JP5005544B2 - 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法 - Google Patents

汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法 Download PDF

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Publication number
JP5005544B2
JP5005544B2 JP2007532268A JP2007532268A JP5005544B2 JP 5005544 B2 JP5005544 B2 JP 5005544B2 JP 2007532268 A JP2007532268 A JP 2007532268A JP 2007532268 A JP2007532268 A JP 2007532268A JP 5005544 B2 JP5005544 B2 JP 5005544B2
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Japan
Prior art keywords
contaminant
trap
platelets
lithographic apparatus
central zone
Prior art date
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Expired - Fee Related
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JP2007532268A
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English (en)
Japanese (ja)
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JP2008513995A5 (enExample
JP2008513995A (ja
Inventor
ベイカー，レビヌス，ピーター
バニエ，バディム，エヴィジェンエビッチ
ワシンク，アーノウド，コルネリス
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エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2008513995A5 publication Critical patent/JP2008513995A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007532268A 2004-09-20 2005-09-19 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法 Expired - Fee Related JP5005544B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/944,422 2004-09-20
US10/944,422 US7161653B2 (en) 2004-09-20 2004-09-20 Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
PCT/NL2005/000680 WO2006049489A1 (en) 2004-09-20 2005-09-19 A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for trapping of contaminants in a lithographic apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010211817A Division JP5249296B2 (ja) 2004-09-20 2010-09-22 汚染物トラップシステム及び汚染物トラップシステムを有するリソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2008513995A JP2008513995A (ja) 2008-05-01
JP2008513995A5 JP2008513995A5 (enExample) 2011-12-15
JP5005544B2 true JP5005544B2 (ja) 2012-08-22

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Family Applications (2)

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JP2007532268A Expired - Fee Related JP5005544B2 (ja) 2004-09-20 2005-09-19 汚染物トラップシステムを有するリソグラフィ装置、汚染物トラップシステム及びデバイス製造方法
JP2010211817A Expired - Fee Related JP5249296B2 (ja) 2004-09-20 2010-09-22 汚染物トラップシステム及び汚染物トラップシステムを有するリソグラフィ装置

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JP2010211817A Expired - Fee Related JP5249296B2 (ja) 2004-09-20 2010-09-22 汚染物トラップシステム及び汚染物トラップシステムを有するリソグラフィ装置

Country Status (4)

Country Link
US (1) US7161653B2 (enExample)
JP (2) JP5005544B2 (enExample)
TW (1) TWI327256B (enExample)
WO (1) WO2006049489A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7368733B2 (en) * 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US7700930B2 (en) * 2007-09-14 2010-04-20 Asml Netherlands B.V. Lithographic apparatus with rotation filter device
WO2010072429A1 (en) 2008-12-22 2010-07-01 Asml Netherlands B.V. A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method
JP5355115B2 (ja) * 2009-01-30 2013-11-27 株式会社東芝 極端紫外光光源装置及びその調整方法
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
KR102813711B1 (ko) 2019-05-02 2025-05-29 삼성전자주식회사 반도체 소자의 제조 장치 및 그를 이용한 반도체 소자의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
EP1223468B1 (en) 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
KR20040052231A (ko) * 2001-10-12 2004-06-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas

Also Published As

Publication number Publication date
TW200625015A (en) 2006-07-16
US20060061740A1 (en) 2006-03-23
JP5249296B2 (ja) 2013-07-31
WO2006049489A1 (en) 2006-05-11
US7161653B2 (en) 2007-01-09
TWI327256B (en) 2010-07-11
JP2008513995A (ja) 2008-05-01
JP2011029653A (ja) 2011-02-10

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