JP2008513965A - 気化ゾーンへの粒子状材料の供給 - Google Patents
気化ゾーンへの粒子状材料の供給 Download PDFInfo
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- JP2008513965A JP2008513965A JP2007532496A JP2007532496A JP2008513965A JP 2008513965 A JP2008513965 A JP 2008513965A JP 2007532496 A JP2007532496 A JP 2007532496A JP 2007532496 A JP2007532496 A JP 2007532496A JP 2008513965 A JP2008513965 A JP 2008513965A
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- 239000011236 particulate material Substances 0.000 title claims abstract description 239
- 230000008016 vaporization Effects 0.000 title claims abstract description 70
- 238000009834 vaporization Methods 0.000 title claims description 52
- 239000000463 material Substances 0.000 claims abstract description 89
- 238000000034 method Methods 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims description 41
- 239000011368 organic material Substances 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 19
- 238000012546 transfer Methods 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 7
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 63
- 230000008020 evaporation Effects 0.000 description 36
- 238000001704 evaporation Methods 0.000 description 36
- 239000000843 powder Substances 0.000 description 20
- 238000000151 deposition Methods 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 230000005525 hole transport Effects 0.000 description 14
- 238000002347 injection Methods 0.000 description 14
- 239000007924 injection Substances 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- 230000008901 benefit Effects 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 13
- 239000002019 doping agent Substances 0.000 description 13
- 239000006200 vaporizer Substances 0.000 description 12
- -1 porphyrin compounds Chemical class 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- 125000005259 triarylamine group Chemical group 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- 239000010406 cathode material Substances 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 238000004132 cross linking Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical group C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 5
- 239000010405 anode material Substances 0.000 description 5
- 125000000732 arylene group Chemical group 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 4
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 150000001342 alkaline earth metals Chemical class 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229960003540 oxyquinoline Drugs 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 3
- 125000003367 polycyclic group Chemical group 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000001454 anthracenes Chemical class 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229910003480 inorganic solid Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- NGQSLSMAEVWNPU-YTEMWHBBSA-N 1,2-bis[(e)-2-phenylethenyl]benzene Chemical class C=1C=CC=CC=1/C=C/C1=CC=CC=C1\C=C\C1=CC=CC=C1 NGQSLSMAEVWNPU-YTEMWHBBSA-N 0.000 description 1
- ZMLPKJYZRQZLDA-UHFFFAOYSA-N 1-(2-phenylethenyl)-4-[4-(2-phenylethenyl)phenyl]benzene Chemical group C=1C=CC=CC=1C=CC(C=C1)=CC=C1C(C=C1)=CC=C1C=CC1=CC=CC=C1 ZMLPKJYZRQZLDA-UHFFFAOYSA-N 0.000 description 1
- XNCMQRWVMWLODV-UHFFFAOYSA-N 1-phenylbenzimidazole Chemical compound C1=NC2=CC=CC=C2N1C1=CC=CC=C1 XNCMQRWVMWLODV-UHFFFAOYSA-N 0.000 description 1
- KYGSXEYUWRFVNY-UHFFFAOYSA-N 2-pyran-2-ylidenepropanedinitrile Chemical class N#CC(C#N)=C1OC=CC=C1 KYGSXEYUWRFVNY-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-M 4-ethenylbenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-M 0.000 description 1
- VIZUPBYFLORCRA-UHFFFAOYSA-N 9,10-dinaphthalen-2-ylanthracene Chemical group C12=CC=CC=C2C(C2=CC3=CC=CC=C3C=C2)=C(C=CC=C2)C2=C1C1=CC=C(C=CC=C2)C2=C1 VIZUPBYFLORCRA-UHFFFAOYSA-N 0.000 description 1
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical class C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 241000819038 Chichester Species 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical group C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 206010057040 Temperature intolerance Diseases 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- LNDKNSMGUSCVEE-UHFFFAOYSA-N boron;methane Chemical compound [B].C LNDKNSMGUSCVEE-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000005606 carbostyryl group Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 150000001893 coumarin derivatives Chemical class 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000005266 diarylamine group Chemical group 0.000 description 1
- 125000004986 diarylamino group Chemical group 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000008543 heat sensitivity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000005297 material degradation process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- USPVIMZDBBWXGM-UHFFFAOYSA-N nickel;oxotungsten Chemical compound [Ni].[W]=O USPVIMZDBBWXGM-UHFFFAOYSA-N 0.000 description 1
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000011860 particles by size Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical class [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical class C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003518 tetracenes Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 150000004882 thiopyrans Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 125000001834 xanthenyl group Chemical class C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G33/00—Screw or rotary spiral conveyors
- B65G33/08—Screw or rotary spiral conveyors for fluent solid materials
- B65G33/12—Screw or rotary spiral conveyors for fluent solid materials with screws formed by straight tubes or drums having internal threads, or by spiral or helical tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
(a)ある量の第1の粒子状材料を、第1の開口部を有する第1の容器に供給し、ある量の第2の粒子状材料を、その第1の容器と離れていて第2の開口部を有する第2の容器に供給し;
(b)第1の粒子状材料を第1の容器の第1の開口部を通じてマニホールドの中に移し、そのマニホールドの中でその第1の粒子状材料を気化させ;
(c)第2の粒子状材料を第2の容器の第2の開口部を通じて上記マニホールドの中に移し、そのマニホールドの中で第2の粒子状材料を気化させることにより、第1の粒子状材料とその第2の粒子状材料を混合し;
(d)この気化した混合材料を上記マニホールドから表面に供給して層を形成する操作を含む方法によって達成される。
R1とR2は、それぞれ独立に、水素原子、アリール基、アルキル基のいずれかを表わすか、R1とR2は、合わさって、シクロアルキル基を完成させる原子を表わし;
R3とR4は、それぞれ独立にアリール基を表わし、そのアリール基は、構造式(C):
R5とR6は、独立に、アリール基の中から選択される。一実施態様では、R5とR6のうちの少なくとも一方は、多環式縮合環構造(例えばナフタレン)を含んでいる。
それぞれのAreは、独立に、アリーレン基(例えばフェニレン部分またはアントラセン部分)の中から選択され;
nは1〜4の整数であり;
Ar、R7、R8、R9は、独立に、アリール基の中から選択される。
6 蒸発源
7 蒸発源
8 蒸発源
9 気柱
10 気化装置
15 基板
20 マニホールド
30 開口部
35 モータ
40 供給装置
45 供給装置
50 第1の容器
55 第2の容器
60 供給路
65 供給路
70 第3の容器
75 第4の容器
80 スクリュー構造
85 スクリュー
85a スクリュー
85b スクリュー
85c スクリュー
90 モータ
95 スクリュー構造
100 粒子状材料
105 スクリュー構造
110 スクリーン
115 螺旋状のネジ山
120 スクリーン
125 中心部
130 ピエゾ電気構造
135 山なし部分
140 ピエゾ電気構造
150 ピエゾ電気構造
155 ピエゾ電気構造
160 粒子状材料
170 加熱素子
180 基部
190 底部
210 回転する螺旋式装置
220 ギア・ドライバ
230 開口部
240 第1の粒子状材料
245 第2の粒子状材料
250 第1のスクリュー構造
255 第2のスクリュー構造
260 混合チェンバー
275 装着用ロック装置
280 蒸着チェンバー
285 OLED基板
295 並進移動装置
300 真空源
310 OLEDデバイス
320 基板
330 アノード
335 正孔注入層
340 正孔輸送層
350 発光層
355 電子輸送層
360 電子注入層
370 有機層
390 カソード
Claims (34)
- 粒子状材料を気化させて表面上に凝縮させることで層を形成する方法であって、
(a)ある量の第1の粒子状材料を、第1の開口部を有する第1の容器に供給し、ある量の第2の粒子状材料を、その第1の容器と離れていて第2の開口部を有する第2の容器に供給し;
(b)第1の粒子状材料を第1の容器の第1の開口部を通じてマニホールドの中に移し、そのマニホールドの中でその第1の粒子状材料を気化させ;
(c)第2の粒子状材料を第2の容器の第2の開口部を通じて上記マニホールドの中に移し、そのマニホールドの中で第2の粒子状材料を気化させることにより、第1の粒子状材料とその第2の粒子状材料を混合し;
(d)この気化した混合材料を上記マニホールドから表面に供給して層を形成する操作を含む方法。 - 少なくとも第1の容器又は第2の容器から供給される粒子状材料を流動化する操作をさらに含む、請求項1に記載の方法。
- 第1の容器または第2の容器にそれぞれ付属する第3の容器と第4の容器を用意し、粒子状材料を対応する第1の容器または第2の容器に移す操作をさらに含む、請求項1に記載の方法。
- 第3の容器と第4の容器からそれぞれ第1の容器または第2の容器に移される粒子状材料を計量し、その第1の容器と第2の容器の中にある粒子状材料の体積を実質的に一定にする操作をさらに含む、請求項3に記載の方法。
- 第1の粒子状材料をマニホールドに移す上記ステップが、
(a)その第1の粒子状材料を第1の開口部を通じて第1のスクリュー構造に移し;
(b)その第1のスクリュー構造の少なくとも一部を回転させてその第1の粒子状材料を第1の容器から供給路に沿って第1の気化ゾーンに移し、その気化ゾーンでその第1の粒子状材料を気化させる操作を含む、請求項1に記載の方法。 - 第2の粒子状材料をマニホールドに移す上記ステップが、
(a)その第2の粒子状材料を第2の開口部を通じて第2のスクリュー構造に移し;
(b)その第2のスクリュー構造の少なくとも一部を回転させて第2の粒子状材料を第2の容器から供給路に沿って第2の気化ゾーンに移し、その気化ゾーンでその第2の粒子状材料を気化させる操作を含む、請求項5に記載の方法。 - 第1の粒子状材料と第2の粒子状材料の少なくとも一方が有機粒子状材料を含む、請求項1に記載の方法。
- 第1のスクリュー構造が、そのスクリュー構造の軸に対して4〜15°の角度を有する螺旋状のネジ山を備える、請求項5に記載の方法。
- 上記スクリュー構造の表面を処理する、請求項5に記載の方法。
- 上記スクリュー構造の表面を窒化チタンでコーティングする、請求項9に記載の方法。
- 上記スクリュー構造の表面を電気研磨する、請求項19に記載の方法。
- 少なくとも第1の容器を大気圧よりも低い圧力に維持する、請求項1に記載の方法。
- 振動装置を用いて第1の有機材料を振動させる操作をさらに含む、請求項5に記載の方法。
- 上記振動装置が、ピエゾ電気構造または回転する螺旋式装置を備える、請求項13に記載の方法。
- 第1のスクリュー構造が第1の容器の内部を貫通し、第2のスクリュー構造が第2の容器の内部を貫通している、請求項6に記載の方法。
- 第1の粒子状材料と第2の粒子状材料を上記スクリュー構造に供給する速度が、気化した粒子状材料の堆積速度と層内の材料の濃度を規定している、請求項6に記載の方法。
- 上記マニホールドが、そのマニホールド内に独立した気化ゾーンを有する、請求項1に記載の方法。
- 第1の粒子状材料が、2種類以上の異なる有機材料成分を含む、請求項1に記載の方法。
- 第2の粒子状材料が、2種類以上の異なる有機材料成分を含む、請求項1に記載の方法。
- 第1のスクリュー構造の少なくとも一部を回転させる上記操作が、増分方式でその第1のスクリュー構造を繰り返し回転させる操作を含む、請求項5に記載の方法。
- 上記気化ゾーンに加熱素子を含める、請求項17に記載の方法。
- 上記供給路内の第1の粒子状材料の温度を望ましい気化温度よりも低い温度に維持する、請求項5に記載の方法。
- 粒子状材料を気化させて表面上に凝縮させることで膜を形成する方法であって、
(a)ある量の第1の粒子状材料を、第1の開口部を有する第1の容器に供給し、ある量の第2の粒子状材料を、その第1の容器と離れていて第2の開口部を有する第2の容器に供給し;
(b)第1の粒子状材料を第1の容器の第1の開口部を通じてマニホールドの中に移し;
(c)第2の粒子状材料を第2の容器の第2の開口部を通じて上記マニホールドの中に移し;
(d)そのマニホールドの中で混合した第1の粒子状材料と第2の粒子状材料を気化させ、そのようにして気化させた第1の粒子状材料と第2の粒子状材料を基板の表面に供給して層を形成する操作を含む方法。 - 第1の容器または第2の容器にそれぞれ付属する第3の容器と第4の容器を用意し、粒子状材料を対応する第1の容器または第2の容器に移す操作をさらに含む、請求項23に記載の方法。
- 第3の容器と第4の容器からそれぞれ第1の容器または第2の容器に移される粒子状材料を計量し、その第1の容器と第2の容器の中にある粒子状材料の体積を実質的に一定にする操作をさらに含む、請求項24に記載の方法。
- 第1の容器と第2の容器の粒子状材料を別々に流動化し、そのように流動化した材料を移す操作をさらに含む、請求項23に記載の方法。
- それぞれ流動化する上記ステップに、振動装置を用いて上記粒子状材料を振動させる操作を含む、請求項26に記載の方法。
- 上記振動装置が、ピエゾ電気構造または回転する螺旋式装置を備える、請求項27に記載の方法。
- 第1の粒子状材料と第2の粒子状材料を上記マニホールドに供給する速度が、気化した粒子状材料の堆積速度と層内の材料の濃度を規定している、請求項23に記載の方法。
- 第1のスクリュー構造が第1の容器の内部を貫通し、第2のスクリュー構造が第2の容器の内部を貫通している、請求項23に記載の方法。
- 第1の粒子状材料が、2種類以上の異なる有機材料成分を含む、請求項23に記載の方法。
- 第2の粒子状材料が、2種類以上の異なる有機材料成分を含む、請求項23に記載の方法。
- 少なくとも第1の粒子状材料が不活性な担体を含む、請求項1に記載の方法。
- 第1の粒子状材料が有機粒子状材料を含む、請求項23に記載の方法。
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US10/945,941 US7288286B2 (en) | 2004-09-21 | 2004-09-21 | Delivering organic powder to a vaporization zone |
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US11/134,139 | 2005-05-20 | ||
US11/134,139 US7501151B2 (en) | 2004-09-21 | 2005-05-20 | Delivering particulate material to a vaporization zone |
PCT/US2005/033154 WO2006034028A2 (en) | 2004-09-21 | 2005-09-16 | Delivering particulate material to a vaporization source |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012195140A (ja) * | 2011-03-16 | 2012-10-11 | Nitto Denko Corp | 有機エレクトロルミネッセンス発光層の製造方法 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7501152B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
US7288286B2 (en) * | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
US20060099344A1 (en) * | 2004-11-09 | 2006-05-11 | Eastman Kodak Company | Controlling the vaporization of organic material |
US7989021B2 (en) * | 2005-07-27 | 2011-08-02 | Global Oled Technology Llc | Vaporizing material at a uniform rate |
US7638168B2 (en) * | 2005-11-10 | 2009-12-29 | Eastman Kodak Company | Deposition system using sealed replenishment container |
US7951421B2 (en) * | 2006-04-20 | 2011-05-31 | Global Oled Technology Llc | Vapor deposition of a layer |
EP2025774B1 (en) * | 2006-05-19 | 2014-03-05 | Ulvac, Inc. | Vapor deposition apparatus for organic vapor deposition material and process for producing organic thin film |
US20080254217A1 (en) * | 2007-04-16 | 2008-10-16 | Boroson Michael L | Fine control of vaporized organic material |
US7883583B2 (en) * | 2008-01-08 | 2011-02-08 | Global Oled Technology Llc | Vaporization apparatus with precise powder metering |
US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
US8048230B2 (en) * | 2008-11-14 | 2011-11-01 | Global Oled Technology Llc | Metering and vaporizing particulate material |
US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
US11946131B2 (en) * | 2017-05-26 | 2024-04-02 | Universal Display Corporation | Sublimation cell with time stability of output vapor pressure |
KR102098455B1 (ko) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
US11293551B2 (en) | 2018-09-30 | 2022-04-05 | ColdQuanta, Inc. | Break-seal system with breakable-membrane bridging rings |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06158279A (ja) * | 1992-09-02 | 1994-06-07 | Hoechst Ag | 薄層の化学物質気相蒸着のための方法および装置 |
JPH06322521A (ja) * | 1993-05-13 | 1994-11-22 | Toyobo Co Ltd | 連続蒸着方法およびその装置 |
JPH10204624A (ja) * | 1997-01-14 | 1998-08-04 | Sumitomo Heavy Ind Ltd | 真空成膜装置の材料供給装置 |
US5945163A (en) * | 1998-02-19 | 1999-08-31 | First Solar, Llc | Apparatus and method for depositing a material on a substrate |
JP2003109755A (ja) * | 2001-09-27 | 2003-04-11 | Sanyo Electric Co Ltd | 有機elデバイスの製造装置 |
JP2003293121A (ja) * | 2002-04-05 | 2003-10-15 | Cluster Ion Beam Technology Kk | 蒸着材料供給手段を備えた蒸着用坩堝 |
JP2004346371A (ja) * | 2003-05-22 | 2004-12-09 | Matsushita Electric Ind Co Ltd | 成膜方法及び装置 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US784585A (en) | 1903-06-30 | 1905-03-14 | Underwood Typewriter Co | Carriage-return mechanism for type-writers or the like. |
GB502576A (en) * | 1937-10-14 | 1939-03-21 | Daniel Gardner | Improvements in or relating to electric furnaces |
US2447789A (en) * | 1945-03-23 | 1948-08-24 | Polaroid Corp | Evaporating crucible for coating apparatus |
NL250330A (ja) | 1959-04-09 | |||
US3488214A (en) * | 1967-03-15 | 1970-01-06 | Sperry Rand Corp | Evaporant material control for vapor deposition apparatus |
US3658520A (en) | 1968-02-20 | 1972-04-25 | Eastman Kodak Co | Photoconductive elements containing as photoconductors triarylamines substituted by active hydrogen-containing groups |
US3567450A (en) | 1968-02-20 | 1971-03-02 | Eastman Kodak Co | Photoconductive elements containing substituted triarylamine photoconductors |
US3607365A (en) * | 1969-05-12 | 1971-09-21 | Minnesota Mining & Mfg | Vapor phase method of coating substrates with polymeric coating |
JPS5651570A (en) * | 1979-09-29 | 1981-05-09 | Clarion Co Ltd | Vapor depositing method |
US4720432A (en) | 1987-02-11 | 1988-01-19 | Eastman Kodak Company | Electroluminescent device with organic luminescent medium |
US4885211A (en) * | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
US4769292A (en) * | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
KR920003591B1 (ko) * | 1988-04-11 | 1992-05-04 | 미쯔비시주우고오교오 가부시기가이샤 | 연속진공증착장치 |
US5263267A (en) * | 1989-03-20 | 1993-11-23 | Judco Manufacturing, Inc. | Method and apparatus for reducing volatile content of sewage sludge and other feed materials |
EP0891121B8 (en) | 1996-12-28 | 2013-01-02 | Futaba Corporation | Organic electroluminescent elements |
JP3738869B2 (ja) * | 1997-06-05 | 2006-01-25 | 松下電器産業株式会社 | 蒸着方法および蒸着装置 |
JP3586551B2 (ja) * | 1998-01-27 | 2004-11-10 | 松下電器産業株式会社 | 光記録媒体の製造方法及び製造装置 |
JP2000068055A (ja) | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機el素子用蒸発源、この有機el素子用蒸発源を用いた有機el素子の製造装置および製造方法 |
KR100837029B1 (ko) | 1998-09-09 | 2008-06-10 | 이데미쓰 고산 가부시키가이샤 | 유기 전자발광 소자 및 페닐렌디아민 유도체 |
US6208075B1 (en) | 1998-11-05 | 2001-03-27 | Eastman Kodak Company | Conductive fluorocarbon polymer and method of making same |
US6660328B1 (en) * | 2000-03-31 | 2003-12-09 | Florida State University Research Foundation | Powder precursor delivery system for chemical vapor deposition |
US7501152B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
-
2005
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06158279A (ja) * | 1992-09-02 | 1994-06-07 | Hoechst Ag | 薄層の化学物質気相蒸着のための方法および装置 |
JPH06322521A (ja) * | 1993-05-13 | 1994-11-22 | Toyobo Co Ltd | 連続蒸着方法およびその装置 |
JPH10204624A (ja) * | 1997-01-14 | 1998-08-04 | Sumitomo Heavy Ind Ltd | 真空成膜装置の材料供給装置 |
US5945163A (en) * | 1998-02-19 | 1999-08-31 | First Solar, Llc | Apparatus and method for depositing a material on a substrate |
JP2003109755A (ja) * | 2001-09-27 | 2003-04-11 | Sanyo Electric Co Ltd | 有機elデバイスの製造装置 |
JP2003293121A (ja) * | 2002-04-05 | 2003-10-15 | Cluster Ion Beam Technology Kk | 蒸着材料供給手段を備えた蒸着用坩堝 |
JP2004346371A (ja) * | 2003-05-22 | 2004-12-09 | Matsushita Electric Ind Co Ltd | 成膜方法及び装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012195140A (ja) * | 2011-03-16 | 2012-10-11 | Nitto Denko Corp | 有機エレクトロルミネッセンス発光層の製造方法 |
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US20060062915A1 (en) | 2006-03-23 |
US7501151B2 (en) | 2009-03-10 |
KR101174296B1 (ko) | 2012-08-16 |
WO2006034028A2 (en) | 2006-03-30 |
EP1809784B1 (en) | 2018-11-07 |
JP4886694B2 (ja) | 2012-02-29 |
KR20070054663A (ko) | 2007-05-29 |
EP1809784A2 (en) | 2007-07-25 |
WO2006034028A3 (en) | 2006-07-06 |
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