JP4951199B2 - （メタ）アクリル酸エステルの製造方法 - Google Patents

（メタ）アクリル酸エステルの製造方法 Download PDF

Info

Publication number
JP4951199B2
JP4951199B2 JP2004188400A JP2004188400A JP4951199B2 JP 4951199 B2 JP4951199 B2 JP 4951199B2 JP 2004188400 A JP2004188400 A JP 2004188400A JP 2004188400 A JP2004188400 A JP 2004188400A JP 4951199 B2 JP4951199 B2 JP 4951199B2
Authority
JP
Japan
Prior art keywords
meth
polymer
resist
acrylic acid
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004188400A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006008600A (ja
JP2006008600A5 (enExample
Inventor
敦 大竹
雅 中村
陽 百瀬
隆史 三橋
昭史 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp, Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Chemical Corp
Priority to JP2004188400A priority Critical patent/JP4951199B2/ja
Publication of JP2006008600A publication Critical patent/JP2006008600A/ja
Publication of JP2006008600A5 publication Critical patent/JP2006008600A5/ja
Application granted granted Critical
Publication of JP4951199B2 publication Critical patent/JP4951199B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2004188400A 2004-06-25 2004-06-25 （メタ）アクリル酸エステルの製造方法 Expired - Fee Related JP4951199B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004188400A JP4951199B2 (ja) 2004-06-25 2004-06-25 （メタ）アクリル酸エステルの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004188400A JP4951199B2 (ja) 2004-06-25 2004-06-25 （メタ）アクリル酸エステルの製造方法

Publications (3)

Publication Number Publication Date
JP2006008600A JP2006008600A (ja) 2006-01-12
JP2006008600A5 JP2006008600A5 (enExample) 2007-08-09
JP4951199B2 true JP4951199B2 (ja) 2012-06-13

Family

ID=35776233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004188400A Expired - Fee Related JP4951199B2 (ja) 2004-06-25 2004-06-25 （メタ）アクリル酸エステルの製造方法

Country Status (1)

Country Link
JP (1) JP4951199B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4942514B2 (ja) * 2007-03-06 2012-05-30 三菱レイヨン株式会社 （メタ）アクリル酸エステルの製造方法
AU2019304450A1 (en) * 2018-07-17 2021-03-11 Evonik Operations Gmbh Method for preparing C-H acidic (meth)acrylates

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003330194A (ja) * 2002-05-14 2003-11-19 Fuji Photo Film Co Ltd ポジ型感光性組成物
WO2004067592A1 (ja) * 2003-01-31 2004-08-12 Mitsubishi Rayon Co., Ltd. レジスト用重合体およびレジスト組成物
JP4323250B2 (ja) * 2003-07-31 2009-09-02 三菱レイヨン株式会社 重合体、重合体の製造方法、レジスト組成物およびパターン形成方法

Also Published As

Publication number Publication date
JP2006008600A (ja) 2006-01-12

Similar Documents

Publication Publication Date Title
JP4000295B2 (ja) レジスト用共重合体およびその製造方法、ならびにレジスト組成物
US20090263743A1 (en) Resist polymer and resist composition
JP2017008068A (ja) 塩基反応性光酸発生剤およびこれを含むフォトレジスト
WO2007138893A1 (ja) ポジ型レジスト組成物およびレジストパターン形成方法
JP5269311B2 (ja) （メタ）アクリル酸エステル、重合体、およびレジスト組成物
JP4006472B2 (ja) レジスト用重合体、レジスト用重合体の製造方法、レジスト組成物、およびパターンが形成された基板の製造方法
JP5456365B2 (ja) 重合体、レジスト組成物、および微細パターンが形成された基板の製造方法
JP5620627B2 (ja) レジスト用重合体の製造方法、レジスト組成物、および微細パターンが形成された基板の製造方法
JP5339494B2 (ja) 重合体、レジスト組成物及びパターンが形成された基板の製造方法
JP4315761B2 (ja) （共）重合体、製造方法、レジスト組成物およびパターン形成方法
JP4323250B2 (ja) 重合体、重合体の製造方法、レジスト組成物およびパターン形成方法
CN100427519C (zh) 用于抗蚀剂的树脂、正性抗蚀剂组合物和形成抗蚀剂图案的方法
JP5059419B2 (ja) 重合体、レジスト組成物及びパターンが形成された基板の製造方法
JP2001022075A (ja) レジスト用樹脂、化学増幅型レジスト組成物およびレジストパターン形成方法
WO2007138797A1 (ja) ポジ型レジスト組成物およびレジストパターン形成方法
JP4851140B2 (ja) （メタ）アクリル酸エステル、重合体、レジスト組成物、およびパターンが形成された基板の製造方法
JP4332445B2 (ja) レジスト用重合体
JP2006008600A (ja) （メタ）アクリル酸エステル、その製造方法、およびその重合体
JP5584980B2 (ja) レジスト材料、レジスト組成物、微細パターンが形成された基板の製造方法、およびレジスト用重合体の製造方法
JP5696868B2 (ja) レジスト用共重合体の製造方法。
JP2006018016A (ja) ポジ型レジスト組成物およびレジストパターン形成方法
JP2006104378A (ja) レジスト用単量体およびレジスト用重合体
JP4390197B2 (ja) 重合体、レジスト組成物およびパターン製造方法
JP4493012B2 (ja) レジスト用重合体およびレジスト組成物
JP5660483B2 (ja) レジスト用重合体組成物、レジスト組成物、およびパターンが形成された基板の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070622

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070622

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101117

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110113

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110817

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110826

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120228

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120312

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4951199

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150316

Year of fee payment: 3

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees