JP4970845B2 - 固体撮像装置 - Google Patents
固体撮像装置 Download PDFInfo
- Publication number
- JP4970845B2 JP4970845B2 JP2006136093A JP2006136093A JP4970845B2 JP 4970845 B2 JP4970845 B2 JP 4970845B2 JP 2006136093 A JP2006136093 A JP 2006136093A JP 2006136093 A JP2006136093 A JP 2006136093A JP 4970845 B2 JP4970845 B2 JP 4970845B2
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- Prior art keywords
- solid
- state imaging
- imaging device
- chip
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000003384 imaging method Methods 0.000 title claims description 113
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- 239000011347 resin Substances 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 24
- 239000004065 semiconductor Substances 0.000 claims description 18
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- 239000012535 impurity Substances 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
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- 239000004925 Acrylic resin Substances 0.000 description 1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/33—Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Image Input (AREA)
Description
図1は、本発明による固体撮像装置の第1実施形態を示す断面図である。固体撮像装置1は、配線基板10、固体撮像チップ20、およびアンダーフィル樹脂30を備えている。配線基板10は、例えばプリント配線基板である。
図4は、本発明による固体撮像装置の第2実施形態を示す断面図である。固体撮像装置2は、配線基板10、固体撮像チップ20、アンダーフィル樹脂30、およびサイドフィル樹脂40を備えている。配線基板10および固体撮像チップ20の構成は、図1で説明したとおりである。本実施形態においても、固体撮像チップ20が配線基板10にフリップチップ実装されている。
2 固体撮像装置
10 配線基板
20 固体撮像チップ
22 半田バンプ
30 アンダーフィル樹脂
40 サイドフィル樹脂
50 半田ボール
90 指
92 指紋
210 半導体基板
220 受光部
230 配線層
240 MOSFET
242 N型不純物拡散層
243 ゲート絶縁膜
244 ゲート電極
S1 裏面
Claims (9)
- 配線基板と、
表面側に受光部を備え、前記配線基板上に、表面が前記配線基板と対向するように実装され、前記表面と反対側の面である裏面から入射した光を光電変換することにより被撮像体を撮像する固体撮像チップと、
前記配線基板と前記固体撮像チップとの間の間隙に充填され、遮光性を有するアンダーフィル樹脂と、
前記固体撮像チップの側面と前記アンダーフィル樹脂の側面とを覆うように形成され、遮光性を有するサイドフィル樹脂と、
を備えることを特徴とする固体撮像装置。 - 請求項1に記載の固体撮像装置において、
前記被撮像体は指であり、前記固体撮像チップは当該指の指紋画像を撮像する固体撮像装置。 - 請求項1又は2に記載の固体撮像装置において、
前記アンダーフィル樹脂は、平面視において、前記固体撮像チップの周縁から延伸した延伸領域を備えており、
平面視における前記延伸領域の幅が、前記配線基板の表面に対する垂直方向に向かって小さくなる固体撮像装置。 - 請求項3に記載の固体撮像装置において、
前記延伸領域が前記サイドフィル樹脂で覆われている固体撮像装置。 - 請求項1乃至4いずれか一項に記載の固体撮像装置において、
前記配線基板の前記固体撮像チップが実装された面の反対側の面に、さらに外部電極端子を備える固体撮像装置。 - 請求項1乃至5いずれか一項に記載の固体撮像装置において、
前記固体撮像チップは、前記受光部により構成されるMOSイメージセンサ部と、MOSFETにより構成されるロジック回路部とが混載されている固体撮像装置。 - 請求項1乃至6いずれか一項に記載の固体撮像装置において、
前記固体撮像チップは、P型半導体基板を備え、前記受光部は前記P型半導体基板中に形成されたN型不純物拡散層である固体撮像装置。 - 請求項1乃至7いずれか一項に記載の固体撮像装置において、
前記固体撮像チップは、N型半導体基板を備え、前記受光部は前記N型半導体基板中に形成されたP型不純物拡散層である固体撮像装置。 - 請求項1乃至8いずれか一項に記載の固体撮像装置において、
CCD型の固体撮像装置である固体撮像装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006136093A JP4970845B2 (ja) | 2006-05-16 | 2006-05-16 | 固体撮像装置 |
US11/798,222 US8508007B2 (en) | 2006-05-16 | 2007-05-11 | Solid-state image sensing device |
CNA2008101859233A CN101459187A (zh) | 2006-05-16 | 2007-05-16 | 固态图像传感装置 |
CNB2007101041066A CN100524788C (zh) | 2006-05-16 | 2007-05-16 | 固态图像传感装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006136093A JP4970845B2 (ja) | 2006-05-16 | 2006-05-16 | 固体撮像装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007311386A JP2007311386A (ja) | 2007-11-29 |
JP4970845B2 true JP4970845B2 (ja) | 2012-07-11 |
Family
ID=38789600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006136093A Expired - Fee Related JP4970845B2 (ja) | 2006-05-16 | 2006-05-16 | 固体撮像装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8508007B2 (ja) |
JP (1) | JP4970845B2 (ja) |
CN (2) | CN101459187A (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008205317A (ja) * | 2007-02-21 | 2008-09-04 | Nec Electronics Corp | 固体撮像装置及びその製造方法及びそれを用いた電子機器 |
JP5326420B2 (ja) * | 2008-08-12 | 2013-10-30 | Jsr株式会社 | 遮光膜形成用感放射線性組成物、固体撮像素子用遮光膜及び固体撮像素子 |
WO2012124183A1 (ja) * | 2011-03-11 | 2012-09-20 | 富士フイルム株式会社 | 撮像装置およびその動作制御方法 |
KR101942141B1 (ko) | 2015-05-12 | 2019-01-24 | 앰코테크놀로지코리아(주) | 지문센서 패키지 |
CN105489588B (zh) * | 2015-12-04 | 2019-05-31 | 苏州迈瑞微电子有限公司 | 传感器封装结构及其制备方法 |
CN107644202B (zh) * | 2017-09-08 | 2021-01-08 | 维沃移动通信有限公司 | 一种光学指纹模组及移动终端 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0226080A (ja) * | 1988-07-14 | 1990-01-29 | Olympus Optical Co Ltd | 半導体素子 |
JP2797941B2 (ja) * | 1993-12-27 | 1998-09-17 | 日本電気株式会社 | 光電変換素子とその駆動方法 |
US6512381B2 (en) * | 1999-12-30 | 2003-01-28 | Stmicroelectronics, Inc. | Enhanced fingerprint detection |
JP4562875B2 (ja) | 2000-07-17 | 2010-10-13 | 浜松ホトニクス株式会社 | 半導体装置 |
JP3530466B2 (ja) * | 2000-07-17 | 2004-05-24 | Necエレクトロニクス株式会社 | 固体撮像装置 |
US6963437B2 (en) * | 2000-10-03 | 2005-11-08 | Gentex Corporation | Devices incorporating electrochromic elements and optical sensors |
JP2003233805A (ja) * | 2001-12-04 | 2003-08-22 | Canon Inc | 画像入力装置 |
JP2003198897A (ja) * | 2001-12-27 | 2003-07-11 | Seiko Epson Corp | 光モジュール、回路基板及び電子機器 |
JP3684233B2 (ja) * | 2002-05-14 | 2005-08-17 | キヤノン株式会社 | 指紋入力装置及びその製造方法 |
US6906403B2 (en) * | 2002-06-04 | 2005-06-14 | Micron Technology, Inc. | Sealed electronic device packages with transparent coverings |
US6885107B2 (en) * | 2002-08-29 | 2005-04-26 | Micron Technology, Inc. | Flip-chip image sensor packages and methods of fabrication |
JP2004296687A (ja) * | 2003-03-26 | 2004-10-21 | Seiko Epson Corp | 撮像素子及びその製造方法、撮像モジュール並びに電子機器 |
JP2004363380A (ja) * | 2003-06-05 | 2004-12-24 | Sanyo Electric Co Ltd | 光半導体装置およびその製造方法 |
JP2005038406A (ja) | 2003-06-27 | 2005-02-10 | Canon Inc | 指紋入力装置及びこれを用いた個人認証システム |
JP2005110896A (ja) * | 2003-10-07 | 2005-04-28 | Canon Inc | 指センサ |
JP2005286888A (ja) * | 2004-03-30 | 2005-10-13 | Fuji Photo Film Co Ltd | 固体撮像装置 |
JP2005327842A (ja) | 2004-05-13 | 2005-11-24 | Citizen Electronics Co Ltd | 固体撮像装置及びその製造方法 |
JP4838501B2 (ja) * | 2004-06-15 | 2011-12-14 | 富士通セミコンダクター株式会社 | 撮像装置及びその製造方法 |
JP4365743B2 (ja) * | 2004-07-27 | 2009-11-18 | 富士通マイクロエレクトロニクス株式会社 | 撮像装置 |
JP4762627B2 (ja) * | 2005-07-25 | 2011-08-31 | オリンパス株式会社 | 撮像装置および撮像装置の製造方法 |
JP2007142058A (ja) * | 2005-11-17 | 2007-06-07 | Matsushita Electric Ind Co Ltd | 半導体撮像素子およびその製造方法並びに半導体撮像装置とその製造方法 |
JP4980665B2 (ja) * | 2006-07-10 | 2012-07-18 | ルネサスエレクトロニクス株式会社 | 固体撮像装置 |
KR100794660B1 (ko) * | 2006-07-14 | 2008-01-14 | 삼성전자주식회사 | 이미지 센서 패키지 및 그 제조 방법 |
JP2009099591A (ja) * | 2007-10-12 | 2009-05-07 | Toshiba Corp | 固体撮像素子及びその製造方法 |
JP5489543B2 (ja) * | 2009-06-09 | 2014-05-14 | キヤノン株式会社 | 固体撮像装置 |
-
2006
- 2006-05-16 JP JP2006136093A patent/JP4970845B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-11 US US11/798,222 patent/US8508007B2/en not_active Expired - Fee Related
- 2007-05-16 CN CNA2008101859233A patent/CN101459187A/zh active Pending
- 2007-05-16 CN CNB2007101041066A patent/CN100524788C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20070279504A1 (en) | 2007-12-06 |
US8508007B2 (en) | 2013-08-13 |
CN101459187A (zh) | 2009-06-17 |
JP2007311386A (ja) | 2007-11-29 |
CN100524788C (zh) | 2009-08-05 |
CN101075627A (zh) | 2007-11-21 |
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