JP4817791B2 - 加熱基板支持体及びその製造方法 - Google Patents

加熱基板支持体及びその製造方法 Download PDF

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Publication number
JP4817791B2
JP4817791B2 JP2005296615A JP2005296615A JP4817791B2 JP 4817791 B2 JP4817791 B2 JP 4817791B2 JP 2005296615 A JP2005296615 A JP 2005296615A JP 2005296615 A JP2005296615 A JP 2005296615A JP 4817791 B2 JP4817791 B2 JP 4817791B2
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JP
Japan
Prior art keywords
groove
substrate support
heating element
heat sink
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005296615A
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English (en)
Japanese (ja)
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JP2006111973A (ja
JP2006111973A5 (https=
Inventor
エー. グエンザー ロルフ
ビー. ハミル カーチス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
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Filing date
Publication date
Priority claimed from US10/965,601 external-priority patent/US20060075970A1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2006111973A publication Critical patent/JP2006111973A/ja
Publication of JP2006111973A5 publication Critical patent/JP2006111973A5/ja
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Publication of JP4817791B2 publication Critical patent/JP4817791B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586Elements in the interior of the support, e.g. electrodes, heating or cooling devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
JP2005296615A 2004-10-13 2005-10-11 加熱基板支持体及びその製造方法 Expired - Fee Related JP4817791B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/965,601 2004-10-13
US10/965,601 US20060075970A1 (en) 2004-10-13 2004-10-13 Heated substrate support and method of fabricating same
US11/115,575 US7674338B2 (en) 2004-10-13 2005-04-26 Heated substrate support and method of fabricating same
US11/115,575 2005-04-26

Publications (3)

Publication Number Publication Date
JP2006111973A JP2006111973A (ja) 2006-04-27
JP2006111973A5 JP2006111973A5 (https=) 2011-08-04
JP4817791B2 true JP4817791B2 (ja) 2011-11-16

Family

ID=36380726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005296615A Expired - Fee Related JP4817791B2 (ja) 2004-10-13 2005-10-11 加熱基板支持体及びその製造方法

Country Status (3)

Country Link
JP (1) JP4817791B2 (https=)
KR (1) KR20060052233A (https=)
TW (1) TWI289610B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009535801A (ja) * 2006-04-28 2009-10-01 ダンスン エレクトロン カンパニー リミテッド サセプタの製造方法、及び、この方法によって製造されたサセプタ
US11694879B2 (en) * 2018-12-07 2023-07-04 Applied Materials, Inc. Component, method of manufacturing the component, and method of cleaning the component
JP2023166746A (ja) 2022-05-10 2023-11-22 東京エレクトロン株式会社 加熱装置及び基板処理装置
CN118147613B (zh) * 2024-02-05 2026-02-27 深圳市原速科技有限公司 治具以及镀膜设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2222192A (en) * 1938-10-12 1940-11-19 Westinghouse Electric & Mfg Co Flatiron
US2389588A (en) * 1942-10-29 1945-11-27 Westinghouse Electric Corp Heating apparatus
US2541118A (en) * 1945-04-11 1951-02-13 Birtman Electric Co Resistance element for electric irons
US5104459A (en) * 1989-11-28 1992-04-14 Atlantic Richfield Company Method of forming aluminum alloy sheet
US5844205A (en) * 1996-04-19 1998-12-01 Applied Komatsu Technology, Inc. Heated substrate support structure
JP3345852B2 (ja) * 1998-06-18 2002-11-18 古河電気工業株式会社 半導体製造装置の基盤ホルダー及びその製造方法
US6376815B1 (en) * 1998-01-12 2002-04-23 Furukawa Electric Co., Ltd. Highly gas tight substrate holder and method of manufacturing the same
JP2000243542A (ja) * 1999-02-24 2000-09-08 Nhk Spring Co Ltd ヒータユニット及びその製造方法
US6897411B2 (en) * 2002-02-11 2005-05-24 Applied Materials, Inc. Heated substrate support
US7154070B2 (en) * 2004-10-08 2006-12-26 Furukawa-Sky Aluminum Corp. Heater plate and a method for manufacturing the heater plate

Also Published As

Publication number Publication date
TWI289610B (en) 2007-11-11
JP2006111973A (ja) 2006-04-27
TW200632124A (en) 2006-09-16
KR20060052233A (ko) 2006-05-19

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