JP4895481B2 - 抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット - Google Patents

抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット Download PDF

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JP4895481B2
JP4895481B2 JP2004108754A JP2004108754A JP4895481B2 JP 4895481 B2 JP4895481 B2 JP 4895481B2 JP 2004108754 A JP2004108754 A JP 2004108754A JP 2004108754 A JP2004108754 A JP 2004108754A JP 4895481 B2 JP4895481 B2 JP 4895481B2
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thin film
mass
resistance
rare earth
temperature
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JP2004108754A
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Japanese (ja)
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JP2005294612A (ja
JP2005294612A5 (enExample
Inventor
敏行 大迫
巌 佐藤
敏夫 森本
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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Priority to JP2004108754A priority Critical patent/JP4895481B2/ja
Priority to CNB2004100900571A priority patent/CN1321206C/zh
Priority to TW93133312A priority patent/TWI250218B/zh
Publication of JP2005294612A publication Critical patent/JP2005294612A/ja
Publication of JP2005294612A5 publication Critical patent/JP2005294612A5/ja
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JP2004108754A 2003-11-04 2004-04-01 抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット Expired - Lifetime JP4895481B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004108754A JP4895481B2 (ja) 2004-04-01 2004-04-01 抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット
CNB2004100900571A CN1321206C (zh) 2003-11-04 2004-11-01 金属电阻材料、溅射靶材、电阻薄膜及其制造方法
TW93133312A TWI250218B (en) 2003-11-04 2004-11-02 Metallic resistance material, sputtering target, resistance thin film, and method for making the resistance thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004108754A JP4895481B2 (ja) 2004-04-01 2004-04-01 抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット

Publications (3)

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JP2005294612A JP2005294612A (ja) 2005-10-20
JP2005294612A5 JP2005294612A5 (enExample) 2006-11-16
JP4895481B2 true JP4895481B2 (ja) 2012-03-14

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JP2004108754A Expired - Lifetime JP4895481B2 (ja) 2003-11-04 2004-04-01 抵抗薄膜および抵抗薄膜形成用のスパッタリングターゲット

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10427277B2 (en) 2011-04-05 2019-10-01 Ingersoll-Rand Company Impact wrench having dynamically tuned drive components and method thereof
WO2016027692A1 (ja) 2014-08-18 2016-02-25 株式会社村田製作所 電子部品および電子部品の製造方法
CN106435478A (zh) * 2016-07-01 2017-02-22 中国计量大学 一种低电阻温度系数镍铬硅薄膜的制备方法

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JP2005294612A (ja) 2005-10-20

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