JP4780939B2 - Light emitting device - Google Patents

Light emitting device Download PDF

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JP4780939B2
JP4780939B2 JP2004219779A JP2004219779A JP4780939B2 JP 4780939 B2 JP4780939 B2 JP 4780939B2 JP 2004219779 A JP2004219779 A JP 2004219779A JP 2004219779 A JP2004219779 A JP 2004219779A JP 4780939 B2 JP4780939 B2 JP 4780939B2
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light emitting
emitting element
light
emitting device
insulating base
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JP2006041230A (en
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美奈子 泉
智英 長谷川
康博 佐々木
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Kyocera Corp
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Kyocera Corp
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Priority to JP2004219779A priority Critical patent/JP4780939B2/en
Priority to PCT/JP2005/006727 priority patent/WO2005106973A1/en
Priority to US11/568,258 priority patent/US20080043444A1/en
Priority to TW094110792A priority patent/TW200541415A/en
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Priority to US13/071,431 priority patent/US8314346B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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Description

本発明は、例えば、発光ダイオード等の発光素子を搭載した発光装置に関する。 The present invention relates to a light emitting device including a light emitting element such as a light emitting diode.

近年、発光素子を用いた発光装置の高輝度、白色化に伴い、携帯電話や大型液晶TV等のバックライトに発光装置が多く用いられてきている。しかしながら、発光素子の高輝度化に伴い、発光装置から発生する熱も増加しており、発光素子の輝度の低下をなくす為には、このような熱を素子より速やかに放散する高い熱放散性を有する発光素子用配線基板が必要となっている(特許文献1、2参照)。
特開平10−215001号公報 特開2003−347600号公報
In recent years, with the increase in brightness and whiteness of light-emitting devices using light-emitting elements, light-emitting devices have been frequently used for backlights of mobile phones, large liquid crystal TVs, and the like. However, as the brightness of light emitting elements increases, the heat generated from the light emitting device also increases, and in order to eliminate the decrease in the brightness of the light emitting elements, such heat dissipation that dissipates such heat more quickly than the elements is high. A wiring board for a light emitting element having the above is required (see Patent Documents 1 and 2).
JP 10-215001 A JP 2003-347600 A

しかしながら、従来から配線基板の絶縁基体に用いられてきたアルミナ材料では、熱伝導率が約15W/m・Kと低いことからそれに代わるものとして高い熱伝導率を有する窒化アルミニウムが注目され始めた。しかし、窒化アルミニウムは原料コストが高く、難焼結性による高温焼成のためプロセスコストも高い。また、熱膨張係数が4〜5×10−6/℃と小さいため、汎用品である9×10−6/℃以上の熱膨張係数を持つプリント基板へ実装した際に、熱膨張差により接続信頼性が損なわれるという問題があった。   However, the alumina material conventionally used for the insulating substrate of the wiring board has a low thermal conductivity of about 15 W / m · K, so aluminum nitride having a high thermal conductivity has begun to attract attention as an alternative. However, aluminum nitride has a high raw material cost and a high process cost due to high-temperature firing due to difficult sintering. In addition, since the coefficient of thermal expansion is as small as 4-5x10-6 / ° C, it is connected due to the difference in thermal expansion when mounted on a general-purpose printed circuit board with a coefficient of thermal expansion of 9x10-6 / ° C or higher. There was a problem that reliability was impaired.

一方、樹脂系の配線基板を用いた場合には、熱膨張係数はプリント基板に近づくため、樹脂系の配線基板とプリント基板の実装信頼性の問題は発生しないが、樹脂系の配線基板は、熱伝導率が0.05W/m・Kと非常に低く、熱に対する問題に全く対処することができない。すなわち、安価で、熱伝導に優れ、実装信頼性に優れた発光素子用配線基板は未だ提供されていない。   On the other hand, when a resin-based wiring board is used, the thermal expansion coefficient approaches that of the printed circuit board, so there is no problem of mounting reliability between the resin-based wiring board and the printed circuit board. The thermal conductivity is as low as 0.05 W / m · K, and the problem with heat cannot be dealt with at all. That is, a light-emitting element wiring board that is inexpensive, excellent in heat conduction, and excellent in mounting reliability has not yet been provided.

従って本発明は、安価で、熱放散性及び実装信頼性に優れた発光装置を提供することを目的とする。 Accordingly, the present invention is inexpensive, and to provide an excellent light emission device heat dissipation and mounting reliability.

本発明の発光装置は、低温焼成セラミックスからなる平板状の絶縁基体と該絶縁基体の表面又は内部のうち少なくとも一方に形成された導体層と前記絶縁基体の一方の主面に設けられた発光素子を搭載する搭載部とを有す発光素子用配線基板と、該発光素子用配線基板の前記搭載部に搭載された発光素子と、を具備してなり、前記搭載部の直下に前記絶縁基体を貫通して設けられ、Cu、Ag、Auのうち少なくとも1種を主成分とし、前記絶縁基体よりも高い熱伝導率を有し、前記発光素子の搭載面積以上の断面積を有する塊状の貫通金属体が、前記絶縁基体と同時焼成されてなるとともに、前記発光素子用配線基板の主面に形成された前記絶縁基体と前記貫通金属体との境界が、金属を主成分とする被覆層により被覆されていることを特徴とする。 The light emitting device of the present invention, light emission provided on one major surface of the flat plate-like insulating substrate and the insulating substrate surface or the conductive layer formed on at least one of the inner and front Symbol insulating substrate made of a low-temperature co-fired ceramic a light emitting element wiring board that having a a mounting portion for mounting the device, it comprises a and a light emitting element mounted on the mounting portion of the wiring board for the light emitting element, the insulating directly below the mounting portion A lump that is provided penetrating the base, has at least one of Cu, Ag, and Au as a main component, has a higher thermal conductivity than the insulating base, and has a cross-sectional area that is greater than the mounting area of the light emitting element. A penetrating metal body is fired simultaneously with the insulating base, and a boundary between the insulating base and the penetrating metal body formed on the main surface of the light-emitting element wiring substrate is a coating layer mainly composed of metal. to be covered by And butterflies.

また、本発明の発光装置は、前記貫通金属体が、少なくとも金属材料とセラミック材料との複合体であることが望ましい。 In the light emitting device of the present invention, it is preferable that the through metal body is a composite of at least a metal material and a ceramic material.

また、本発明の発光装置は、前記貫通金属体が、少なくとも電気回路の一部を形成して
なることが望ましい。
In the light emitting device of the present invention, it is preferable that the through metal body forms at least a part of an electric circuit.

また、本発明の発光装置は、前記貫通金属体の少なくとも一方の端面が絶縁膜で覆われていることが望ましい。 In the light emitting device of the present invention, it is desirable that at least one end face of the through metal body is covered with an insulating film.

また、本発明の発光装置は、前記絶縁基体の40〜400℃における熱膨張係数が9〜18×10−6/℃であることが望ましい。 In the light emitting device of the present invention, it is desirable that the thermal expansion coefficient of the insulating base at 40 to 400 ° C. is 9 to 18 × 10 −6 / ° C.

また、本発明の発光装置は、前記導体層又は貫通金属体がCu、Ag、Auのうち少なくとも1種を主成分とすることが望ましい。 In the light emitting device of the present invention, it is desirable that the conductor layer or the penetrating metal body is mainly composed of at least one of Cu, Ag, and Au.

また、本発明の発光装置は、前記発光素子用配線基板の搭載部が形成された側の主面に、発光素子を収容するための枠体が形成されてなることが望ましい。 In the light emitting device of the present invention, it is desirable that a frame for accommodating the light emitting elements is formed on the main surface on the side where the mounting portion of the wiring board for light emitting elements is formed.

本発明の発光装置によれば熱放散性に優れ、発熱そのものを小さくすることができ、しかも、絶縁基体の熱膨張係数などの特性を任意に変化させることができ、例えば、有機基板等との熱膨張ミスマッチを抑制できるため、発光装置の接合信頼性向上に寄与できる。また、絶縁基体に比較的ガラスを多く含んでいるため、光の反射率が高く、光の利用率を高くすることができる。 According to the light emitting device of the present invention, heat dissipation is excellent, heat generation itself can be reduced, and characteristics such as a thermal expansion coefficient of the insulating base can be arbitrarily changed. The thermal expansion mismatch can be suppressed, which can contribute to improving the bonding reliability of the light emitting device. Further, since the insulating substrate contains a relatively large amount of glass, the reflectance of light is high and the utilization factor of light can be increased.

本発明の発光装置を構成する発光素子用配線基板は、例えば、図1(a)に示すように、1050℃以下で焼成された低温焼成セラミックスからなる絶縁基体1と、絶縁基体1の主面1aに形成された発光素子との接続端子3、絶縁基体1の他方の主面1bに形成された外部電極端子5、接続端子3と外部電極端子5とを電気的に接続するように、絶縁基体1を貫通して設けられた貫通導体7とから構成されている。 As shown in FIG. 1A, for example, a wiring board for a light-emitting element that constitutes a light- emitting device of the present invention includes an insulating base 1 made of low-temperature fired ceramic fired at 1050 ° C. or lower, and the main surface of the insulating base 1 Insulating so that the connection terminal 3 with the light emitting element formed on 1a, the external electrode terminal 5 formed on the other main surface 1b of the insulating base 1, and the connection terminal 3 and the external electrode terminal 5 are electrically connected. The through conductor 7 is provided through the base body 1.

そして、一方の接続端子3aと他方の接続端子3bとの間には、発光素子を搭載するための搭載部9が形成されている。また、絶縁基体1を貫通するように搭載部9の直下には、貫通金属体10が形成されている。   A mounting portion 9 for mounting a light emitting element is formed between one connection terminal 3a and the other connection terminal 3b. Further, a penetrating metal body 10 is formed immediately below the mounting portion 9 so as to penetrate the insulating base 1.

また、例えば、発光素子用配線基板11は、図1(b)に示すように、搭載部9側に、搭載される発光素子を収納するための枠体13が形成されている。 Further, for example, the wiring board 11 for emitting light device, as shown in FIG. 1 (b), the mounting portion 9 side, the frame body 13 for accommodating a light emitting element mounted is formed.

本発明によれば、このような発光素子用配線基板11において、絶縁基体1を1050℃以下で焼成された低温焼成セラミックスにより形成することが重要である。このことにより、低抵抗で、しかも高熱伝導な銅や銀、金などの金属との同時焼成が可能となり、低抵抗な配線層を具備する発光素子用配線基板11を容易に、しかも安価に形成することができる。また、低温焼成セラミックスは、一般的に、ガラス成分を多く含むため、1050℃を超える温度で焼成される例えば、アルミナや窒化アルミなどと比較すると、熱伝導率が低く、放熱性を要求される部材には用いられてこなかったが、有機系の部材と比べると数倍以上の熱伝導率を有している。また、アルミナや窒化アルミに用いられるタングステンなどを主成分とする配線層と比べると、約1/3程度の低抵抗を有しているのである。また、低温焼成セラミックスは、一般的にガラスに起因する成分を多く有するため、なめらかな表面状態を容易に形成することができ、発光素子が発する光を効率的に反射することができる。また、反射率以外にも、透明度や色調を制御することも容易であり、さまざまな発光装置に好適に用いられるものである。   According to the present invention, in such a light emitting element wiring substrate 11, it is important to form the insulating substrate 1 from low-temperature fired ceramics fired at 1050 ° C. or lower. As a result, it is possible to simultaneously sinter with a metal such as copper, silver or gold having low resistance and high thermal conductivity, and the wiring substrate 11 for a light emitting element having a low resistance wiring layer can be easily and inexpensively formed. can do. In addition, since low-temperature fired ceramics generally contain a large amount of glass components, the heat conductivity is low and heat dissipation is required as compared with, for example, alumina and aluminum nitride that are fired at a temperature exceeding 1050 ° C. Although it has not been used as a member, it has a thermal conductivity several times higher than that of an organic member. In addition, it has a low resistance of about 1/3 compared to a wiring layer mainly composed of tungsten or the like used for alumina or aluminum nitride. In addition, since the low-temperature fired ceramic generally has many components derived from glass, a smooth surface state can be easily formed, and light emitted from the light-emitting element can be efficiently reflected. In addition to the reflectance, it is easy to control transparency and color tone, and it is suitable for various light emitting devices.

そして、以上説明したこれらの効果が相乗され、配線層3、5、7に起因する発熱を抑
制し、しかも、熱を比較的迅速に装置外に放出することができるとともに、発光装置の発する光を効率よく利用することができるのである。
These effects described above are synergistically suppressed, heat generation due to the wiring layers 3, 5, and 7 can be suppressed, and heat can be released to the outside of the device relatively quickly, and light emitted from the light emitting device. Can be used efficiently.

また、絶縁基体1よりも高い熱伝導率を有する貫通金属体10を、絶縁基体1を貫通して形成することも重要である。このことにより、発光素子用配線基板11の熱伝導を格段に向上させることができるため、さらに、発光素子から発生する熱を速やかに発光素子用配線基板11の外へ放射することができ、発光素子の輝度低下を防ぐことが可能となる。なお、貫通金属体10は塊状とされている。   It is also important to form the penetrating metal body 10 having a higher thermal conductivity than the insulating substrate 1 through the insulating substrate 1. Accordingly, the heat conduction of the light emitting element wiring substrate 11 can be remarkably improved, and further, heat generated from the light emitting element can be quickly radiated to the outside of the light emitting element wiring substrate 11, and the light emission. It becomes possible to prevent a decrease in luminance of the element. The penetrating metal body 10 is in a lump shape.

そして、貫通金属体10を、発光素子用配線基板11に搭載される発光素子の搭載面積以上、特には、搭載面積よりも大きな断面積とすることが好ましい。断面積を大きくすることにより、放熱部分が増加し、更に発光素子から発生する熱を速やかに放散することができる。特に断面積が1.1倍が良く、更に好適には1.2倍とすることが望ましい。   Then, it is preferable that the through metal body 10 has a cross-sectional area larger than the mounting area of the light emitting element mounted on the light emitting element wiring substrate 11, in particular, larger than the mounting area. By increasing the cross-sectional area, the heat radiating portion is increased and heat generated from the light emitting element can be quickly dissipated. In particular, the cross-sectional area is preferably 1.1 times, and more preferably 1.2 times.

さらに、貫通金属体10を、少なくとも金属材料とセラミック材料との複合体として同時焼成することが好ましい。複合体とすることにより、熱膨張係数を制御することが容易となり、例えば、貫通金属体10と絶縁基体1との熱膨張係数を近くすることが可能となり、貫通金属体10と絶縁基体1との熱膨張ミスマッチを防ぐことができる。特に、絶縁基体1と貫通金属体10との熱膨張係数差は4.0×10−6/℃以下が良く、更に好適には2.0×10−6/℃以下が良く、最も好適には1.0×10−6/℃以下が望ましい。 Furthermore, it is preferable that the through metal body 10 be co-fired as a composite of at least a metal material and a ceramic material. By using a composite, it becomes easy to control the thermal expansion coefficient. For example, the thermal expansion coefficient between the through metal body 10 and the insulating base 1 can be made close. Thermal expansion mismatch can be prevented. In particular, the difference in thermal expansion coefficient between the insulating substrate 1 and the through metal body 10 is preferably 4.0 × 10 −6 / ° C. or less, more preferably 2.0 × 10 −6 / ° C. or less, and most preferably. Is desirably 1.0 × 10 −6 / ° C. or less.

また、同時焼成することにより添加されたセラミック材料が絶縁基体1との接着強度を高めることができる。   Further, the ceramic material added by simultaneous firing can increase the adhesive strength with the insulating substrate 1.

そして、貫通金属体10に、電気回路としての機能を付与することが好ましい。導通端子が不要となり、発光素子用配線基板11の小型化が可能となる。   And it is preferable to provide the penetrating metal body 10 with a function as an electric circuit. A conduction terminal is not required, and the light emitting element wiring substrate 11 can be downsized.

そしてまた、貫通金属体10の少なくとも一方の端面を絶縁膜6で覆うことにより、外部端子との短絡が防止でき、また、発光装置をプリント板などに実装する際に貫通金属体10直下に配線を配すことが可能となるため機器の小型化に寄与する。   Further, by covering at least one end face of the through metal body 10 with the insulating film 6, a short circuit with the external terminal can be prevented, and when the light emitting device is mounted on a printed board or the like, the wiring is directly under the through metal body 10 Contributes to miniaturization of equipment.

また、絶縁膜を貫通金属体10の発光素子搭載側の端面を覆うように、形成することにより、発光素子電極間の短絡を防止でき、発光素子のフリップチップ実装を簡便にすることができる。   Further, by forming the insulating film so as to cover the end surface of the penetrating metal body 10 on the light emitting element mounting side, a short circuit between the light emitting element electrodes can be prevented, and the flip chip mounting of the light emitting element can be simplified.

また、絶縁基体1の40〜400℃における熱膨張係数が9〜18×10−6/℃であることが好ましい。これにより、9×10−6/℃以上の熱膨張係数を持つ汎用品のプリント基板への実装信頼性が向上でき、かつ9×10−6/℃以上の熱膨張係数を持つ貫通金属体10との接着信頼性を向上させることができる。特に熱膨張係数としては、10〜17×10−6/℃であることが好ましく、さらには12〜16×10−6/℃であることが好ましい。 Moreover, it is preferable that the thermal expansion coefficient in 40-400 degreeC of the insulating base | substrate 1 is 9-18 * 10 < -6 > / degreeC. As a result, the mounting reliability of a general-purpose product having a thermal expansion coefficient of 9 × 10 −6 / ° C. or more on a printed circuit board can be improved, and the through metal body 10 having a thermal expansion coefficient of 9 × 10 −6 / ° C. or more. Adhesion reliability can be improved. In particular, the coefficient of thermal expansion is preferably 10 to 17 × 10 −6 / ° C., and more preferably 12 to 16 × 10 −6 / ° C.

また、低温焼成セラミックスであっても、高強度を示すものを用いることが望ましい。   Further, it is desirable to use a low-temperature fired ceramic that exhibits high strength.

このような特性を発現する絶縁基体1としては、低温焼成セラミックスとして、例えば、特開2002−167265号公報や、特開2003−73163号公報に記載されている低温焼成セラミックスが好適に用いられる。   As the insulating substrate 1 that exhibits such characteristics, for example, low-temperature fired ceramics described in JP-A Nos. 2002-167265 and 2003-73163 are suitably used as low-temperature fired ceramics.

特開2002−167265号公報によれば、組成物中にクォーツ結晶を30〜60質
量%、特に35〜55質量%の割合で含有することが重要であり、これによって、低温焼成セラミックスの熱膨張係数を高めることができる。
According to Japanese Patent Laid-Open No. 2002-167265, it is important to contain a quartz crystal in the composition in a proportion of 30 to 60% by mass, particularly 35 to 55% by mass. The coefficient can be increased.

そして、絶縁基体1を作製するには、上記ガラスセラミック組成物に、適当な成形の有機樹脂バインダを添加した後、所望の成形手段、例えば、ドクターブレード、圧延法、金型プレス等によりシート状に任意の形状に成形後、成形のために配合した有機樹脂バインダ成分を700℃前後の大気雰囲気中で熱処理して除去する。この有機樹脂バインダ成分を効率よく除去するという観点から、成形体の収縮開始温度は700〜850℃程度であることが望ましい。   In order to produce the insulating substrate 1, an organic resin binder having an appropriate shape is added to the glass ceramic composition, and then a sheet shape is formed by a desired forming means such as a doctor blade, a rolling method, a die press, or the like. After forming into an arbitrary shape, the organic resin binder component blended for molding is removed by heat treatment in an air atmosphere at around 700 ° C. From the viewpoint of efficiently removing the organic resin binder component, the shrinkage start temperature of the molded body is desirably about 700 to 850 ° C.

焼成は、銅などの酸化しやすい金属と同時焼成する場合には850℃〜1050℃の非酸化性雰囲気中で行われ、これにより相対密度95%以上まで緻密化される。この時の焼成温度が850℃より低いと緻密化することができず、1050℃を越えるとメタライズ配線層との同時焼成でメタライズ層が溶融してしまう。   Firing is performed in a non-oxidizing atmosphere at 850 ° C. to 1050 ° C. when co-firing with a metal that is easily oxidized, such as copper, thereby densifying the material to a relative density of 95% or more. If the firing temperature at this time is lower than 850 ° C., it cannot be densified, and if it exceeds 1050 ° C., the metallized layer is melted by simultaneous firing with the metallized wiring layer.

なお、配線層として、銀などの酸化しにくい金属を用いた場合には大気中で焼成してもよいことは言うまでもない。   Needless to say, when a metal such as silver that is difficult to oxidize is used as the wiring layer, it may be fired in the air.

また上記ガラスセラミックスからなる絶縁基体1の表面に、Cuからなるメタライズ配線層3を配設した発光素子用配線基板11を製造するには、絶縁基体1を構成するための前述したようなガラスとセラミックス材料とからなる原料粉末に適当な有機バインダ、可塑剤、溶剤を添加混合して泥漿物を作るとともに該泥漿物をドクターブレード法やカレンダーロール法を採用することによってグリーンシート(生シート)を作製する。   In order to manufacture the light emitting element wiring substrate 11 in which the metallized wiring layer 3 made of Cu is disposed on the surface of the insulating base 1 made of the glass ceramic, the glass as described above for forming the insulating base 1 is used. Add a suitable organic binder, plasticizer and solvent to the raw material powder made of ceramic material to make a slurry, and then apply the doctor blade method or calendar roll method to produce a green sheet (raw sheet). Make it.

そして、メタライズ配線層3及び外部電極端子5用として、表面に金属酸化物が被覆されたCu粉末と有機バインダ、可塑剤、溶剤を加えて混合しメタライズペーストを作製する。なお、Cu粉末表面への被覆層の形成は、メッキ法、スパッタリング法などによって形成することができる。   Then, for the metallized wiring layer 3 and the external electrode terminal 5, a Cu powder coated with a metal oxide on the surface, an organic binder, a plasticizer, and a solvent are added and mixed to prepare a metallized paste. The coating layer can be formed on the surface of the Cu powder by a plating method, a sputtering method, or the like.

そして、このメタライズペーストをグリーンシートに周知のスクリーン印刷法により所定パターンに印刷塗布する。また、場合によっては、グリーンシートに適当な打ち抜き加工してスルーホールを形成し、このホール内にも貫通導体7となるメタライズペーストを充填する。そしてこれらのグリーンシートを複数枚積層する。   Then, this metallized paste is printed on a green sheet in a predetermined pattern by a well-known screen printing method. In some cases, the green sheet is appropriately punched to form a through hole, and this hole is also filled with a metallized paste that becomes the through conductor 7. A plurality of these green sheets are laminated.

その後、この積層体を500〜700℃の水蒸気を含有する窒素雰囲気中で熱処理して有機樹脂バインダを除去した後に、850℃〜1050℃の窒素などの非酸化性雰囲気中で焼成して、絶縁基体1が相対密度95%以上まで緻密化されるまで焼成する。   Thereafter, the laminate is heat-treated in a nitrogen atmosphere containing water vapor at 500 to 700 ° C. to remove the organic resin binder, and then fired in a non-oxidizing atmosphere such as nitrogen at 850 ° C. to 1050 ° C. for insulation. Baking until the substrate 1 is densified to a relative density of 95% or more.

その後、発光素子用配線基板11の表面のメタライズ配線層3の表面に、電解めっき法や無電解めっき法によってCu、Ag、Au、Niなどのめっき層を形成することによって、本発明の発光素子用配線基板11を完成することができる。   Thereafter, a plating layer of Cu, Ag, Au, Ni, or the like is formed on the surface of the metallized wiring layer 3 on the surface of the wiring substrate 11 for the light emitting element by an electrolytic plating method or an electroless plating method, whereby the light emitting element of the present invention. The wiring board 11 can be completed.

そして、このような絶縁基体1の表面あるいは内部に、接続端子3、外部電極端子5、貫通導体7、貫通金属体10を形成することで、発光素子用配線基板11に配線回路を形成することができる。かかる貫通金属体10は、セラミックグリーンシートと、金属材料とセラミック材料からなり、セラミックグリーンシートと実質的に同一厚みの金属シートを作製する工程と、セラミックグリーンシートの所定箇所に貫通孔を形成する工程と、貫通孔を形成したセラミックグリーンシートに金属シートを積層する工程と、セラミックグリーンシートにおける貫通孔形成部分を金属シート側から押圧することによって、金属シートの一部を貫通孔内に埋め込み、セラミックグリーンシートと金属シートとを一体化し
た。
A wiring circuit is formed on the wiring board 11 for the light emitting element by forming the connection terminal 3, the external electrode terminal 5, the through conductor 7, and the through metal body 10 on the surface or inside of the insulating base 1. Can do. The through metal body 10 is made of a ceramic green sheet, a metal material, and a ceramic material. The through metal body 10 includes a step of producing a metal sheet having substantially the same thickness as the ceramic green sheet, and a through hole is formed at a predetermined position of the ceramic green sheet. A step of laminating a metal sheet on a ceramic green sheet in which a through hole is formed, and by pressing a through hole forming portion in the ceramic green sheet from the metal sheet side, a part of the metal sheet is embedded in the through hole, A ceramic green sheet and a metal sheet were integrated.

そして、これらの配線回路に用いる導体および貫通金属体を、Cu、Ag、Auのうち少なくとも1種を主成分として形成することで、絶縁基体1と同時焼成して、接続端子3、外部電極端子5、貫通導体7、貫通金属体10を形成することが可能となり、安価な発光素子用配線基板11を得ることができる。   Then, the conductor and the penetrating metal body used for these wiring circuits are formed by using at least one of Cu, Ag, and Au as a main component, and are fired simultaneously with the insulating base 1, thereby connecting terminals 3 and external electrode terminals. 5, the through conductor 7 and the through metal body 10 can be formed, and an inexpensive light emitting element wiring substrate 11 can be obtained.

また、接続端子3および貫通金属体10の表面にAlやAgめっきを施すことにより、反射率を向上させることができる。   In addition, the reflectance can be improved by applying Al or Ag plating to the surfaces of the connection terminal 3 and the through metal body 10.

また、発光素子用配線基板11の主面に形成された、絶縁基体1と貫通金属体10との境界を、金属、セラミック、樹脂のうち少なくとも1種を主成分とする被覆層により被覆することが望ましい。これらの被覆層で金属体と絶縁基体との間を被覆することにより熱膨張差を緩衝し、絶縁基体1と貫通金属体10との境界でのクラックの発生を抑制できる。   Further, the boundary between the insulating base 1 and the penetrating metal body 10 formed on the main surface of the light emitting element wiring substrate 11 is covered with a coating layer mainly composed of at least one of metal, ceramic, and resin. Is desirable. By covering between the metal body and the insulating substrate with these coating layers, the difference in thermal expansion can be buffered, and the occurrence of cracks at the boundary between the insulating substrate 1 and the penetrating metal body 10 can be suppressed.

また、発光素子用配線基板11の搭載部9の主面に、発光素子を収納するための枠体13を設けることが好ましい。これによって、発光素子を保護できるとともに、発光素子21の周辺に蛍光体などを容易に配置することができ、枠体により発光素子の発する光を反射させて所定の方向に誘導することも可能である。   Further, it is preferable to provide a frame 13 for housing the light emitting element on the main surface of the mounting portion 9 of the wiring board 11 for the light emitting element. As a result, the light emitting element can be protected, and a phosphor or the like can be easily arranged around the light emitting element 21, and the light emitted from the light emitting element can be reflected by the frame and guided in a predetermined direction. is there.

また、枠体13を、セラミックスにより形成することで、絶縁基体1と枠体13とを同時焼成することができ、工程が簡略化されるため、安価な発光素子用配線基板11を容易に作製することができる。また、セラミックスは耐熱性、耐湿性に優れているため、長期間の使用や、悪条件での使用にも、優れた耐久性を有する発光素子用配線基板11となる。   Moreover, since the frame 13 is formed of ceramics, the insulating substrate 1 and the frame 13 can be fired at the same time, and the process is simplified. Therefore, the inexpensive light-emitting element wiring substrate 11 is easily manufactured. can do. In addition, since ceramics are excellent in heat resistance and moisture resistance, the light emitting element wiring substrate 11 has excellent durability even when used for a long period of time or under adverse conditions.

また、安価で、加工性に優れた金属により枠体13を形成することで、複雑な形状の枠体13であっても、容易に安価に製造することができ、安価な発光素子用配線基板11を供給することができる。この金属製の枠体13は、例えば、AlやFe−Ni−Co合金等などにより好適に形成することができる。また、枠体13の表面には、Ni、Au、Agなどからなるめっき層(図示せず)を形成してもよい。   In addition, by forming the frame body 13 from a metal that is inexpensive and excellent in workability, even the frame body 13 having a complicated shape can be easily manufactured at low cost, and an inexpensive wiring board for a light-emitting element. 11 can be supplied. This metal frame 13 can be suitably formed by Al, Fe-Ni-Co alloy, etc., for example. Further, a plating layer (not shown) made of Ni, Au, Ag or the like may be formed on the surface of the frame 13.

なお、このように枠体13を金属により形成する場合には、この金属層17と枠体13とを、例えば、エポキシ樹脂などからなる接着剤を介して、接合することができる。   In addition, when forming the frame 13 with a metal in this way, the metal layer 17 and the frame 13 can be joined via an adhesive made of, for example, an epoxy resin.

そして、以上説明した本発明の発光素子用配線基板1に、例えば、図2(a)に示すように発光素子21として、LEDチップ21などを搭載し、ボンディングワイヤ23により発光素子21に給電することにより、発光素子21を機能させることができ、発光素子21からの発熱を貫通金属体10から速やかに放出することができるため、ヒートシンク等の放熱部材が不要となり、実装される電気機器の小型化に寄与できるとともに、熱膨張係数をプリント基板に近いものとすることにより、プリント基板やモールド材との熱膨張係数のミスマッチを抑制できるため、接合信頼性の高い発光装置25ができる。なお、ヒートシンクを設けることで、更に放熱性が向上することはもちろんであり、例えば、ヒートシンクのような冷却装置を設けることを排除するものではない。   Then, for example, as shown in FIG. 2A, an LED chip 21 or the like is mounted on the light emitting element wiring substrate 1 of the present invention described above as a light emitting element 21, and power is supplied to the light emitting element 21 through the bonding wire 23. Thus, the light emitting element 21 can be made to function, and the heat generated from the light emitting element 21 can be quickly released from the through metal body 10, so that a heat radiating member such as a heat sink is not necessary, and the mounted electric apparatus is small. By making the thermal expansion coefficient close to that of the printed circuit board, it is possible to suppress mismatch of the thermal expansion coefficient with the printed circuit board and the molding material, and thus the light emitting device 25 with high bonding reliability can be obtained. In addition, by providing a heat sink, it is needless to say that heat dissipation is further improved, and for example, provision of a cooling device such as a heat sink is not excluded.

また、発光素子用配線基板11に形成された搭載部9に、例えば発光素子21として、LEDチップ21などを搭載し、ボンディングワイヤ23により、LEDチップ21と接続端子3と電気的に接続して、給電することにより、発光素子21の放射する光を絶縁基体1や枠体13に反射させ、所定の方向へと誘導することができるため、高効率の発光装
置25となる。また、絶縁基体1並びに枠体13の熱伝導率が高いため、発光素子21からの発熱を速やかに放出することができ、発熱による輝度低下を抑制できる。
Further, an LED chip 21 or the like is mounted on the mounting portion 9 formed on the light emitting element wiring substrate 11 as, for example, the light emitting element 21, and the LED chip 21 and the connection terminal 3 are electrically connected by the bonding wire 23. By supplying power, the light emitted from the light emitting element 21 can be reflected by the insulating base 1 and the frame 13 and guided in a predetermined direction, so that the highly efficient light emitting device 25 is obtained. Further, since the thermal conductivity of the insulating base 1 and the frame 13 is high, heat generated from the light emitting element 21 can be quickly released, and a reduction in luminance due to heat generation can be suppressed.

また、図2(b)に示すように、発光素子21を搭載した側の発光素子用配線基板1の主面1aに、枠体13を搭載した発光装置25では、枠体13の内側に発光素子21を収納することで、容易に発光素子21を保護することができる。   In addition, as shown in FIG. 2B, in the light emitting device 25 in which the frame body 13 is mounted on the main surface 1 a of the light emitting element wiring substrate 1 on the side where the light emitting element 21 is mounted, light is emitted inside the frame body 13. By storing the element 21, the light emitting element 21 can be easily protected.

なお、図2(a)、(b)に示した例では、発光素子21は、接着剤29により発光素子用配線基板1に固定され、電力の供給はワイヤボンド23によりなされているが、発光素子用配線基板1との接続形態は、フリップチップ接続であってもよいことは言うまでもない。   In the example shown in FIGS. 2A and 2B, the light emitting element 21 is fixed to the light emitting element wiring substrate 1 with an adhesive 29, and power is supplied by the wire bond 23. Needless to say, the connection form with the element wiring board 1 may be flip-chip connection.

また、発光素子21は、モールド材31により被覆されているが、モールド材31を用いずに、蓋体(図示せず)を用いて封止してもよく、また、モールド材31と蓋体とを併用してもよい。蓋体を用いる場合であって、発光素子21を用いる場合には蓋体は、ガラスなどの透光性の素材を用いることが望ましい。   Moreover, although the light emitting element 21 is covered with the molding material 31, it may be sealed using a lid (not shown) without using the molding material 31, or the molding material 31 and the lid. And may be used in combination. In the case where the lid is used, and the light emitting element 21 is used, it is desirable that the lid is made of a translucent material such as glass.

なお、発光素子21を搭載する場合には、必要に応じて、このモールド材31に発光素子21が放射する光を波長変換するための蛍光体(図示せず)を添加してもよい。   In addition, when mounting the light emitting element 21, you may add the fluorescent substance (not shown) for wavelength-converting the light which the light emitting element 21 radiates | emits to this molding material 31 as needed.

なお、絶縁基体1が多層に積層されている形態であってもよいことは勿論である。   Needless to say, the insulating substrate 1 may be laminated in multiple layers.

発光素子用配線基板の原料粉末として、純度99%以上、平均粒径5μmのクォーツ粉末30質量%、純度99%以上、平均粒系3μmのSiO 29質量%−BaO 64質量%−B 3%−Al 3質量%−CaO 1質量%の組成を有するガラス粉末70質量%、を混合し、有機バインダを添加して、十分に混合した後、成形用有機樹脂(バインダ)としてアクリル系バインダと、トルエンを溶媒として混合し、スラリーを調整した。しかる後に、ドクターブレード法にて組成1の絶縁基体用グリーンシートを作製した。 As a raw material powder for a wiring board for a light-emitting element, a quartz powder having a purity of 99% or more and an average particle size of 5 μm is 30% by mass, a purity of 99% or more and an average grain size of 3 μm is SiO 2 29% by mass—BaO 64% by mass—B 2 O 3 3% -Al 2 O 3 3% by mass-CaO 1% by mass of glass powder 70% by mass, and after adding an organic binder and mixing well, an organic resin for molding (binder) A slurry was prepared by mixing an acrylic binder and toluene as a solvent. Thereafter, a green sheet for an insulating substrate having composition 1 was produced by a doctor blade method.

また、純度99%以上、平均粒系3μmのSiO 50質量%−Al 5質量%−MgO 20質量%−CaO 25質量%の組成を有する結晶性のガラス粉末60質量%と、無機フィラーとして、純度99%以上、平均粒径2μmのアルミナ40質量%を混合し、上記と同様の方法で組成2のセラミックグリーンシートを作製した。 Moreover, 60% by mass of a crystalline glass powder having a composition of purity 99% or more, SiO 2 50% by mass—Al 2 O 3 5% by mass—MgO 20% by mass—CaO 25% by mass with an average grain size of 3 μm, inorganic As the filler, 40% by mass of alumina having a purity of 99% or more and an average particle diameter of 2 μm was mixed, and a ceramic green sheet having composition 2 was produced in the same manner as described above.

一方、平均粒径が5μmのCu、Ag、Au粉末、およびセラミック材料として平均粒子径5μmのガラス粉末を表1のように混合し、アクリル系バインダと混錬し、導体ペーストを調整した。   On the other hand, Cu, Ag, Au powder having an average particle diameter of 5 μm and glass powder having an average particle diameter of 5 μm as a ceramic material were mixed as shown in Table 1 and kneaded with an acrylic binder to prepare a conductor paste.

そして、また、導体ペーストと同様の金属とセラミック材料とを導体ペーストと同様の割合で混合し、さらに、成形用有機樹脂(バインダ)としてアクリル系バインダと、トルエンを溶媒として混合し、スラリーを調整した。しかる後に、ドクターブレード法にてセラミックグリーンシートと略同一厚みの金属シートを作製した。   Then, the same metal and ceramic material as the conductor paste are mixed in the same ratio as the conductor paste, and further, an acrylic binder as a molding organic resin (binder) and toluene as a solvent are mixed to prepare a slurry. did. Thereafter, a metal sheet having substantially the same thickness as the ceramic green sheet was produced by a doctor blade method.

そして、上記のセラミックグリーンシートに対して、打ち抜き加工を施し、直径が100μmのビアホールを形成し、このビアホール内に、導体ペーストをスクリーン印刷法によって充填するとともに、配線パターン状に印刷塗布した。   The ceramic green sheet was punched to form a via hole having a diameter of 100 μm. The via hole was filled with a conductive paste by a screen printing method and printed and applied in a wiring pattern.

そして、セラミックグリーンシートの所定箇所に貫通孔を形成し、セラミックグリーン
シートにおける貫通孔形成部分を金属シートから押圧することによって、金属シートの一部を貫通孔内に埋め込み、セラミックグリーンシートと金属シートとを一体化して、貫通金属体となる金属シートをセラミックグリーンシートに埋め込んだ。
Then, a through hole is formed at a predetermined position of the ceramic green sheet, and a part of the metal sheet is embedded in the through hole by pressing a through hole forming portion of the ceramic green sheet from the metal sheet. The ceramic green sheet and the metal sheet And a metal sheet to be a through metal body was embedded in a ceramic green sheet.

このようにして作製した金属シートや導体ペーストを具備するセラミックグリーンシートを組み合わせ、位置合わせし、積層圧着し、外形10mm×10mm×厚み0.6mmの積層体を作製した。そして、窒素水蒸気混合雰囲気にて脱脂を行った後、引き続き、900℃の最高温度で1時間焼成した。そして、絶縁基体の一方の主面に接続端子を形成し、他方の主面に外部電極端子を形成し、両者を貫通導体で接続した発光素子用配線基板を作製した。その後、接続端子並びに外部電極端子の表面にNi、AuおよびAgめっきを順次施した。   The thus produced metal sheet and ceramic green sheet comprising the conductor paste were combined, aligned, and laminated and pressure-bonded to produce a laminate having an outer shape of 10 mm × 10 mm × thickness of 0.6 mm. And after performing degreasing | defatting in nitrogen steam mixed atmosphere, it baked at the highest temperature of 900 degreeC continuously for 1 hour. Then, a connection terminal was formed on one main surface of the insulating base, an external electrode terminal was formed on the other main surface, and a light-emitting element wiring board in which both were connected by a through conductor was produced. Thereafter, Ni, Au and Ag plating were sequentially applied to the surfaces of the connection terminal and the external electrode terminal.

なお、一部の試料については、焼成した後で、絶縁基体1と貫通金属体8との境界にエポキシ樹脂を塗布し、150℃、1時間の条件で硬化させ、約20μmの厚みの被覆層を形成した。   For some samples, after firing, an epoxy resin was applied to the boundary between the insulating substrate 1 and the penetrating metal body 8 and cured under conditions of 150 ° C. for 1 hour, and a coating layer having a thickness of about 20 μm. Formed.

さらに、一部の発光素子用配線基板について、搭載部が形成された側には、10mm×10mm×2mmの外形寸法を有し、絶縁基体と接する側の内径が4mm、逆側の内径が8mmのテーパー状の貫通穴を有する絶縁基体と同様の材質からなる枠体、あるいは金属製の枠体を形成した。   Further, some of the wiring boards for light emitting elements have an outer dimension of 10 mm × 10 mm × 2 mm on the side where the mounting portion is formed, the inner diameter on the side in contact with the insulating base is 4 mm, and the inner diameter on the opposite side is 8 mm. A frame made of the same material as the insulating substrate having a tapered through hole or a metal frame was formed.

なお、枠体を絶縁基体と同じ材質で形成した発光素子用配線基板については、絶縁基体と枠体とをグリーンシートにて一体物として形成し、同時焼成を行って作製した。   The light-emitting element wiring board in which the frame body was formed of the same material as the insulating base body was manufactured by forming the insulating base body and the frame body as a single body with a green sheet and performing simultaneous firing.

また、金属製の枠体としては、熱膨張係数が23×10−6/℃、熱伝導率が238W/m・KのAl製金属枠体と、熱膨張係数が6×10−6/℃、熱伝導率が17W/m・KのFe−Ni−Co合金製金属枠体とを用いた。 Moreover, as a metal frame, an Al metal frame having a thermal expansion coefficient of 23 × 10 −6 / ° C. and a thermal conductivity of 238 W / m · K, and a thermal expansion coefficient of 6 × 10 −6 / ° C. A metal frame made of Fe—Ni—Co alloy having a thermal conductivity of 17 W / m · K was used.

また、金属製の枠体を設けた発光素子用配線基板については、絶縁基体の搭載部側にガラスにて、枠体を接合して作製した。   The light emitting element wiring board provided with the metal frame was manufactured by bonding the frame to the mounting portion side of the insulating base with glass.

これらの発光素子用配線基板に接着剤としてエポキシ樹脂を用いて出力1.5Wの発光素子であるLEDチップを搭載部に実装し、ボンディングワイヤによりLEDチップと接続端子とを結線し、さらに、LEDチップと接続端子とを熱膨張係数が40×10−6/℃のエポキシ樹脂からなるモールド材で覆い、発光装置を得た。 An LED chip, which is a light emitting element with an output of 1.5 W, is mounted on the mounting part using an epoxy resin as an adhesive on these wiring boards for light emitting elements, and the LED chip and the connection terminal are connected by a bonding wire. The chip and the connection terminal were covered with a mold material made of an epoxy resin having a thermal expansion coefficient of 40 × 10 −6 / ° C. to obtain a light emitting device.

得られた発光装置を、−55℃〜125℃の温度サイクル試験を3000サイクルまで行い、試験後、貫通金属体と絶縁基体間の接着界面の剥離状況を確認した。   The obtained light-emitting device was subjected to a temperature cycle test of −55 ° C. to 125 ° C. up to 3000 cycles. After the test, the peeling state of the adhesion interface between the through metal body and the insulating substrate was confirmed.

また、発光装置に0.4Aの電流を通電し、全放射束測定を行った。   Further, a current of 0.4 A was applied to the light emitting device, and the total radiant flux was measured.

また、絶縁基体及び貫通金属体の熱伝導率はレーザーフラッシュ法により測定し、熱膨張係数はTMAにより、25〜400℃の範囲で測定した。   Moreover, the thermal conductivity of the insulating substrate and the through metal body was measured by a laser flash method, and the thermal expansion coefficient was measured in the range of 25 to 400 ° C. by TMA.

金属製枠体付きは、Al並びにFe−Ni−Co合金をエポキシ樹脂を用いて、150℃、1時間の条件で接合した。   With the metal frame, Al and Fe-Ni-Co alloy were joined using an epoxy resin at 150 ° C for 1 hour.

以上の工程により作製した発光素子用配線基板の特性と、試験結果を表1に示す。

Figure 0004780939
Table 1 shows the characteristics and test results of the light-emitting element wiring substrate manufactured through the above steps.
Figure 0004780939

表1に示すように、貫通金属体がない試料No.5は、貫通金属体による熱放散がないため、発光装置に通電した際に発生するLEDチップからの熱を十分に放散することができず、他の試料と比較すると特性は劣るものの、配線層に起因する発熱が小さく、しかも反射率が高いため、十分実用に耐えるものであった。   As shown in Table 1, sample no. 5 does not dissipate heat due to the penetrating metal body, and therefore cannot sufficiently dissipate heat from the LED chip generated when the light emitting device is energized, and although the characteristics are inferior to other samples, the wiring layer Because of the small heat generation due to the above and high reflectivity, it was sufficiently practical.

一方、試料No.1〜4、6〜13は、LEDチップの過剰な加熱がなく、非常に高い発光効率を実現することができた。   On the other hand, sample No. In 1-4, 6-13, there was no excessive heating of the LED chip, and very high luminous efficiency could be realized.

特に、枠体を形成した試料No.1〜4、6〜9、12および13では、枠体を設けなかった場合に比べ、光特性がさらに向上した。   In particular, Sample No. with a frame was formed. In 1-4, 6-9, 12 and 13, the optical characteristics were further improved compared to the case where no frame was provided.

試料No.1〜13において貫通金属体と絶縁基体との間には、クラックが全くなく、優れた信頼性を有することがわかる。なお、試料No.6、7は参考試料である。   Sample No. 1 to 13, it can be seen that there are no cracks between the penetrating metal body and the insulating substrate, and that there is excellent reliability. Sample No. Reference numerals 6 and 7 are reference samples.

(a)は、発光素子用配線基板の断面図であり、(b)は、枠体を設けた発光素子用配線基板の断面図である。(A) is a cross-sectional view of a wiring substrate emitting light element, (b) are cross-sectional views of a wiring substrate emitting light device having a frame body. (a)は、本発明の発光装置の断面図であり、(b)は、枠体を設けた本発明の発光装置の断面図である。(A) is sectional drawing of the light-emitting device of this invention, (b) is sectional drawing of the light-emitting device of this invention which provided the frame.

1・・・絶縁基体
3・・・接続端子
5・・・外部電極端子
7・・・貫通導体
10・・・貫通金属体
11・・・発光素子用配線基板
13・・・枠体
13a・・・枠体の内壁面
21・・・発光素子
25・・・発光装置
31・・・モールド材
DESCRIPTION OF SYMBOLS 1 ... Insulation base | substrate 3 ... Connection terminal 5 ... External electrode terminal 7 ... Penetration conductor 10 ... Penetration metal body 11 ... Wiring board 13 for light emitting elements ... Frame body 13a ... -Inner wall surface 21 of the frame body ... Light emitting element 25 ... Light emitting device 31 ... Mold material

Claims (7)

低温焼成セラミックスからなる平板状の絶縁基体と該絶縁基体の表面又は内部のうち少なくとも一方に形成された導体層と前記絶縁基体の一方の主面に設けられた発光素子を搭載する搭載部とを有す発光素子用配線基板と、
該発光素子用配線基板の前記搭載部に搭載された発光素子と、を具備してなり、
前記搭載部の直下に前記絶縁基体を貫通して設けられ、Cu、Ag、Auのうち少なくとも1種を主成分とし、前記絶縁基体よりも高い熱伝導率を有し、前記発光素子の搭載面積以上の断面積を有する塊状の貫通金属体が、前記絶縁基体と同時焼成されてなるとともに、前記発光素子用配線基板の主面に形成された前記絶縁基体と前記貫通金属体との境界が、金属を主成分とする被覆層により被覆されていることを特徴とする発光装置
A mounting portion for mounting a light emitting element provided on one main surface of the low temperature sintering made of a ceramic plate-shaped insulating substrate and the insulating substrate surface or at least one which is formed on the conductive layer and before Symbol insulating base of the internal a light emitting element wiring board that have a,
A light emitting element mounted on the mounting portion of the light emitting element wiring substrate,
The light-emitting element mounting area is provided directly below the mounting portion, penetrating the insulating base, has at least one of Cu, Ag, and Au as a main component and has a higher thermal conductivity than the insulating base. The massive penetrating metal body having the above cross-sectional area is fired simultaneously with the insulating base, and the boundary between the insulating base and the penetrating metal body formed on the main surface of the wiring board for light emitting element is A light-emitting device which is covered with a coating layer containing a metal as a main component .
前記貫通金属体が、少なくとも金属材料とセラミック材料との複合体であることを特徴とする請求項1に記載の発光装置The light-emitting device according to claim 1, wherein the through metal body is a composite of at least a metal material and a ceramic material. 前記貫通金属体が、少なくとも電気回路の一部を形成してなることを特徴とする請求項1又は2に記載の発光装置The light-emitting device according to claim 1, wherein the through metal body forms at least a part of an electric circuit. 前記貫通金属体の少なくとも一方の端面が絶縁膜で覆われていることを特徴とする請求項1乃至3のうちいずれかに記載の発光装置The light-emitting device according to claim 1, wherein at least one end face of the through metal body is covered with an insulating film. 前記絶縁基体の40〜400℃における熱膨張係数が9〜18×10−6/℃であることを特徴とする請求項1乃至4のうちいずれかに記載の発光装置5. The light-emitting device according to claim 1, wherein the insulating base has a thermal expansion coefficient of 9 to 18 × 10 −6 / ° C. at 40 to 400 ° C. 5. 前記導体層がCu、Ag、Auのうち少なくとも1種を主成分とすることを特徴とする請求項1乃至5のうちいずれかに記載の発光装置6. The light emitting device according to claim 1, wherein the conductor layer contains at least one of Cu, Ag, and Au as a main component. 前記発光素子用配線基板の搭載部が形成された側の主面に、前記発光素子を収容するための枠体が形成されてなることを特徴とする請求項1乃至のうちいずれかに記載の発光装置The frame body for accommodating the said light emitting element is formed in the main surface at the side in which the mounting part of the said wiring board for light emitting elements was formed, The Claim 1 thru | or 6 characterized by the above-mentioned. Light-emitting device .
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