JP4921644B2 - 波面測定装置および波面測定方法 - Google Patents

波面測定装置および波面測定方法 Download PDF

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Publication number
JP4921644B2
JP4921644B2 JP2001051408A JP2001051408A JP4921644B2 JP 4921644 B2 JP4921644 B2 JP 4921644B2 JP 2001051408 A JP2001051408 A JP 2001051408A JP 2001051408 A JP2001051408 A JP 2001051408A JP 4921644 B2 JP4921644 B2 JP 4921644B2
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Japan
Prior art keywords
plano
optical system
convex
test
light
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Expired - Fee Related
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JP2001051408A
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English (en)
Japanese (ja)
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JP2002250678A (ja
JP2002250678A5 (enExample
Inventor
浩幸 西田
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Olympus Corp
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Olympus Corp
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Priority to JP2001051408A priority Critical patent/JP4921644B2/ja
Priority to US10/083,558 priority patent/US6785006B2/en
Publication of JP2002250678A publication Critical patent/JP2002250678A/ja
Priority to US10/895,331 priority patent/US6967724B2/en
Publication of JP2002250678A5 publication Critical patent/JP2002250678A5/ja
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Publication of JP4921644B2 publication Critical patent/JP4921644B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods

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  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2001051408A 2001-02-27 2001-02-27 波面測定装置および波面測定方法 Expired - Fee Related JP4921644B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2001051408A JP4921644B2 (ja) 2001-02-27 2001-02-27 波面測定装置および波面測定方法
US10/083,558 US6785006B2 (en) 2001-02-27 2002-02-27 Wavefront measuring apparatus and wavefront measuring method
US10/895,331 US6967724B2 (en) 2001-02-27 2004-07-21 Wavefront measuring apparatus and wavefront measuring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001051408A JP4921644B2 (ja) 2001-02-27 2001-02-27 波面測定装置および波面測定方法

Publications (3)

Publication Number Publication Date
JP2002250678A JP2002250678A (ja) 2002-09-06
JP2002250678A5 JP2002250678A5 (enExample) 2008-04-10
JP4921644B2 true JP4921644B2 (ja) 2012-04-25

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ID=18912196

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JP2001051408A Expired - Fee Related JP4921644B2 (ja) 2001-02-27 2001-02-27 波面測定装置および波面測定方法

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US (2) US6785006B2 (enExample)
JP (1) JP4921644B2 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003042731A (ja) * 2001-08-01 2003-02-13 Canon Inc 形状計測装置および形状計測方法
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100568101C (zh) 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10261775A1 (de) * 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1650787A4 (en) * 2003-07-25 2007-09-19 Nikon Corp INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
JP4782019B2 (ja) * 2004-01-16 2011-09-28 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系の光学測定のための装置及び方法、測定構造支持材、及びマイクロリソグラフィ投影露光装置
WO2005119368A2 (en) * 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
JP4739806B2 (ja) * 2004-06-07 2011-08-03 富士フイルム株式会社 光ビーム測定装置および方法
JP2006135111A (ja) 2004-11-05 2006-05-25 Canon Inc 波面収差測定装置、露光装置、及びデバイス製造方法
TWI242661B (en) * 2004-12-27 2005-11-01 Ind Tech Res Inst Apparatus as a tuning filter
JP2007035709A (ja) * 2005-07-22 2007-02-08 Canon Inc 露光装置及びそれを用いたデバイス製造方法
US7295293B2 (en) * 2005-10-21 2007-11-13 Hewlett-Packard Development Company, L.P. Apparatus and method for testing a reflector coating
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8018602B1 (en) 2006-01-13 2011-09-13 Applied Science Innovations, Inc. Metrology of optics with high aberrations
US7545511B1 (en) 2006-01-13 2009-06-09 Applied Science Innovations, Inc. Transmitted wavefront metrology of optics with high aberrations
US8743373B1 (en) 2006-01-13 2014-06-03 Applied Science Innovations, Inc. Metrology of optics with high aberrations
DE102006031076A1 (de) * 2006-03-17 2007-09-20 Osram Opto Semiconductors Gmbh Optisches Projektionsgerät
CA2587805C (en) * 2007-04-25 2014-02-18 The Procter & Gamble Company Improved vitamin d content uniformity in pharmaceutical dosage forms
WO2012001929A1 (ja) * 2010-07-01 2012-01-05 パナソニック株式会社 波面収差測定装置及び波面収差測定方法
CN104089583B (zh) * 2014-06-24 2016-08-24 北京空间机电研究所 一种光学系统波前的子孔径反演方法
US11647906B2 (en) * 2017-08-03 2023-05-16 Michal Pawel Kasprzak Dermoscope and methods
US11143503B2 (en) * 2018-08-07 2021-10-12 Kimball Electronics Indiana, Inc. Interferometric waviness detection systems
US12196944B2 (en) 2020-01-09 2025-01-14 Kimball Electronics Indiana, Inc. Imaging system for leak detection

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62168008A (ja) * 1986-01-20 1987-07-24 Ricoh Co Ltd 非球面形状測定装置
JPH0634335A (ja) * 1992-07-17 1994-02-08 Olympus Optical Co Ltd シェアリング干渉方法およびラジアルシェア素子
JPH09184787A (ja) 1995-12-28 1997-07-15 Olympus Optical Co Ltd 光学レンズ用解析評価装置
JPH1090113A (ja) * 1996-09-18 1998-04-10 Sony Corp 干渉計
JP3796368B2 (ja) * 1999-03-24 2006-07-12 キヤノン株式会社 投影露光装置
JP2001074605A (ja) * 1999-08-31 2001-03-23 Nikon Corp 波面収差測定装置
JP2002022606A (ja) * 2000-07-04 2002-01-23 Sony Corp 光学収差測定方法及び光学収差測定装置
JP2002071513A (ja) * 2000-08-28 2002-03-08 Nikon Corp 液浸系顕微鏡対物レンズ用干渉計および液浸系顕微鏡対物レンズの評価方法

Also Published As

Publication number Publication date
US20020118370A1 (en) 2002-08-29
JP2002250678A (ja) 2002-09-06
US6967724B2 (en) 2005-11-22
US20040257584A1 (en) 2004-12-23
US6785006B2 (en) 2004-08-31

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