JP4969595B2 - プラズマ処理装置及びプラズマ処理方法 - Google Patents

プラズマ処理装置及びプラズマ処理方法 Download PDF

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Publication number
JP4969595B2
JP4969595B2 JP2009019862A JP2009019862A JP4969595B2 JP 4969595 B2 JP4969595 B2 JP 4969595B2 JP 2009019862 A JP2009019862 A JP 2009019862A JP 2009019862 A JP2009019862 A JP 2009019862A JP 4969595 B2 JP4969595 B2 JP 4969595B2
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substrate
tray
placement
support portion
hole
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Japanese (ja)
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JP2009177190A (ja
JP2009177190A5 (enExample
Inventor
尚吾 置田
浩海 朝倉
彰三 渡邉
隆三 宝珍
宏之 鈴木
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Publication of JP2009177190A5 publication Critical patent/JP2009177190A5/ja
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JP2009019862A 2009-01-30 2009-01-30 プラズマ処理装置及びプラズマ処理方法 Expired - Lifetime JP4969595B2 (ja)

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JP2009019862A JP4969595B2 (ja) 2009-01-30 2009-01-30 プラズマ処理装置及びプラズマ処理方法

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JP2009019862A JP4969595B2 (ja) 2009-01-30 2009-01-30 プラズマ処理装置及びプラズマ処理方法

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JP2005297378A Division JP4361045B2 (ja) 2005-10-12 2005-10-12 プラズマ処理装置及びプラズマ処理方法

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JP2009177190A JP2009177190A (ja) 2009-08-06
JP2009177190A5 JP2009177190A5 (enExample) 2009-09-17
JP4969595B2 true JP4969595B2 (ja) 2012-07-04

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5369233B2 (ja) * 2010-03-19 2013-12-18 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
US20130068726A1 (en) * 2010-05-27 2013-03-21 Shogo Okita Plasma processing apparatus
JP5593384B2 (ja) * 2010-06-01 2014-09-24 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07335616A (ja) * 1994-06-06 1995-12-22 Hitachi Ltd ウエハ処理装置
JP2001230234A (ja) * 2000-02-16 2001-08-24 Hitachi Ltd プラズマ処理装置及び方法
JP3960929B2 (ja) * 2003-02-25 2007-08-15 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP3950806B2 (ja) * 2003-03-05 2007-08-01 株式会社日立ハイテクノロジーズ プラズマ処理装置及びプラズマ処理方法
JP4640922B2 (ja) * 2003-09-05 2011-03-02 東京エレクトロン株式会社 プラズマ処理装置
JP4361045B2 (ja) * 2005-10-12 2009-11-11 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法

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