JP4916903B2 - プローブの製造方法 - Google Patents
プローブの製造方法 Download PDFInfo
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- JP4916903B2 JP4916903B2 JP2007026662A JP2007026662A JP4916903B2 JP 4916903 B2 JP4916903 B2 JP 4916903B2 JP 2007026662 A JP2007026662 A JP 2007026662A JP 2007026662 A JP2007026662 A JP 2007026662A JP 4916903 B2 JP4916903 B2 JP 4916903B2
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- 239000000523 sample Substances 0.000 title claims description 174
- 238000004519 manufacturing process Methods 0.000 title claims description 28
- 238000005530 etching Methods 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- 230000001737 promoting effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 64
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000007769 metal material Substances 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000011800 void material Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- KSSJBGNOJJETTC-UHFFFAOYSA-N COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC Chemical compound COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC KSSJBGNOJJETTC-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/22—Contacts for co-operating by abutting
- H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
- H01R13/2407—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R2201/00—Connectors or connections adapted for particular applications
- H01R2201/20—Connectors or connections adapted for particular applications for testing or measuring purposes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
- H01R43/16—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for manufacturing contact members, e.g. by punching and by bending
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
- Y10T29/49151—Assembling terminal to base by deforming or shaping
- Y10T29/49153—Assembling terminal to base by deforming or shaping with shaping or forcing terminal into base aperture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
- Y10T29/49208—Contact or terminal manufacturing by assembling plural parts
- Y10T29/49222—Contact or terminal manufacturing by assembling plural parts forming array of contacts or terminals
Landscapes
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
14 プローブ基板
16 プローブ
22 取付け部
24 アーム部
24a アーム部分
26 針先部
30 開口
32 基台
34 連結部
36 保持部
42 犠牲層
42a 犠牲層部分
46 レジスト
46a 凹所
48 プローブ金属材料
116 本体部分
124(124a)、126 対応部分
136、136a、136b 補助部分
134、134a、134b 連結部分
Claims (10)
- 基台上の犠牲層上に該犠牲層が露出する凹所をレジストで形成し、該凹所内にプローブ材料を堆積してプローブを形成した後、前記レジストを除去し、さらにエッチング処理により、前記犠牲層の一部を残してその残部を除去し、この残存する前記犠牲層の一部で前記基台上に保持された前記プローブを前記基台上から剥離することを含むプローブの製造方法において、
前記レジストの前記凹所には、前記プローブの平面形状に対応した本体部分と、該本体部分に連続する補助部分であって前記本体部分に堆積されたプローブ材料で形成されるプローブ下の犠牲層部分が前記エッチング処理によって除去されたとき前記補助部分に堆積されたプローブ材料で形成される保持部下の犠牲層部分が残るに充分な平面形状を有する補助部分とが形成されており、該補助部分を含む前記凹所にプローブ材料を堆積した後、前記エッチング処理により、前記プローブ下の前記犠牲層部分を残すことなく除去した後であって前記保持部下の前記犠牲層部分を残すことなく除去する前に、前記プローブを前記保持部から分離することを特徴とするプローブの製造方法。 - 前記プローブは、プローブ基板への取付け端を有する取付け部と、該取付け部から横方向へ伸びるアーム部と、該アーム部に一体的に設けられ、該アーム部から縦方向へ伸長し、その先端に針先が設けられる針先部とを備える全体に板状のプローブであり、前記レジストの前記凹所の前記取付け部に対応する部分の平面形状の面積よりも前記補助部分の平面形状の面積が大きくなるように前記凹所が形成されている、請求項1に記載の製造方法。
- 前記凹所の前記取付け部に対応する部分には、前記エッチング処理を促進する開口を前記取付け部に形成するための抜き穴部が形成されている、請求項2に記載の製造方法。
- 前記凹所には、さらに、前記補助部分よりも細幅であって該補助部分と前記本体部分とを連結する連結部分が設けられ、前記補助部分は、前記連結部分を経て前記プローブのための前記本体部分に連続する、請求項2に記載の製造方法。
- 前記連結部分は、前記凹所の前記取付け部に対応する部分に、前記取付け端に対応する部分を除く箇所で連続するように、形成されている、請求項4に記載の製造方法。
- 前記連結部分は、前記凹所の前記取付け部に対応する部分に、その側方で連続するように形成されている、請求項5に記載の製造方法。
- 前記連結部分は、前記凹所の前記針先部に対応する部分に、前記針先に対応する部分を除く箇所で連続するように、形成されている、請求項4に記載の製造方法。
- 前記連結部分は、前記凹所の前記針先部に対応する部分に、その側方で連続するように形成されている、請求項7に記載の製造方法。
- 前記連結部分は、該連結部分に堆積される前記プローブ材料で形成される連結部に脆弱部を構成するためのテーパ部を有する、請求項4に記載の製造方法。
- 前記レジストには、プローブのための複数の前記本体部分が共通の前記補助部分を経て連続するように形成される、請求項1に記載の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007026662A JP4916903B2 (ja) | 2007-02-06 | 2007-02-06 | プローブの製造方法 |
US12/017,299 US7721429B2 (en) | 2007-02-06 | 2008-01-21 | Method for manufacturing a probe |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007026662A JP4916903B2 (ja) | 2007-02-06 | 2007-02-06 | プローブの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008191027A JP2008191027A (ja) | 2008-08-21 |
JP4916903B2 true JP4916903B2 (ja) | 2012-04-18 |
Family
ID=39674922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007026662A Active JP4916903B2 (ja) | 2007-02-06 | 2007-02-06 | プローブの製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7721429B2 (ja) |
JP (1) | JP4916903B2 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090144970A1 (en) * | 2007-12-06 | 2009-06-11 | Winmems Technologies Holdings Co., Ltd. | Fabricating an array of mems parts on a substrate |
US7811849B2 (en) * | 2008-01-30 | 2010-10-12 | Winmems Technologies Co., Ltd. | Placing a MEMS part on an application platform using a guide mask |
JP2009270880A (ja) * | 2008-05-02 | 2009-11-19 | Micronics Japan Co Ltd | 電子デバイスの電気的試験用接触子、その製造方法及びプローブ組立体 |
US8089294B2 (en) | 2008-08-05 | 2012-01-03 | WinMENS Technologies Co., Ltd. | MEMS probe fabrication on a reusable substrate for probe card application |
WO2010038433A1 (ja) * | 2008-09-30 | 2010-04-08 | ローム株式会社 | プローブカードの製造方法、プローブカード、半導体装置の製造方法およびプローブの形成方法 |
US7737714B2 (en) * | 2008-11-05 | 2010-06-15 | Winmems Technologies Holdings Co., Ltd. | Probe assembly arrangement |
JP2010117268A (ja) * | 2008-11-13 | 2010-05-27 | Nidec-Read Corp | 検査用プローブ |
US7928751B2 (en) * | 2009-02-18 | 2011-04-19 | Winmems Technologies Holdings Co., Ltd. | MEMS interconnection pins fabrication on a reusable substrate for probe card application |
EP2555001A1 (en) * | 2010-03-30 | 2013-02-06 | Sumitomo Electric Industries, Ltd. | Contact probe, contact probe connecting body and methods for manufacturing same |
JP6068925B2 (ja) * | 2012-10-23 | 2017-01-25 | 株式会社日本マイクロニクス | プローブの製造方法 |
JP6548963B2 (ja) * | 2015-06-10 | 2019-07-24 | 株式会社日本マイクロニクス | プローブの製造方法、プローブ、プローブ積層体、プローブ組立体およびプローブ組立体の製造方法 |
KR20220022668A (ko) * | 2020-08-19 | 2022-02-28 | (주)포인트엔지니어링 | 양극산화막 몰드 및 이를 포함하는 몰드구조체, 이를 이용한 성형물의 제조방법 및 그 성형물 |
CN116430088B (zh) * | 2023-06-13 | 2023-11-24 | 南方科技大学 | 探针及其制备方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60147192A (ja) * | 1984-01-11 | 1985-08-03 | 株式会社日立製作所 | プリント配線板の製造方法 |
JP2710544B2 (ja) * | 1993-09-30 | 1998-02-10 | インターナショナル・ビジネス・マシーンズ・コーポレイション | プローブ構造、プローブ構造の形成方法 |
US5772451A (en) * | 1993-11-16 | 1998-06-30 | Form Factor, Inc. | Sockets for electronic components and methods of connecting to electronic components |
JPH11271015A (ja) * | 1998-03-23 | 1999-10-05 | Olympus Optical Co Ltd | 走査型プローブ顕微鏡用カンチレバーチップ及びその製造方法 |
SG75186A1 (en) | 1998-11-30 | 2000-09-19 | Advantest Corp | Method for producing contact structures |
JP4414502B2 (ja) * | 1999-02-25 | 2010-02-10 | 東京エレクトロン株式会社 | プロービングカード |
EP1359388B1 (de) * | 2002-05-03 | 2004-12-08 | Nanoworld AG | SPM-Sensor und Verfahren zu dessen Herstellung |
JP4217468B2 (ja) * | 2002-12-03 | 2009-02-04 | 株式会社アドバンテスト | プローブピンの配線基板への接続方法、及びプローブカードの製造方法 |
CN100343676C (zh) | 2003-05-13 | 2007-10-17 | 日本麦可罗尼克斯股份有限公司 | 通电试验用探针 |
-
2007
- 2007-02-06 JP JP2007026662A patent/JP4916903B2/ja active Active
-
2008
- 2008-01-21 US US12/017,299 patent/US7721429B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20080184559A1 (en) | 2008-08-07 |
JP2008191027A (ja) | 2008-08-21 |
US7721429B2 (en) | 2010-05-25 |
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