JP4942107B2 - 光触媒素子 - Google Patents
光触媒素子 Download PDFInfo
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- JP4942107B2 JP4942107B2 JP2007211423A JP2007211423A JP4942107B2 JP 4942107 B2 JP4942107 B2 JP 4942107B2 JP 2007211423 A JP2007211423 A JP 2007211423A JP 2007211423 A JP2007211423 A JP 2007211423A JP 4942107 B2 JP4942107 B2 JP 4942107B2
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- Prior art keywords
- light
- metal coating
- coating layer
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- photocatalytic
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- 230000001699 photocatalysis Effects 0.000 title claims description 73
- 229910052751 metal Inorganic materials 0.000 claims description 81
- 239000002184 metal Substances 0.000 claims description 81
- 239000010410 layer Substances 0.000 claims description 69
- 239000011247 coating layer Substances 0.000 claims description 61
- 239000010409 thin film Substances 0.000 claims description 34
- 239000011941 photocatalyst Substances 0.000 claims description 16
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 14
- 229910052707 ruthenium Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 12
- 150000002739 metals Chemical class 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 3
- 238000001465 metallisation Methods 0.000 claims 1
- 230000001965 increasing effect Effects 0.000 description 26
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 19
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 18
- 230000003197 catalytic effect Effects 0.000 description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 14
- 230000005684 electric field Effects 0.000 description 13
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 12
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000012327 Ruthenium complex Substances 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000000956 alloy Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 229910052761 rare earth metal Inorganic materials 0.000 description 5
- -1 rare earth metal ions Chemical class 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000002165 photosensitisation Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229910052693 Europium Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- 229910052775 Thulium Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000005281 excited state Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000013032 photocatalytic reaction Methods 0.000 description 2
- 230000000644 propagated effect Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 108010043121 Green Fluorescent Proteins Proteins 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 208000017983 photosensitivity disease Diseases 0.000 description 1
- 231100000434 photosensitization Toxicity 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Optical Elements Other Than Lenses (AREA)
- Catalysts (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
本発明の光触媒素子において、金属被覆層は、入射光のうち、入射角が所定の条件に適合したものが金属表面で吸収され、前記エバネッセント光を発生する。また、前記金属被覆層は、前記基材に入射せしめられる前記可視光等の光の波長より小さな直径を備え、規則性を持って配列された孔部を備えるので、前記所定の条件に適合した入射角により発生するエバネッセント光に加えて、該孔部に入射した光によってもエバネッセント光が発生する。前記孔部に発生するエバネッセント光は、1つの孔部に発生したエバネッセント光が該孔部の配列の規則性に従って、次々に隣接する孔部に伝播することによって強度が増大される。従って、前記金属被覆層が前記孔部を規則性を持って配列させたものであるときには、前記全反射により発生するエバネッセント光と、前記孔部に発生する強度が増大されたエバネッセント光とにより、該金属被覆層の表面に前記表面プラズモン共鳴光を容易に励起させることができる。
前記表面プラズモン共鳴光は、電界強度増大効果を備えているので、入射光の強度を増大する。この結果、強度が増大された光が前記光触媒薄膜層に入射することとなり、該光触媒薄膜層は、触媒作用を示すことができる。
Claims (4)
- 光が入射せしめられる基材と、該基材の表面に形成された金属被覆層と、該金属被覆層の上に形成された光触媒薄膜層とを備える光触媒素子であって、
該基材は、入射光が該金属被覆層の表面にエバネッセント光を形成するように入射角を制御すると共に、該基材はプリズムであり、該プリズムの1つの面に形成されて入射光の波長より小さな直径を備え規則性を持って配列された孔部を備える金属被覆層と、該金属被覆層の上に形成された光触媒薄膜層とを備えることを特徴とする光触媒素子。 - 前記金属被覆層は、Au,Ag,Al,Cu,Pt,Pdからなる群から選択される1種以上の金属からなることを特徴とする請求項1記載の光触媒素子。
- 前記金属被覆層と、前記光触媒薄膜層との間に、ルテニウム色素層を備えることを特徴とする請求項1または請求項2記載の光触媒素子。
- 前記金属被覆層と、前記光触媒薄膜層との間に、2光子蛍光体層を備えることを特徴とする請求項1乃至請求項3のいずれか1項記載の光触媒素子。
Priority Applications (1)
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JP2007211423A JP4942107B2 (ja) | 2007-08-14 | 2007-08-14 | 光触媒素子 |
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JP2007211423A JP4942107B2 (ja) | 2007-08-14 | 2007-08-14 | 光触媒素子 |
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JP2009045514A JP2009045514A (ja) | 2009-03-05 |
JP4942107B2 true JP4942107B2 (ja) | 2012-05-30 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5629931B2 (ja) * | 2009-02-12 | 2014-11-26 | スタンレー電気株式会社 | 光触媒素子 |
US8075980B2 (en) * | 2009-05-14 | 2011-12-13 | Empire Technology Development Llc | Diffraction grating assisted self-cleaning material |
KR101021567B1 (ko) | 2009-05-25 | 2011-03-16 | 성균관대학교산학협력단 | 광촉매, 이의 제조방법 및 이를 이용한 휘발성 유기물의 분해 방법 |
US20130242298A1 (en) * | 2010-11-26 | 2013-09-19 | Konica Minolta, Inc. | Prism part of analysis chip, analysis chip including the prism part, and method for producing prism part of analysis chip |
EP3642322A4 (en) * | 2017-06-23 | 2021-03-31 | Ciencia, Inc. | SURFACE PLASMON ENHANCED PHOTOCATALYSIS |
WO2020158150A1 (ja) * | 2019-01-31 | 2020-08-06 | 日本電気硝子株式会社 | プリズム、光デバイス、プリズムの製造方法及びパッケージデバイスの製造方法 |
JP7427888B2 (ja) * | 2019-01-31 | 2024-02-06 | 日本電気硝子株式会社 | プリズム、光デバイス、プリズムの製造方法及びパッケージデバイスの製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH105597A (ja) * | 1996-06-26 | 1998-01-13 | Hitachi Ltd | 触媒の高効率化方法 |
JP2003238104A (ja) * | 2002-02-18 | 2003-08-27 | Univ Tohoku | 水素生成光装置 |
JP2003267507A (ja) * | 2002-03-18 | 2003-09-25 | Nisshin Steel Co Ltd | ゴミステーション |
JP4205923B2 (ja) * | 2002-10-17 | 2009-01-07 | 株式会社光波 | 光触媒装置 |
JP4227397B2 (ja) * | 2002-11-27 | 2009-02-18 | 株式会社フジクラ | 光触媒用担体 |
JP4439194B2 (ja) * | 2003-03-25 | 2010-03-24 | 岡谷電機産業株式会社 | 浄化装置 |
JP2005181401A (ja) * | 2003-12-16 | 2005-07-07 | Fujikura Ltd | 光触媒担持用ファイバ |
JP2005197140A (ja) * | 2004-01-09 | 2005-07-21 | Sony Corp | 光励起式機能デバイス及びその製造方法 |
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