JP4855885B2 - マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 - Google Patents

マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 Download PDF

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Publication number
JP4855885B2
JP4855885B2 JP2006269609A JP2006269609A JP4855885B2 JP 4855885 B2 JP4855885 B2 JP 4855885B2 JP 2006269609 A JP2006269609 A JP 2006269609A JP 2006269609 A JP2006269609 A JP 2006269609A JP 4855885 B2 JP4855885 B2 JP 4855885B2
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JP
Japan
Prior art keywords
mask
cassette
case
photomask
holding means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006269609A
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English (en)
Japanese (ja)
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JP2008087811A (ja
Inventor
和久 井村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2006269609A priority Critical patent/JP4855885B2/ja
Priority to TW096134036A priority patent/TW200821235A/zh
Priority to CN2007101630075A priority patent/CN101152919B/zh
Priority to KR1020070097765A priority patent/KR101094502B1/ko
Publication of JP2008087811A publication Critical patent/JP2008087811A/ja
Application granted granted Critical
Publication of JP4855885B2 publication Critical patent/JP4855885B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006269609A 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 Expired - Fee Related JP4855885B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006269609A JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法
TW096134036A TW200821235A (en) 2006-09-29 2007-09-12 Mask case, mask cassette, pattern transfer method, manufacturing method for display apparatus and installation method of phto-mask
CN2007101630075A CN101152919B (zh) 2006-09-29 2007-09-28 掩膜壳体、掩膜盒、图案转录方法及显示装置的制造方法
KR1020070097765A KR101094502B1 (ko) 2006-09-29 2007-09-28 마스크 케이스, 마스크 카세트, 패턴 전사 방법, 표시장치의 제조 방법 및 포토마스크의 설치 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006269609A JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法

Publications (2)

Publication Number Publication Date
JP2008087811A JP2008087811A (ja) 2008-04-17
JP4855885B2 true JP4855885B2 (ja) 2012-01-18

Family

ID=39254845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006269609A Expired - Fee Related JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法

Country Status (4)

Country Link
JP (1) JP4855885B2 (enExample)
KR (1) KR101094502B1 (enExample)
CN (1) CN101152919B (enExample)
TW (1) TW200821235A (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5052106B2 (ja) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 ペリクルの収納方法
KR101121176B1 (ko) * 2008-04-23 2012-03-23 피엠씨글로벌 주식회사 포토마스크 케이스의 구조
JP5149207B2 (ja) * 2009-01-13 2013-02-20 株式会社荏原製作所 基板搭載装置
KR101067818B1 (ko) * 2009-08-14 2011-09-27 (주)아이콘 반도체 장비용 트레이 클램프 장치
JP2011203309A (ja) * 2010-03-24 2011-10-13 Shin-Etsu Chemical Co Ltd ペリクルの収納容器およびペリクル収納容器の搬送用台車
JP5586559B2 (ja) * 2011-10-28 2014-09-10 信越化学工業株式会社 ペリクル収容容器
TWI622538B (zh) * 2012-05-11 2018-05-01 Nikon Corp Substrate box, substrate transfer box, case cover, substrate transfer system, and substrate transfer method
JP2014218328A (ja) * 2013-05-08 2014-11-20 新東エスプレシジョン株式会社 メタルマスクシート供給システム
JP6418421B2 (ja) * 2015-01-26 2018-11-07 株式会社ニコン マスクケース、保管装置、搬送装置、露光装置、及びデバイス製造方法
TWI658532B (zh) * 2017-08-09 2019-05-01 明安國際企業股份有限公司 基板承置匣
US11104496B2 (en) * 2019-08-16 2021-08-31 Gudeng Precision Industrial Co., Ltd. Non-sealed reticle storage device
EP4579721A3 (en) * 2019-12-24 2025-12-10 Entegris, Inc. Reticle pod having retention through baseplate
TWI760062B (zh) * 2020-05-14 2022-04-01 家登精密工業股份有限公司 提供有保持銷組件之光罩盒及固持光罩的方法
US11703754B2 (en) 2020-05-14 2023-07-18 Taiwan Semiconductor Manufacturing Company Ltd. Particle prevention method in reticle pod
TWI779505B (zh) * 2020-05-14 2022-10-01 台灣積體電路製造股份有限公司 光罩盒及防止光罩污染之方法
US11874596B2 (en) * 2020-09-30 2024-01-16 Gudeng Precision Industrial Co., Ltd Workpiece container system
JP7313498B1 (ja) 2022-02-18 2023-07-24 株式会社協同 フォトマスク収納ケース、及び、フォトマスク収納ケース用のフォトマスク用クッション部材
TWI853622B (zh) * 2023-06-28 2024-08-21 日商協同股份有限公司 光罩收納盒

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03188446A (ja) 1989-09-05 1991-08-16 Konica Corp カセット供給装置
KR100383260B1 (ko) 2001-03-08 2003-05-09 삼성전자주식회사 레티클 위치감지장치기능을 갖는 포크 암을 구비한 레이클이송장치
JP2005032886A (ja) * 2003-07-10 2005-02-03 Nikon Corp マスクフレーム、露光方法及び露光装置
JP4581681B2 (ja) * 2004-12-27 2010-11-17 株式会社ニコン レチクル保護装置および露光装置

Also Published As

Publication number Publication date
KR20080029876A (ko) 2008-04-03
KR101094502B1 (ko) 2011-12-19
TWI356797B (enExample) 2012-01-21
CN101152919B (zh) 2013-07-31
CN101152919A (zh) 2008-04-02
JP2008087811A (ja) 2008-04-17
TW200821235A (en) 2008-05-16

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