JP4843399B2 - 検査装置及び検査方法 - Google Patents

検査装置及び検査方法 Download PDF

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Publication number
JP4843399B2
JP4843399B2 JP2006207780A JP2006207780A JP4843399B2 JP 4843399 B2 JP4843399 B2 JP 4843399B2 JP 2006207780 A JP2006207780 A JP 2006207780A JP 2006207780 A JP2006207780 A JP 2006207780A JP 4843399 B2 JP4843399 B2 JP 4843399B2
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Japan
Prior art keywords
signal
illumination light
sample
condition
detectors
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Expired - Fee Related
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JP2006207780A
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Japanese (ja)
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JP2008032600A (ja
JP2008032600A5 (enExample
Inventor
健次 岡
松井　　繁
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2006207780A priority Critical patent/JP4843399B2/ja
Priority to US11/830,320 priority patent/US7557911B2/en
Publication of JP2008032600A publication Critical patent/JP2008032600A/ja
Publication of JP2008032600A5 publication Critical patent/JP2008032600A5/ja
Priority to US12/482,479 priority patent/US7773210B2/en
Priority to US12/823,290 priority patent/US8169606B2/en
Application granted granted Critical
Publication of JP4843399B2 publication Critical patent/JP4843399B2/ja
Priority to US13/432,153 priority patent/US8462327B2/en
Priority to US13/886,302 priority patent/US8699017B2/en
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2006207780A 2006-07-31 2006-07-31 検査装置及び検査方法 Expired - Fee Related JP4843399B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006207780A JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法
US11/830,320 US7557911B2 (en) 2006-07-31 2007-07-30 Appearance inspection apparatus
US12/482,479 US7773210B2 (en) 2006-07-31 2009-06-11 Appearance inspection apparatus
US12/823,290 US8169606B2 (en) 2006-07-31 2010-06-25 Appearance inspection apparatus
US13/432,153 US8462327B2 (en) 2006-07-31 2012-03-28 Appearance inspection apparatus
US13/886,302 US8699017B2 (en) 2006-07-31 2013-05-03 Appearance inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006207780A JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法

Publications (3)

Publication Number Publication Date
JP2008032600A JP2008032600A (ja) 2008-02-14
JP2008032600A5 JP2008032600A5 (enExample) 2008-12-04
JP4843399B2 true JP4843399B2 (ja) 2011-12-21

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JP2006207780A Expired - Fee Related JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法

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US (5) US7557911B2 (enExample)
JP (1) JP4843399B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4843399B2 (ja) 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ 検査装置及び検査方法
JP4755054B2 (ja) * 2006-09-01 2011-08-24 株式会社日立ハイテクノロジーズ 表面検査方法、及び表面検査装置
JP5341440B2 (ja) * 2008-09-10 2013-11-13 株式会社日立ハイテクノロジーズ 検査装置
JP5216869B2 (ja) * 2008-12-26 2013-06-19 株式会社日立ハイテクノロジーズ 検査方法及び検査装置
JP5425601B2 (ja) 2009-12-03 2014-02-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびその画質改善方法
JP5450161B2 (ja) * 2010-02-26 2014-03-26 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
JP5628010B2 (ja) * 2010-11-30 2014-11-19 株式会社日立ハイテクノロジーズ 欠陥検査装置、判定条件構築装置及び欠陥検査方法
JP5869817B2 (ja) * 2011-09-28 2016-02-24 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
FR2986106B1 (fr) * 2012-01-20 2014-08-22 Soitec Silicon On Insulator Procede de fabrication de substrats semi-conducteur, et substrats semi-conducteur
SG11201407341TA (en) 2012-05-09 2014-12-30 Seagate Technology Llc Surface features mapping
JP2013238534A (ja) * 2012-05-16 2013-11-28 Shin Etsu Handotai Co Ltd ウエーハ表面の評価方法
US9212900B2 (en) 2012-08-11 2015-12-15 Seagate Technology Llc Surface features characterization
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9377394B2 (en) 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9274064B2 (en) * 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
JP2013224957A (ja) * 2013-07-03 2013-10-31 Hitachi High-Technologies Corp 検査装置
CN105572040A (zh) * 2014-10-15 2016-05-11 富泰华工业（深圳）有限公司 光源装置
JP6973205B2 (ja) * 2018-03-15 2021-11-24 オムロン株式会社 画像処理システム、画像処理装置、画像処理プログラム

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571468B2 (ja) * 1990-11-28 1997-01-16 日立電子エンジニアリング株式会社 ヘイズと連続異物群の判別方法
JP3476913B2 (ja) * 1994-07-08 2003-12-10 オリンパス株式会社 欠陥種別判定装置及びプロセス管理システム
US5712701A (en) * 1995-03-06 1998-01-27 Ade Optical Systems Corporation Surface inspection system and method of inspecting surface of workpiece
JP3686160B2 (ja) 1995-04-10 2005-08-24 株式会社日立ハイテクノロジーズ ウエハ表面検査方法および検査装置
EP0979398B1 (en) * 1996-06-04 2012-01-04 KLA-Tencor Corporation Optical scanning system for surface inspection
JP3784603B2 (ja) * 2000-03-02 2006-06-14 株式会社日立製作所 検査方法及びその装置並びに検査装置における検査条件設定方法
DE10053904C2 (de) 2000-10-31 2003-05-22 Emitec Emissionstechnologie Kleinvolumiger NO¶x¶-Adsorber
JP2002310935A (ja) * 2001-04-19 2002-10-23 Murata Mfg Co Ltd 照明条件抽出方法、照明条件抽出装置、外観検査システム
JP4096533B2 (ja) * 2001-08-31 2008-06-04 松下電工株式会社 画像処理検査システム
KR100437024B1 (ko) * 2001-10-18 2004-06-23 엘지전자 주식회사 박막 검사 방법 및 그 장치
JP2003130808A (ja) * 2001-10-29 2003-05-08 Hitachi Ltd 欠陥検査方法及びその装置
JP4079841B2 (ja) * 2003-06-30 2008-04-23 オリンパス株式会社 欠陥表示装置
JP4357355B2 (ja) * 2004-05-07 2009-11-04 株式会社日立ハイテクノロジーズ パターン検査方法及びその装置
US7605913B2 (en) * 2004-12-19 2009-10-20 Kla-Tencor Corporation System and method for inspecting a workpiece surface by analyzing scattered light in a front quartersphere region above the workpiece
JP4843399B2 (ja) * 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ 検査装置及び検査方法

Also Published As

Publication number Publication date
US20090244529A1 (en) 2009-10-01
US20080024765A1 (en) 2008-01-31
US20120194808A1 (en) 2012-08-02
US20100259750A1 (en) 2010-10-14
US8462327B2 (en) 2013-06-11
JP2008032600A (ja) 2008-02-14
US7773210B2 (en) 2010-08-10
US7557911B2 (en) 2009-07-07
US20130242293A1 (en) 2013-09-19
US8699017B2 (en) 2014-04-15
US8169606B2 (en) 2012-05-01

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