JP4889623B2 - 透明導電膜及び透明導電膜を用いた太陽電池 - Google Patents
透明導電膜及び透明導電膜を用いた太陽電池 Download PDFInfo
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- JP4889623B2 JP4889623B2 JP2007335036A JP2007335036A JP4889623B2 JP 4889623 B2 JP4889623 B2 JP 4889623B2 JP 2007335036 A JP2007335036 A JP 2007335036A JP 2007335036 A JP2007335036 A JP 2007335036A JP 4889623 B2 JP4889623 B2 JP 4889623B2
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 47
- 229910052760 oxygen Inorganic materials 0.000 claims description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 33
- 239000001301 oxygen Substances 0.000 claims description 33
- 238000006243 chemical reaction Methods 0.000 claims description 31
- 239000011787 zinc oxide Substances 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052733 gallium Inorganic materials 0.000 claims description 12
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 239000000969 carrier Substances 0.000 claims description 8
- 229910003437 indium oxide Inorganic materials 0.000 claims description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical group [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 70
- 239000004065 semiconductor Substances 0.000 description 43
- 230000000052 comparative effect Effects 0.000 description 14
- 239000002019 doping agent Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000001552 radio frequency sputter deposition Methods 0.000 description 6
- 239000011701 zinc Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- -1 tin oxide (SnO 2 ) Chemical class 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910007541 Zn O Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
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- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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Description
以下において、本発明の実施形態に係る太陽電池10の構成について、図1を参照しながら説明する。
本実施形態にかかる透明導電膜4は、Sn、Zn、Inなどから選択される第1元素αの酸化物、すなわち、酸化錫(SnO2)、酸化亜鉛(ZnO)、酸化インジウム(In2O3)などを母材として含む。また、透明導電膜4には、第2元素βと第3元素γの2種類のドーパントが添加される。第2元素β及び第3元素γは、第1元素αの酸化物に添加され、酸素と結合する。このような第1元素αの酸化物、第2元素β、第3元素γの組合せを下表に示す。
基板1上に、熱CVD法やスパッタ法により受光面電極層2を形成する。受光面電極層2は、例えば、500〜800nmの膜厚を有するSnO2膜である。
本実施形態にかかる太陽電池10が備える透明導電膜4は、第1元素αの酸化物と、第1元素αの酸化物に添加される第2元素β及び第3元素γとを含み、第2元素βが酸素Oと結合する間隔は、第1元素αが酸素Oと結合する間隔よりも小さく、第3元素γが酸素Oと結合する間隔は、第1元素αが酸素Oと結合する間隔よりも大きい。
本発明は上記の実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。
本発明の実施例に係る透明導電膜を以下のように製造した。
実施例と同条件のRFスパッタ装置により、GaがドープされたZnO(GZO)をターゲットとして、Gaの添加量が異なる3種類の透明導電膜(GZO)を形成した。具体的には、Gaが2wt%添加された比較例1と、Gaが4wt%添加された比較例2と、Gaが6wt%添加された比較例3とを形成した。比較例1〜3の膜厚を100nmとした。
実施例と同条件のRFスパッタ装置により、BがドープされたZnO(BZO)をターゲットとして比較例4を形成した。比較例4では、Bを4wt%添加し、膜厚を100nmとした。
実施例と同条件のRFスパッタ装置により、ノンドープのZnOをターゲットとして比較例5を形成した。
実施例と比較例1〜5について、吸収係数と抵抗率とを測定した。吸収係数は、波長1000nmの光について測定した。横軸を抵抗率、縦軸を吸収係数として測定結果を図2に示す。同図に示すように、実施例では、比較例1〜5に比べて、低い吸収係数と低い抵抗率の両方を併せ持つことが確認された。
2…受光面電極層
3…光電変換層
4…透明導電膜
5…裏面電極層
10…太陽電池
31…第1半導体層
32…反射層
32…第2半導体層
33…第2半導体層
Claims (4)
- 第1元素の酸化物と、
前記第1元素の酸化物に添加される第2元素と、
前記第2元素と同じ族の元素であり、前記第1元素の酸化物に添加される第3元素と
を含み、
前記第1元素の酸化物は、酸化亜鉛または酸化インジウムであって、光透過性を有し、
前記第2元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも小さく、
前記第3元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも大きい
ことを特徴とする透明導電膜。 - 前記第1元素の酸化物は、酸化亜鉛であって、
前記第2元素は、ボロンであり、
前記第3元素は、ガリウムである
ことを特徴とする請求項1に記載の透明導電膜。 - 光透過性及び絶縁性を有する基板と、
前記基板上に形成される受光面電極層と、
前記受光面電極層上に設けられ、受光により光生成キャリアを生成する光電変換層と、
前記光電変換層上に形成される透明導電膜と、
前記透明導電膜上に形成され、金属材料からなる裏面電極層と、
を備え、
前記透明導電膜は、
第1元素の酸化物と、
前記第1元素の酸化物に添加される第2元素と、
前記第2元素と同じ族の元素であり、前記第1元素の酸化物に添加される第3元素と
を含み、
前記第1元素の酸化物は、酸化亜鉛または酸化インジウムであって、光透過性を有し、
前記第2元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも小さく、
前記第3元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも大きい
ことを特徴とする太陽電池。 - 光透過性及び絶縁性を有する基板と、
前記基板上に形成される受光面電極層と、
前記受光面電極層上に設けられ、受光により光生成キャリアを生成する光電変換層と、
を備え、
前記受光面電極層は、
第1元素の酸化物と、
前記第1元素の酸化物に添加される第2元素と、
前記第2元素と同じ族の元素であり、前記第1元素の酸化物に添加される第3元素と
を含み、
前記第1元素の酸化物は、酸化亜鉛または酸化インジウムであって、光透過性を有し、
前記第2元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも小さく、
前記第3元素が酸素と結合する間隔は、前記第1元素が酸素と結合する間隔よりも大きい
ことを特徴とする太陽電池。
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JP2007335036A JP4889623B2 (ja) | 2007-12-26 | 2007-12-26 | 透明導電膜及び透明導電膜を用いた太陽電池 |
US12/337,976 US20090165850A1 (en) | 2007-12-26 | 2008-12-18 | Transparent conductive film and solar cell using the same |
EP08254052A EP2075849A3 (en) | 2007-12-26 | 2008-12-18 | Transparent conductive film and solar cell using the same |
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JP2007335036A JP4889623B2 (ja) | 2007-12-26 | 2007-12-26 | 透明導電膜及び透明導電膜を用いた太陽電池 |
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JP2009158288A JP2009158288A (ja) | 2009-07-16 |
JP2009158288A5 JP2009158288A5 (ja) | 2011-04-21 |
JP4889623B2 true JP4889623B2 (ja) | 2012-03-07 |
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JP2013524499A (ja) * | 2010-03-31 | 2013-06-17 | ソーラーエクセル ベスローテン フェノーツハップ | 増強光捕捉スキームによる薄膜光起電力素子 |
KR101777598B1 (ko) * | 2011-10-17 | 2017-09-14 | 한국전자통신연구원 | 태양전지 제조방법 |
KR102032286B1 (ko) | 2013-11-11 | 2019-10-17 | 한국전자통신연구원 | 실리콘 태양전지 |
CN104637970B (zh) * | 2015-03-03 | 2018-03-06 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、x射线平板探测器、摄像系统 |
US12009379B2 (en) * | 2017-05-01 | 2024-06-11 | Visera Technologies Company Limited | Image sensor |
US10998514B2 (en) | 2017-12-01 | 2021-05-04 | Samsung Electronics Co., Ltd. | Photoelectric devices and image sensors and electronic devices |
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JPS5931506A (ja) * | 1982-08-16 | 1984-02-20 | ソニー株式会社 | 透明電極薄膜 |
JP2962897B2 (ja) | 1991-10-17 | 1999-10-12 | キヤノン株式会社 | 光起電力素子 |
JP3367149B2 (ja) * | 1993-06-30 | 2003-01-14 | 三菱マテリアル株式会社 | 導電性酸化物粉末の製造方法 |
JP3507623B2 (ja) * | 1996-06-27 | 2004-03-15 | シャープ株式会社 | 透明導電膜の製造方法及びそれを用いた薄膜太陽電池 |
US20020084455A1 (en) * | 1999-03-30 | 2002-07-04 | Jeffery T. Cheung | Transparent and conductive zinc oxide film with low growth temperature |
JP2001035252A (ja) * | 1999-07-19 | 2001-02-09 | Asahi Glass Co Ltd | 透明導電膜 |
JP2002057359A (ja) * | 2000-06-01 | 2002-02-22 | Sharp Corp | 積層型太陽電池 |
JP4229606B2 (ja) * | 2000-11-21 | 2009-02-25 | 日本板硝子株式会社 | 光電変換装置用基体およびそれを備えた光電変換装置 |
JP4894103B2 (ja) * | 2001-07-24 | 2012-03-14 | 株式会社ブリヂストン | 透明導電フィルム及びタッチパネル |
WO2007021214A1 (fr) * | 2005-08-16 | 2007-02-22 | Otkrytoe Aktsyonernoe Obshchestvo 'polema' | Procede de synthese de ceramique |
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EP2075849A2 (en) | 2009-07-01 |
EP2075849A3 (en) | 2011-12-07 |
US20090165850A1 (en) | 2009-07-02 |
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