JP4931811B2 - 一体型高真空ポンピングシステム - Google Patents
一体型高真空ポンピングシステム Download PDFInfo
- Publication number
- JP4931811B2 JP4931811B2 JP2007525664A JP2007525664A JP4931811B2 JP 4931811 B2 JP4931811 B2 JP 4931811B2 JP 2007525664 A JP2007525664 A JP 2007525664A JP 2007525664 A JP2007525664 A JP 2007525664A JP 4931811 B2 JP4931811 B2 JP 4931811B2
- Authority
- JP
- Japan
- Prior art keywords
- valve
- housing
- bypass
- tmp
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005086 pumping Methods 0.000 title description 6
- 238000012545 processing Methods 0.000 claims description 31
- 230000007246 mechanism Effects 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 3
- 239000012634 fragment Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 22
- 230000008569 process Effects 0.000 description 19
- 239000007789 gas Substances 0.000 description 16
- 238000013461 design Methods 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 11
- 238000012423 maintenance Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 230000010354 integration Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 238000003745 diagnosis Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000007726 management method Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 101710112672 Probable tape measure protein Proteins 0.000 description 1
- 101710204224 Tape measure protein Proteins 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/042—Turbomolecular vacuum pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
- F04B17/03—Pumps characterised by combination with, or adaptation to, specific driving engines or motors driven by electric motors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
- F04B53/06—Venting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
- F04D27/02—Surge control
- F04D27/0269—Surge control by changing flow path between different stages or between a plurality of compressors; load distribution between compressors
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Details Of Valves (AREA)
Description
真空室の制御された排気も、可変コンダクタンス弁をバイパス弁として使用することにより実現される。更に、弁44は、緩やかに起動できるように非常に小さな追加の弁で補強してもよく、そうすれば、室は、排気弁44を迂回する追加の低速の狭いバイパス配管を通して排気される。
Claims (5)
- 気体を送出するための装置において、
処理室に接続するための一体のフランジを有するハウジングと、
前記ハウジング内に一体化されたキャビティであって、ターボ分子ポンプを備えているキャビティと、
前記ハウジング内に一体化され且つ前記ハウジングに可動式に接続されている吸込弁であって、前記キャビティ内の前記ターボ分子ポンプと前記処理室との間に配置されている吸込弁と、
前記ハウジング内に一体に配置されているバイパス管路であって、前記バイパス管路に沿って複数の位置で前記キャビティと弁調整式連通状態にある、バイパス管路と、
前記キャビティと前記処理室の間の前記バイパス管路内のバイパス流を調整するために、前記バイパス管路内に配置されているバイパス弁と、
前記キャビティから前記バイパス管路への流れを調整するための排気弁であって、前記バイパス弁に近接して配置されている排気弁と、を備え、
前記ハウジングと前記バイパス弁と前記排気弁とは、互いに熱的に接触しており、
前記バイパス弁と前記排気弁とは、蛇腹機構を有する、装置。 - 前記ハウジング、前記吸込弁、前記バイパス弁、前記排気弁、及び前記バイパス管路は、作動中は同じ温度に維持されている、請求項1に記載の装置。
- 前記排気弁は、前記ターボ分子ポンプの排出口に取り付けられている、請求項1又は2に記載の装置。
- 前記バイパス管路は、前記ハウジング内にミーリング加工されている、請求項1乃至3の何れか1項に記載の装置。
- 前記ハウジングは、ポンプが故障した場合には、前記ターボ分子ポンプの破砕片を保有するように寸法が決められ構築されている、請求項1乃至4の何れか1項に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/916,081 US7140847B2 (en) | 2004-08-11 | 2004-08-11 | Integrated high vacuum pumping system |
US10/916,081 | 2004-08-11 | ||
PCT/US2005/027596 WO2006020473A1 (en) | 2004-08-11 | 2005-08-03 | An integrated high vacuum pumping system |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008510093A JP2008510093A (ja) | 2008-04-03 |
JP4931811B2 true JP4931811B2 (ja) | 2012-05-16 |
Family
ID=35800136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007525664A Active JP4931811B2 (ja) | 2004-08-11 | 2005-08-03 | 一体型高真空ポンピングシステム |
Country Status (7)
Country | Link |
---|---|
US (1) | US7140847B2 (ja) |
EP (1) | EP1781946B1 (ja) |
JP (1) | JP4931811B2 (ja) |
KR (1) | KR101224337B1 (ja) |
CN (1) | CN100491720C (ja) |
TW (1) | TWI356131B (ja) |
WO (1) | WO2006020473A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100697280B1 (ko) * | 2005-02-07 | 2007-03-20 | 삼성전자주식회사 | 반도체 제조 설비의 압력 조절 방법 |
US7438534B2 (en) * | 2005-10-07 | 2008-10-21 | Edwards Vacuum, Inc. | Wide range pressure control using turbo pump |
JP2008088880A (ja) * | 2006-09-29 | 2008-04-17 | Anest Iwata Corp | 真空排気装置 |
JP5357679B2 (ja) * | 2009-09-24 | 2013-12-04 | 入江工研株式会社 | コンダクタンスバルブ及び真空ポンプ |
JP5304749B2 (ja) * | 2010-08-05 | 2013-10-02 | 株式会社島津製作所 | 真空分析装置 |
US9267605B2 (en) | 2011-11-07 | 2016-02-23 | Lam Research Corporation | Pressure control valve assembly of plasma processing chamber and rapid alternating process |
JP6009193B2 (ja) * | 2012-03-30 | 2016-10-19 | 株式会社荏原製作所 | 真空排気装置 |
CN109563617B (zh) * | 2016-08-26 | 2021-06-08 | 应用材料公司 | 低压升降杆腔硬件 |
JP6729408B2 (ja) * | 2017-01-13 | 2020-07-22 | 株式会社島津製作所 | 弁装置 |
US10559451B2 (en) * | 2017-02-15 | 2020-02-11 | Applied Materials, Inc. | Apparatus with concentric pumping for multiple pressure regimes |
US10704715B2 (en) * | 2017-05-29 | 2020-07-07 | Shimadzu Corporation | Vacuum pumping device, vacuum pump, and vacuum valve |
JP6992335B2 (ja) * | 2017-09-07 | 2022-01-13 | 株式会社島津製作所 | 真空ポンプ起動制御装置 |
GB2575450B (en) * | 2018-07-09 | 2022-01-26 | Edwards Ltd | A variable inlet conductance vacuum pump, vacuum pump arrangement and method |
GB2592043A (en) * | 2020-02-13 | 2021-08-18 | Edwards Ltd | Axial flow vacuum pump |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5866746A (ja) * | 1981-10-16 | 1983-04-21 | Matsushita Electric Ind Co Ltd | 熱交換器 |
JPH041481A (ja) * | 1990-04-13 | 1992-01-06 | Mitsubishi Electric Corp | 真空容器の真空排気機構 |
JPH07171374A (ja) * | 1992-03-23 | 1995-07-11 | Matsushita Electron Corp | 排気系バルブの操作方法 |
JPH10176663A (ja) * | 1996-12-16 | 1998-06-30 | Ebara Corp | トラップ装置 |
JPH11210802A (ja) * | 1998-01-21 | 1999-08-03 | Kayaba Ind Co Ltd | ロータリーダンパ |
JP2002257040A (ja) * | 2001-03-05 | 2002-09-11 | Sharp Corp | 真空排気装置 |
JP2003065282A (ja) * | 2001-08-22 | 2003-03-05 | Shimadzu Corp | ターボ分子ポンプ |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3096785A (en) | 1960-06-27 | 1963-07-09 | Ingersoll Rand Co | Pipe line pump |
US3097785A (en) * | 1961-06-05 | 1963-07-16 | American Can Co | Opening means for vermin-proof carton |
US3151806A (en) | 1962-09-24 | 1964-10-06 | Joseph E Whitfield | Screw type compressor having variable volume and adjustable compression |
US4171936A (en) | 1978-03-13 | 1979-10-23 | General Motors Corporation | Engine turbocharger with integral wastegate |
JPS62153597A (ja) * | 1985-12-27 | 1987-07-08 | Hitachi Ltd | 真空ポンプ |
DE3827489C1 (ja) | 1988-08-12 | 1989-10-12 | Gruenbeck Wasseraufbereitung Gmbh, 8884 Hoechstaedt, De | |
JPH041418A (ja) | 1990-04-18 | 1992-01-06 | Nissan Motor Co Ltd | 2ストローク内燃機関 |
JP3160504B2 (ja) * | 1995-09-05 | 2001-04-25 | 三菱重工業株式会社 | ターボ分子ポンプ |
DE19712096C1 (de) | 1997-03-22 | 1998-04-02 | Lang Apparatebau Gmbh | Dosierpumpe zum dosierten Fördern von Flüssigkeiten |
GB9717400D0 (en) * | 1997-08-15 | 1997-10-22 | Boc Group Plc | Vacuum pumping systems |
US6161576A (en) | 1999-06-23 | 2000-12-19 | Mks Instruments, Inc. | Integrated turbo pump and control valve system |
US6089537A (en) | 1999-06-23 | 2000-07-18 | Mks Instruments, Inc. | Pendulum valve assembly |
TW460942B (en) * | 1999-08-31 | 2001-10-21 | Mitsubishi Material Silicon | CVD device, purging method, method for determining maintenance time for a semiconductor making device, moisture content monitoring device, and semiconductor making device with such moisture content monitoring device |
DE10114585A1 (de) | 2001-03-24 | 2002-09-26 | Pfeiffer Vacuum Gmbh | Vakuumpumpe |
KR100451651B1 (ko) | 2001-12-13 | 2004-10-08 | 엘지전자 주식회사 | 원심형 압축기의 역회전 방지구조 |
GB0229355D0 (en) * | 2002-12-17 | 2003-01-22 | Boc Group Plc | Vacuum pumping arrangement |
US7717684B2 (en) * | 2003-08-21 | 2010-05-18 | Ebara Corporation | Turbo vacuum pump and semiconductor manufacturing apparatus having the same |
-
2004
- 2004-08-11 US US10/916,081 patent/US7140847B2/en active Active
-
2005
- 2005-08-03 WO PCT/US2005/027596 patent/WO2006020473A1/en active Application Filing
- 2005-08-03 KR KR1020077003237A patent/KR101224337B1/ko active IP Right Grant
- 2005-08-03 EP EP05779007.3A patent/EP1781946B1/en active Active
- 2005-08-03 CN CNB2005800274068A patent/CN100491720C/zh active Active
- 2005-08-03 JP JP2007525664A patent/JP4931811B2/ja active Active
- 2005-08-11 TW TW094127250A patent/TWI356131B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5866746A (ja) * | 1981-10-16 | 1983-04-21 | Matsushita Electric Ind Co Ltd | 熱交換器 |
JPH041481A (ja) * | 1990-04-13 | 1992-01-06 | Mitsubishi Electric Corp | 真空容器の真空排気機構 |
JPH07171374A (ja) * | 1992-03-23 | 1995-07-11 | Matsushita Electron Corp | 排気系バルブの操作方法 |
JPH10176663A (ja) * | 1996-12-16 | 1998-06-30 | Ebara Corp | トラップ装置 |
JPH11210802A (ja) * | 1998-01-21 | 1999-08-03 | Kayaba Ind Co Ltd | ロータリーダンパ |
JP2002257040A (ja) * | 2001-03-05 | 2002-09-11 | Sharp Corp | 真空排気装置 |
JP2003065282A (ja) * | 2001-08-22 | 2003-03-05 | Shimadzu Corp | ターボ分子ポンプ |
Also Published As
Publication number | Publication date |
---|---|
CN101002020A (zh) | 2007-07-18 |
JP2008510093A (ja) | 2008-04-03 |
EP1781946B1 (en) | 2014-07-30 |
KR20070040810A (ko) | 2007-04-17 |
WO2006020473A1 (en) | 2006-02-23 |
KR101224337B1 (ko) | 2013-01-21 |
TWI356131B (en) | 2012-01-11 |
EP1781946A4 (en) | 2012-12-19 |
WO2006020473A8 (en) | 2006-11-16 |
EP1781946A1 (en) | 2007-05-09 |
TW200624675A (en) | 2006-07-16 |
US7140847B2 (en) | 2006-11-28 |
CN100491720C (zh) | 2009-05-27 |
US20060034715A1 (en) | 2006-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4931811B2 (ja) | 一体型高真空ポンピングシステム | |
US20060175012A1 (en) | Semiconductor fabrication equipment and method for controlling pressure | |
US20050189074A1 (en) | Gas processing apparatus and method and computer storage medium storing program for controlling same | |
US7806383B2 (en) | Slit valve | |
JP2731080B2 (ja) | ガス制御装置 | |
KR20010043301A (ko) | 진공장치 | |
US6598615B1 (en) | Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber | |
JP4451615B2 (ja) | 真空ポンプシステムとその制御方法 | |
KR20060125813A (ko) | 진공 펌프 | |
WO2006132455A1 (en) | Vacuum gate valve | |
KR100593748B1 (ko) | 반도체 제조설비용 저압배기라인의 역류방지밸브 | |
KR100446455B1 (ko) | 진공 게이트밸브 | |
WO2022075230A1 (ja) | 真空排気システム | |
JP2004218648A (ja) | 真空装置 | |
JP2018066370A (ja) | 気密性真空ポンプ遮断弁 | |
KR20060122420A (ko) | 진공 시스템 | |
KR20100073338A (ko) | 반도체 공정챔버의 진공펌프 시스템 | |
KR20060119363A (ko) | 반도체 제조설비용 진공설비 | |
KR100227830B1 (ko) | 반도체 공정챔버용 진공시스템 및 이를 이용한가스공급방법 | |
KR20040096317A (ko) | 배기 가스 처리 시스템 | |
KR20210096577A (ko) | 진공 시스템 | |
KR20070089006A (ko) | 플랜지 쿨링 유니트를 갖는 확산로 | |
KR20060134286A (ko) | 반도체 제조설비용 진공설비 | |
TW202142727A (zh) | 噴淋頭組件 | |
KR20060126215A (ko) | 화학기상증착 장치의 배기라인 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20080617 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080704 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101126 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101202 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110225 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110304 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110525 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110617 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110920 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110928 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111208 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120119 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120214 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4931811 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150224 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |