JP4895109B2 - 形状検査方法及び形状検査装置 - Google Patents
形状検査方法及び形状検査装置 Download PDFInfo
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- JP4895109B2 JP4895109B2 JP2006276513A JP2006276513A JP4895109B2 JP 4895109 B2 JP4895109 B2 JP 4895109B2 JP 2006276513 A JP2006276513 A JP 2006276513A JP 2006276513 A JP2006276513 A JP 2006276513A JP 4895109 B2 JP4895109 B2 JP 4895109B2
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- 229960005375 lutein Drugs 0.000 claims description 3
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S1/00—Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range
- H01S1/02—Masers, i.e. devices using stimulated emission of electromagnetic radiation in the microwave range solid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
Description
Δt1=d(n−1)/c (1)
となる。よって、(1)式から、nが既知であれば、凹部のz方向の大きさ(段差)dが求まる。また、図5から、検査対象部材をx軸方向に移動させ、t1に現れる信号が消えるx軸方向の位置から凹部のx方向の幅2aを求めることができる。
2・・・・・・・・・光分割手段
3・・・・・・・・・光遅延手段
4・・・・・・・・・テラヘルツパルス光発生手段
5・・・・・・・・・照射手段
6・・・・・・・・・受光手段
7・・・・・・・・・検出手段
8・・・・・・・・・検査対象部材
9・・・・・・・・・移動手段
10・・・・・・・・形状判別器
Pu ・・・・・・・ポンプ光
Po ・・・・・・・プローブ光
S、S’・・・・・・テラヘルツパルス光
Claims (3)
- 検査対象部材を透過するテラヘルツパルス光を該テラヘルツパルス光の光軸方向に段差がある前記検査対象部材の段差部に照射する照射工程と、前記照射工程で照射され前記検査対象部材の前記段差部を透過した前記テラヘルツパルス光の電場振幅時間分解波形を検出する検出工程と、を有する形状検査方法であって、
前記照射工程は、前記光軸方向の寸法が前記段差部を境界としてそれぞれ異なる前記検査対象部材の第1部位と第2部位に対して、前記テラヘルツパルス光の集光スポット内に前記段差部を境界として前記第1部位と前記第2部位とが含まれるように照射する工程であり、
前記検出工程で検出された前記電場振幅時間分解波形の前記第1部位を透過したテラヘルツパルス光と前記第2部位を透過したテラヘルツパルス光の位相情報から前記検査対象部材の前記段差部の段差寸法を測定することを特徴とする形状検査方法。 - 短パルスレーザ光を発生するレーザ光源と、
前記レーザ光源から発生された前記短パルスレーザ光をポンプ光とプローブ光とに分割する光分割手段と、
前記光分割手段で分割された前記プローブ光或いは前記ポンプ光の時間遅延を制御する光遅延手段と、
前記光分割手段で分割された前記ポンプ光でポンプされて検査対象部材を透過するテラヘルツパルス光を発生するテラヘルツパルス光発生手段と、
前記テラヘルツパルス光発生手段から発生された前記テラヘルツパルス光を、該テラヘルツパルス光の光軸方向に段差がある前記検査対象部材の段差部を境界として前記光軸方向の寸法がそれぞれ異なる前記検査対象部材の第1部位と第2部位に対して、前記テラヘルツパルス光の集光スポット内に前記段差部を境界として前記第1部位と前記第2部位とが含まれるように照射する照射手段と、
前記段差部を透過した前記テラヘルツパルス光を受光する受光手段と、
前記受光手段で受光した前記テラヘルツパルス光の電場振幅時間分解波形を前記プローブ光で検出する検出手段と、
前記電場振幅時間分解波形の前記第1部位を透過したテラヘルツパルス光と前記第2部位を透過したテラヘルツパルス光の位相情報から前記検査対象部材の前記段差部の形状を判別する形状判別器と、を備えたことを特徴とする形状検査装置。 - 前記照射手段の開口数をNA1とし、前記受光手段の開口数をNA2とするとき、NA1<NA2である請求項2に記載の形状検査装置。
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JP2006276513A JP4895109B2 (ja) | 2006-10-10 | 2006-10-10 | 形状検査方法及び形状検査装置 |
EP20070117890 EP1912057A3 (en) | 2006-10-10 | 2007-10-04 | Method and device for configuration examination |
US11/869,312 US7593099B2 (en) | 2006-10-10 | 2007-10-09 | Method and device for configuration examination |
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JP2006276513A JP4895109B2 (ja) | 2006-10-10 | 2006-10-10 | 形状検査方法及び形状検査装置 |
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JP2008096200A JP2008096200A (ja) | 2008-04-24 |
JP4895109B2 true JP4895109B2 (ja) | 2012-03-14 |
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US (1) | US7593099B2 (ja) |
EP (1) | EP1912057A3 (ja) |
JP (1) | JP4895109B2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102009021843B4 (de) * | 2009-05-19 | 2011-02-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Bestimmung einer in einen zu befüllenden Körper zudosierten Menge eines fließfähigen Stoffes |
DE102009040990A1 (de) * | 2009-09-10 | 2011-03-17 | Carl Zeiss Ag | Vorrichtung und Verfahren zum Vermessen einer Oberfläche |
JP5462779B2 (ja) * | 2010-12-27 | 2014-04-02 | 大日本スクリーン製造株式会社 | 基板検査装置及び基板検査方法 |
JP5743644B2 (ja) * | 2011-03-30 | 2015-07-01 | 株式会社Screenホールディングス | 基板検査装置および基板検査方法 |
JP2013007740A (ja) * | 2011-05-23 | 2013-01-10 | Canon Inc | 波面測定装置及び波面測定方法、物体測定装置 |
JP5972536B2 (ja) * | 2011-07-26 | 2016-08-17 | 株式会社Screenホールディングス | 基板検査装置および基板検査方法 |
JP2013217909A (ja) * | 2012-03-11 | 2013-10-24 | Canon Inc | 屈折率算出方法及び装置、屈折率算出用物質、及びトモグラフィ装置 |
JP6078870B2 (ja) * | 2012-06-28 | 2017-02-15 | 株式会社Screenホールディングス | 検査装置および検査方法 |
JP6044893B2 (ja) * | 2013-03-08 | 2016-12-14 | 株式会社Screenホールディングス | 検査装置および検査方法 |
KR102261858B1 (ko) * | 2014-10-15 | 2021-06-07 | 삼성전자주식회사 | 2차원 분광 시스템 및 분석 방법 |
WO2018154690A1 (ja) * | 2017-02-23 | 2018-08-30 | 株式会社ニコン | テラヘルツ測定装置、検査装置、テラヘルツ測定方法および検査方法 |
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---|---|---|---|---|
JPH05272941A (ja) * | 1992-03-27 | 1993-10-22 | Toshiba Corp | パターン検出方法および検査装置 |
JPH0655414A (ja) * | 1992-08-13 | 1994-03-01 | Mechatro Tokiwa Internatl:Kk | 超音波による工具位置の測定方法 |
US6195168B1 (en) * | 1999-07-22 | 2001-02-27 | Zygo Corporation | Infrared scanning interferometry apparatus and method |
US7152007B2 (en) | 2000-02-28 | 2006-12-19 | Tera View Limited | Imaging apparatus and method |
JP4476462B2 (ja) * | 2000-03-27 | 2010-06-09 | 株式会社栃木ニコン | 半導体の電気特性評価装置 |
US6556306B2 (en) | 2001-01-04 | 2003-04-29 | Rensselaer Polytechnic Institute | Differential time domain spectroscopy method for measuring thin film dielectric properties |
JP2002243416A (ja) * | 2001-02-13 | 2002-08-28 | Tochigi Nikon Corp | 厚み測定方法及び装置並びにウエハ |
WO2004027491A1 (en) * | 2002-09-18 | 2004-04-01 | Teraview Limited | Apparatus for varying the path length of a beam of radiation |
JP2005043230A (ja) | 2003-07-23 | 2005-02-17 | Institute Of Physical & Chemical Research | 細長部材の欠陥検出方法及び装置 |
JP4280654B2 (ja) * | 2004-02-17 | 2009-06-17 | アイシン精機株式会社 | マルチチャンネルテラヘルツ波スペクトル測定法及び測定装置 |
GB2415777B (en) * | 2004-06-29 | 2006-11-01 | Tera View Ltd | Imaging apparatus and method |
JP4654003B2 (ja) * | 2004-11-09 | 2011-03-16 | 株式会社栃木ニコン | 測定装置 |
JPWO2006085403A1 (ja) | 2005-02-10 | 2009-01-29 | 国立大学法人大阪大学 | 実時間テラヘルツ・トモグラフィー装置および分光イメージング装置 |
JP4565198B2 (ja) * | 2005-03-01 | 2010-10-20 | 国立大学法人大阪大学 | 高分解・高速テラヘルツ分光計測装置 |
JP5035618B2 (ja) * | 2006-12-05 | 2012-09-26 | 独立行政法人理化学研究所 | 電磁波を用いた検出方法、及び検出装置 |
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2006
- 2006-10-10 JP JP2006276513A patent/JP4895109B2/ja not_active Expired - Fee Related
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2007
- 2007-10-04 EP EP20070117890 patent/EP1912057A3/en not_active Withdrawn
- 2007-10-09 US US11/869,312 patent/US7593099B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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US20080084554A1 (en) | 2008-04-10 |
EP1912057A2 (en) | 2008-04-16 |
EP1912057A3 (en) | 2010-01-20 |
US7593099B2 (en) | 2009-09-22 |
JP2008096200A (ja) | 2008-04-24 |
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