JP2008032600A5 - - Google Patents

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Publication number
JP2008032600A5
JP2008032600A5 JP2006207780A JP2006207780A JP2008032600A5 JP 2008032600 A5 JP2008032600 A5 JP 2008032600A5 JP 2006207780 A JP2006207780 A JP 2006207780A JP 2006207780 A JP2006207780 A JP 2006207780A JP 2008032600 A5 JP2008032600 A5 JP 2008032600A5
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JP
Japan
Prior art keywords
illumination light
sample
synthesis
inspection apparatus
detectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006207780A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008032600A (ja
JP4843399B2 (ja
Filing date
Publication date
Priority claimed from JP2006207780A external-priority patent/JP4843399B2/ja
Priority to JP2006207780A priority Critical patent/JP4843399B2/ja
Application filed filed Critical
Priority to US11/830,320 priority patent/US7557911B2/en
Publication of JP2008032600A publication Critical patent/JP2008032600A/ja
Publication of JP2008032600A5 publication Critical patent/JP2008032600A5/ja
Priority to US12/482,479 priority patent/US7773210B2/en
Priority to US12/823,290 priority patent/US8169606B2/en
Publication of JP4843399B2 publication Critical patent/JP4843399B2/ja
Application granted granted Critical
Priority to US13/432,153 priority patent/US8462327B2/en
Priority to US13/886,302 priority patent/US8699017B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006207780A 2006-07-31 2006-07-31 検査装置及び検査方法 Expired - Fee Related JP4843399B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006207780A JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法
US11/830,320 US7557911B2 (en) 2006-07-31 2007-07-30 Appearance inspection apparatus
US12/482,479 US7773210B2 (en) 2006-07-31 2009-06-11 Appearance inspection apparatus
US12/823,290 US8169606B2 (en) 2006-07-31 2010-06-25 Appearance inspection apparatus
US13/432,153 US8462327B2 (en) 2006-07-31 2012-03-28 Appearance inspection apparatus
US13/886,302 US8699017B2 (en) 2006-07-31 2013-05-03 Appearance inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006207780A JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法

Publications (3)

Publication Number Publication Date
JP2008032600A JP2008032600A (ja) 2008-02-14
JP2008032600A5 true JP2008032600A5 (enExample) 2008-12-04
JP4843399B2 JP4843399B2 (ja) 2011-12-21

Family

ID=38985882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006207780A Expired - Fee Related JP4843399B2 (ja) 2006-07-31 2006-07-31 検査装置及び検査方法

Country Status (2)

Country Link
US (5) US7557911B2 (enExample)
JP (1) JP4843399B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4843399B2 (ja) 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ 検査装置及び検査方法
JP4755054B2 (ja) * 2006-09-01 2011-08-24 株式会社日立ハイテクノロジーズ 表面検査方法、及び表面検査装置
JP5341440B2 (ja) * 2008-09-10 2013-11-13 株式会社日立ハイテクノロジーズ 検査装置
JP5216869B2 (ja) * 2008-12-26 2013-06-19 株式会社日立ハイテクノロジーズ 検査方法及び検査装置
JP5425601B2 (ja) 2009-12-03 2014-02-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびその画質改善方法
JP5450161B2 (ja) * 2010-02-26 2014-03-26 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
JP5628010B2 (ja) * 2010-11-30 2014-11-19 株式会社日立ハイテクノロジーズ 欠陥検査装置、判定条件構築装置及び欠陥検査方法
JP5869817B2 (ja) * 2011-09-28 2016-02-24 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
FR2986106B1 (fr) * 2012-01-20 2014-08-22 Soitec Silicon On Insulator Procede de fabrication de substrats semi-conducteur, et substrats semi-conducteur
SG11201407341TA (en) 2012-05-09 2014-12-30 Seagate Technology Llc Surface features mapping
JP2013238534A (ja) * 2012-05-16 2013-11-28 Shin Etsu Handotai Co Ltd ウエーハ表面の評価方法
US9212900B2 (en) 2012-08-11 2015-12-15 Seagate Technology Llc Surface features characterization
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9377394B2 (en) 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9274064B2 (en) * 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
JP2013224957A (ja) * 2013-07-03 2013-10-31 Hitachi High-Technologies Corp 検査装置
CN105572040A (zh) * 2014-10-15 2016-05-11 富泰华工业（深圳）有限公司 光源装置
JP6973205B2 (ja) * 2018-03-15 2021-11-24 オムロン株式会社 画像処理システム、画像処理装置、画像処理プログラム

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571468B2 (ja) * 1990-11-28 1997-01-16 日立電子エンジニアリング株式会社 ヘイズと連続異物群の判別方法
JP3476913B2 (ja) * 1994-07-08 2003-12-10 オリンパス株式会社 欠陥種別判定装置及びプロセス管理システム
US5712701A (en) * 1995-03-06 1998-01-27 Ade Optical Systems Corporation Surface inspection system and method of inspecting surface of workpiece
JP3686160B2 (ja) 1995-04-10 2005-08-24 株式会社日立ハイテクノロジーズ ウエハ表面検査方法および検査装置
EP0979398B1 (en) * 1996-06-04 2012-01-04 KLA-Tencor Corporation Optical scanning system for surface inspection
JP3784603B2 (ja) * 2000-03-02 2006-06-14 株式会社日立製作所 検査方法及びその装置並びに検査装置における検査条件設定方法
DE10053904C2 (de) 2000-10-31 2003-05-22 Emitec Emissionstechnologie Kleinvolumiger NO¶x¶-Adsorber
JP2002310935A (ja) * 2001-04-19 2002-10-23 Murata Mfg Co Ltd 照明条件抽出方法、照明条件抽出装置、外観検査システム
JP4096533B2 (ja) * 2001-08-31 2008-06-04 松下電工株式会社 画像処理検査システム
KR100437024B1 (ko) * 2001-10-18 2004-06-23 엘지전자 주식회사 박막 검사 방법 및 그 장치
JP2003130808A (ja) * 2001-10-29 2003-05-08 Hitachi Ltd 欠陥検査方法及びその装置
JP4079841B2 (ja) * 2003-06-30 2008-04-23 オリンパス株式会社 欠陥表示装置
JP4357355B2 (ja) * 2004-05-07 2009-11-04 株式会社日立ハイテクノロジーズ パターン検査方法及びその装置
US7605913B2 (en) * 2004-12-19 2009-10-20 Kla-Tencor Corporation System and method for inspecting a workpiece surface by analyzing scattered light in a front quartersphere region above the workpiece
JP4843399B2 (ja) * 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ 検査装置及び検査方法

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