TWI327256B - A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus - Google Patents
A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus Download PDFInfo
- Publication number
- TWI327256B TWI327256B TW094132537A TW94132537A TWI327256B TW I327256 B TWI327256 B TW I327256B TW 094132537 A TW094132537 A TW 094132537A TW 94132537 A TW94132537 A TW 94132537A TW I327256 B TWI327256 B TW I327256B
- Authority
- TW
- Taiwan
- Prior art keywords
- contaminant
- trap
- plates
- point
- traps
- Prior art date
Links
- 239000000356 contaminant Substances 0.000 title claims description 257
- 238000000034 method Methods 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 230000005855 radiation Effects 0.000 claims description 118
- 238000001459 lithography Methods 0.000 claims description 80
- 238000005286 illumination Methods 0.000 claims description 78
- 238000000059 patterning Methods 0.000 claims description 38
- 230000002093 peripheral effect Effects 0.000 claims description 30
- 239000003344 environmental pollutant Substances 0.000 claims description 26
- 231100000719 pollutant Toxicity 0.000 claims description 26
- 230000014759 maintenance of location Effects 0.000 claims description 23
- 238000009826 distribution Methods 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 17
- 230000002829 reductive effect Effects 0.000 claims description 10
- 238000011144 upstream manufacturing Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 206010036790 Productive cough Diseases 0.000 claims 3
- 230000000644 propagated effect Effects 0.000 claims 3
- 210000003802 sputum Anatomy 0.000 claims 3
- 208000024794 sputum Diseases 0.000 claims 3
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 206010011469 Crying Diseases 0.000 claims 1
- 208000034809 Product contamination Diseases 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 238000004020 luminiscence type Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 38
- 239000012465 retentate Substances 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 230000003068 static effect Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 101100338494 Chlamydia trachomatis serovar L2 (strain 434/Bu / ATCC VR-902B) hctB gene Proteins 0.000 description 1
- 235000009300 Ehretia acuminata Nutrition 0.000 description 1
- 244000046038 Ehretia acuminata Species 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 101100338495 Oryza sativa subsp. japonica HCT2 gene Proteins 0.000 description 1
- 241000239226 Scorpiones Species 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/944,422 US7161653B2 (en) | 2004-09-20 | 2004-09-20 | Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200625015A TW200625015A (en) | 2006-07-16 |
| TWI327256B true TWI327256B (en) | 2010-07-11 |
Family
ID=35677316
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094132537A TWI327256B (en) | 2004-09-20 | 2005-09-20 | A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7161653B2 (enExample) |
| JP (2) | JP5005544B2 (enExample) |
| TW (1) | TWI327256B (enExample) |
| WO (1) | WO2006049489A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7368733B2 (en) * | 2006-03-30 | 2008-05-06 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus comprising same |
| US7889312B2 (en) * | 2006-09-22 | 2011-02-15 | Asml Netherlands B.V. | Apparatus comprising a rotating contaminant trap |
| US8227771B2 (en) * | 2007-07-23 | 2012-07-24 | Asml Netherlands B.V. | Debris prevention system and lithographic apparatus |
| US7700930B2 (en) * | 2007-09-14 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus with rotation filter device |
| WO2010072429A1 (en) | 2008-12-22 | 2010-07-01 | Asml Netherlands B.V. | A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method |
| JP5355115B2 (ja) * | 2009-01-30 | 2013-11-27 | 株式会社東芝 | 極端紫外光光源装置及びその調整方法 |
| US9753383B2 (en) * | 2012-06-22 | 2017-09-05 | Asml Netherlands B.V. | Radiation source and lithographic apparatus |
| KR102813711B1 (ko) | 2019-05-02 | 2025-05-29 | 삼성전자주식회사 | 반도체 소자의 제조 장치 및 그를 이용한 반도체 소자의 제조 방법 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1008352C2 (nl) * | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
| EP1223468B1 (en) | 2001-01-10 | 2008-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| JP2003022950A (ja) * | 2001-07-05 | 2003-01-24 | Canon Inc | Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置 |
| DE10138284A1 (de) * | 2001-08-10 | 2003-02-27 | Zeiss Carl | Beleuchtungssystem mit genesteten Kollektoren |
| KR20040052231A (ko) * | 2001-10-12 | 2004-06-22 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부 |
| KR100748447B1 (ko) * | 2002-08-23 | 2007-08-10 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어 |
| TWI230847B (en) * | 2002-12-23 | 2005-04-11 | Asml Netherlands Bv | Contamination barrier with expandable lamellas |
-
2004
- 2004-09-20 US US10/944,422 patent/US7161653B2/en not_active Expired - Fee Related
-
2005
- 2005-09-19 JP JP2007532268A patent/JP5005544B2/ja not_active Expired - Fee Related
- 2005-09-19 WO PCT/NL2005/000680 patent/WO2006049489A1/en not_active Ceased
- 2005-09-20 TW TW094132537A patent/TWI327256B/zh not_active IP Right Cessation
-
2010
- 2010-09-22 JP JP2010211817A patent/JP5249296B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TW200625015A (en) | 2006-07-16 |
| US20060061740A1 (en) | 2006-03-23 |
| JP5249296B2 (ja) | 2013-07-31 |
| WO2006049489A1 (en) | 2006-05-11 |
| US7161653B2 (en) | 2007-01-09 |
| JP5005544B2 (ja) | 2012-08-22 |
| JP2008513995A (ja) | 2008-05-01 |
| JP2011029653A (ja) | 2011-02-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |