JP4916663B2 - 高透過光学検査ツール - Google Patents
高透過光学検査ツール Download PDFInfo
- Publication number
- JP4916663B2 JP4916663B2 JP2004518066A JP2004518066A JP4916663B2 JP 4916663 B2 JP4916663 B2 JP 4916663B2 JP 2004518066 A JP2004518066 A JP 2004518066A JP 2004518066 A JP2004518066 A JP 2004518066A JP 4916663 B2 JP4916663 B2 JP 4916663B2
- Authority
- JP
- Japan
- Prior art keywords
- inspection system
- light
- optical inspection
- microscope optical
- autofocus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007689 inspection Methods 0.000 title claims description 95
- 230000003287 optical effect Effects 0.000 title claims description 77
- 230000005540 biological transmission Effects 0.000 title description 24
- 238000005286 illumination Methods 0.000 claims description 21
- 229910002601 GaN Inorganic materials 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000006117 anti-reflective coating Substances 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 3
- 238000005755 formation reaction Methods 0.000 claims 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 46
- 239000011248 coating agent Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/025—Objectives with variable magnification
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/16—Microscopes adapted for ultraviolet illumination ; Fluorescence microscopes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/18—Arrangements with more than one light path, e.g. for comparing two specimens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/24—Base structure
- G02B21/241—Devices for focusing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Microscoopes, Condenser (AREA)
- Automatic Focus Adjustment (AREA)
- Eye Examination Apparatus (AREA)
Description
102…照射源
104…光学レンズセット
106…半導体ウェーハ試料
108…検査検出器
110…ビームスプリッタ
112…被写界深度
114…オートフォーカスデバイス
116…LED
118…オートフォーカス光ビーム
120…オートフォーカス検出器
122…ビームスプリッタ
126…格子画像
200、300…グラフ
202…曲線
204…ARコーティング透過曲線
206…破線
302…オートフォーカス波長
Claims (10)
- 顕微鏡光学検査システムであって、
検査光学レンズ要素群の少なくとも1つのセットと、
光を前記検査光学レンズ要素群のセットに導く照射源であって、検査に用いられる光の動作帯域幅がほぼ247〜450ナノメートルの範囲の光の波長を含む照射源と、
発光ダイオードによって生成されたオートフォーカス光ビームを前記検査光学レンズ要素群のセットのうちの少なくともいくつかに導くオートフォーカスデバイスであって、前記照射源と共に使用され、前記オートフォーカス光ビームとして波長がほぼ405ナノメートルの光のみを使用するオートフォーカスデバイスと、
を備え、
前記検査光学レンズ要素の少なくとも1つは、ほぼ247〜450ナノメートルの範囲の波長の光を透過する複数の反射防止膜の層状形成を有する、
顕微鏡光学検査システム。 - 請求項1に記載の顕微鏡光学検査システムであって、前記照射源が水銀−キセノン照射源である顕微鏡光学検査システム。
- 請求項2に記載の顕微鏡光学検査システムであって、前記水銀−キセノン照射源は、ランプ、エキシマレーザ、発光ダイオード、レーザダイオード、および高調波変換ソリッドステートレーザからなるグループから選択されるタイプである顕微鏡光学検査システム。
- 請求項1から3のうちのいずれか一項に記載の顕微鏡光学検査システムであって、前記発光ダイオードは、少なくともガリウムおよび窒化物から作られる、顕微鏡光学検査システム。
- 請求項4に記載の顕微鏡光学検査システムであって、前記発光ダイオードは、ガリウム−窒化物、アルミニウムーガリウムー窒化物、またはインジウムーガリウムー窒化物からなるグループから選択される化合物から形成される顕微鏡光学検査システム。
- 請求項1に記載の顕微鏡光学検査システムであって、前記光学レンズ要素の少なくとも1つは、ほぼ247〜370ナノメートルの範囲の波長の光を透過する複数の反射防止膜の層状形成を有する顕微鏡光学検査システム。
- 請求項1に記載の顕微鏡光学検査システムであって、前記反射防止膜のうちの少なくとも1つは、Sc2O3、HfO2、ZrO2、およびY2O3からなるグループから選択される材料から形成される顕微鏡光学検査システム。
- 請求項7に記載の顕微鏡光学検査システムであって、反射防止膜群のそれぞれの層状形成内の反射防止膜は、ほぼ25〜250ナノメートルの範囲の厚さを有する顕微鏡光学検査システム。
- 請求項1に記載の顕微鏡光学検査システムであって、前記少なくとも1つの光学レンズ要素は、対物レンズユニットの一部である顕微鏡光学検査システム。
- 請求項1〜9のうちのいずれか一項に記載の顕微鏡光学検査システムであって、前記顕微鏡光学検査システムは、反射屈折光学系である顕微鏡光学検査システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/187,005 US6661580B1 (en) | 2000-03-10 | 2002-06-28 | High transmission optical inspection tools |
US10/187,005 | 2002-06-28 | ||
PCT/US2003/020472 WO2004003601A2 (en) | 2002-06-28 | 2003-06-27 | High transmission optical inspection tools |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011242388A Division JP5876272B2 (ja) | 2002-06-28 | 2011-11-04 | 高透過光学検査システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005531772A JP2005531772A (ja) | 2005-10-20 |
JP4916663B2 true JP4916663B2 (ja) | 2012-04-18 |
Family
ID=29999333
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004518066A Expired - Lifetime JP4916663B2 (ja) | 2002-06-28 | 2003-06-27 | 高透過光学検査ツール |
JP2011242388A Expired - Lifetime JP5876272B2 (ja) | 2002-06-28 | 2011-11-04 | 高透過光学検査システム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011242388A Expired - Lifetime JP5876272B2 (ja) | 2002-06-28 | 2011-11-04 | 高透過光学検査システム |
Country Status (3)
Country | Link |
---|---|
US (1) | US6661580B1 (ja) |
JP (2) | JP4916663B2 (ja) |
WO (1) | WO2004003601A2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070258085A1 (en) * | 2006-05-02 | 2007-11-08 | Robbins Michael D | Substrate illumination and inspection system |
DE10339619A1 (de) * | 2003-08-28 | 2005-03-24 | Leica Microsystems (Schweiz) Ag | Stereomikroskop mit integrierter Auflicht-Beleuchtungseinrichtung |
US7092082B1 (en) * | 2003-11-26 | 2006-08-15 | Kla-Tencor Technologies Corp. | Method and apparatus for inspecting a semiconductor wafer |
US7345825B2 (en) * | 2005-06-30 | 2008-03-18 | Kla-Tencor Technologies Corporation | Beam delivery system for laser dark-field illumination in a catadioptric optical system |
US7508504B2 (en) * | 2006-05-02 | 2009-03-24 | Accretech Usa, Inc. | Automatic wafer edge inspection and review system |
US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
US10755397B2 (en) | 2018-04-18 | 2020-08-25 | International Business Machines Corporation | Automated focusing of a microscope of an optical inspection system |
CN108728009A (zh) * | 2018-04-28 | 2018-11-02 | 浙江福莱新材料股份有限公司 | 一种增透减反射冷裱膜及其制备方法 |
CN108728008A (zh) * | 2018-04-28 | 2018-11-02 | 浙江福莱新材料股份有限公司 | 一种减反射冷裱膜及其制备方法 |
MX2021016073A (es) * | 2019-12-31 | 2022-03-25 | Illumina Inc | Funcionalidad de enfoque automático en el análisis óptico de muestras. |
CN111239999B (zh) * | 2020-01-08 | 2022-02-11 | 腾讯科技(深圳)有限公司 | 一种基于显微镜的光学数据处理方法、装置及存储介质 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6320697B2 (en) * | 1931-08-07 | 2001-11-20 | Nikon Corporation | Illuminating light selection device for a microscope |
JPH06177012A (ja) * | 1992-12-03 | 1994-06-24 | Nikon Corp | アライメント装置 |
US5581356A (en) * | 1993-06-14 | 1996-12-03 | Instruments Sa, Inc. | High purity tunable forensic light source |
JPH08179202A (ja) * | 1994-12-22 | 1996-07-12 | Asahi Optical Co Ltd | 紫外線結像光学システム |
US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
US6483638B1 (en) * | 1996-07-22 | 2002-11-19 | Kla-Tencor Corporation | Ultra-broadband UV microscope imaging system with wide range zoom capability |
US5999310A (en) * | 1996-07-22 | 1999-12-07 | Shafer; David Ross | Ultra-broadband UV microscope imaging system with wide range zoom capability |
JPH10123058A (ja) * | 1996-10-18 | 1998-05-15 | Okawara Mfg Co Ltd | 粉粒体の粒度測定装置並びにこれを用いた流動層処理装置 |
JPH10190058A (ja) * | 1996-12-24 | 1998-07-21 | Hitachi Cable Ltd | 紫外線照射装置 |
JPH1152224A (ja) * | 1997-06-04 | 1999-02-26 | Hitachi Ltd | 自動焦点検出方法およびその装置並びに検査装置 |
JPH11126926A (ja) * | 1997-10-23 | 1999-05-11 | Toyoda Gosei Co Ltd | 光源モジュール |
JPH11287631A (ja) * | 1998-03-31 | 1999-10-19 | Lintec Corp | 観測装置 |
US6239901B1 (en) * | 1998-04-03 | 2001-05-29 | Agilent Technologies, Inc. | Light source utilizing a light emitting device constructed on the surface of a substrate and light conversion device that includes a portion of the substrate |
JP2000174370A (ja) * | 1998-12-03 | 2000-06-23 | Sony Corp | レーザ光走査装置、焦点制御装置、検査装置および走査装置 |
JP2001028947A (ja) * | 1999-07-23 | 2001-02-06 | Yamato Kogyo Kk | 有用植物の育成方法 |
JP2001134760A (ja) * | 1999-11-02 | 2001-05-18 | Sony Corp | 紫外光の焦点位置制御機構及び検査装置 |
JP4348839B2 (ja) * | 2000-06-28 | 2009-10-21 | ソニー株式会社 | 検査装置及び検査方法 |
US6486940B1 (en) * | 2000-07-21 | 2002-11-26 | Svg Lithography Systems, Inc. | High numerical aperture catadioptric lens |
JP3630624B2 (ja) * | 2000-09-18 | 2005-03-16 | 株式会社日立製作所 | 欠陥検査装置および欠陥検査方法 |
-
2002
- 2002-06-28 US US10/187,005 patent/US6661580B1/en not_active Expired - Lifetime
-
2003
- 2003-06-27 WO PCT/US2003/020472 patent/WO2004003601A2/en active Application Filing
- 2003-06-27 JP JP2004518066A patent/JP4916663B2/ja not_active Expired - Lifetime
-
2011
- 2011-11-04 JP JP2011242388A patent/JP5876272B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP5876272B2 (ja) | 2016-03-02 |
JP2005531772A (ja) | 2005-10-20 |
WO2004003601A3 (en) | 2004-10-21 |
JP2012027039A (ja) | 2012-02-09 |
US6661580B1 (en) | 2003-12-09 |
WO2004003601A2 (en) | 2004-01-08 |
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