JPS5651570A - Vapor depositing method - Google Patents

Vapor depositing method

Info

Publication number
JPS5651570A
JPS5651570A JP12478579A JP12478579A JPS5651570A JP S5651570 A JPS5651570 A JP S5651570A JP 12478579 A JP12478579 A JP 12478579A JP 12478579 A JP12478579 A JP 12478579A JP S5651570 A JPS5651570 A JP S5651570A
Authority
JP
Japan
Prior art keywords
vapor depositing
powder
depositing material
tantalum
subliming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12478579A
Other languages
Japanese (ja)
Inventor
Kazuo Sato
Masaaki Yashiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Faurecia Clarion Electronics Co Ltd
Original Assignee
Clarion Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clarion Co Ltd filed Critical Clarion Co Ltd
Priority to JP12478579A priority Critical patent/JPS5651570A/en
Publication of JPS5651570A publication Critical patent/JPS5651570A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To heat vapor depositing material uniformly and to prevent the scattering of the material, by mixing powdered vapor depositing material with metallic powder which causes no chemical reaction at the subliming temp. of the vapor depositing material, and by heating the mixture contained in a boat for vapor depositing source. CONSTITUTION:Vapor depositing material 2 such as WO3, SiO2, ZnS of particle size not coarser than 400 mesh is mixed with high melting metal such as tantalum 3 of particle size of 150 mesh in a volume ratio 5:1, and is placed in a boat 1 for vapor depositing source. When the boad 1 is heated, the vapor depositing material powder 2 is heated uniformly because of the tantalum 3 powder having high heat conductivity. On the other hand the scattering of vapor depositing material powder 2 which does not attain the subliming temp. is prevented because the powder 2 is restrained by the weight of the tantalum powder 3.
JP12478579A 1979-09-29 1979-09-29 Vapor depositing method Pending JPS5651570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12478579A JPS5651570A (en) 1979-09-29 1979-09-29 Vapor depositing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12478579A JPS5651570A (en) 1979-09-29 1979-09-29 Vapor depositing method

Publications (1)

Publication Number Publication Date
JPS5651570A true JPS5651570A (en) 1981-05-09

Family

ID=14894055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12478579A Pending JPS5651570A (en) 1979-09-29 1979-09-29 Vapor depositing method

Country Status (1)

Country Link
JP (1) JPS5651570A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006034028A3 (en) * 2004-09-21 2006-07-06 Eastman Kodak Co Delivering particulate material to a vaporization source
WO2006034019A3 (en) * 2004-09-21 2006-11-09 Eastman Kodak Co Delivering particulate material to a vaporization zone
US7288285B2 (en) 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7288286B2 (en) 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006034028A3 (en) * 2004-09-21 2006-07-06 Eastman Kodak Co Delivering particulate material to a vaporization source
WO2006034019A3 (en) * 2004-09-21 2006-11-09 Eastman Kodak Co Delivering particulate material to a vaporization zone
US7288285B2 (en) 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7288286B2 (en) 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
EP2239352A3 (en) * 2004-09-21 2011-06-08 Global OLED Technology LLC Delivering particulate material to a vaporization zone

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