JP4824527B2 - 試料分析装置 - Google Patents
試料分析装置 Download PDFInfo
- Publication number
- JP4824527B2 JP4824527B2 JP2006297764A JP2006297764A JP4824527B2 JP 4824527 B2 JP4824527 B2 JP 4824527B2 JP 2006297764 A JP2006297764 A JP 2006297764A JP 2006297764 A JP2006297764 A JP 2006297764A JP 4824527 B2 JP4824527 B2 JP 4824527B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- contact hole
- photodetector
- luminescence
- charged particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination and light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2808—Cathodoluminescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
- H01J2237/281—Bottom of trenches or holes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
前記照射系は前記荷電粒子を前記試料に間欠的に照射するように制御され、前記信号処理部は前記荷電粒子の間欠照射終了時点から間欠照射開始時点までの期間における前記光検出器からの検出信号の減衰特性に基づき前記試料の同定を行うことを特徴とする。
18…ウエハ(試料)
24…信号処理部
25…荷電粒子検出器
33…光検出器
Claims (6)
- 表面に部分的に凹部が存在する試料に荷電粒子を照射する照射系と、前記荷電粒子の照射に基づき前記試料の表面側から得られたルミネッセンスを集光する集光反射鏡部と、該集光反射鏡部に導かれたルミネッセンスを検出する光検出器と、前記試料の表面から反射された反射荷電粒子を検出する荷電粒子検出器と、該荷電粒子検出器の検出信号に基づき前記試料の形状を求めると共に前記光検出器の検出信号に基づき前記試料の材質を同定する信号処理部とを備え、
前記照射系は前記荷電粒子を前記試料に間欠的に照射するように制御され、前記信号処理部は前記荷電粒子の間欠照射終了時点から間欠照射開始時点までの期間における前記光検出器からの検出信号の減衰特性に基づき前記試料の同定を行うことを特徴とする試料分析装置。 - 前記試料は、レジストが表面に設けられた半導体であり、前記凹部はコンタクトホールであることを特徴とする請求項1に記載の試料分析装置。
- 前記減衰特性が前記荷電粒子の間欠照射終了時点において前記光検出器から得られた検出信号の値が所定値に減少するまでの減衰時間であることを特徴とする請求項1又は請求項2に記載の試料分析装置。
- 前記減衰特性が前記荷電粒子の間欠照射終了時点において前記光検出器から得られた検出信号が所定値に減少するまでの減衰時間であり、前記信号処理部は、該減衰時間が前記所定値と比較して小さい場合には前記コンタクトホールが規格に合致しないと判断し、該減衰時間が前記所定値と比較して大きい場合には前記コンタクトホールが規格に合致すると判断し、又は、該減衰時間が所定値と比較して大きい場合には前記コンタクトホールが規格に合致しないと判断し、前記減衰時間が前記所定値と比較して小さい場合には前記コンタクトホールが規格に合致すると判断することを特徴とする請求項2に記載の試料分析装置。
- 前記ルミネッセンスは分光器又は分光プリズムによって分解されて前記光検出器に導かれ、該光検出器は波長毎に分解された検出信号を出力し、前記信号処理部は各波長毎に分解されたルミネッセンスの減衰時間に基づき前記試料の同定を行うことを特徴とする請求項3に記載の試料分析装置。
- 前記照射系は前記荷電粒子の加速電圧を変更可能であり、前記信号処理部は前記加速電圧を加味して前記試料の同定を行うことを特徴とする請求項3に記載の試料分析装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006297764A JP4824527B2 (ja) | 2006-11-01 | 2006-11-01 | 試料分析装置 |
US11/932,083 US20080121799A1 (en) | 2006-11-01 | 2007-10-31 | Sample analyzing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006297764A JP4824527B2 (ja) | 2006-11-01 | 2006-11-01 | 試料分析装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008116246A JP2008116246A (ja) | 2008-05-22 |
JP4824527B2 true JP4824527B2 (ja) | 2011-11-30 |
Family
ID=39462666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006297764A Active JP4824527B2 (ja) | 2006-11-01 | 2006-11-01 | 試料分析装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20080121799A1 (ja) |
JP (1) | JP4824527B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2573796B1 (en) | 2011-09-22 | 2014-05-07 | Carl Zeiss Microscopy Limited | Particle beam system having a hollow light guide |
JP5983275B2 (ja) * | 2012-10-09 | 2016-08-31 | 富士通株式会社 | 検査装置および検査方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT306804B (de) * | 1971-10-05 | 1973-04-25 | Oesterr Studien Atomenergie | Kathodolumineszenzeinrichtung für Rasterelektronenmikroskope |
DE3729846A1 (de) * | 1987-09-05 | 1989-03-23 | Zeiss Carl Fa | Kathodolumineszenzdetektor |
US4929041A (en) * | 1989-01-09 | 1990-05-29 | Johnston Pump/General Valve, Inc. | Cathodoluminescence system for use in a scanning electron microscope including means for controlling optical fiber aperture |
CA2084923A1 (en) * | 1991-12-20 | 1993-06-21 | Ronald E. Stafford | Slm spectrometer |
JP3476482B2 (ja) * | 1992-05-22 | 2003-12-10 | 株式会社トプコン | 形態観察装置 |
US5569920A (en) * | 1995-06-14 | 1996-10-29 | National University Of Singapore | Retractable cathodoluminescence detector with high ellipticity and high backscattered electron rejection performance for large area specimens |
JPH1038805A (ja) * | 1996-07-18 | 1998-02-13 | Horon:Kk | カソードルミネッセンス装置 |
JPH1196956A (ja) * | 1997-09-22 | 1999-04-09 | Hitachi Ltd | 走査電子顕微鏡 |
US6885445B2 (en) * | 1998-05-09 | 2005-04-26 | Renishaw Plc | Electron microscope and spectroscopy system |
US6476387B1 (en) * | 1998-05-15 | 2002-11-05 | Hitachi, Ltd. | Method and apparatus for observing or processing and analyzing using a charged beam |
US6043882A (en) * | 1998-10-02 | 2000-03-28 | Imec Vzw | Emission microscope and method for continuous wavelength spectroscopy |
JP2001284363A (ja) * | 2000-03-29 | 2001-10-12 | Sumitomo Electric Ind Ltd | InGaP/GaAs−HBTの製造方法及び評価方法 |
JP3859446B2 (ja) * | 2000-12-07 | 2006-12-20 | 株式会社東芝 | 半導体基板検査装置および半導体基板検査方法 |
WO2006093966A2 (en) * | 2005-02-28 | 2006-09-08 | The Trustees Of Princeton University | Sem cathodoluminescent imaging using up-converting nanophosphors |
EP1739715A3 (en) * | 2005-06-29 | 2008-12-10 | Horiba, Ltd. | Sample measuring device |
-
2006
- 2006-11-01 JP JP2006297764A patent/JP4824527B2/ja active Active
-
2007
- 2007-10-31 US US11/932,083 patent/US20080121799A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2008116246A (ja) | 2008-05-22 |
US20080121799A1 (en) | 2008-05-29 |
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