KR101174296B1 - 미립자 물질의 증발 소스로의 전달 - Google Patents

미립자 물질의 증발 소스로의 전달 Download PDF

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Publication number
KR101174296B1
KR101174296B1 KR1020077006395A KR20077006395A KR101174296B1 KR 101174296 B1 KR101174296 B1 KR 101174296B1 KR 1020077006395 A KR1020077006395 A KR 1020077006395A KR 20077006395 A KR20077006395 A KR 20077006395A KR 101174296 B1 KR101174296 B1 KR 101174296B1
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KR
South Korea
Prior art keywords
particulate material
particulate
manifold
auger
auger structure
Prior art date
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Expired - Lifetime
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KR1020077006395A
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English (en)
Korean (ko)
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KR20070054663A (ko
Inventor
마이클 롱
제레미 매튜 그레이스
브루스 에드워드 코페
Original Assignee
글로벌 오엘이디 테크놀러지 엘엘씨
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Priority claimed from US10/945,941 external-priority patent/US7288286B2/en
Application filed by 글로벌 오엘이디 테크놀러지 엘엘씨 filed Critical 글로벌 오엘이디 테크놀러지 엘엘씨
Publication of KR20070054663A publication Critical patent/KR20070054663A/ko
Application granted granted Critical
Publication of KR101174296B1 publication Critical patent/KR101174296B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G33/00—Screw or rotary spiral conveyors
    • B65G33/08—Screw or rotary spiral conveyors for fluent solid materials
    • B65G33/12—Screw or rotary spiral conveyors for fluent solid materials with screws formed by straight tubes or drums having internal threads, or by spiral or helical tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020077006395A 2004-09-21 2005-09-16 미립자 물질의 증발 소스로의 전달 Expired - Lifetime KR101174296B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/945,941 2004-09-21
US10/945,941 US7288286B2 (en) 2004-09-21 2004-09-21 Delivering organic powder to a vaporization zone
US11/134,139 2005-05-20
US11/134,139 US7501151B2 (en) 2004-09-21 2005-05-20 Delivering particulate material to a vaporization zone

Publications (2)

Publication Number Publication Date
KR20070054663A KR20070054663A (ko) 2007-05-29
KR101174296B1 true KR101174296B1 (ko) 2012-08-16

Family

ID=35758545

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077006395A Expired - Lifetime KR101174296B1 (ko) 2004-09-21 2005-09-16 미립자 물질의 증발 소스로의 전달

Country Status (5)

Country Link
US (1) US7501151B2 (https=)
EP (1) EP1809784B1 (https=)
JP (1) JP4886694B2 (https=)
KR (1) KR101174296B1 (https=)
WO (1) WO2006034028A2 (https=)

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* Cited by examiner, † Cited by third party
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US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7288286B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US20060099344A1 (en) * 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7989021B2 (en) * 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
US7638168B2 (en) * 2005-11-10 2009-12-29 Eastman Kodak Company Deposition system using sealed replenishment container
US7951421B2 (en) * 2006-04-20 2011-05-31 Global Oled Technology Llc Vapor deposition of a layer
CN101356296B (zh) * 2006-05-19 2011-03-30 株式会社爱发科 有机蒸镀材料用蒸镀装置、有机薄膜的制造方法
US20080254217A1 (en) * 2007-04-16 2008-10-16 Boroson Michael L Fine control of vaporized organic material
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
JP2012195140A (ja) * 2011-03-16 2012-10-11 Nitto Denko Corp 有機エレクトロルミネッセンス発光層の製造方法
US11946131B2 (en) * 2017-05-26 2024-04-02 Universal Display Corporation Sublimation cell with time stability of output vapor pressure
KR102098455B1 (ko) * 2017-12-26 2020-04-07 주식회사 포스코 연속 증착 장치 및 연속 증착 방법
US11293551B2 (en) 2018-09-30 2022-04-05 ColdQuanta, Inc. Break-seal system with breakable-membrane bridging rings
CN117448746B (zh) * 2023-10-17 2025-12-05 南京大学 石墨烯-多热点金纳米结构复合体系的制备方法及其应用

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US784585A (en) 1903-06-30 1905-03-14 Underwood Typewriter Co Carriage-return mechanism for type-writers or the like.
GB502576A (en) * 1937-10-14 1939-03-21 Daniel Gardner Improvements in or relating to electric furnaces
US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
NL250330A (https=) 1959-04-09
US3488214A (en) * 1967-03-15 1970-01-06 Sperry Rand Corp Evaporant material control for vapor deposition apparatus
US3567450A (en) 1968-02-20 1971-03-02 Eastman Kodak Co Photoconductive elements containing substituted triarylamine photoconductors
US3658520A (en) 1968-02-20 1972-04-25 Eastman Kodak Co Photoconductive elements containing as photoconductors triarylamines substituted by active hydrogen-containing groups
US3607365A (en) * 1969-05-12 1971-09-21 Minnesota Mining & Mfg Vapor phase method of coating substrates with polymeric coating
JPS5651570A (en) * 1979-09-29 1981-05-09 Clarion Co Ltd Vapor depositing method
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US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone

Also Published As

Publication number Publication date
EP1809784B1 (en) 2018-11-07
WO2006034028A2 (en) 2006-03-30
JP4886694B2 (ja) 2012-02-29
US20060062915A1 (en) 2006-03-23
KR20070054663A (ko) 2007-05-29
WO2006034028A3 (en) 2006-07-06
JP2008513965A (ja) 2008-05-01
US7501151B2 (en) 2009-03-10
EP1809784A2 (en) 2007-07-25

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