JP4976070B2 - 成膜装置 - Google Patents

成膜装置 Download PDF

Info

Publication number
JP4976070B2
JP4976070B2 JP2006190097A JP2006190097A JP4976070B2 JP 4976070 B2 JP4976070 B2 JP 4976070B2 JP 2006190097 A JP2006190097 A JP 2006190097A JP 2006190097 A JP2006190097 A JP 2006190097A JP 4976070 B2 JP4976070 B2 JP 4976070B2
Authority
JP
Japan
Prior art keywords
film
forming apparatus
wire
lithium
roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006190097A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008019458A5 (enExample
JP2008019458A (ja
Inventor
伸之 奥田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Research Institute of Innovative Technology for the Earth RITE
Original Assignee
Sumitomo Electric Industries Ltd
Research Institute of Innovative Technology for the Earth RITE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd, Research Institute of Innovative Technology for the Earth RITE filed Critical Sumitomo Electric Industries Ltd
Priority to JP2006190097A priority Critical patent/JP4976070B2/ja
Publication of JP2008019458A publication Critical patent/JP2008019458A/ja
Publication of JP2008019458A5 publication Critical patent/JP2008019458A5/ja
Application granted granted Critical
Publication of JP4976070B2 publication Critical patent/JP4976070B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Physical Vapour Deposition (AREA)
  • Battery Electrode And Active Subsutance (AREA)
JP2006190097A 2006-07-11 2006-07-11 成膜装置 Expired - Fee Related JP4976070B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006190097A JP4976070B2 (ja) 2006-07-11 2006-07-11 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006190097A JP4976070B2 (ja) 2006-07-11 2006-07-11 成膜装置

Publications (3)

Publication Number Publication Date
JP2008019458A JP2008019458A (ja) 2008-01-31
JP2008019458A5 JP2008019458A5 (enExample) 2009-06-18
JP4976070B2 true JP4976070B2 (ja) 2012-07-18

Family

ID=39075643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006190097A Expired - Fee Related JP4976070B2 (ja) 2006-07-11 2006-07-11 成膜装置

Country Status (1)

Country Link
JP (1) JP4976070B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102656071B1 (ko) * 2018-11-27 2024-04-08 베이징 웰리온 뉴 에너지 테크놀로지 컴퍼니 리미티드 사이클 효율이 높은 전극을 제조하는 시스템, 사이클 효율이 높은 전극을 제조하는 방법 및 이의 응용
JP2023507160A (ja) * 2019-12-20 2023-02-21 シオン・パワー・コーポレーション リチウム金属電極

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0867967A (ja) * 1994-08-29 1996-03-12 Sumitomo Electric Ind Ltd 線材供給装置
JP2837367B2 (ja) * 1995-02-16 1998-12-16 日新製鋼株式会社 連続熱処理炉、連続真空蒸着設備等の区画出入口のシール装置
JP3453290B2 (ja) * 1997-12-26 2003-10-06 松下電器産業株式会社 蒸着用電極構造、蒸着装置、蒸着方法および有機発光素子の製造方法

Also Published As

Publication number Publication date
JP2008019458A (ja) 2008-01-31

Similar Documents

Publication Publication Date Title
JP5820586B2 (ja) 多孔質皮膜のための複合線材を用いたワイヤアーク溶射システム並びに関連方法
CN106973570B (zh) 电解铜箔、包括该电解铜箔的电极、包括该电解铜箔的二次电池以及该电解铜箔的制造方法
CN100564612C (zh) 镀膜的制备方法、电镀用阴极辊和制造电路板的方法
CN102414874A (zh) 含有金属化碳纳米管和纳米纤维的复合材料
CN102598158A (zh) 层叠膜的制造方法
CN104723625A (zh) 具备防静电功能的电子元件包装用包装材料及其制造方法
CN104919075A (zh) 制造基于固体的薄膜电池的至少一层的方法、其等离子体粉末喷枪和基于固体的薄膜电池
CN101113516A (zh) 一种纳米复合类金刚石涂层制备方法
JP4976070B2 (ja) 成膜装置
JP2011089160A (ja) リチウム膜の製造方法およびリチウム膜製造装置
Aghasibeig et al. Fabrication of nickel electrode coatings by combination of atmospheric and suspension plasma spray processes
Kumar et al. Modern coating processes and technologies
JP2017110239A (ja) ガス放出キャンロール及びその製造方法並びにこれを搭載した長尺基板の真空処理装置
JP6978057B2 (ja) 燃料電池用セパレータ製造方法及び成膜装置
JP2023540510A (ja) バイポーラプレート(bpp)のためのドープdlc
Hirahara et al. The effect of a tin oxide buffer layer for the high yield synthesis of carbon nanocoils
WO2002014585A1 (fr) Matériau de cathode et tambour cathode rotatif pour la production de feuillar de cuivre électrolytique par utilisation du matériau de cathode
Ando et al. Alumina and titania films deposition by APS/ASPPS dual mode thermal spray equipment using Ar added N2 working gas
Aghasibeig et al. Three-dimensional electrode coatings for hydrogen production manufactured by combined atmospheric and suspension plasma spray
JP2016108630A (ja) 静電吸着ロール
US20210040634A1 (en) Method for producing metal porous body, and plating apparatus
JP6447459B2 (ja) 成膜方法及びその装置並びに成膜体製造装置
Low et al. The reduction of hydrogen peroxide at an Au-coated nanotubular TiO2 array
JP2014231628A (ja) 長尺樹脂フィルムの表面処理装置及び表面処理方法、並びに該表面処理装置を備えたロールツーロール成膜装置
CN116463605A (zh) 复合薄膜、其制备方法及双面卷绕式真空镀膜设备

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20090402

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090415

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090420

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20090402

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101220

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120403

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120412

R150 Certificate of patent or registration of utility model

Ref document number: 4976070

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150420

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees