) | 2013-01-10 |
WO2011125510A1 (ja) | 2011-10-13 |
US20130014611A1 (en) | 2013-01-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5010706B2 (ja) | タンタルの回収方法 | |
JP5860034B2 (ja) | タンタル回収方法 | |
Mineta et al. | Development of a recycling process for tantalum from capacitor scraps | |
WO2017145099A1 (en) | Process for recovery of pure cobalt oxide from spent lithium ion batteries with high manganese content | |
CS274297B2 (en) | Method of worn-out electric batteries, fit printed circuit cards and electronic structural elements treatment | |
JP5262627B2 (ja) | 使用済みニッケル水素電池からのニッケル濃縮物の回収方法 | |
JP6289411B2 (ja) | 鉄含有溶液からの鉄の除去方法及び、有価金属の回収方法 | |
KR101567499B1 (ko) | Led 폐기물로부터 유가금속의 선별 회수 방법 | |
EP3802890A1 (en) | Hydrometallurgical method for the recovery of base metals and precious metals from a waste material | |
KR101426518B1 (ko) | 사용 후 휴대폰의 인쇄회로기판 스크랩으로부터 귀금속의 회수 방법 | |
WO2017037625A1 (en) | A method and process of recovering metal values from waste monolithic ceramic capacitors | |
JP2019169308A (ja) | コバルトとアルミニウムの分離方法 | |
JP2022182229A (ja) | リチウムイオン電池からの金属回収方法 | |
KR20130125590A (ko) | 폐 리드프레임 스크랩으로부터의 주석 회수 방법 | |
JP5270934B2 (ja) | 電子基板からのタンタルの回収方法 | |
Nieberl et al. | Application and recycling of tantalum from waste electric and electronic equipment–A review | |
JP5835961B2 (ja) | 金属の浸出方法 | |
CN1132946C (zh) | 贵金属熔炼渣湿法冶金工艺 | |
EP3055437A1 (en) | Hydrometallurgy process for the recovery of materials from electronic boards | |
Barnwal et al. | Comparison of different routes for recovery of metals from electronic scrap | |
JP4657172B2 (ja) | 金属シリコンの精製方法 | |
TW202120699A (zh) | 廢鉭電容器回收銀、鉭之方法 | |
KR101162561B1 (ko) | 금속용매제를 이용한 폐무연솔더볼로부터의 은 및 주석 회수방법 | |
JP5570335B2 (ja) | ニオブの回収方法 | |
Wędrychowicz et al. | Recycling of Gold From Waste Electrical and Electronic Equipment by Electrorefining of Copper |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110803 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120507 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120601 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5010706 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150608 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |