JP4933610B2 - 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法 - Google Patents

銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法 Download PDF

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Publication number
JP4933610B2
JP4933610B2 JP2009506541A JP2009506541A JP4933610B2 JP 4933610 B2 JP4933610 B2 JP 4933610B2 JP 2009506541 A JP2009506541 A JP 2009506541A JP 2009506541 A JP2009506541 A JP 2009506541A JP 4933610 B2 JP4933610 B2 JP 4933610B2
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sio
silicone resin
silicone
alternatively
layer
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Expired - Fee Related
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JP2009506541A
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Japanese (ja)
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JP2009534839A (ja
JP2009534839A5 (enExample
Inventor
トーマス・ダンカン・バーナード
志成 張原
秀克 畑中
真樹 伊藤
ディミトリス・エリアス・カツォーリス
通孝 須藤
ビゾング・ズー
ローレンス・エム・ウッズ
ジョセフ・エイチ・アームストロング
ローザイン・エム・リベリン
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DuPont Toray Specialty Materials KK
Dow Silicones Corp
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Dow Corning Toray Co Ltd
Dow Corning Corp
Dow Silicones Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/126Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/167Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Photovoltaic Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2009506541A 2006-04-18 2007-04-18 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法 Expired - Fee Related JP4933610B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US79277006P 2006-04-18 2006-04-18
US79285206P 2006-04-18 2006-04-18
US60/792,852 2006-04-18
US60/792,770 2006-04-18
PCT/US2007/009359 WO2007123898A1 (en) 2006-04-18 2007-04-18 Copper indium diselenide-based photovoltaic device and method of preparing the same

Related Child Applications (1)

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JP2011231726A Division JP2012069965A (ja) 2006-04-18 2011-10-21 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法

Publications (3)

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JP2009534839A JP2009534839A (ja) 2009-09-24
JP2009534839A5 JP2009534839A5 (enExample) 2010-06-03
JP4933610B2 true JP4933610B2 (ja) 2012-05-16

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JP2009506541A Expired - Fee Related JP4933610B2 (ja) 2006-04-18 2007-04-18 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法
JP2011231726A Pending JP2012069965A (ja) 2006-04-18 2011-10-21 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法

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JP2011231726A Pending JP2012069965A (ja) 2006-04-18 2011-10-21 銅インジウム二セレン化物をベースとする光起電デバイス及びその光起電デバイスを作製する方法

Country Status (9)

Country Link
US (1) US20090084428A1 (enExample)
EP (1) EP2018669B1 (enExample)
JP (2) JP4933610B2 (enExample)
KR (1) KR20090003334A (enExample)
CN (1) CN102646724A (enExample)
AT (1) ATE448569T1 (enExample)
DE (1) DE602007003216D1 (enExample)
ES (1) ES2335551T3 (enExample)
WO (1) WO2007123898A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8207442B2 (en) 2006-04-18 2012-06-26 Itn Energy Systems, Inc. Reinforcing structures for thin-film photovoltaic device substrates, and associated methods
US8124870B2 (en) 2006-09-19 2012-02-28 Itn Energy System, Inc. Systems and processes for bifacial collection and tandem junctions using a thin-film photovoltaic device
CN101646559A (zh) 2007-02-22 2010-02-10 陶氏康宁公司 具有优良的耐火性和抗冲击性的复合制品及其制备方法
EP2031082B1 (fr) * 2007-08-31 2014-09-03 Aperam Alloys Imphy Substrat métallique texture cristallographiquement, dispositif texture cristallographiquement, cellule et module photovoltaique comprenant un tel dispositif et procédé de dépot de couches minces
US20100236607A1 (en) * 2008-06-12 2010-09-23 General Electric Company Monolithically integrated solar modules and methods of manufacture
US8134069B2 (en) * 2009-04-13 2012-03-13 Miasole Method and apparatus for controllable sodium delivery for thin film photovoltaic materials
US20110017289A1 (en) * 2009-07-24 2011-01-27 Electronics And Telecommunications Research Institute Cigs solar cell and method of fabricating the same
KR102090184B1 (ko) * 2016-01-13 2020-03-18 주식회사 메카로에너지 Cigs 광흡수층을 포함하는 태양전지 및 이의 제조방법
KR101956093B1 (ko) * 2017-01-24 2019-06-24 울산과학기술원 유전체-금속 나노입자 복합체를 포함하는 광 흡수체, 이의 제조방법 및 이를 포함하는 물분해 광전극

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0078541A2 (en) * 1981-11-04 1983-05-11 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Flexible photovoltaic device
EP0881695A2 (en) * 1997-05-16 1998-12-02 International Solar Electric Technology, Inc. A method of making group IB-IIIA-VIA compund semiconductor films and method of fabricating a photovoltaic device
EP1207188A2 (en) * 2000-11-20 2002-05-22 General Electric Company Curable silicone adhesive compositions
EP1388572A1 (en) * 2002-08-08 2004-02-11 Shin-Etsu Chemical Co., Ltd. Addition reaction curable organopolysiloxane composition
EP1489666A1 (en) * 2002-03-26 2004-12-22 Honda Giken Kogyo Kabushiki Kaisha Compound thin-film solar cell and process for producing the same
WO2005017058A1 (en) * 2003-08-01 2005-02-24 Dow Corning Corporation Silicone based dielectric coatings and films for photovoltaic applications
US20050061437A1 (en) * 2003-09-19 2005-03-24 Shin-Etsu Chemical Co., Ltd. Curable silicone resin composition
WO2005052078A1 (en) * 2003-11-28 2005-06-09 Dow Corning Toray Co., Ltd. A method of manufacturing a layered silicone composite material

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL131800C (enExample) * 1965-05-17
DE2709094C2 (de) * 1977-03-02 1984-11-22 Boehringer Mannheim Gmbh, 6800 Mannheim Adsorbens für die affinitätsspezifische Trennung von Nukleinsäuren, Verfahren zu seiner Herstellung und seine Verwendung
US4087585A (en) * 1977-05-23 1978-05-02 Dow Corning Corporation Self-adhering silicone compositions and preparations thereof
US4260780A (en) * 1979-11-27 1981-04-07 The United States Of America As Represented By The Secretary Of The Air Force Phenylmethylpolysilane polymers and process for their preparation
US4276424A (en) * 1979-12-03 1981-06-30 Petrarch Systems Methods for the production of organic polysilanes
US4314956A (en) * 1980-07-23 1982-02-09 Dow Corning Corporation High yield silicon carbide pre-ceramic polymers
US4324901A (en) * 1981-04-29 1982-04-13 Wisconsin Alumni Research Foundation Soluble polysilastyrene and method for preparation
US4530879A (en) * 1983-03-04 1985-07-23 Minnesota Mining And Manufacturing Company Radiation activated addition reaction
US4510094A (en) * 1983-12-06 1985-04-09 Minnesota Mining And Manufacturing Company Platinum complex
US4720856A (en) * 1986-09-02 1988-01-19 Motorola, Inc. Control circuit having a direct current control loop for controlling the gain of an attenuator
US4766176A (en) * 1987-07-20 1988-08-23 Dow Corning Corporation Storage stable heat curable organosiloxane compositions containing microencapsulated platinum-containing catalysts
JPH0214244A (ja) * 1988-06-30 1990-01-18 Toray Dow Corning Silicone Co Ltd 加熱硬化性オルガノポリシロキサン組成物
JP3029680B2 (ja) * 1991-01-29 2000-04-04 東レ・ダウコーニング・シリコーン株式会社 オルガノペンタシロキサンおよびその製造方法
DE4217432A1 (de) * 1992-05-26 1993-12-02 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung von Glas mit verbesserter Langzeitstandfähigkeit bei erhöhten Temperaturen
JP3169148B2 (ja) * 1992-09-30 2001-05-21 三井化学株式会社 防火ガラス
US5441897A (en) * 1993-04-12 1995-08-15 Midwest Research Institute Method of fabricating high-efficiency Cu(In,Ga)(SeS)2 thin films for solar cells
DE4423195A1 (de) * 1994-07-01 1996-01-04 Wacker Chemie Gmbh Triazenoxid-Übergangsmetall-Komplexe als Hydrosilylierungskatalysatoren
JP3825843B2 (ja) * 1996-09-12 2006-09-27 キヤノン株式会社 太陽電池モジュール
DE69728846T2 (de) * 1996-12-31 2005-04-21 Dow Corning Verfahren zur Herstellung von Gummi-modifizierte feste Silikon-Harze und daraus hergestellte Komposite
DE19731416C1 (de) * 1997-07-22 1998-09-17 Vetrotech Saint Gobain Int Ag Brandschutzverglasung
JPH11289103A (ja) * 1998-02-05 1999-10-19 Canon Inc 半導体装置および太陽電池モジュ―ル及びその解体方法
US6846852B2 (en) * 2001-08-16 2005-01-25 Goldschmidt Ag Siloxane-containing compositions curable by radiation to silicone elastomers
US6537845B1 (en) * 2001-08-30 2003-03-25 Mccandless Brian E. Chemical surface deposition of ultra-thin semiconductors
US6660395B2 (en) * 2002-03-12 2003-12-09 Dow Corning Corporation Silicone resin based composites interleaved for improved toughness
KR20050004876A (ko) * 2002-05-27 2005-01-12 닛토덴코 가부시키가이샤 수지 시트, 이것을 사용한 액정 셀 기판
US7037592B2 (en) * 2003-02-25 2006-05-02 Dow Coming Corporation Hybrid composite of silicone and organic resins
US20070160936A1 (en) * 2003-06-23 2007-07-12 Gardner Geoffrey B Adhesion method using gray-scale photolithography
US8716592B2 (en) * 2004-07-12 2014-05-06 Quanex Ig Systems, Inc. Thin film photovoltaic assembly method
US7576017B2 (en) * 2004-11-10 2009-08-18 Daystar Technologies, Inc. Method and apparatus for forming a thin-film solar cell using a continuous process
US8092910B2 (en) * 2005-02-16 2012-01-10 Dow Corning Toray Co., Ltd. Reinforced silicone resin film and method of preparing same
KR101271662B1 (ko) * 2005-02-16 2013-06-05 다우 코닝 도레이 캄파니 리미티드 강화 실리콘 수지 필름 및 이의 제조방법
US8207442B2 (en) * 2006-04-18 2012-06-26 Itn Energy Systems, Inc. Reinforcing structures for thin-film photovoltaic device substrates, and associated methods

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0078541A2 (en) * 1981-11-04 1983-05-11 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Flexible photovoltaic device
EP0881695A2 (en) * 1997-05-16 1998-12-02 International Solar Electric Technology, Inc. A method of making group IB-IIIA-VIA compund semiconductor films and method of fabricating a photovoltaic device
EP1207188A2 (en) * 2000-11-20 2002-05-22 General Electric Company Curable silicone adhesive compositions
EP1489666A1 (en) * 2002-03-26 2004-12-22 Honda Giken Kogyo Kabushiki Kaisha Compound thin-film solar cell and process for producing the same
EP1388572A1 (en) * 2002-08-08 2004-02-11 Shin-Etsu Chemical Co., Ltd. Addition reaction curable organopolysiloxane composition
WO2005017058A1 (en) * 2003-08-01 2005-02-24 Dow Corning Corporation Silicone based dielectric coatings and films for photovoltaic applications
US20050061437A1 (en) * 2003-09-19 2005-03-24 Shin-Etsu Chemical Co., Ltd. Curable silicone resin composition
WO2005052078A1 (en) * 2003-11-28 2005-06-09 Dow Corning Toray Co., Ltd. A method of manufacturing a layered silicone composite material

Also Published As

Publication number Publication date
US20090084428A1 (en) 2009-04-02
KR20090003334A (ko) 2009-01-09
EP2018669A1 (en) 2009-01-28
EP2018669B1 (en) 2009-11-11
ES2335551T3 (es) 2010-03-29
JP2012069965A (ja) 2012-04-05
JP2009534839A (ja) 2009-09-24
ATE448569T1 (de) 2009-11-15
DE602007003216D1 (de) 2009-12-24
WO2007123898A1 (en) 2007-11-01
CN102646724A (zh) 2012-08-22

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