JP4934274B2 - 光沢面測定のための協調偏光 - Google Patents
光沢面測定のための協調偏光 Download PDFInfo
- Publication number
- JP4934274B2 JP4934274B2 JP2004280788A JP2004280788A JP4934274B2 JP 4934274 B2 JP4934274 B2 JP 4934274B2 JP 2004280788 A JP2004280788 A JP 2004280788A JP 2004280788 A JP2004280788 A JP 2004280788A JP 4934274 B2 JP4934274 B2 JP 4934274B2
- Authority
- JP
- Japan
- Prior art keywords
- polarizer
- cameras
- optical
- measurement system
- polarizers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000010287 polarization Effects 0.000 title claims description 40
- 238000004441 surface measurement Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 claims description 50
- 238000005259 measurement Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- 238000010586 diagram Methods 0.000 description 5
- 238000007689 inspection Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/063—Illuminating optical parts
- G01N2201/0635—Structured illumination, e.g. with grating
Landscapes
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/673,598 | 2003-09-29 | ||
| US10/673,598 US7092094B2 (en) | 2003-09-29 | 2003-09-29 | Coordinated polarization for shiny surface measurement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005106820A JP2005106820A (ja) | 2005-04-21 |
| JP2005106820A5 JP2005106820A5 (enExample) | 2007-11-15 |
| JP4934274B2 true JP4934274B2 (ja) | 2012-05-16 |
Family
ID=34194885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004280788A Expired - Lifetime JP4934274B2 (ja) | 2003-09-29 | 2004-09-28 | 光沢面測定のための協調偏光 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7092094B2 (enExample) |
| EP (1) | EP1519143A1 (enExample) |
| JP (1) | JP4934274B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100268069A1 (en) * | 2009-04-16 | 2010-10-21 | Rongguang Liang | Dental surface imaging using polarized fringe projection |
| WO2012149243A1 (en) * | 2011-04-29 | 2012-11-01 | Siemens Healthcare Diagnostics Inc. | High flux collimated illuminator and method of uniform field illumination |
| US9186470B2 (en) * | 2012-02-08 | 2015-11-17 | Apple Inc. | Shape reflector and surface contour mapping |
| CN103868472B (zh) * | 2013-12-23 | 2016-09-07 | 黑龙江科技大学 | 一种用于高反射率零件的面结构光三维测量装置与方法 |
| DE102017213549B3 (de) * | 2017-08-04 | 2018-09-27 | Ifm Electronic Gmbh | Lichtschnittsensor und Verfahren zum Betreiben eines Lichtschnittsensors |
| DE102021123355A1 (de) | 2021-09-09 | 2023-03-09 | Deutsches Zentrum für Luft- und Raumfahrt e.V. | Verfahren und Vorrichtung zum Erkennen von Fehlstellen |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3173047D1 (en) * | 1981-04-04 | 1986-01-09 | Ibm Deutschland | Device for the determination of the polarisation rate in a light-wave field and use of this device to interferometric and holographic measurements |
| JPH04127004A (ja) * | 1990-09-18 | 1992-04-28 | Jasco Corp | エリプソメータ及びその使用方法 |
| JPH04240553A (ja) * | 1991-01-24 | 1992-08-27 | Shimadzu Corp | 物体特性の評価方法 |
| JPH05142141A (ja) * | 1991-11-19 | 1993-06-08 | Katsuya Masao | 薄膜測定装置 |
| US5625446A (en) | 1993-10-18 | 1997-04-29 | United Technologies Corporation | Optical measurement system for articles with varying surface reflectivity |
| US6028671A (en) | 1996-01-31 | 2000-02-22 | General Scanning, Inc. | Method and system for suppressing unwanted reflections in an optical system |
| WO2001007881A1 (en) * | 1999-07-27 | 2001-02-01 | Colorado School Of Mines | Parallel detecting, spectroscopic ellipsometers/polarimeters |
| US6597454B1 (en) | 2000-05-12 | 2003-07-22 | X-Rite, Incorporated | Color measurement instrument capable of obtaining simultaneous polarized and nonpolarized data |
| JP2002116085A (ja) * | 2000-10-05 | 2002-04-19 | Tetsuya Hamamoto | 偏光計測装置 |
| JP2002139423A (ja) * | 2000-11-01 | 2002-05-17 | Fuji Electric Co Ltd | 油膜検知装置 |
| JP2002148186A (ja) * | 2000-11-09 | 2002-05-22 | Olympus Optical Co Ltd | 偏光測定方法および装置 |
| JP2002162344A (ja) * | 2000-11-22 | 2002-06-07 | Nec Corp | 異方性薄膜評価方法および装置 |
| US20020089747A1 (en) | 2001-01-09 | 2002-07-11 | Hay Ranald Joseph | Techniques for reducing observed glare by using polarized optical transmission & reception devices |
| JP4558217B2 (ja) * | 2001-01-12 | 2010-10-06 | 独立行政法人理化学研究所 | 金属試料の特性を光学的に測定する方法及び装置 |
| US6678057B2 (en) | 2001-12-19 | 2004-01-13 | General Electric Company | Method and device for reduction in noise in images from shiny parts |
| US7253901B2 (en) * | 2002-01-23 | 2007-08-07 | Kla-Tencor Technologies Corporation | Laser-based cleaning device for film analysis tool |
-
2003
- 2003-09-29 US US10/673,598 patent/US7092094B2/en not_active Expired - Lifetime
-
2004
- 2004-09-28 JP JP2004280788A patent/JP4934274B2/ja not_active Expired - Lifetime
- 2004-09-29 EP EP04255937A patent/EP1519143A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP1519143A1 (en) | 2005-03-30 |
| US20050068532A1 (en) | 2005-03-31 |
| JP2005106820A (ja) | 2005-04-21 |
| US7092094B2 (en) | 2006-08-15 |
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