JP4886694B2 - 気化ゾーンへの粒子状材料の供給 - Google Patents
気化ゾーンへの粒子状材料の供給 Download PDFInfo
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Classifications
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G33/00—Screw or rotary spiral conveyors
- B65G33/08—Screw or rotary spiral conveyors for fluent solid materials
- B65G33/12—Screw or rotary spiral conveyors for fluent solid materials with screws formed by straight tubes or drums having internal threads, or by spiral or helical tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
(a)ある量の第1の粒子状材料を、第1の開口部を有する第1の容器に供給し、ある量の第2の粒子状材料を、その第1の容器と離れていて第2の開口部を有する第2の容器に供給し;
(b)第1の粒子状材料を第1の容器の第1の開口部を通じてマニホールドの中に移し、そのマニホールドの中でその第1の粒子状材料を気化させ;
(c)第2の粒子状材料を第2の容器の第2の開口部を通じて上記マニホールドの中に移し、そのマニホールドの中で第2の粒子状材料を気化させることにより、第1の粒子状材料とその第2の粒子状材料を混合し;
(d)この気化した混合材料を上記マニホールドから表面に供給して層を形成する操作を含む方法によって達成される。
R1とR2は、それぞれ独立に、水素原子、アリール基、アルキル基のいずれかを表わすか、R1とR2は、合わさって、シクロアルキル基を完成させる原子を表わし;
R3とR4は、それぞれ独立にアリール基を表わし、そのアリール基は、構造式(C):
R5とR6は、独立に、アリール基の中から選択される。一実施態様では、R5とR6のうちの少なくとも一方は、多環式縮合環構造(例えばナフタレン)を含んでいる。
それぞれのAreは、独立に、アリーレン基(例えばフェニレン部分またはアントラセン部分)の中から選択され;
nは1〜4の整数であり;
Ar、R7、R8、R9は、独立に、アリール基の中から選択される。
6 蒸発源
7 蒸発源
8 蒸発源
9 気柱
10 気化装置
15 基板
20 マニホールド
30 開口部
35 モータ
40 供給装置
45 供給装置
50 第1の容器
55 第2の容器
60 供給路
65 供給路
70 第3の容器
75 第4の容器
80 スクリュー構造
85 スクリュー
85a スクリュー
85b スクリュー
85c スクリュー
90 モータ
95 スクリュー構造
100 粒子状材料
105 スクリュー構造
110 スクリーン
115 螺旋状のネジ山
120 スクリーン
125 中心部
130 ピエゾ電気構造
135 山なし部分
140 ピエゾ電気構造
150 ピエゾ電気構造
155 ピエゾ電気構造
160 粒子状材料
170 加熱素子
180 基部
190 底部
210 回転する螺旋式装置
220 ギア・ドライバ
230 開口部
240 第1の粒子状材料
245 第2の粒子状材料
250 第1のスクリュー構造
255 第2のスクリュー構造
260 混合チェンバー
275 装着用ロック装置
280 蒸着チェンバー
285 OLED基板
295 並進移動装置
300 真空源
310 OLEDデバイス
320 基板
330 アノード
335 正孔注入層
340 正孔輸送層
350 発光層
355 電子輸送層
360 電子注入層
370 有機層
390 カソード
Claims (1)
- 有機材料を気化させて表面上に凝縮させることで膜を形成する方法であって、
(a)ある量の第1の有機材料を粉末形態で第1の容器に供給し、かつ、ある量の第2の有機材料を、その第1の容器から離れている第2の容器に供給し;
(b)第1の容器内の第1の有機材料を流動化し、その流動化された第1の有機材料を、第1のスクリュー構造によって第1の容器からマニホールドの中に移し、該マニホールドの中で第1の有機材料を気化させ;
(c)第2の容器内の第2の有機材料を流動化し、その流動化された第2の有機材料を、第2のスクリュー構造によって第2の容器から該マニホールドの中に移し、そして該マニホールドの中で第2の有機材料を気化させることで気化された第1の有機材料と第2の有機材料とを混合させ;
(d)混合された気化材料を該マニホールドから基板の表面に供給して層を形成する操作を含む方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US10/945,941 | 2004-09-21 | ||
US10/945,941 US7288286B2 (en) | 2004-09-21 | 2004-09-21 | Delivering organic powder to a vaporization zone |
US11/134,139 US7501151B2 (en) | 2004-09-21 | 2005-05-20 | Delivering particulate material to a vaporization zone |
US11/134,139 | 2005-05-20 | ||
PCT/US2005/033154 WO2006034028A2 (en) | 2004-09-21 | 2005-09-16 | Delivering particulate material to a vaporization source |
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JP2008513965A JP2008513965A (ja) | 2008-05-01 |
JP2008513965A5 JP2008513965A5 (ja) | 2008-10-30 |
JP4886694B2 true JP4886694B2 (ja) | 2012-02-29 |
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US (1) | US7501151B2 (ja) |
EP (1) | EP1809784B1 (ja) |
JP (1) | JP4886694B2 (ja) |
KR (1) | KR101174296B1 (ja) |
WO (1) | WO2006034028A2 (ja) |
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WO2006034028A3 (en) | 2006-07-06 |
JP2008513965A (ja) | 2008-05-01 |
KR101174296B1 (ko) | 2012-08-16 |
WO2006034028A2 (en) | 2006-03-30 |
US7501151B2 (en) | 2009-03-10 |
KR20070054663A (ko) | 2007-05-29 |
US20060062915A1 (en) | 2006-03-23 |
EP1809784A2 (en) | 2007-07-25 |
EP1809784B1 (en) | 2018-11-07 |
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