JP5005702B2 - 湿度センサー - Google Patents
湿度センサー Download PDFInfo
- Publication number
- JP5005702B2 JP5005702B2 JP2008540727A JP2008540727A JP5005702B2 JP 5005702 B2 JP5005702 B2 JP 5005702B2 JP 2008540727 A JP2008540727 A JP 2008540727A JP 2008540727 A JP2008540727 A JP 2008540727A JP 5005702 B2 JP5005702 B2 JP 5005702B2
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- electrode
- conductive
- humidity sensor
- groove
- barrier material
- Prior art date
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- 230000004888 barrier function Effects 0.000 claims description 40
- 239000000463 material Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000011231 conductive filler Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 230000007797 corrosion Effects 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 4
- 210000001520 comb Anatomy 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000007772 electrode material Substances 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 15
- 229910052802 copper Inorganic materials 0.000 description 14
- 239000010949 copper Substances 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 101100107923 Vitis labrusca AMAT gene Proteins 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 239000005441 aurora Substances 0.000 description 1
- CEJLBZWIKQJOAT-UHFFFAOYSA-N dichloroisocyanuric acid Chemical compound ClN1C(=O)NC(=O)N(Cl)C1=O CEJLBZWIKQJOAT-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
- G01N27/223—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance for determining moisture content, e.g. humidity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
10%超の気孔率を有し、第1導電性電極と第2導電性電極とを隔てる多孔質誘電体と、を含む湿度センサーを提供する。実施態様において、気孔率は20%超であり、特定の実施態様において、気孔率は30%超である。
Claims (8)
- 各々少なくとも一つの素子(48)を有しており、これら素子は、少なくとも0.3mmの全平行長で互いに平行に延び、かつ、1μm以下で離間している第1及び第2導電性電極(40、42)と、
10%超の気孔率を有し、第1導電性電極(40)と第2導電性電極(42)とを隔てる多孔質誘電体(20)と、
腐食から導電性電極を保護するために導電性電極の周囲に延びるバリア層(28、32)と、
を具え、
前記多孔質誘電体(20)が、3.0未満の誘電率を有する低誘電率誘電体オルトシリケートガラスであり、
前記バリア層(28、32)が、導電性電極(40、42)の両側面及び底面の第1バリア材(28)、及び導電性電極(40、42)の上面の第2バリア材(32)を含み、前記第1バリア材と前記第2バリア材とが異なる、
湿度センサー。 - 前記第1及び第2導電性電極が相互嵌合した櫛状体であり、該櫛状体の歯(48)は少なくとも0.3mmの全平行長で延びている素子であり、前記第1及び第2導電性素子の歯は互いに1μm以下で離間している、請求項1に記載の湿度センサー。
- 前記第2バリア材(32)は、導電性電極材料上に選択的に蒸着することが可能なバリア材である、請求項1又は2に記載の湿度センサー。
- 前記第2バリア材(32)が誘電体バリアである請求項1又は2に記載の湿度センサー。
- 第1バリア材(28)が金属である、請求項1〜4の何れか一項に記載の湿度センサー。
- 第1電極と第2電極との間に0.5から1MV/cmの電場を印加し、
湿度の指標として第1電極と第2電極(40、42)との間を通過する電流を測定する、
請求項1〜5の何れか一項に記載の湿度センサーの使用法。 - 少なくとも10%の気孔率を有する多孔質誘電体(20)を蒸着し;
多孔質誘電体をエッチングして、それぞれ少なくとも一個以上の素子を有する第1溝及び第2溝(26)を形成し、ここで前記第1溝及び第2溝(26)の前記素子は、少なくとも0.3mmの全平行長で互いに平行に延びており、1μm以下で離間しており;
前記溝(26)を導電体で充填して、少なくとも0.3mmの全平行長で平行に延びており、1μm以下で離間している素子を有する第1及び第2導電性電極(40、42)を形成し、
前記溝を充填する工程が
前記溝(26)の両側面上及び底面上に第1バリア材のバリア層(28)を蒸着すること、及び
前記溝(26)に導電性充填材(30)を充填する、
ことを含み、
前記多孔質誘電体(20)が、3.0未満の誘電率を有する低誘電率誘電体(20)であり、
更に、前記溝(26)を導電性充填材(30)で充填した後、第2バリア材(32)を前記導電性充填材上に選択的に蒸着して、導電性充填材(30)の上面、両側面及び底面に延びているバリア層(28、32)を形成する
湿度センサーの製造方法。 - 前記第1及び第2溝(26)、並びに第1電極及び第2電極(40、42)が相互嵌合した櫛状体であり、前記櫛状体の歯は少なくとも0.3mmの全平行長で延びており、各櫛状体の歯がもう一方の櫛状体の歯との間で1μm以下離間している、請求項7に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05110874 | 2005-11-17 | ||
EP05110874.4 | 2005-11-17 | ||
PCT/IB2006/053907 WO2007057794A1 (en) | 2005-11-17 | 2006-10-24 | Moisture sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009516192A JP2009516192A (ja) | 2009-04-16 |
JP5005702B2 true JP5005702B2 (ja) | 2012-08-22 |
Family
ID=37835286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008540727A Active JP5005702B2 (ja) | 2005-11-17 | 2006-10-24 | 湿度センサー |
Country Status (5)
Country | Link |
---|---|
US (1) | US8079248B2 (ja) |
EP (1) | EP1952134A1 (ja) |
JP (1) | JP5005702B2 (ja) |
CN (1) | CN101310175A (ja) |
WO (1) | WO2007057794A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2934051B1 (fr) * | 2008-07-16 | 2011-12-09 | Commissariat Energie Atomique | Detecteur d'humidite capacitif a dielectrique hydrophile nanoporeux |
EP2282333B1 (en) * | 2009-07-27 | 2013-03-20 | Nxp B.V. | Integrated circuit comprising moisture sensor |
EP2336758B1 (en) * | 2009-12-16 | 2012-08-29 | Nxp B.V. | Capacitive sensor |
FR2990757B1 (fr) * | 2012-05-15 | 2014-10-31 | Commissariat Energie Atomique | Capteur capacitif a materiau poreux ayant un agencement ameliore |
EP2867659A4 (en) * | 2012-05-30 | 2016-03-16 | Medisens Wireless Inc | SYSTEM AND METHOD FOR FLUID DETECTION |
EP2708878B1 (en) | 2012-09-12 | 2020-04-22 | ams international AG | Method of manufacturing an integrated circuit comprising a gas sensor |
US10175188B2 (en) | 2013-03-15 | 2019-01-08 | Robert Bosch Gmbh | Trench based capacitive humidity sensor |
US9285334B2 (en) * | 2013-06-06 | 2016-03-15 | Zhi David Chen | Hybrid dielectric moisture sensors |
CN103630582B (zh) * | 2013-12-11 | 2016-02-10 | 江苏物联网研究发展中心 | 一种mems湿度传感器及制备方法 |
TWI515429B (zh) * | 2014-03-12 | 2016-01-01 | 友達光電股份有限公司 | 化學感測器及其製造方法 |
US9494538B2 (en) * | 2014-04-04 | 2016-11-15 | Deere & Company | Agricultural moisture sensor with co-planar electrodes |
JP6770238B2 (ja) | 2017-03-31 | 2020-10-14 | ミツミ電機株式会社 | 湿度センサ |
JP7120519B2 (ja) | 2018-07-12 | 2022-08-17 | ミネベアミツミ株式会社 | 湿度センサ及びその製造方法 |
DE102018215018A1 (de) * | 2018-09-04 | 2020-03-05 | Infineon Technologies Ag | Feuchtigkeitssensor |
CN109724758A (zh) * | 2018-12-11 | 2019-05-07 | 努比亚技术有限公司 | 一种进水检测装置、方法、移动终端及存储介质 |
CN115867797A (zh) | 2020-07-02 | 2023-03-28 | 伊鲁米纳公司 | 具有场效应晶体管的装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4057823A (en) | 1976-07-02 | 1977-11-08 | International Business Machines Corporation | Porous silicon dioxide moisture sensor and method for manufacture of a moisture sensor |
GB8411981D0 (en) | 1984-05-10 | 1984-06-13 | Atomic Energy Authority Uk | Sensors |
ATE310950T1 (de) | 1999-12-08 | 2005-12-15 | Sensirion Ag | Kapazitiver sensor |
DE10134938A1 (de) * | 2001-07-18 | 2003-02-06 | Bosch Gmbh Robert | Halbleiterbauelement sowie ein Verfahren zur Herstellung des Halbleiterbauelements |
JP2003270189A (ja) * | 2002-03-20 | 2003-09-25 | Denso Corp | 容量式湿度センサ |
TW573119B (en) * | 2002-08-28 | 2004-01-21 | Nanya Technology Corp | A moisture detecting method, a moisture detecting device and method of fabricating the same |
US20040149032A1 (en) * | 2003-01-31 | 2004-08-05 | Sell Jeffrey A | Liquid level sensor |
US7202177B2 (en) * | 2003-10-08 | 2007-04-10 | Lam Research Corporation | Nitrous oxide stripping process for organosilicate glass |
EP1730506B1 (en) * | 2004-04-02 | 2018-09-26 | Silicon Laboratories Inc. | An integrated electronic sensor |
DE102004031135A1 (de) * | 2004-06-28 | 2006-01-19 | Infineon Technologies Ag | Resistives Halbleiterelement basierend auf einem Festkörperionenleiter |
JP4492947B2 (ja) * | 2004-07-23 | 2010-06-30 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
US7502109B2 (en) * | 2005-05-17 | 2009-03-10 | Honeywell International Inc. | Optical micro-spectrometer |
-
2006
- 2006-10-24 WO PCT/IB2006/053907 patent/WO2007057794A1/en active Application Filing
- 2006-10-24 US US12/093,667 patent/US8079248B2/en active Active
- 2006-10-24 EP EP06809684A patent/EP1952134A1/en not_active Withdrawn
- 2006-10-24 JP JP2008540727A patent/JP5005702B2/ja active Active
- 2006-10-24 CN CNA2006800425363A patent/CN101310175A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1952134A1 (en) | 2008-08-06 |
CN101310175A (zh) | 2008-11-19 |
WO2007057794A1 (en) | 2007-05-24 |
US20080316673A1 (en) | 2008-12-25 |
US8079248B2 (en) | 2011-12-20 |
JP2009516192A (ja) | 2009-04-16 |
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