JP2002250678A5 - - Google Patents
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- Publication number
- JP2002250678A5 JP2002250678A5 JP2001051408A JP2001051408A JP2002250678A5 JP 2002250678 A5 JP2002250678 A5 JP 2002250678A5 JP 2001051408 A JP2001051408 A JP 2001051408A JP 2001051408 A JP2001051408 A JP 2001051408A JP 2002250678 A5 JP2002250678 A5 JP 2002250678A5
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- JP
- Japan
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Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001051408A JP4921644B2 (ja) | 2001-02-27 | 2001-02-27 | 波面測定装置および波面測定方法 |
| US10/083,558 US6785006B2 (en) | 2001-02-27 | 2002-02-27 | Wavefront measuring apparatus and wavefront measuring method |
| US10/895,331 US6967724B2 (en) | 2001-02-27 | 2004-07-21 | Wavefront measuring apparatus and wavefront measuring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001051408A JP4921644B2 (ja) | 2001-02-27 | 2001-02-27 | 波面測定装置および波面測定方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002250678A JP2002250678A (ja) | 2002-09-06 |
| JP2002250678A5 true JP2002250678A5 (enExample) | 2008-04-10 |
| JP4921644B2 JP4921644B2 (ja) | 2012-04-25 |
Family
ID=18912196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001051408A Expired - Fee Related JP4921644B2 (ja) | 2001-02-27 | 2001-02-27 | 波面測定装置および波面測定方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US6785006B2 (enExample) |
| JP (1) | JP4921644B2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003042731A (ja) * | 2001-08-01 | 2003-02-13 | Canon Inc | 形状計測装置および形状計測方法 |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN100568101C (zh) | 2002-11-12 | 2009-12-09 | Asml荷兰有限公司 | 光刻装置和器件制造方法 |
| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE10261775A1 (de) * | 2002-12-20 | 2004-07-01 | Carl Zeiss Smt Ag | Vorrichtung zur optischen Vermessung eines Abbildungssystems |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4524669B2 (ja) * | 2003-07-25 | 2010-08-18 | 株式会社ニコン | 投影光学系の検査方法および検査装置 |
| US8004690B2 (en) * | 2004-01-16 | 2011-08-23 | Carl Zeiss Smt Gmbh | Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus |
| KR101368523B1 (ko) * | 2004-06-04 | 2014-02-27 | 칼 짜이스 에스엠테 게엠베하 | 광학적 결상 시스템의 결상 품질을 측정하기 위한 시스템 |
| JP4739806B2 (ja) * | 2004-06-07 | 2011-08-03 | 富士フイルム株式会社 | 光ビーム測定装置および方法 |
| JP2006135111A (ja) | 2004-11-05 | 2006-05-25 | Canon Inc | 波面収差測定装置、露光装置、及びデバイス製造方法 |
| TWI242661B (en) * | 2004-12-27 | 2005-11-01 | Ind Tech Res Inst | Apparatus as a tuning filter |
| JP2007035709A (ja) * | 2005-07-22 | 2007-02-08 | Canon Inc | 露光装置及びそれを用いたデバイス製造方法 |
| US7295293B2 (en) * | 2005-10-21 | 2007-11-13 | Hewlett-Packard Development Company, L.P. | Apparatus and method for testing a reflector coating |
| US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8018602B1 (en) | 2006-01-13 | 2011-09-13 | Applied Science Innovations, Inc. | Metrology of optics with high aberrations |
| US7545511B1 (en) | 2006-01-13 | 2009-06-09 | Applied Science Innovations, Inc. | Transmitted wavefront metrology of optics with high aberrations |
| US8743373B1 (en) | 2006-01-13 | 2014-06-03 | Applied Science Innovations, Inc. | Metrology of optics with high aberrations |
| DE102006031076A1 (de) * | 2006-03-17 | 2007-09-20 | Osram Opto Semiconductors Gmbh | Optisches Projektionsgerät |
| CA2835910C (en) * | 2007-04-25 | 2016-06-28 | Warner Chilcott Company, Llc | Improved vitamin d content uniformity in pharmaceutical dosage forms |
| WO2012001929A1 (ja) * | 2010-07-01 | 2012-01-05 | パナソニック株式会社 | 波面収差測定装置及び波面収差測定方法 |
| CN104089583B (zh) * | 2014-06-24 | 2016-08-24 | 北京空间机电研究所 | 一种光学系统波前的子孔径反演方法 |
| WO2019025175A1 (en) * | 2017-08-03 | 2019-02-07 | Kasprzak Michal Pawel | DERMATOSCOPE AND METHODS |
| US11143503B2 (en) * | 2018-08-07 | 2021-10-12 | Kimball Electronics Indiana, Inc. | Interferometric waviness detection systems |
| US12196944B2 (en) | 2020-01-09 | 2025-01-14 | Kimball Electronics Indiana, Inc. | Imaging system for leak detection |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62168008A (ja) * | 1986-01-20 | 1987-07-24 | Ricoh Co Ltd | 非球面形状測定装置 |
| JPH0634335A (ja) * | 1992-07-17 | 1994-02-08 | Olympus Optical Co Ltd | シェアリング干渉方法およびラジアルシェア素子 |
| JPH09184787A (ja) | 1995-12-28 | 1997-07-15 | Olympus Optical Co Ltd | 光学レンズ用解析評価装置 |
| JPH1090113A (ja) * | 1996-09-18 | 1998-04-10 | Sony Corp | 干渉計 |
| JP3796368B2 (ja) * | 1999-03-24 | 2006-07-12 | キヤノン株式会社 | 投影露光装置 |
| JP2001074605A (ja) * | 1999-08-31 | 2001-03-23 | Nikon Corp | 波面収差測定装置 |
| JP2002022606A (ja) * | 2000-07-04 | 2002-01-23 | Sony Corp | 光学収差測定方法及び光学収差測定装置 |
| JP2002071513A (ja) * | 2000-08-28 | 2002-03-08 | Nikon Corp | 液浸系顕微鏡対物レンズ用干渉計および液浸系顕微鏡対物レンズの評価方法 |
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2001
- 2001-02-27 JP JP2001051408A patent/JP4921644B2/ja not_active Expired - Fee Related
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2002
- 2002-02-27 US US10/083,558 patent/US6785006B2/en not_active Expired - Lifetime
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2004
- 2004-07-21 US US10/895,331 patent/US6967724B2/en not_active Expired - Lifetime