JP5005854B2 - 電気化学デバイス - Google Patents

電気化学デバイス Download PDF

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Publication number
JP5005854B2
JP5005854B2 JP2000620150A JP2000620150A JP5005854B2 JP 5005854 B2 JP5005854 B2 JP 5005854B2 JP 2000620150 A JP2000620150 A JP 2000620150A JP 2000620150 A JP2000620150 A JP 2000620150A JP 5005854 B2 JP5005854 B2 JP 5005854B2
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JP
Japan
Prior art keywords
nickel
target
layer
oxide
nickel oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000620150A
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English (en)
Japanese (ja)
Other versions
JP2003500534A (ja
JP2003500534A5 (fr
Inventor
ブテイユ，ファビアン
ジロン，ジャン−クリストフ
ベルメルシュ，マルク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Original Assignee
Saint Gobain Glass France SAS
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Filing date
Publication date
Application filed by Saint Gobain Glass France SAS filed Critical Saint Gobain Glass France SAS
Publication of JP2003500534A publication Critical patent/JP2003500534A/ja
Publication of JP2003500534A5 publication Critical patent/JP2003500534A5/ja
Application granted granted Critical
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
    • G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
    • G02F1/1524—Transition metal compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Physical Vapour Deposition (AREA)
JP2000620150A 1999-05-20 2000-05-19 電気化学デバイス Expired - Fee Related JP5005854B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9906408A FR2793888B1 (fr) 1999-05-20 1999-05-20 Dispositif electrochimique
FR99/06408 1999-05-20
PCT/FR2000/001388 WO2000071777A1 (fr) 1999-05-20 2000-05-19 Dispositif electrochimique

Publications (3)

Publication Number Publication Date
JP2003500534A JP2003500534A (ja) 2003-01-07
JP2003500534A5 JP2003500534A5 (fr) 2007-07-19
JP5005854B2 true JP5005854B2 (ja) 2012-08-22

Family

ID=9545804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000620150A Expired - Fee Related JP5005854B2 (ja) 1999-05-20 2000-05-19 電気化学デバイス

Country Status (5)

Country Link
EP (1) EP1109945A1 (fr)
JP (1) JP5005854B2 (fr)
KR (1) KR100686611B1 (fr)
FR (1) FR2793888B1 (fr)
WO (1) WO2000071777A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE0103198D0 (sv) 2001-09-26 2001-09-26 Andris Azens Electrochromic film and device comprising the same
FR2833107B1 (fr) * 2001-12-05 2004-02-20 Saint Gobain Electrode de dispositifs electrochimiques/electrocommandables
FR2835534B1 (fr) * 2002-02-06 2004-12-24 Saint Gobain CIBLE CERAMIQUE NiOx NON STOECHIOMETRIQUE
RU2288850C2 (ru) 2002-02-20 2006-12-10 Сэн-Гобэн Гласс Франс Остекление с жестким элементом, включенным в напрессованную пластмассовую деталь
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
FR2904704B1 (fr) 2006-08-04 2008-12-05 Saint Gobain Dispositif electrochimique, et/ou elelctrocommandable du type vitrage et a proprietes optiques et/ou energetiques variables
JP5233133B2 (ja) * 2007-03-06 2013-07-10 日産自動車株式会社 エレクトロクロミック膜
JP5305137B2 (ja) * 2007-12-05 2013-10-02 日立金属株式会社 垂直磁気記録媒体のＮｉ合金中間層を形成するためのＮｉ−Ｗ系焼結ターゲット材
DE102009025972B4 (de) * 2009-06-15 2018-12-27 Sage Electrochromics, Inc. Verbundglasscheibe und deren Verwendung
US8687261B2 (en) 2011-07-21 2014-04-01 Sage Electrochromics, Inc. Electrochromic nickel oxide simultaneously doped with lithium and a metal dopant
JP5965258B2 (ja) * 2012-09-10 2016-08-03 国立大学法人北見工業大学 エレクトロクロミック素子及びその製造方法
US8947759B2 (en) * 2012-10-12 2015-02-03 Sage Electrochromics, Inc. Partially tinted clear state for improved color and solar-heat gain control of electrochromic devices
AT14157U1 (de) 2013-12-20 2015-05-15 Plansee Se W-Ni-Sputtertarget
FR3140955A1 (fr) 2022-10-13 2024-04-19 Saint-Gobain Glass France Vitrage electrochrome
FR3140954A1 (fr) 2022-10-13 2024-04-19 Saint-Gobain Glass France Vitrage electrochrome

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424231A (en) * 1977-07-25 1979-02-23 Motorola Inc Method and apparatus for magnetronnsputtering ferro magnetic materials
JPH02199429A (ja) * 1988-11-21 1990-08-07 Saint Gobain Vitrage Internatl エレクトロクロミック集成体
JPH0728098A (ja) * 1993-07-14 1995-01-31 Asahi Glass Co Ltd エレクトロクロミック調光体の製造方法および製造装置
JPH07321069A (ja) * 1994-05-26 1995-12-08 Nec Corp 半導体集積回路装置の製造方法
JPH09152634A (ja) * 1995-03-03 1997-06-10 Canon Inc エレクトロクロミック素子及びその製造方法
JPH09249962A (ja) * 1996-03-14 1997-09-22 Toshiba Corp 酸化物薄膜の形成方法および酸化物薄膜
JPH1030181A (ja) * 1996-03-27 1998-02-03 Saint Gobain Vitrage 電気化学装置
JPH10195643A (ja) * 1996-12-26 1998-07-28 Toshiba Corp スパッタターゲット、スパッタ装置、半導体装置およびその製造方法
JPH10206902A (ja) * 1996-09-18 1998-08-07 Saint Gobain Vitrage 電気化学装置及びその製造方法
JPH10251848A (ja) * 1997-03-17 1998-09-22 Japan Energy Corp スパッタリング用ターゲットおよび皮膜形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19640515A1 (de) * 1996-10-01 1998-04-09 Flachglas Ag Elektrochromer Spiegel und Verfahren zum Herstellen eines elektrochromen Spiegels

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424231A (en) * 1977-07-25 1979-02-23 Motorola Inc Method and apparatus for magnetronnsputtering ferro magnetic materials
JPH02199429A (ja) * 1988-11-21 1990-08-07 Saint Gobain Vitrage Internatl エレクトロクロミック集成体
JPH0728098A (ja) * 1993-07-14 1995-01-31 Asahi Glass Co Ltd エレクトロクロミック調光体の製造方法および製造装置
JPH07321069A (ja) * 1994-05-26 1995-12-08 Nec Corp 半導体集積回路装置の製造方法
JPH09152634A (ja) * 1995-03-03 1997-06-10 Canon Inc エレクトロクロミック素子及びその製造方法
JPH09249962A (ja) * 1996-03-14 1997-09-22 Toshiba Corp 酸化物薄膜の形成方法および酸化物薄膜
JPH1030181A (ja) * 1996-03-27 1998-02-03 Saint Gobain Vitrage 電気化学装置
JPH10206902A (ja) * 1996-09-18 1998-08-07 Saint Gobain Vitrage 電気化学装置及びその製造方法
JPH10195643A (ja) * 1996-12-26 1998-07-28 Toshiba Corp スパッタターゲット、スパッタ装置、半導体装置およびその製造方法
JPH10251848A (ja) * 1997-03-17 1998-09-22 Japan Energy Corp スパッタリング用ターゲットおよび皮膜形成方法

Also Published As

Publication number Publication date
FR2793888B1 (fr) 2002-06-28
EP1109945A1 (fr) 2001-06-27
FR2793888A1 (fr) 2000-11-24
JP2003500534A (ja) 2003-01-07
KR100686611B1 (ko) 2007-02-23
KR20010070985A (ko) 2001-07-28
WO2000071777A1 (fr) 2000-11-30

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