JP4772228B2 - 発光装置の作製方法 - Google Patents
発光装置の作製方法 Download PDFInfo
- Publication number
- JP4772228B2 JP4772228B2 JP2001223863A JP2001223863A JP4772228B2 JP 4772228 B2 JP4772228 B2 JP 4772228B2 JP 2001223863 A JP2001223863 A JP 2001223863A JP 2001223863 A JP2001223863 A JP 2001223863A JP 4772228 B2 JP4772228 B2 JP 4772228B2
- Authority
- JP
- Japan
- Prior art keywords
- conductive layer
- tft
- layer
- insulating film
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001223863A JP4772228B2 (ja) | 2000-07-31 | 2001-07-25 | 発光装置の作製方法 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000232431 | 2000-07-31 | ||
| JP2000-232431 | 2000-07-31 | ||
| JP2000232431 | 2000-07-31 | ||
| JP2001223863A JP4772228B2 (ja) | 2000-07-31 | 2001-07-25 | 発光装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002141168A JP2002141168A (ja) | 2002-05-17 |
| JP2002141168A5 JP2002141168A5 (https=) | 2008-09-11 |
| JP4772228B2 true JP4772228B2 (ja) | 2011-09-14 |
Family
ID=26597116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001223863A Expired - Fee Related JP4772228B2 (ja) | 2000-07-31 | 2001-07-25 | 発光装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4772228B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3778176B2 (ja) | 2002-05-28 | 2006-05-24 | セイコーエプソン株式会社 | 発光装置および電子機器 |
| WO2004086343A1 (ja) * | 2003-03-26 | 2004-10-07 | Semiconductor Energy Laboratory Co., Ltd. | 素子基板及び発光装置 |
| JP2009010242A (ja) * | 2007-06-29 | 2009-01-15 | Mitsubishi Electric Corp | 表示装置及びその製造方法 |
| CN112396745B (zh) * | 2019-07-30 | 2023-09-19 | 中移物联网有限公司 | 一种闸机控制方法及电子设备 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6462722B1 (en) * | 1997-02-17 | 2002-10-08 | Seiko Epson Corporation | Current-driven light-emitting display apparatus and method of producing the same |
| US5952789A (en) * | 1997-04-14 | 1999-09-14 | Sarnoff Corporation | Active matrix organic light emitting diode (amoled) display pixel structure and data load/illuminate circuit therefor |
| JP3282582B2 (ja) * | 1998-04-21 | 2002-05-13 | 日本電気株式会社 | トップゲート型薄膜トランジスタ及びその製造方法 |
| JP3883706B2 (ja) * | 1998-07-31 | 2007-02-21 | シャープ株式会社 | エッチング方法、及び薄膜トランジスタマトリックス基板の製造方法 |
| JP4008133B2 (ja) * | 1998-12-25 | 2007-11-14 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
2001
- 2001-07-25 JP JP2001223863A patent/JP4772228B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002141168A (ja) | 2002-05-17 |
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