JP4989709B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Optical Transform (AREA)
Description
− 放射ビームB(例えばUV放射又はDUV放射)を調節するように構成された照明システム(イルミネータ)ILと、
− パターニングデバイス(例えばマスク)MAを支持するように構成され、特定のパラメータに従ってパターニングデバイスMAを正確に位置決めするように構成された第1のポジショナPMに接続された支持構造(例えばマスクテーブル)MTと、
− 基板(例えばレジストコートウェーハ)Wを保持するように構成され、特定のパラメータに従って基板Wを正確に位置決めするように構成された第2のポジショナPWに接続された基板テーブル(例えばウェーハテーブル)WTと、
− パターニングデバイスMAによって放射ビームBに与えられたパターンを基板Wのターゲット部分C(例えば1つ又は複数のダイを含む)に投影するように構成された投影システム(例えば屈折投影レンズシステム)PSとを含む。
Claims (8)
- 基板を保持する基板テーブルと、
基準フレームと、
前記基板テーブル又は前記基準フレームに取り付けられた格子と、
前記基板テーブル又は前記基準フレームの他方に取り付けられたセンサであって、前記格子によって向きが変えられた放射を検出して、前記基板テーブルと前記基準フレームとの間の相対位置を測定するセンサと、
前記格子又はセンサに汚染物が到達するのを妨げるバリアであって、前記格子又はセンサとは反対方向に向いた表面を有するバリアと、
を備え、
前記バリアと前記格子又はセンサとの間に空隙があるように、前記バリアが、前記格子又はセンサから遠位の位置にあり、
ガスを前記空隙に提供するガス供給部をさらに備えるリソグラフィ装置。 - フレームをさらに備え、前記バリアが該フレームに取り付けられる、請求項1に記載の装置。
- 前記バリアが、前記格子又はセンサに隣接する空間を取り囲む、請求項1又は2に記載の装置。
- 前記バリアが、各々が前記格子又はセンサの異なる部分に隣接して位置する複数の別々のバリアを備える、請求項1〜3のいずれか1項に記載の装置。
- 前記バリアが前記装置に着脱式に取り付けられる、請求項1〜4のいずれか1項に記載の装置。
- 前記バリアが、使用時に、前記バリア上のいかなる液滴も重力の影響下で移動するように、水平面に対してある角度をなす、請求項1〜5のいずれか1項に記載の装置。
- 前記バリアの表面から汚染物を除去する汚染物除去デバイスをさらに備える、請求項1〜6のいずれか1項に記載の装置。
- 基板テーブル上に保持された基板にパターン付放射ビームを投影するステップを含むデバイス製造方法であって、投影システムに対する前記基板テーブルの位置が、格子とセンサを用いて測定され、バリアが、前記格子又はセンサに汚染物が到達するのを防ぎ、該バリアが、前記格子又はセンサとは反対方向に向いた表面を有し、前記バリアと前記格子又はセンサとの間に空隙があるように前記バリアが前記格子又はセンサから遠位の位置にあり、ガスが前記空隙に提供される、デバイス製造方法。
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US19348708P | 2008-12-03 | 2008-12-03 | |
US61/193,487 | 2008-12-03 |
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JP2012038613A Active JP5639605B2 (ja) | 2008-12-03 | 2012-02-24 | リソグラフィ装置及びデバイス製造方法 |
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US (3) | US10197927B2 (ja) |
JP (2) | JP4989709B2 (ja) |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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NL1036468A1 (nl) * | 2008-02-27 | 2009-08-31 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL2003638A (en) * | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
WO2010143652A1 (ja) * | 2009-06-10 | 2010-12-16 | 株式会社ニコン | 露光方法及び装置、並びにデバイス製造方法 |
NL2006913A (en) * | 2010-07-16 | 2012-01-17 | Asml Netherlands Bv | Lithographic apparatus and method. |
EP2423749B1 (en) | 2010-08-24 | 2013-09-11 | ASML Netherlands BV | A lithographic apparatus and device manufacturing method |
JP6132917B2 (ja) * | 2012-09-18 | 2017-05-24 | エーエスエムエル ネザーランズ ビー.ブイ. | ステージシステム、ステージシステムを備えるリソグラフィ装置 |
US10216095B2 (en) | 2013-08-30 | 2019-02-26 | Asml Netherlands B.V. | Immersion lithographic apparatus |
CN113939773A (zh) * | 2019-06-13 | 2022-01-14 | Asml荷兰有限公司 | 光刻设备 |
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JPH11118677A (ja) | 1997-10-14 | 1999-04-30 | Hitachi Ltd | 校正用被検査物およびその製造方法ならびに検査装置の校正方法および検査装置 |
WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
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US20100134769A1 (en) | 2010-06-03 |
JP5639605B2 (ja) | 2014-12-10 |
US20210096476A1 (en) | 2021-04-01 |
US11609504B2 (en) | 2023-03-21 |
JP2010153840A (ja) | 2010-07-08 |
US10197927B2 (en) | 2019-02-05 |
US20190271920A1 (en) | 2019-09-05 |
US10866530B2 (en) | 2020-12-15 |
JP2012138602A (ja) | 2012-07-19 |
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