JP4886694B2 - 気化ゾーンへの粒子状材料の供給 - Google Patents

気化ゾーンへの粒子状材料の供給 Download PDF

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Publication number
JP4886694B2
JP4886694B2 JP2007532496A JP2007532496A JP4886694B2 JP 4886694 B2 JP4886694 B2 JP 4886694B2 JP 2007532496 A JP2007532496 A JP 2007532496A JP 2007532496 A JP2007532496 A JP 2007532496A JP 4886694 B2 JP4886694 B2 JP 4886694B2
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Japan
Prior art keywords
particulate material
container
screw
organic
materials
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Expired - Lifetime
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JP2007532496A
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English (en)
Japanese (ja)
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JP2008513965A5 (https=
JP2008513965A (ja
Inventor
ロング，マイケル
マシュー グレース，ジェレミー
エドワード コッペ，ブルース
Original Assignee
グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー
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Priority claimed from US10/945,941 external-priority patent/US7288286B2/en
Application filed by グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー filed Critical グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー
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Publication of JP2008513965A5 publication Critical patent/JP2008513965A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G33/00—Screw or rotary spiral conveyors
    • B65G33/08—Screw or rotary spiral conveyors for fluent solid materials
    • B65G33/12—Screw or rotary spiral conveyors for fluent solid materials with screws formed by straight tubes or drums having internal threads, or by spiral or helical tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2007532496A 2004-09-21 2005-09-16 気化ゾーンへの粒子状材料の供給 Expired - Lifetime JP4886694B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/945,941 2004-09-21
US10/945,941 US7288286B2 (en) 2004-09-21 2004-09-21 Delivering organic powder to a vaporization zone
US11/134,139 2005-05-20
US11/134,139 US7501151B2 (en) 2004-09-21 2005-05-20 Delivering particulate material to a vaporization zone
PCT/US2005/033154 WO2006034028A2 (en) 2004-09-21 2005-09-16 Delivering particulate material to a vaporization source

Publications (3)

Publication Number Publication Date
JP2008513965A JP2008513965A (ja) 2008-05-01
JP2008513965A5 JP2008513965A5 (https=) 2008-10-30
JP4886694B2 true JP4886694B2 (ja) 2012-02-29

Family

ID=35758545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007532496A Expired - Lifetime JP4886694B2 (ja) 2004-09-21 2005-09-16 気化ゾーンへの粒子状材料の供給

Country Status (5)

Country Link
US (1) US7501151B2 (https=)
EP (1) EP1809784B1 (https=)
JP (1) JP4886694B2 (https=)
KR (1) KR101174296B1 (https=)
WO (1) WO2006034028A2 (https=)

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* Cited by examiner, † Cited by third party
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US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7288286B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US20060099344A1 (en) * 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7989021B2 (en) * 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
US7638168B2 (en) * 2005-11-10 2009-12-29 Eastman Kodak Company Deposition system using sealed replenishment container
US7951421B2 (en) * 2006-04-20 2011-05-31 Global Oled Technology Llc Vapor deposition of a layer
CN101356296B (zh) * 2006-05-19 2011-03-30 株式会社爱发科 有机蒸镀材料用蒸镀装置、有机薄膜的制造方法
US20080254217A1 (en) * 2007-04-16 2008-10-16 Boroson Michael L Fine control of vaporized organic material
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
JP2012195140A (ja) * 2011-03-16 2012-10-11 Nitto Denko Corp 有機エレクトロルミネッセンス発光層の製造方法
US11946131B2 (en) * 2017-05-26 2024-04-02 Universal Display Corporation Sublimation cell with time stability of output vapor pressure
KR102098455B1 (ko) * 2017-12-26 2020-04-07 주식회사 포스코 연속 증착 장치 및 연속 증착 방법
US11293551B2 (en) 2018-09-30 2022-04-05 ColdQuanta, Inc. Break-seal system with breakable-membrane bridging rings
CN117448746B (zh) * 2023-10-17 2025-12-05 南京大学 石墨烯-多热点金纳米结构复合体系的制备方法及其应用

Citations (7)

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Publication number Priority date Publication date Assignee Title
JPH06158279A (ja) * 1992-09-02 1994-06-07 Hoechst Ag 薄層の化学物質気相蒸着のための方法および装置
JPH06322521A (ja) * 1993-05-13 1994-11-22 Toyobo Co Ltd 連続蒸着方法およびその装置
JPH10204624A (ja) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd 真空成膜装置の材料供給装置
US5945163A (en) * 1998-02-19 1999-08-31 First Solar, Llc Apparatus and method for depositing a material on a substrate
JP2003109755A (ja) * 2001-09-27 2003-04-11 Sanyo Electric Co Ltd 有機ｅｌデバイスの製造装置
JP2003293121A (ja) * 2002-04-05 2003-10-15 Cluster Ion Beam Technology Kk 蒸着材料供給手段を備えた蒸着用坩堝
JP2004346371A (ja) * 2003-05-22 2004-12-09 Matsushita Electric Ind Co Ltd 成膜方法及び装置

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US3488214A (en) * 1967-03-15 1970-01-06 Sperry Rand Corp Evaporant material control for vapor deposition apparatus
US3567450A (en) 1968-02-20 1971-03-02 Eastman Kodak Co Photoconductive elements containing substituted triarylamine photoconductors
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US3607365A (en) * 1969-05-12 1971-09-21 Minnesota Mining & Mfg Vapor phase method of coating substrates with polymeric coating
JPS5651570A (en) * 1979-09-29 1981-05-09 Clarion Co Ltd Vapor depositing method
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KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
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JP3738869B2 (ja) * 1997-06-05 2006-01-25 松下電器産業株式会社 蒸着方法および蒸着装置
JP3586551B2 (ja) * 1998-01-27 2004-11-10 松下電器産業株式会社 光記録媒体の製造方法及び製造装置
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
CN1213127C (zh) 1998-09-09 2005-08-03 出光兴产株式会社 有机电致发光器件与苯二胺衍生物
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US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06158279A (ja) * 1992-09-02 1994-06-07 Hoechst Ag 薄層の化学物質気相蒸着のための方法および装置
JPH06322521A (ja) * 1993-05-13 1994-11-22 Toyobo Co Ltd 連続蒸着方法およびその装置
JPH10204624A (ja) * 1997-01-14 1998-08-04 Sumitomo Heavy Ind Ltd 真空成膜装置の材料供給装置
US5945163A (en) * 1998-02-19 1999-08-31 First Solar, Llc Apparatus and method for depositing a material on a substrate
JP2003109755A (ja) * 2001-09-27 2003-04-11 Sanyo Electric Co Ltd 有機ｅｌデバイスの製造装置
JP2003293121A (ja) * 2002-04-05 2003-10-15 Cluster Ion Beam Technology Kk 蒸着材料供給手段を備えた蒸着用坩堝
JP2004346371A (ja) * 2003-05-22 2004-12-09 Matsushita Electric Ind Co Ltd 成膜方法及び装置

Also Published As

Publication number Publication date
EP1809784B1 (en) 2018-11-07
WO2006034028A2 (en) 2006-03-30
US20060062915A1 (en) 2006-03-23
KR101174296B1 (ko) 2012-08-16
KR20070054663A (ko) 2007-05-29
WO2006034028A3 (en) 2006-07-06
JP2008513965A (ja) 2008-05-01
US7501151B2 (en) 2009-03-10
EP1809784A2 (en) 2007-07-25

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