JP4752648B2 - Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element - Google Patents

Description

  The present invention relates to a radiation-sensitive composition for forming a colored layer, a color filter, and a color liquid crystal display element. More specifically, the present invention relates to a color filter used for a transmissive or reflective color liquid crystal display device, a color imaging tube element, and the like. The present invention relates to a radiation-sensitive composition used for forming a colored layer useful for production, a color filter having a colored layer formed from the radiation-sensitive composition, and a color liquid crystal display device including the color filter.

Conventionally, in producing a color filter using a colored radiation-sensitive composition, after applying the colored radiation-sensitive composition on a substrate or a substrate on which a light-shielding layer having a desired pattern has been formed and drying, A method of obtaining pixels of each color by irradiating a dry coating film with a desired pattern shape (hereinafter referred to as “exposure”) and developing it is known (see, for example, Patent Document 1 and Patent Document 2). ing.
In recent years, in the technical field of color filters, the trend to shorten the tact time by lowering the exposure amount has become the mainstream, and the formation of finer patterns reflecting the higher definition of liquid crystal display elements. However, with conventional colored radiation-sensitive compositions, pattern edges are easily chipped and undercut during development, so that pixels with a good pattern shape and a black matrix are obtained while shortening the tact time. However, it is not always sufficient to form a high-definition pattern.

JP-A-2-144502 JP-A-3-53201

  The problem of the present invention is that the radiation-sensitive composition for forming a colored layer exhibiting excellent developability, more specifically, no undissolved material remains during development or scum is generated at the pattern edge, Another object of the present invention is to provide a novel radiation-sensitive composition for forming a colored layer, which can provide a pixel and a black matrix that do not cause pattern edge chipping and undercut even at low exposure, and can form a fine pattern.

〔式（１）において、各Ｘは相互に独立に下記式（２）または式（３）で表される２価の基を示し、各Ｙは相互に独立にカルボキシル基を４個有する有機化合物のカルボキシル基を除いた残基を示し、各Ｒ ¹ は相互に独立に水素原子またはメチル基を示し、各Ｒ ² は相互に独立に水素原子またはカルボキシル基封鎖剤残基を示し、ｎは１〜４０の整数である。但し、式中の＊印を付した２つの結合手は相互に直接結合している。

〕
本発明でいう「着色層」とは、カラーフィルタに用いられる画素および／またはブラックマトリックスからなる層を意味する。 The present invention, first,
A radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photoradical generator, wherein (B) the alkali-soluble resin , colored layer forming a radiation-sensitive composition characterized by comprising a polyester you express the following formula (1), made of.

[In the formula (1), each X independently represents a divalent group represented by the following formula (2) or (3), and each Y independently represents an organic compound having four carboxyl groups. Each R ¹ independently represents a hydrogen atom or a methyl group, each R ² independently represents a hydrogen atom or a carboxyl group-blocking residue, and n is 1 It is an integer of ~ 40. However, the two bonds marked with * in the formula are directly connected to each other.

]
The “colored layer” in the present invention means a layer composed of pixels and / or a black matrix used for a color filter.

The present invention secondly,
It consists of a color filter having a colored layer formed from the radiation-sensitive composition for forming the colored layer.

Third, the present invention
A color liquid crystal display element comprising the color filter;

Hereinafter, the present invention will be described in detail.
Radiation-sensitive composition for forming colored layer- component (A)-
The color tone of the colorant, which is the component (A) in the present invention, is not particularly limited, and is appropriately selected according to the use of the obtained color filter, and may be any of a pigment, a dye, or a natural pigment.
Since the color filter is required to have high-definition color development and heat resistance, the colorant in the present invention is preferably a colorant having high color developability and high heat resistance, in particular, a colorant having high heat decomposition resistance. Organic pigments or inorganic pigments are used, and organic pigments and carbon black are particularly preferably used.
Examples of the organic pigment include a color index (CI; The Society of Dyers).
and Colourists, Inc.), and compounds having a color index (CI) number as shown below can be mentioned.

CI Pigment Yellow 1, CI Pigment Yellow 3, CI Pigment Yellow 12, CI Pigment Yellow 13, CI Pigment Yellow 14, CI Pigment Yellow 15, CI Pigment Yellow 16, CI Pigment Yellow 17, CI Pigment Yellow 20, CI Pigment Yellow 24, CI Pigment Yellow 31, CI Pigment Yellow 55, CI Pigment Yellow 60, CI Pigment Yellow 61, CI Pigment Yellow 65, CI Pigment Yellow 71, CI Pigment Yellow 73, CI Pigment Yellow 74, CI Pigment Yellow 81, CI Pigment Yellow 83, CI Pigment Yellow 93, CI Pigment Yellow 95, CI Pigment Yellow 97, CI Pigment Yellow 98, CI Pigment Yellow 100, CI CI Pigment Yellow 101, CI Pigment Yellow 104, CI Pigment Yellow 106, CI Pigment Yellow 108, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 113, CI Pigment Yellow 114, CI Pigment Yellow 116, CI Pigment Yellow 117, CI Pigment Yellow 119, CI Pigment Yellow 120, CI Pigment Yellow 126, CI Pigment Yellow 127, CI Pigment Yellow 128, CI Pigment Yellow 129, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 151, CI Pigment Yellow 152, CI Pigment Yellow 153, CI Pigment Yellow 154, CI Pigment ...... DOO Yellow 155, C.I Pigment Yellow 156, C.I Pigment Yellow 166, C.I Pigment Yellow 168, C.I Pigment Yellow 175, C.I Pigment Yellow 180, C.I Pigment Yellow 185;

CI Pigment Orange 1, CI Pigment Orange 5, CI Pigment Orange 13, CI Pigment Orange 14, CI Pigment Orange 16, CI Pigment Orange 17, CI Pigment Orange 24, CI Pigment Orange 34, CI Pigment Orange 36, CI Pigment Orange 38, CI Pigment Orange 40, CI Pigment Orange 43, CI Pigment Orange 46, CI Pigment Orange 49, CI Pigment Orange 51, CI Pigment Orange 61, CI Pigment Orange 63, CI Pigment Orange 64, CI Pigment Orange 71, CI Pigment Orange 73;
CI Pigment Violet 1, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29, CI Pigment Violet 32, CI Pigment Violet 36, CI Pigment Violet 38;

CI Pigment Red 1, CI Pigment Red 2, CI Pigment Red 3, CI Pigment Red 4, CI Pigment Red 5, CI Pigment Red 6, CI Pigment Red 7, CI Pigment Red 8, CI Pigment Red 9, CI Pigment Red 10, CI Pigment Red 11, CI Pigment Red 12, CI Pigment Red 14, CI Pigment Red 15, CI Pigment Red 16, CI Pigment Red 17, CI Pigment Red 18, CI Pigment Red 19, CI Pigment Red 21, CI Pigment Red 22, CI Pigment Red 23, CI Pigment Red 30, CI Pigment Red 31, CI Pigment Red 32, CI Pigment Red 37, CI Pigment Red 38, CI Pigment Red 40, CI Pigment Red 41, CI Pigment Red 42, CI Pigment Red 48: 1, CI Pigment Red 48: 2, CI Pigment Red 48: 3, CI Pigment Red 48: 4, CI Pigment Red 49: 1, CI Pigment Red 49: 2, CI CI Pigment Red 50: 1, CI Pigment Red 52: 1, CI Pigment Red 53: 1, CI Pigment Red 57, CI Pigment Red 57: 1, CI Pigment Red 57: 2, CI Pigment Red 58: 2, CI Pigment Red 58 : 4, CI Pigment Red 60: 1, CI Pigment Red 63: 1, CI Pigment Red 63: 2, CI Pigment Red 64: 1, CI Pigment Red 81: 1, CI Pigment Red 83, CI Pigment Red 88, CI Pigment Red 90: 1, CI pigmentless 97,

CI Pigment Red 101, CI Pigment Red 102, CI Pigment Red 104, CI Pigment Red 105, CI Pigment Red 106, CI Pigment Red 108, CI Pigment Red 112, CI Pigment Red 113, CI Pigment Red 114, CI Pigment Red 122, CI Pigment Red 123, CI Pigment Red 144, CI Pigment Red 146, CI Pigment Red 149, CI Pigment Red 150, CI Pigment Red 151, CI Pigment Red 166, CI Pigment Red 168, CI Pigment Red 170, CI Pigment Red 171, CI Pigment Red 172, CI Pigment Red 174, CI Pigment Red 175, CI Pigment Red 176, CI Pigment Red 177, CI Pigment Red 178, CI Pigment Red 179, CI Pigment Red 180, CI Pigment Red 185, CI Pigment Red 187, CI Pigment Red 188, CI Pigment Red 190, CI Pigment Red 193, CI Pigment Red 194, CI Pigment Red 202, CI Pigment Red 206, CI Pigment Red 207, CI Pigment Red 208, CI Pigment Red 209, CI Pigment Red 215, CI Pigment Red 216, CI Pigment Red 220, CI Pigment Red 224, CI Pigment Red 226, CI Pigment Red 242, CI Pigment Red 243, CI Pigment Red 245, CI Pigment Red 254, CI Pigment Red 255, CI Pigment Red 264, C.I. Pigment Red 265;

CI Pigment Blue 15, CI Pigment Blue 15: 3, CI Pigment Blue 15: 4, CI Pigment Blue 15: 6, CI Pigment Blue 60;
CI Pigment Green 7, CI Pigment Green 36;
CI Pigment Brown 23, CI Pigment Brown 25;
CI Pigment Black 1, CI Pigment Black 7.
The organic pigment can be used after being purified by, for example, a sulfuric acid recrystallization method, a solvent washing method, or a combination thereof.

  Examples of inorganic pigments include titanium oxide, barium sulfate, calcium carbonate, zinc white, lead sulfate, yellow lead, zinc yellow, red bean (red iron oxide (III)), cadmium red, ultramarine blue, bitumen, and chromium oxide green. , Cobalt green, amber, titanium black, synthetic iron black, carbon black and the like.

  In the present invention, the pigments can be used alone or in admixture of two or more, and an organic pigment and an inorganic pigment can be used in combination. The above organic pigments are used, and when forming a black matrix, two or more organic pigments and / or carbon black are preferably used.

  In the present invention, the pigment surface can be used by modifying the particle surface with a polymer, if desired. Examples of the polymer that modifies the pigment particle surface include the polymers described in Patent Document 3 and the like, and various commercially available polymers or oligomers for dispersing pigments.

JP-A-8-259876

Moreover, in this invention, a coloring agent can be used with a dispersing agent depending on necessity. Examples of the dispersant include cationic, anionic, nonionic, amphoteric, silicone, and fluorine surfactants.
Examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether; polyoxyethylene n-octylphenyl ether, polyoxyethylene n-nonyl. Polyoxyethylene alkyl phenyl ethers such as phenyl ether; polyethylene glycol diesters such as polyethylene glycol dilaurate and polyethylene glycol distearate; sorbitan fatty acid esters; fatty acid-modified polyesters; tertiary amine-modified polyurethanes; polyethyleneimines In addition, the following trade names are KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and F-Top (manufactured by Tochem Products). MegaFuck (Dainippon Ink & Chemicals), Florard (Sumitomo 3M), Asahi Guard, Surflon (Asahi Glass), BYK, Disperbyk (Bicchemy Japan) Product), Solsperse (manufactured by Seneca Co., Ltd.), EFKA (manufactured by EFKA Chemicals Beebuy Co., Ltd.), and the like.
These surfactants can be used alone or in admixture of two or more.
The usage-amount of surfactant is 50 parts weight or less normally with respect to 100 weight part of coloring agents, Preferably it is 0-30 weight part.

  In the present invention, the radiation-sensitive resin composition can be prepared by an appropriate method. However, when a pigment is used as a colorant, the pigment is used in a solvent in the presence of a dispersant, as will be described later (B ) Along with alkali-soluble resin, for example, using a bead mill, roll mill, etc., mixing and dispersing while pulverizing to prepare a pigment dispersion, which is prepared by mixing with components (B) to (D) described later Is preferred.

The amount of the dispersant used in preparing the pigment dispersion is usually 100 parts by weight or less, preferably 0.5 to 100 parts by weight, more preferably 1 to 70 parts by weight, particularly 100 parts by weight of the pigment. Preferably it is 10-50 weight part. In this case, if the amount of the dispersant used exceeds 100 parts by weight, developability and the like may be impaired.
Moreover, as a solvent used when preparing a pigment dispersion liquid, the thing similar to the solvent illustrated about the liquid composition of the radiation sensitive resin composition mentioned later can be mentioned, for example.
The amount of the solvent used in preparing the pigment dispersion is usually 500 to 1,000 parts by weight, preferably 700 to 900 parts by weight with respect to 100 parts by weight of the pigment.

When preparing a pigment dispersion using a bead mill, for example, glass beads or titania beads having a diameter of about 0.5 to 10 mm are used, and a pigment mixture composed of a pigment, a solvent and a dispersant is used. Preferably, it can be carried out by mixing and dispersing while cooling with cooling water or the like.
In this case, the filling rate of the beads is usually 50 to 80% of the mill capacity, and the injection amount of the pigment mixed solution is usually about 20 to 50% of the mill capacity. The treatment time is usually 2 to 50 hours, preferably 2 to 25 hours.
Moreover, when preparing using a roll mill, it can carry out by processing, for example, using a 3 roll mill, a 2 roll mill, etc., preferably cooling a pigment liquid mixture with cooling water etc.
In this case, the roll interval is preferably 10 μm or less, and the shearing force is usually about 10 8 dyn / sec. The treatment time is usually 2 to 50 hours, preferably 2 to 25 hours.

-(B) component-
(B) component in the present invention, the formula (1) represented Ru polyester (hereinafter "polyester (1)" hereinafter.) An alkali-soluble resin containing a (hereinafter, referred to as "(B) an alkali-soluble resin".) (A) A resin that acts as a binder for the colorant and is soluble in an alkaline developer used in the development processing step when producing a color filter.

Polyester (1) is produced, for example, by synthesizing a diol compound corresponding to formula (1) and esterifying the diol compound with an acid anhydride of a tetravalent carboxylic acid corresponding to formula (1). can do.

  The polyester (1) is preferably a di (meth) acryloyl group-containing diol compound represented by the following formula (6) or formula (7) and a tetrabasic acid dianhydride represented by the following formula (8). (Hereinafter referred to as “tetrabasic acid dianhydride (8)”).

〔式（６）において、Ｒ¹ は式（１）におけるＲ¹ と同義である。〕

In [Equation (6), R ¹ has the same meaning as R ¹ in Formula (1). ]

〔式（７）において、Ｒ¹ は式（１）におけるＲ¹ と同義である。〕

In [Equation (7), R ¹ is the same meaning as that of R ¹ in formula (1). ]

〔式（８）において、Ｙは式（１）におけるＹと同義である。〕

[In Formula (8), Y is synonymous with Y in Formula (1). ]

Below , the manufacturing method of polyester (1) is demonstrated.
First, the di (meth) acryloyl group-containing diol compound is represented by, for example, a diphenol represented by the following formula (9) (hereinafter referred to as “diphenol (9)”) and / or a formula (10). Diglycidyl etherification of diphenol (hereinafter referred to as “diphenol (10)”) to synthesize a diglycidyl etherification product represented by the following formula (11) or formula (12), followed by the diglycidyl etherification product It can be produced by addition reaction of acrylic acid and / or methacrylic acid to the epoxy groups at both ends.

  The di (meth) acryloyl group-containing diol compound thus obtained preferably has an acid value of less than 10 mgKOH / g and an epoxy equivalent of 10,000 to 20,000.

  When synthesizing the (meth) acryloyl group-containing diol compound, diphenols can be used alone or in admixture of two or more, but diphenol (9) and diphenol (10) are preferably used. It is desirable to use together at a weight ratio of 80-60: 20-40.

The diglycidyl etherification reaction of diphenol when synthesizing a di (meth) acryloyl group-containing diol compound can be carried out according to a general epoxy resin synthesis method. For example, the presence of a basic catalyst in diphenol It can be synthesized by reacting epichlorohydrin under.
The diglycidyl etherified product thus obtained preferably has an epoxy equivalent of 260 to 300.

  Further, the tetrabasic acid dianhydride (8) is not particularly limited, but is preferably a compound represented by the following formula (8-1) or a compound represented by the formula (8-2). And a compound represented by the formula (8-3).

  The method for carrying out the esterification reaction between the di (meth) acryloyl group-containing diol compound and the tetrabasic acid dianhydride (8) in producing the polyester (1) is not particularly limited. A polyester (1) can be produced by dissolving a (meth) acryloyl group-containing diol compound in an organic solvent under heating, adding tetrabasic acid dianhydride (8) to this, and reacting with stirring. it can.

In the polyester (1) obtained by such esterification reaction, R ² in the formula (1) is all hydrogen atoms, and 2 to 3 are present in each residue portion of the tetrabasic acid dianhydride (8). And thus exhibits excellent solubility in an aqueous alkali solution.

In the present invention, at least a part of the free carboxyl groups in the polyester (1) obtained by the esterification reaction can be used by blocking with a carboxyl group blocking agent. In this case, the carboxyl group is blocked. By changing the ratio, the acid value of the polyester (1) can be adjusted to control the alkali solubility.
The carboxyl group-blocking agent is not particularly limited, and examples thereof include glycidyl ethers, carbodiimides and the like, and examples thereof include phenyl glycidyl ether, 4-n-butylphenyl glycidyl ether, resorcing lysidyl ether and the like. Is preferred.

In the present invention, the acid value of the polyester (1) is preferably 20 to 80 mgKOH / g, more preferably 30 to 70 mgKOH / g. Although depending on the type of tetrabasic acid dianhydride (8), it is preferable that 50% by mole or more, preferably 70% by mole or more of R ² in the polyester (1) is a hydrogen atom. It is desirable from the viewpoint of securing the property.
Moreover, it is preferable that the polyester (1) after blocking with a carboxyl group blocking agent has an epoxy equivalent of 60,000 or more.

  Since the polyester (1) has a plurality of polymerizable acryloyl groups or methacryloyl groups, the polyester (1) is cured by exposure and hardly dissolves in an alkaline aqueous solution. On the other hand, since it dissolves in an aqueous alkali solution in an uncured state, it is exposed partially as a resist film, leaving a hardened portion and exhibiting an alkali developability in which the uncured portion can be dissolved and removed with an aqueous alkali solution. Polyester (1) has good adhesion to various substrates, small curing shrinkage, high glass transition point (Tg) and excellent heat resistance, and can form a resist film with high hardness. Furthermore, the alicyclic hydrocarbon skeleton portion contained in the molecular main chain has a relatively soft structure and has good flexibility.

In the present invention, the weight average molecular weight in terms of polystyrene (hereinafter referred to as “Mw”) measured by gel permeation chromatography (GPC) (elution solvent: tetrahydrofuran) of polyester (1 ) is preferably 3,000 to 100,000. 000, more preferably 5,000 to 25,000. In this case, if the Mw of the polyester (1) is smaller than the above range, flexibility and adhesion tend to be lowered. There is a tendency to decrease. The Mw of the polyester (1) can be adjusted by changing the amount of the organic solvent or reaction raw material in the esterification reaction.
The number average molecular weight in terms of polystyrene (hereinafter referred to as “Mn”) measured by gel permeation chromatography (GPC) of polyester (1) (elution solvent: tetrahydrofuran) is usually 1,000-60,000, Preferably it is 2,000-25,000.
The polyester (1) preferably has an acid value of 60 to 70 mgKOH / g from the viewpoint of ensuring good alkali solubility in an uncured state.
In this invention, polyester (1) can be used individually or in mixture of 2 or more types.

Moreover, in this invention, other alkali-soluble resin can be used together with polyester (1) as alkali-soluble resin.
Examples of the other alkali-soluble resin include a polymerizable unsaturated monomer having an acidic functional group such as a carboxyl group, a phenolic hydroxyl group, and a sulfonic acid, and another copolymerizable unsaturated monomer (hereinafter, “ And a copolymer with a "copolymerizable unsaturated monomer").

Examples of the polymerizable unsaturated monomer having a carboxyl group (hereinafter referred to as “carboxyl group-containing unsaturated monomer”) include:
Unsaturated monocarboxylic acids such as (meth) acrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid;
Unsaturated dicarboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid or the like;
A trivalent or higher unsaturated polycarboxylic acid or anhydride thereof;
Mono [(meth) acryloyloxyalkyl] esters of divalent or higher polyvalent carboxylic acids such as succinic acid mono [2- (meth) acryloyloxyethyl] and phthalic acid mono [2- (meth) acryloyloxyethyl];
Examples thereof include mono (meth) acrylates of polymers having a carboxyl group and a hydroxyl group at both ends, such as ω-carboxypolycaprolactone mono (meth) acrylate.
The said carboxyl group-containing unsaturated monomer can be used individually or in mixture of 2 or more types.

Examples of the polymerizable unsaturated monomer having a phenolic hydroxyl group include o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, o-hydroxy-α-methylstyrene, m-hydroxy-α-methyl. Examples thereof include styrene, p-hydroxy-α-methylstyrene, N-o-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide and the like.
These polymerizable unsaturated monomers having a phenolic hydroxyl group can be used alone or in admixture of two or more.
Examples of the polymerizable unsaturated monomer having a sulfonic acid group include isoprene sulfonic acid and p-styrene sulfonic acid.
These polymerizable unsaturated monomers having a sulfonic acid group can be used alone or in admixture of two or more.

Next, as the copolymerizable unsaturated monomer, for example,
Macromonomers having a mono (meth) acryloyl group at the end of a polymer molecular chain such as polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, polysiloxane, etc. (hereinafter simply referred to as “macromonomers”) :):
N-phenylmaleimide, N-o-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, N-o-methylphenylmaleimide, Nm-methylphenylmaleimide, Np-methyl N-aryl maleimides such as phenylmaleimide, N-o-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, Np-methoxyphenylmaleimide, and N-substituted maleimides such as N-cyclohexylmaleimide;

Styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl ether, m -Aromatic vinyl compounds such as vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether;
Indenes such as indene and 1-methylindene;

Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, sec-butyl (meth) Acrylate, t-butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (Meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, 2-methoxyethyl (meth) acrylate Rate, 2-phenoxyethyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxypropylene glycol (meth) acrylate, methoxydipropylene glycol (meth) acrylate, isobornyl Unsaturated carboxylic esters such as (meth) acrylate, dicyclopentadienyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, glycerol mono (meth) acrylate;

2-aminoethyl (meth) acrylate, 2-dimethylaminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate, 2-dimethylaminopropyl acrylate, 3-aminopropyl (meth) acrylate, 3-dimethylaminopropyl ( Unsaturated carboxylic acid aminoalkyl esters such as (meth) acrylate;
Unsaturated carboxylic acid glycidyl esters such as glycidyl (meth) acrylate;
Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate;
Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether;
Vinyl cyanide compounds such as (meth) acrylonitrile, α-chloroacrylonitrile, vinylidene cyanide;
Unsaturated amides such as (meth) acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth) acrylamide;
Examples thereof include aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene.

  In the present invention, as other alkali-soluble resin, for example, a copolymer of a carboxyl group-containing unsaturated monomer and a copolymerizable unsaturated monomer (hereinafter simply referred to as “carboxyl group-containing copolymer”). (B) polystyrene macromonomer, polymethyl (meth) acrylate macromonomer, N-phenylmaleimide, N-cyclohexyl, (a) carboxyl group-containing unsaturated monomer having (meth) acrylic acid as an essential component At least one selected from the group of maleimide, 2-hydroxyethyl (meth) acrylate, benzyl (meth) acrylate and glycerol (meth) acrylate, and (c) optionally styrene, α-methylstyrene, methyl (meth) ) Acrylate, allyl (meth) acrylate and phenyl (meth) a Copolymers of at least one further monomer mixture comprising selected from the group of relations is more preferred.

The Mw of other alkali-soluble resins is usually 2,000 to 300,000, preferably 3,000 to 100,000, and Mn is usually 1,000 to 60,000, preferably 2,000. ~ 25,000.
In the present invention, other alkali-soluble resins can be used alone or in admixture of two or more.

In this invention, the total usage-amount of alkali-soluble resin is 10-1,000 weight part normally with respect to 100 weight part of (A) coloring agents, Preferably it is 20-500 weight part. In this case, if the total use amount of the alkali-soluble resin is less than 10 parts by weight, for example, the alkali developability may decrease, or there is a possibility that background stain or film residue may occur on the unexposed part of the substrate or on the light shielding layer. On the other hand, when the amount exceeds 1,000 parts by weight, the colorant concentration relatively decreases, and it may be difficult to achieve the target color density as a thin film.
Moreover, the usage-amount of polyester (1) in alkali-soluble resin becomes like this. Preferably it is 10 to 100 weight%, Most preferably, it is 20 to 100 weight%. In this case, if the proportion of polyester (1) used is less than 10% by weight, the intended effect of the present invention may be impaired.

-(C) component-
The component (C) in the present invention is a polyfunctional monomer having two or more polymerizable unsaturated bonds.
As such a polyfunctional monomer, for example,
Di (meth) acrylates of alkylene glycols such as ethylene glycol and propylene glycol;
Di (meth) acrylates of polyalkylene glycols such as polyethylene glycol and polypropylene glycol;
Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol and the like, and their dicarboxylic acid-modified products;
Oligo (meth) acrylates such as polyester, epoxy resin, urethane resin, alkyd resin, silicone resin, spirane resin;
Di (meth) acrylates of hydroxylated polymers at both ends such as both ends hydroxypoly-1,3-butadiene, both ends hydroxypolyisoprene, both ends hydroxypolycaprolactone,
And tris [2- (meth) acryloyloxyethyl] phosphate.

Among these polyfunctional monomers, poly (meth) acrylates of polyhydric alcohols having 3 or more valences and their dicarboxylic acid-modified products, specifically, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, Pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate,
A compound represented by the following formula (13), a compound represented by the following formula (14)

In particular, trimethylolpropane triacrylate, pentaerythritol triacrylate, and dipentaerythritol hexaacrylate have high strength of the colored layer, excellent surface smoothness of the colored layer, and on the unexposed substrate and the light shielding layer. It is preferable in that ground stains, film residues and the like are hardly generated on the top.
The said polyfunctional monomer can be used individually or in mixture of 2 or more types.

  The usage-amount of the polyfunctional monomer in this invention is 5-500 weight part normally with respect to 100 weight part of (B) alkali-soluble resin, Preferably it is 20-300 weight part. In this case, if the amount of the polyfunctional monomer used is less than 5 parts by weight, the strength and surface smoothness of the colored layer tend to be reduced. On the other hand, if it exceeds 500 parts by weight, for example, alkali developability is reduced. There is a tendency that background contamination, film residue, etc. are likely to occur on the unexposed substrate or the light shielding layer.

In the present invention, a part of the polyfunctional monomer can be replaced with a monofunctional monomer having one polymerizable unsaturated bond.
Examples of the monofunctional monomer include those similar to the compounds exemplified for the carboxyl group-containing unsaturated monomer and copolymerizable unsaturated monomer in the other alkali-soluble resins, and N- (meta ) In addition to acryloylmorpholine, N-vinylpyrrolidone, N-vinyl-ε-caprolactam, commercially available products include M-5600 (trade name, manufactured by Toagosei Co., Ltd.).
These monofunctional monomers can be used alone or in admixture of two or more.

The proportion of the monofunctional monomer used is usually 90% by weight or less, preferably 50% by weight or less, based on the total of the polyfunctional monomer and the monofunctional monomer. In this case, when the use ratio of the monofunctional monomer exceeds 90% by weight, the strength and surface smoothness of the resulting colored layer may be insufficient.
The total use amount of the polyfunctional monomer and the monofunctional monomer in the present invention is usually 5 to 500 parts by weight, preferably 20 to 300 parts by weight with respect to 100 parts by weight of the (B) alkali-soluble resin. Part. In this case, if the total amount used is less than 5 parts by weight, the strength and surface smoothness of the colored layer tend to be lowered. On the other hand, if it exceeds 500 parts by weight, for example, alkali developability is lowered or unexposed parts There is a tendency that soiling, film residue, etc. are likely to occur on the substrate or the light shielding layer.

-(D) Photoradical generator-
The component (D) in the present invention comprises (C) a polyfunctional monomer and a monofunctional monomer used in some cases by exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, charged particle beam, and X-ray. It is a photo radical generator that generates radicals capable of initiating polymerization of the body.
As the photoradical generator in the present invention, for example, a compound represented by the following formula (4) or formula (5) (hereinafter referred to as “carbazole compound (D1)”) is preferable.

[In the formulas (4) and (5), each R ³ independently represents a linear, branched or cyclic alkyl group or phenyl group having 1 to 12 carbon atoms, and each R ⁴ is independent from each other. Represents a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or a phenyl group, and each R ⁵ is independently a hydrogen atom or a linear or branched chain having 1 to 12 carbon atoms. Alternatively, it represents a cyclic alkyl group, and each R ⁶ , each R ⁷ and each R ⁸ each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms. However, the alkyl groups of R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ⁸ are each a group of straight, branched or cyclic alkoxyl groups having 1 to 6 carbon atoms, phenyl groups and halogen atoms. Each of the phenyl groups of R ³ and R ⁴ may be a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, or a linear group having 1 to 6 carbon atoms. Further, it may be substituted with a substituent selected from the group consisting of a branched or cyclic alkoxyl group, a phenyl group and a halogen atom. ]

In the formulas (4) and (5), examples of the linear, branched or cyclic alkyl group having 1 to 12 carbon atoms of R ³ , R ⁴ and R ⁵ include, for example, a methyl group, an ethyl group, n- Propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n- Nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, cyclopentyl group, cyclohexyl group and the like can be mentioned.

Examples of the linear, branched or cyclic alkyl group having 1 to 6 carbon atoms of R ⁶ , R ⁷ and R ⁸ include, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n -Butyl group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group, cyclopentyl group, cyclohexyl group and the like can be mentioned.

Of the substituents for the alkyl groups of R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ⁸ , and the substituents for the phenyl groups of R ³ and R ⁴ , a straight chain having 1 to 6 carbon atoms Examples of the branched or cyclic alkoxyl group include a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n-butoxy group, and a t-butoxy group. As the halogen atom, For example, a fluorine atom, a chlorine atom, etc. can be mentioned.
Among the substituents for each phenyl group of R ³ and R ⁴ , examples of the linear, branched or cyclic alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, an n-propyl group, An i-propyl group, an n-butyl group, a t-butyl group, etc. can be mentioned.
One or more of these substituents may be present in each alkyl group and each phenyl group.

In the formulas (4) and (5), R ³ is preferably a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a phenyl group or the like, and R ⁴ is a hydrogen atom , methyl group, ethyl group, n- propyl group, i- propyl, n- butyl, n- pentyl, n- hexyl, n- heptyl, preferably such as n- octyl group, as R ⁵ is A hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group and the like are preferable, and R ⁶ , R ⁷ and R ⁸ are each a hydrogen atom, a methyl group, an ethyl group, n- A propyl group, i-propyl group, n-butyl group and the like are preferable.

  Specific examples of the preferred carbazole compound (D1) in the present invention include 1- [9-ethyl-6-benzoyl-9. H. -Carbazol-3-yl] -nonane-1,2-nonane-2-oxime-O-benzoate, 1- [9-ethyl-6-benzoyl-9. H. -Carbazol-3-yl] -nonane-1,2-nonane-2-oxime-O-acetate, 1- [9-ethyl-6-benzoyl-9. H. -Carbazol-3-yl] -pentane-1,2-pentane-2-oxime-O-acetate, 1- [9-ethyl-6-benzoyl-9. H. -Carbazol-3-yl] -octane-1-one oxime-O-acetate, 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-benzoate, 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate, 1- [9-ethyl-6- (1,3,5-trimethylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-benzoate, 1- [9-n-butyl-6- (2-ethylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-benzoate and the like.

Of these carbazole compounds (D1), 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate is preferred.
In the present invention, the carbazole compound (D1) can be used alone or in admixture of two or more.

  Examples of photo radical generators other than the carbazole compound (D1) (hereinafter referred to as “other photo radical generators”) include, for example, the following formula (15-1), formula (15-2) or formula ( 15-3) Biimidazole compound, benzoin compound, acetophenone compound, benzophenone compound, α-diketone compound, polynuclear quinone compound, xanthone compound, phosphine compound having at least one main skeleton represented by 15-3) And triazine compounds.

Examples of the biimidazole compound include:
2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) -1,2′-biimidazole,
2,2′-bis (2-bromophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) -1,2′-biimidazole,
2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole,
2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole,
2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole,
2,2′-bis (2-bromophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole,
2,2′-bis (2,4-dibromophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole,
Examples include 2,2′-bis (2,4,6-tribromophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole.

  Among these biimidazole compounds, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2 , 4-Dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole and 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5 , 5′-tetraphenyl-1,2′-biimidazole is preferred, especially 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole. Is preferred.

-Hydrogen donor-
In the present invention, when a biimidazole compound is used as the photoradical generator, it is preferable to use a hydrogen donor described below in combination because the sensitivity can be further improved.
The “hydrogen donor” as used herein means a compound that can donate a hydrogen atom to a radical generated from a biimidazole compound by exposure.
As such a hydrogen donor, a mercaptan compound defined below, an amine compound defined below, and the like are preferable.
The mercaptan-based compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having one or more, preferably 1 to 3, more preferably 1 to 2, mercapto groups directly bonded to the mother nucleus (hereinafter referred to as “mercaptan”). It is referred to as “system hydrogen donor”).
The amine compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having 1 or more, preferably 1 to 3, more preferably 1 to 2 amino groups directly bonded to the mother nucleus (hereinafter referred to as “the amine compound”). "Amine-based hydrogen donor").
These hydrogen donors can also have a mercapto group and an amino group at the same time.

Hereinafter, the hydrogen donor will be described more specifically.
The mercaptan-based hydrogen donor can have one or more benzene rings or heterocyclic rings, and can have both a benzene ring and a heterocyclic ring. When two or more of these rings are present, It may or may not be formed.
In addition, when the mercaptan hydrogen donor has two or more mercapto groups, at least one of the remaining mercapto groups is substituted with an alkyl, aralkyl or aryl group as long as at least one free mercapto group remains. Furthermore, as long as at least one free mercapto group remains, a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group, or two sulfur atoms are It can have structural units linked in the form of disulfides.
Furthermore, the mercaptan-based hydrogen donor may be substituted with a carboxyl group, a substituted or unsubstituted alkoxycarbonyl group, a substituted or unsubstituted phenoxycarbonyl group, a nitrile group, or the like at a place other than the mercapto group.

Specific examples of such mercaptan hydrogen donors include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto- 2,5-dimethylaminopyridine and the like can be mentioned.
Of these mercaptan-based hydrogen donors, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferable, and 2-mercaptobenzothiazole is particularly preferable.

Next, the amine-based hydrogen donor can have one or more benzene rings or heterocyclic rings, and can have both a benzene ring and a heterocyclic ring. When these two or more rings are present, A condensed ring may or may not be formed.
In the amine-based hydrogen donor, one or more of the amino groups may be substituted with an alkyl group or a substituted alkyl group, and a carboxyl group, a substituted or unsubstituted alkoxycarbonyl group, Alternatively, it may be substituted with an unsubstituted phenoxycarbonyl group, nitrile group or the like.

Specific examples of such amine-based hydrogen donors include 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, Examples include ethyl 4-dimethylaminobenzoate, i-amyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile and the like.
Among these amine-based hydrogen donors, 4,4′-bis (dimethylamino) benzophenone and 4,4′-bis (diethylamino) benzophenone are preferable, and 4,4′-bis (diethylamino) benzophenone is particularly preferable. In addition, 4,4′-bis (dimethylamino) benzophenone and 4,4′-bis (diethylamino) benzophenone can act as a photoradical initiator alone even in the absence of a biimidazole compound. .

In the present invention, the hydrogen donor can be used alone or in admixture of two or more. However, one or more mercaptan hydrogen donors and one or more amine hydrogen donors are used in combination. It is preferable that the formed colored layer does not easily fall off the substrate during development, and the strength and sensitivity of the colored layer are high.
Specific examples of a preferred combination of a mercaptan hydrogen donor and an amine hydrogen donor include 2-mercaptobenzothiazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzothiazole / 4,4′-. Bis (diethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone, and the like are further preferable combinations. Are 2-mercaptobenzothiazole / 4,4′-bis (diethylamino) benzophenone and 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone, and a particularly preferred combination is 2-mercaptobenzothia A Lumpur / 4,4'-bis (diethylamino) benzophenone.
The weight ratio of mercaptan hydrogen donor to amine hydrogen donor in the combination of mercaptan hydrogen donor and amine hydrogen donor is usually 1: 1 to 1: 4, preferably 1: 1 to 1: 3.

Examples of the benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and methyl 2-benzoylbenzoate.
Examples of the acetophenone compound include 2,2-dimethoxyacetophenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane- 1-one, 1- (4-i-propylphenyl) -2-hydroxy-2-methylpropan-1-one, 2-methyl- (4-methylthiophenyl) -2-morpholino-1-propan-1-one 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 1-hydroxycyclohexyl Examples include phenyl ketone and 2,2-dimethoxy-1,2-diphenylethane-1-one. Kill.

Examples of the benzophenone compound include 4,4′-bis (dimethylamino) benzophenone and 4,4′-bis (diethylamino) benzophenone.
Examples of the α-diketone compound include diacetyl, dibenzoyl, methylbenzoylformate, and the like.
Examples of the polynuclear quinone compound include anthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1,4-naphthoquinone, and the like.
Examples of the xanthone compound include xanthone, thioxanthone, and 2-chlorothioxanthone.
Examples of the phosphine compound include bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide and 2,4,6-trimethylbenzoyldiphenylphosphine oxide.

  Examples of the triazine compound include 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (Furan-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) ) -S-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) Ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4- Kishisuchiriru) -4,6-bis (trichloromethyl) -s-triazine, 2-(4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine,

Compound represented by the following formula (16)

And a compound represented by the following formula (17):

Examples thereof include compounds having a halomethyl group.
In the present invention, the photo radical generator can be used alone or in admixture of two or more.
Furthermore, in the present invention, one or more of a sensitizer, a curing accelerator, or a polymer photocrosslinking / sensitizer can be used in combination with the photoradical generator as necessary.

The amount of the photo radical generator used in the present invention is usually 0.01 to 200 with respect to (C) 100 parts by weight of the total of the polyfunctional monomer and the monofunctional monomer optionally used. Part by weight, preferably 1 to 120 parts by weight, particularly preferably 1 to 100 parts by weight. In this case, if the amount of the photo radical generator used is less than 0.01 parts by weight, curing by exposure becomes insufficient, and it becomes difficult to obtain a pattern array in which pixel patterns or black matrix patterns are arranged according to a predetermined arrangement. On the other hand, if the amount exceeds 200 parts by weight, the formed colored layer tends to fall off from the substrate during development, and background stains, film residue, etc. are likely to occur on the unexposed portion of the substrate or on the light shielding layer.
In the present invention, when the carbazole compound (D1) and another photoradical generator are used in combination as the photoradical generator, the use ratio of the other photoradical generator is such that the carbazole compound (D1) and other photoradical generator are used. Preferably it is 50 weight% or less with respect to the sum total with a photoradical generator, More preferably, it is 30 weight% or less.

-Additives-
The radiation-sensitive composition for forming a colored layer of the present invention can contain various additives as necessary.
Examples of the additive include an organic acid or an organic amino compound (provided to improve the solubility characteristics of the radiation-sensitive composition in an alkaline developer and to further suppress the remaining undissolved product after development) The hydrogen donor is excluded).

The organic acid is preferably an aliphatic carboxylic acid or a phenyl group-containing carboxylic acid having one or more carboxyl groups in the molecule.
Examples of the aliphatic carboxylic acid include
Monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethylacetic acid, enanthic acid, caprylic acid;
Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassylic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid Dicarboxylic acids such as cyclohexanedicarboxylic acid, itaconic acid, citraconic acid, maleic acid, fumaric acid, mesaconic acid;
And tricarboxylic acids such as tricarballylic acid, aconitic acid, and camphoronic acid.

Examples of the phenyl group-containing carboxylic acid include a compound in which a carboxyl group is directly bonded to the phenyl group, and a carboxylic acid in which the carboxyl group is bonded to the phenyl group via a carbon chain.
Examples of the phenyl group-containing carboxylic acid include
Aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelic acid, mesitylene acid;
Aromatic dicarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid;
Trivalent or higher aromatic polycarboxylic acids such as trimellitic acid, trimesic acid, merophanic acid, pyromellitic acid,
Examples thereof include phenylacetic acid, hydroatropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, cinnamylidene acid, coumaric acid, and umberic acid.

Among these organic acids, aliphatic carboxylic acids are aliphatic from the viewpoints of alkali solubility, solubility in a solvent described later, prevention of soiling and film residue on the substrate or the light-shielding layer in the unexposed area, and the like. Dicarboxylic acids are preferred, and malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid and the like are particularly preferred. As the phenyl group-containing carboxylic acid, aromatic dicarboxylic acids are preferable, and phthalic acid is particularly preferable.
The organic acids can be used alone or in admixture of two or more.
The amount of the organic acid used is usually 15% by weight or less, preferably 10% by weight or less, based on the whole radiation-sensitive composition. In this case, when the usage-amount of organic acid exceeds 15 weight%, there exists a tendency for the adhesiveness with respect to the board | substrate of the formed colored layer to fall.

The organic amino compound is preferably an aliphatic amine or a phenyl group-containing amine having one or more amino groups in the molecule.
Examples of the aliphatic amine include:
n-propylamine, i-propylamine, n-butylamine, i-butylamine, sec-butylamine, t-butylamine, n-pentylamine, n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methylcyclohexylamine, 3-methylcyclohexylamine, 4-methylcyclohexylamine, 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, 4- Mono (cyclo) alkylamines such as ethylcyclohexylamine;
Methylethylamine, diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, di-i-propylamine, di-n-butylamine, di-i-butylamine, di-sec-butylamine, di Di (cyclo) alkylamines such as t-butylamine, di-n-pentylamine, di-n-hexylamine, methylcyclohexylamine, ethylcyclohexylamine, dicyclohexylamine;

Dimethylethylamine, methyldiethylamine, triethylamine, dimethyl n-propylamine, diethyl n-propylamine, methyldi-n-propylamine, ethyldi-n-propylamine, tri-n-propylamine, tri-i-propylamine, tri- n-butylamine, tri-i-butylamine, tri-sec-butylamine, tri-t-butylamine, tri-n-pentylamine, tri-n-hexylamine, dimethylcyclohexylamine, diethylcyclohexylamine, methyldicyclohexylamine, ethyldicyclohexyl Tri (cyclo) alkylamines such as amine and tricyclohexylamine;
2-aminoethanol, 3-amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol, 5-amino-1-pentanol, 6-amino-1-hexanol, 4-amino- Mono (cyclo) alkanolamines such as 1-cyclohexanol;

Diethanolamine, di-n-propanolamine, di-i-propanolamine, di-n-butanolamine, di-i-butanolamine, di-n-pentanolamine, di-n-hexanolamine, di (4-cyclo Di (cyclo) alkanolamines such as hexanol) amine;
Triethanolamine, tri-n-propanolamine, tri-i-propanolamine, tri-n-butanolamine, tri-i-butanolamine, tri-n-pentanolamine, tri-n-hexanolamine, tri (4 -Tri (cyclo) alkanolamines such as cyclohexanol) amine;

3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 4-amino-1, 2-cyclohexanediol, 4-amino-1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3-propanediol Amino (cyclo) alkanediols such as 2-diethylamino-1,3-propanediol;
1-aminocyclopentanemethanol, 4-aminocyclopentanemethanol, 1-aminocyclohexanemethanol, 4-aminocyclohexanemethanol, 4-dimethylaminocyclopentanemethanol, 4-diethylaminocyclopentanemethanol, 4-dimethylaminocyclohexanemethanol, 4- Amino group-containing cycloalkanemethanols such as diethylaminocyclohexanemethanol;
β-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminovaleric acid, 5-aminovaleric acid, 6-aminocaproic acid, 1-aminocyclo Examples thereof include aminocarboxylic acids such as propanecarboxylic acid, 1-aminocyclohexanecarboxylic acid, and 4-aminocyclohexanecarboxylic acid.

Examples of the phenyl group-containing amine include compounds in which an amino group is directly bonded to a phenyl group, and compounds in which an amino group is bonded to a phenyl group via a carbon chain.
As the phenyl group-containing amine, for example,
Aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propylaniline, 4-i-propylaniline, 4-n-butylaniline, 4-t-butylaniline, Aromatic amines such as 1-naphthylamine, 2-naphthylamine, N, N-dimethylaniline, N, N-diethylaniline, 4-methyl-N, N-dimethylaniline;
Aminobenzyl alcohols such as 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl alcohol, 4-dimethylaminobenzyl alcohol, 4-diethylaminobenzyl alcohol;
Examples include aminophenols such as 2-aminophenol, 3-aminophenol, 4-aminophenol, 4-dimethylaminophenol, and 4-diethylaminophenol.

Among these organic amino compounds, mono (cyclo) alkanolamines are used as aliphatic amines from the viewpoints of solubility in the solvent described later, prevention of soiling and film residue on the unexposed portion of the substrate or the light shielding layer, and the like. And amino (cyclo) alkanediols are preferred, in particular 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino -1,3-propanediol, 4-amino-1,2-butanediol and the like are preferable. Moreover, as a phenyl group containing amine, aminophenols are preferable and 2-aminophenol, 3-aminophenol, 4-aminophenol, etc. are especially preferable.
The organic amino compounds can be used alone or in admixture of two or more.
The amount of the organic amino compound used is usually 15% by weight or less, preferably 10% by weight or less, based on the whole radiation-sensitive composition. In this case, when the usage-amount of an organic amino compound exceeds 15 weight%, there exists a tendency for the adhesiveness with respect to the board | substrate of the formed colored layer to fall.

Furthermore, as an additive other than the organic acid and the organic amino compound, for example,
Dispersing aids such as blue pigment derivatives and yellow pigment derivatives such as copper phthalocyanine derivatives;
Fillers such as glass and alumina;
Polymer compounds such as polyvinyl alcohol, polyethylene glycol monoalkyl ethers, poly (fluoroalkyl acrylates);
Nonionic, cationic and anionic surfactants;
Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltri Methoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropyl Adhesion promoters such as methyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane;
Antioxidants such as 2,2′-thiobis (4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol;
UV absorbers such as 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, alkoxybenzophenones;
Anti-agglomeration agents such as sodium polyacrylate;
Examples thereof include thermal radical generators such as 1,1′-azobis (cyclohexane-1-carbonitrile) and 2-phenylazo-4-methoxy-2,4-dimethylvaleronitrile.

Solvent The radiation-sensitive composition for forming a colored layer according to the present invention contains the components (A) to (D) as essential components, and contains the additive components as necessary. Prepared as a composition.
As the solvent, the components (A) to (D) and additive components constituting the radiation-sensitive composition are dispersed or dissolved, and do not react with these components and have appropriate volatility. Can be appropriately selected and used.

As such a solvent, for example,
Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n- Butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, di Propylene glycol mono Chirueteru, dipropylene glycol mono -n- propyl ether, dipropylene glycol mono -n- butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl (poly) alkylene glycol monoalkyl ethers such as ether;

(Poly) alkylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate;
Other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran;
Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;

Lactic acid alkyl esters such as methyl lactate and ethyl lactate;
Ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2-hydroxy Methyl 3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-acetate Butyl, n-amyl formate, i-amyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate , Methyl acetoacetate, ethyl acetoacetate, ethyl 2-oxobutanoate Other esters;
Aromatic hydrocarbons such as toluene and xylene;
Examples include amides or lactams such as N, N-dimethylformamide, N, N-dimethylacetamide, and N-methylpyrrolidone.

Among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl from the viewpoints of solubility, pigment dispersibility, coatability, etc. Ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl lactate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, n-acetate -Butyl, i-butyl acetate, n-amyl formate, i-amyl acetate, n-butyl propionate, ethyl butyrate, i-propyl butyrate, n-butyl butyrate, Ethyl Rubin acid and the like are preferable.
The said solvent can be used individually or in mixture of 2 or more types.

Along with the solvent, benzyl ethyl ether, di-n-hexyl ether, acetonyl acetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate In addition, a high boiling point solvent such as diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate can be used in combination.
These high-boiling solvents can be used alone or in admixture of two or more.
The amount of the solvent used is not particularly limited, but the total concentration of each component excluding the solvent of the composition is usually from the viewpoint of applicability, stability, etc. of the resulting radiation-sensitive composition. An amount of 5 to 50% by weight, preferably 10 to 40% by weight, is desirable.

Color filter The color filter of the present invention has a colored layer formed from the radiation-sensitive composition for forming a colored layer of the present invention.
Below, the method of forming the colored layer in the color filter of this invention is demonstrated.
First, on the surface of the substrate, if necessary, a light shielding layer is formed so as to partition a portion for forming pixels, and a liquid composition of a radiation sensitive composition in which, for example, a red pigment is dispersed on the substrate. After applying the material, pre-baking is performed to evaporate the solvent and form a coating film. Next, the coating film is exposed through a photomask, and then developed using an alkali developer to dissolve and remove the unexposed portions of the coating film, and then post-baked to form a red pixel pattern. A pixel array arranged in an array is formed.
Thereafter, using each liquid composition of the radiation-sensitive composition in which the green or blue pigment is dispersed, the liquid composition is applied, pre-baked, exposed, developed and post-baked in the same manner as described above, and the green composition By sequentially forming the pixel array and the blue pixel array on the same substrate, a color filter in which the pixel arrays of the three primary colors of red, green, and blue are arranged on the substrate can be obtained. However, in the present invention, the order of forming the pixels of each color is not limited to the above.
The black matrix can be formed in the same manner as in the case of the pixel using, for example, a radiation-sensitive composition for forming a colored layer in which a black pigment is dispersed.

Examples of the substrate used when forming the pixel and / or the black matrix include glass, silicon, polycarbonate, polyester, aromatic polyamide, polyamideimide, and polyimide.
In addition, these substrates may be subjected to appropriate pretreatment such as chemical treatment with a silane coupling agent or the like, plasma treatment, ion plating, sputtering, gas phase reaction method, vacuum deposition, etc., if desired.
When applying a liquid composition of a radiation sensitive composition to a substrate, an appropriate application such as a spray method, a roll coating method, a spin coating method (spin coating method), a slit die coating method, a bar coating method, an ink jet method, etc. Although a method can be employed, a spin coating method and a slit die coating method are particularly preferable.
The coating thickness is usually 0.1 to 10 μm, preferably 0.2 to 8.0 μm, particularly preferably 0.2 to 6.0 μm as the film thickness after drying.

As the radiation used when forming the pixel and / or the black matrix, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like can be used, but the wavelength is in the range of 190 to 450 nm. Some radiation is preferred.
Exposure of radiation is preferably 10~10,000J / m ^2.
Examples of the alkali developer include sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-undecene, 1, An aqueous solution such as 5-diazabicyclo- [4.3.0] -5-nonene is preferred.
An appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like can be added to the alkaline developer. In addition, it is usually washed with water after alkali development.
As a development processing method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied. The development conditions are preferably 5 to 300 seconds at room temperature.

  The color filter of the present invention thus obtained is extremely useful for, for example, a transmissive or reflective color liquid crystal display element, a color imaging tube element, a color sensor, and the like.

Color liquid crystal display element The color liquid crystal display element of the present invention comprises the color filter of the present invention.
Further, as one form of the color liquid crystal display element of the present invention, a pixel and / or a black matrix is formed as described above on the thin film transistor substrate array using the radiation-sensitive composition for forming a colored layer of the present invention. By doing so, a color liquid crystal display element having particularly excellent characteristics can be produced.

The radiation-sensitive composition for forming a colored layer of the present invention contains the components (A) to (D) as essential components. Specific examples of particularly preferred compositions are as follows. (D)
(I) (B) Polyester whose Mw is 3,000-100,000 obtained by esterification reaction of (B) alkali-soluble resin with a di (meth) acryloyl group-containing diol compound and tetrabasic acid dianhydride (8) A radiation-sensitive composition for forming a colored layer comprising (1).
(B) (C) The radiation sensitive material for forming a colored layer according to (a), wherein the polyfunctional monomer is at least one selected from the group consisting of trimethylolpropane triacrylate, pentaerythritol triacrylate and dipentaerythritol hexaacrylate. Sex composition.
(C) (D) The photoradical generator is carbazole compound (D1) as 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate The radiation-sensitive composition for forming a colored layer according to the above (i) or (b).
(D) (A) The radiation-sensitive composition for forming a colored layer according to (a), (b) or 1 (c), wherein the colorant contains an organic pigment and / or carbon black.

Further, the preferred color filter of the present invention is
(E) It has a pixel and / or a black matrix formed from the radiation-sensitive composition for forming a colored layer of the above (a), (b), (c) or (d).

The preferred color liquid crystal display element of the present invention is
(F) comprising the color filter of (e),
Further preferred color liquid crystal display elements of the present invention are:
(G) The color filter described in (e) is provided on the thin film transistor substrate array.

The radiation-sensitive composition for forming a colored layer according to the present invention has an undissolved substance remaining on the unexposed portion of the substrate and the light-shielding layer at the time of development even when the pigment is contained at a high concentration. It is possible to form a good pixel pattern and a black matrix pattern that do not cause scum at the edge of the pattern and that are free from pattern edge chipping and undercut even at a low exposure amount.
Furthermore, the pixels and black matrix formed using the radiation-sensitive composition for forming a colored layer of the present invention have high surface smoothness and excellent adhesion to the substrate.
Therefore, the radiation-sensitive composition for forming a colored layer of the present invention can be used very suitably for the production of various color filters including color filters for color liquid crystal display elements in the electronic industry.

Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples. Here, the part is based on weight.
<Manufacture of alkali-soluble resin>
Synthesis example 1 (Synthesis of diglycidyl etherified product of diphenol)
In a flask equipped with a condenser and a stirrer, 1,070 g of a mixture of diphenol (9): diphenol (10) = 70: 30 (weight ratio) (trade name YP-90, manufactured by Yashara Chemical Co., Ltd.), Epichloro 1,520 g of hydrin and 1,700 g of dimethyl sulfoxide were charged, dissolved by heating to 50 ° C. with stirring, 290 g of caustic soda was added, and the mixture was reacted at 65 to 90 ° C. for 10 hours. The progress and end point of the reaction were confirmed by measuring the epoxy equivalent, and after the epoxy equivalent reached the target value, the solvent was distilled off under reduced pressure at 90-100 ° C. Thereafter, the reaction product is redissolved in toluene at 50 to 70 ° C., further distilled water is added and washed with water, and after stationary separation, the organic layer is removed under reduced pressure to remove the reaction product 1, 260 g was obtained. The epoxy equivalent of the obtained reaction product was 260.

With respect to this reaction product, a ¹ H-NMR spectrum (solvent: CDCl ₃ , tetramethylsilane standard, the same applies hereinafter) was measured, and the chemical shift δ (ppm) was 6.8 to 7.3 (bonded to the cyclohexane skeleton). 8H), 3.3 and 3.9 to 4.2 (derived from epoxy group; 6H), 0.7 to 0.9 (2 in i-propyl group bonded to cyclohexane skeleton) The peak of 6H) was observed.
Further, when an infrared absorption spectrum (IR) was measured, absorption of 1241 cm ⁻¹ (derived from an aromatic ether structure and an epoxy group), 1036 cm ⁻¹ and 828 cm ⁻¹ (derived from an aromatic ether structure) was observed.
From the above results, it was confirmed that this reaction product was a mixture of the diglycidyl etherified product represented by the formula (11) and the diglycidyl etherified product represented by the formula (12).

Synthesis Example 2 (Synthesis of dimethacryloyl group-containing diol compound)
A flask equipped with a condenser and a stirrer was charged with 1,000 g of the mixture of the diglycidyl etherified product obtained in Synthesis Example 1, 350 g of methacrylic acid, and 1.0 g of hydroquinone monomethyl ether, and dissolved by heating to 60 ° C. while stirring. Thereafter, 8 g of tetraethylammonium bromide was added, and the reaction was continued while stirring at 70 to 90 ° C. until the acid value of the reaction product was 8 mgKOH / g and the epoxy equivalent was 17,000. After 15 hours, the end point was confirmed by acid value and epoxy equivalent, and then cooled to room temperature to obtain 1,300 g of a reaction product. The obtained reaction product had an acid value of 8 mgKOH / g, a hydroxyl value of 165 mgKOH / g, and an epoxy equivalent of 17,000.

¹ H-NMR spectrum of this reaction product was measured, and the chemical shift δ (ppm) was 5.6 and 6.1 (derived from a double bond of methacrylic acid; 4H), 3.9 to 4.4. (The peak of “3.3 and 3.9 to 4.2” of the mixture of diglycidyl etherified compounds shifted by the ring opening of the epoxy group; 10H) was observed.
Further, when the infrared absorption spectrum (IR) was measured, absorption of 1,720 cm ⁻¹ (derived from the aliphatic ester structure) was observed.
From the above results, this reaction product is a mixture of a dimethacryloyl group-containing diol compound represented by the following formula (6-1) and a dimethacryloyl group-containing diol compound represented by the following formula (7-1). Was confirmed.

Synthesis Example 3 (Synthesis of diacryloyl group-containing diol compound)
In Synthesis Example 2, a diacryloyl group-containing diol compound represented by Formula (6-2) below and Formula (7-2) below in the same manner as Synthesis Example 2 except that 293 g of acrylic acid was used instead of methacrylic acid. 1,200 g of a mixture of diacryloyl group-containing diol compounds represented by the formula: The obtained mixture had an acid value of 6 mgKOH / g, a hydroxyl value of 171 mgKOH / g, and an epoxy equivalent of 16,500.

Synthesis Example 4 (Production of polyester (1))
A flask equipped with a condenser and a stirrer was charged with 670 g of the dimethacryloyl group-containing diol compound obtained in Synthesis Example 2 and 1,300 g of methyl isobutyl ketone, heated to 60 ° C. with stirring, and dissolved. While adding 220 g of pyromellitic anhydride represented by formula (8-1) (manufactured by Daicel Chemical Industries, Ltd.) and stirring at 80 ° C., the acid value of the reaction product averages 67.9 mg KOH / g, The reaction was continued until the fluctuation range of the value became 2 mgKOH / g or less. After completion of the reaction, distilled water was added to the reaction solution, washed with water, and allowed to stand and separated, and then the organic layer was distilled off at 50 to 70 ° C. under reduced pressure to obtain 860 g of a resin. The obtained resin had Mw = 18,000 and an acid value = 61.2 mgKOH / g.

When the ¹ H-NMR spectrum of this resin was measured, the chemical shift δ (ppm) was 6.9 to 7.6 (derived from the benzene ring bonded to the cyclohexane skeleton and the benzene ring of pyromellitic acid). 8 and 6.2 (derived from methacrylic acid double bond), 1.1 to 2.2 (derived from cyclohexane skeleton), 0.7 to 0.9 (2,2-propylene group bonded to cyclohexane skeleton) A peak derived from two of the methyl groups; 6H) was observed.
Further, when an infrared absorption spectrum (IR) was measured, absorption of 1735 cm ⁻¹ (derived from an aliphatic ester structure), 1735 cm ⁻¹ , 1241 cm ⁻¹ and 1102 cm ⁻¹ (derived from an aromatic ester structure) was observed. .
From the above results, it was confirmed that this resin was polyester (1) represented by the following formula (1-1).
This polyester (1) is referred to as “alkali-soluble resin (B-1)”.

〔式（１−１）において、Ｘは式（１）におけるＸと同義である。但し、式中の＊印を付した２つの結合手は相互に直接結合している。〕

[In Formula (1-1), X is synonymous with X in Formula (1). However, the two bonds marked with * in the formula are directly connected to each other. ]

Synthesis Example 5 (Production of polyester (1))
In Synthesis Example 4, the same procedure as in Synthesis Example 4 was used, except that 660 g of the diacryloyl group-containing diol compound obtained in Synthesis Example 3 was used instead of the mixture of the dimethacryloyl group-containing diol compound obtained in Synthesis Example 2. 840 g of polyester (1) represented by the following formula (1-2) was obtained. The obtained polyester (1) had Mw = 15,000 and an acid value = 60.9 mgKOH / g.
This polyester (1) is referred to as “alkali-soluble resin (B-2)”.

〔式（１−２）において、Ｘは式（１）におけるＸと同義である。但し、式中の＊印を付した２つの結合手は相互に直接結合している。〕

[In Formula (1-2), X is synonymous with X in Formula (1). However, the two bonds marked with * in the formula are directly connected to each other. ]

Synthesis Example 6 (Production of carboxyl group-blocked polyester (1))
A flask equipped with a condenser and a stirrer was charged with 275 g of the polyester (1) obtained in Synthesis Example 4 and 275 g of propylene glycol monomethyl acetate, and dissolved by heating to 60 ° C. with stirring. 5 g is added, 30 g of phenylglycidyl ether (trade name Epiol P, manufactured by Nippon Oil & Fats Co., Ltd.) is added as a carboxyl group blocking agent, and the fluctuation range of the acid value is 2 mgKOH / g or less while stirring at 80 to 90 ° C The reaction was continued until After completion of the reaction, it was cooled to room temperature to obtain 300 g of resin. The obtained resin had Mw = 21,000 and an acid value = 52.1 mgKOH / g.

When ¹ H-NMR spectrum of this resin was measured, 6.9 to 7.6 (phenylglycidyl ether group) was added to the chemical shift δ (ppm) in addition to the peak of the polyester (1) obtained in Synthesis Example 4. Peak derived from the benzene ring in the middle).
In addition, when the infrared absorption spectrum (IR) was measured, absorption of 1,047 cm ⁻¹ (derived from the aromatic ether structure) was observed. It was getting stronger.
From the above results, in this resin, 78% of the hydrogen atoms in the carboxyl group in the formula (1-1) were substituted with a blocking agent residue (—CH ₂ CH (OH) CH ₂ OC ₆ H ₅ ). It was confirmed that the polyester (1) has a structure.
This polyester (1) is referred to as “alkali-soluble resin (B-3)”.

Synthesis Example 7 (Production of carboxyl group-blocked polyester (1))
In Synthesis Example 6, 340 g of a resin was obtained in the same manner as in Synthesis Example 6 except that 300 g of the polyester (1) obtained in Synthesis Example 5 was used instead of the polyester (1) obtained in Synthesis Example 4. The obtained resin had Mw = 25,000 and an acid value = 50.0 mgKOH / g.
This polyester (1) is referred to as “alkali-soluble resin (B-4)”.

Synthesis Example 8 (Production of polyester (1))
A flask equipped with a condenser and a stirrer was charged with 670 g of the dimethacryloyl group-containing diol compound obtained in Synthesis Example 2 and 1,470 g of methyl isobutyl ketone, heated to 60 ° C. with stirring, and dissolved. Add 313 g of diphenyl ether tetracarboxylic dianhydride (manac Co., Ltd.) represented by the formula (8-2), and react while stirring at 80 ° C. until the acid value becomes 53.3 mgKOH / g. Continued. After completion of the reaction, distilled water was added to the reaction solution, washed with water, and allowed to stand and separated, and then the organic layer was evaporated under reduced pressure at 50 to 70 ° C. to obtain 800 g of a resin. The obtained resin had Mw = 18,000 and an acid value = 61.2 mgKOH / g.
This polyester (1) is referred to as “alkali-soluble resin (B-5)”.

〔式（１−３）において、Ｘは式（１）におけるＸと同義である。但し、式中の＊印を付した２つの結合手は相互に直接結合している。〕

[In Formula (1-3), X is synonymous with X in Formula (1). However, the two bonds marked with * in the formula are directly connected to each other. ]

Synthesis Example 9 (Production of polyester (1))
A flask equipped with a condenser and a stirrer was charged with 670 g of the dimethacryloyl group-containing diol compound obtained in Synthesis Example 2 and 1660 g of methyl isobutyl ketone, heated to 60 ° C. with stirring, and dissolved. 434 g of ethylene glycol bis (trimellitate) dianhydride (manufactured by Shin Nippon Rika Co., Ltd.) represented by 8-3) is added and reacted while stirring at 80 ° C., so that the acid value becomes 46.2 mgKOH / g. The reaction continued until. After completion of the reaction, distilled water was added to the reaction solution, washed with water, and allowed to stand and separated, and then the organic layer was evaporated under reduced pressure at 50 to 70 ° C. to obtain 900 g of a resin. Obtained resin was Mw = 13,000 and was polyester (1) represented by the following formula (1-4).
This polyester (1) is referred to as “alkali-soluble resin (B-6)”.

〔式（１−４）において、Ｘは式（１）におけるＸと同義である。但し、式中の＊印を付した２つの結合手は相互に直接結合している。〕

[In Formula (1-4), X is synonymous with X in Formula (1). However, the two bonds marked with * in the formula are directly connected to each other. ]

Synthesis Example 10 (Production of comparative alkali-soluble resin)
A flask equipped with a condenser and a stirrer was charged with 4 parts of 2,2′-azobis (2,4-dimethylvaleronitrile) and 200 parts of propylene glycol monomethyl ether acetate, followed by 12 parts of methacrylic acid, 18 parts of styrene, and benzyl methacrylate. 24 parts, 30 parts of N-phenylmaleimide, 16 parts of 2-hydroxyethyl methacrylate, and 6.5 parts of α-methylstyrene dimer as a chain transfer agent were substituted with nitrogen, and then gently stirred to prepare a reaction solution of 80 parts. The mixture was heated to 0 ° C. and polymerized for 3 hours while maintaining this temperature. After completion of the polymerization, the reaction solution was heated to 100 ° C., 0.5 part of 2,2′-azobis (2,4-dimethylvaleronitrile) was added, and further polymerized for 1 hour to obtain an alkali-soluble resin solution ( Solid content concentration = 33.2% by weight) was obtained.
The obtained alkali-soluble resin was Mw = 8,500 and Mn = 4,500.
This alkali-soluble resin is referred to as “alkali-soluble resin (B-7)”.

Synthesis Example 11 (Production of comparative alkali-soluble resin)
A flask equipped with a condenser and a stirrer was charged with 2 parts of 2,2′-azobis (2,4-dimethylvaleronitrile) and 200 parts of propylene glycol monomethyl ether acetate, followed by 10 parts of methacrylic acid, 15 parts of styrene, and benzyl methacrylate. 30 parts, 25 parts of N-phenylmaleimide, 20 parts of ω-carboxypolycaprolactone mono (meth) acrylate, 2 parts of α-methylstyrene dimer as a chain transfer agent, purged with nitrogen, and then gently stirred to react. The solution was heated to 80 ° C. and polymerized for 3 hours while maintaining this temperature. After completion of the polymerization, the reaction solution was heated to 100 ° C., 0.5 part of 2,2′-azobis (2,4-dimethylvaleronitrile) was added, and further polymerized for 1 hour to obtain an alkali-soluble resin solution ( Solid content concentration = 33.1%) was obtained.
The obtained alkali-soluble resin had Mw = 20,000 and Mn = 9,000.
This alkali-soluble resin is referred to as “alkali-soluble resin (B-8)”.

Synthesis Example 12 (Production of comparative alkali-soluble resin)
A flask equipped with a condenser and a stirrer was charged with 4 parts of 2,2′-azobis (2,4-dimethylvaleronitrile) and 200 parts of propylene glycol monomethyl ether acetate, followed by 10 parts of methacrylic acid, 15 parts of styrene, and benzyl methacrylate. 40 parts, 25 parts of N-phenylmaleimide, 10 parts of 2-hydroxyethyl methacrylate and 6.5 parts of α-methylstyrene dimer as a chain transfer agent were purged with nitrogen, and then gently stirred to prepare a reaction solution of 80 parts. The mixture was heated to 0 ° C. and polymerized for 3 hours while maintaining this temperature. After completion of the polymerization, the reaction solution was heated to 100 ° C., 0.5 part of 2,2′-azobis (2,4-dimethylvaleronitrile) was added, and further polymerized for 1 hour to obtain an alkali-soluble resin solution ( Solid content concentration = 33.3%) was obtained.
The obtained alkali-soluble resin had Mw = 7,800 and Mn = 4,500.
This alkali-soluble resin is referred to as “alkali-soluble resin (B-9)”.

Example 1
<Preparation of liquid composition>
(A) 8 parts of a 80:20 (weight ratio) mixture of CI Pigment Red 254 and CI Pigment Red 177 as a colorant, 4 parts (in terms of solid content) of EFKA-46 as a dispersant, and propylene glycol monomethyl ether acetate as a solvent 75 parts were treated with a bead mill to prepare a pigment dispersion.
Subsequently, 87 parts of the obtained pigment dispersion, (B) 8 parts of an alkali-soluble resin (B-1) as an alkali-soluble resin, (C) 2 parts of dipentaerythritol hexaacrylate and pentaerythritol tetra as a polyfunctional monomer 4 parts of acrylate, (D) 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate (trade name CGI-242, manufactured by Ciba Specialty Chemicals, the same shall apply hereinafter), 70 parts of methoxybutyl acetate and ethyl-3 as solvents -96 parts of ethoxypropionate was mixed to prepare a liquid composition (R1).

<Formation of colored layer>
The liquid composition (R1) is applied to a soda glass substrate on which a silicon dioxide (SiO2) film that prevents elution of sodium ions is formed on the surface using a spin coater, and then is applied on a hot plate at 90 ° C. for 2 minutes. Pre-baking was performed to form a coating film having a thickness of 1.2 μm.
Next, after cooling the substrate to room temperature, the coating film was exposed to ultraviolet rays containing wavelengths of 365 nm, 405 nm, and 436 nm through a photomask (slit width 30 μm) using a high-pressure mercury lamp. The exposure amount at this time was 100 J / m ² . Thereafter, the substrate was immersed in a 0.04 wt% potassium hydroxide aqueous solution at 23 ° C. for 45 seconds, developed, washed with ultrapure water, and air-dried. Thereafter, post-baking was performed in a clean oven at 230 ° C. for 30 minutes to form a red stripe pixel pattern on the substrate.

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 1-1.

Examples 2-5
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R2) to (R5) were prepared in the same manner as in Example 1, except that the dispersant was changed to that shown in Table 1-1.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R2) to (R5) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 to 6 μm could be formed.
The main contents are shown in Table 1-1.

Example 6
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (R6) was prepared in the same manner as in Example 1 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-2).
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (R6) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 1-1.

Examples 7-10
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R7) to (R10) were prepared in the same manner as in Example 6 except that the dispersant was changed to that shown in Table 1-1.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R7) to (R10) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5, 8 to 6 μm could be formed. The main contents are shown in Table 1-1.

Example 11
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (R11) was prepared in the same manner as in Example 1 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-3).
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (R11) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 1-2.

Examples 12-15
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R12) to (R15) were prepared in the same manner as in Example 11 except that the dispersant was changed to that shown in Table 1-2.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R12) to (R15) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed, and a pattern with a line width of 6 to 8 μm could be formed.
The main contents are shown in Table 1-2.

Example 16
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (R16) was prepared in the same manner as in Example 1 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-4).
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (R16) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 1-2.

Examples 17-20
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R17) to (R20) were prepared in the same manner as in Example 16 except that the dispersant was changed to that shown in Table 1-2.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R17) to (R20) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5, 8 to 6 μm could be formed. The main contents are shown in Table 1-2.

Example 21
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (R21) was prepared in the same manner as in Example 1 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-5).
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (R21) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 μm could be formed.
The main contents are shown in Table 1-3.

Examples 22-25
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R22) to (R25) were prepared in the same manner as in Example 21, except that the dispersant was changed to those shown in Table 1-3.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R22) to (R25) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5, 8 to 6 μm could be formed. The main contents are shown in Table 1-3.

Example 26
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (R26) was prepared in the same manner as in Example 1 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-6).
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (R26) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 1-3.

Examples 27-30
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (R27) to (R30) were prepared in the same manner as in Example 26 except that the dispersant was changed to those shown in Table 1-3.
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (R27) to (R30) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5, 8 to 6 μm could be formed. The main contents are shown in Table 1-3.

Example 31
<Preparation of liquid composition>
(A) 11 parts of a 60:40 (weight ratio) mixture of CI Pigment Green 36 and CI Pigment Yellow 150 as a colorant, 4 parts (in terms of solid content) of EFKA-46 as a dispersant, and propylene glycol monomethyl ether acetate as a solvent 75 parts were treated with a bead mill to prepare a pigment dispersion.
Subsequently, 90 parts of the obtained pigment dispersion, (B) 8 parts of an alkali-soluble resin (B-1) as an alkali-soluble resin, (C) 2 parts of dipentaerythritol hexaacrylate and pentaerythritol tetra as a polyfunctional monomer 4 parts of acrylate, (D) 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate (3 parts), 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxypropionate as a solvent were mixed to prepare a liquid composition (G1). did.
(Formation of colored layer)
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 2-1.

Examples 32-35
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G2) to (G5) were prepared in the same manner as in Example 31, except that the dispersant was changed to that shown in Table 2-1.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G2) to (G5) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 to 6 μm could be formed.
The main contents are shown in Table 2-1.

Example 36
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (G6) was prepared in the same manner as in Example 31 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-2).
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G6) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 2-1.

Examples 37-40
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G7) to (G10) were prepared in the same manner as in Example 36, except that the dispersant was changed to that shown in Table 2-1.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G7) to (G10) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6, 8 to 5 μm could be formed. The main contents are shown in Table 2-1.

Example 41
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (G11) was prepared in the same manner as in Example 31 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-3).
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G11) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 2-2.

Examples 42-45
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G12) to (G15) were prepared in the same manner as in Example 41 except that the dispersant was changed to that shown in Table 2-2.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G12) to (G15) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 to 6 μm could be formed.
The main contents are shown in Table 2-2.

Example 46
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (G16) was prepared in the same manner as in Example 31, except that the alkali-soluble resin was changed to the alkali-soluble resin (B-4).
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G16) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 2-2.

Examples 47-50
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G17) to (G20) were prepared in the same manner as in Example 46 except that the dispersant was changed to that shown in Table 2-2.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G17) to (G20) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), undercut was not recognized and a pattern with a line width of 6, 5 to 8 μm could be formed. The main contents are shown in Table 2-2.

Example 51
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (G21) was prepared in the same manner as in Example 31, except that the alkali-soluble resin was changed to the alkali-soluble resin (B-5).
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G21) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 2-3.

Examples 52-55
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G22) to (G25) were prepared in the same manner as in Example 51 except that the dispersant was changed to those shown in Table 2-3.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G22) to (G25) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6, 8 to 5 μm could be formed. The main contents are shown in Table 2-3.

Example 56
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (G26) was prepared in the same manner as in Example 31, except that the alkali-soluble resin was changed to the alkali-soluble resin (B-6).
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (G26) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 2-3.

Examples 57-60
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (G27) to (G30) were prepared in the same manner as in Example 56, except that the dispersant was changed to that shown in Table 2-3.
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (G27) to (G30) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed, and a pattern with a line width of 5, 6 to 8 μm could be formed. The main contents are shown in Table 2-3.

Example 61
<Preparation of liquid composition>
(A) 9 parts of a 95: 5 (weight ratio) mixture of CI Pigment Blue 15: 6 and CI Pigment Violet 23 as a colorant, 4 parts (in terms of solid content) of EFKA-46 as a dispersant, and propylene glycol monomethyl as a solvent A pigment dispersion was prepared by treating 75 parts of ether acetate with a bead mill.
Next, 88 parts of the obtained pigment dispersion, (B) 8 parts of an alkali-soluble resin (B-1) as an alkali-soluble resin, (C) 2 parts of dipentaerythritol hexaacrylate and pentaerythritol tetra as a polyfunctional monomer 4 parts of acrylate, (D) 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate 3 parts, 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxypropionate as a solvent were mixed to prepare a liquid composition (B1) did.
(Formation of colored layer)
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 3-1.

Examples 62-65
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B2) to (B5) were prepared in the same manner as in Example 61 except that the dispersant was changed to that shown in Table 3-1.
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B2) to (B5) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 to 6 μm could be formed.
The main contents are shown in Table 3-1.

Example 66
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (B6) was prepared in the same manner as in Example 61 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-2).
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B6) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 3-1.

Examples 67-70
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B7) to (B10) were prepared in the same manner as in Example 66 except that the dispersant was changed to that shown in Table 3-1.
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B7) to (B10) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 to 5 μm could be formed.
The main contents are shown in Table 3-1.

Example 71
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (B11) was prepared in the same manner as in Example 61 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-3).
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B11) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 3-2.

Examples 72-75
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B12) to (B15) were prepared in the same manner as in Example 71 except that the dispersant was changed to that shown in Table 3-2.
Subsequently, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B12) to (B15) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed, and a pattern with a line width of 5, 6 to 8 μm could be formed. The main contents are shown in Table 3-2.

Example 76
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (B16) was prepared in the same manner as in Example 61 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-4).
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B16) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 3-2.

Examples 77-80
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B17) to (B20) were prepared in the same manner as in Example 76, except that the dispersant was changed to that shown in Table 3-2.
Subsequently, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B17) to (B20) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 to 8 μm could be formed.
The main contents are shown in Table 3-2.

Example 81
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (B21) was prepared in the same manner as in Example 61 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-5).
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B21) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 3-3.

Examples 82-85
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B22) to (B25) were prepared in the same manner as in Example 81 except that the dispersant was changed to that shown in Table 3-3.
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B22) to (B25) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 to 8 μm could be formed.
The main contents are shown in Table 3-3.

Example 86
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (B26) was prepared in the same manner as in Example 61 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-6).
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (B26) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 μm could be formed.
The main contents are shown in Table 3-3.

Examples 87-90
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (B27) to (B30) were prepared in the same manner as in Example 86, except that the dispersant was changed to that shown in Table 3-3.
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (B27) to (B30) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 to 5 μm could be formed.
The main contents are shown in Table 3-3.

Example 91
<Preparation of liquid composition>
(A) 20 parts of carbon black as a colorant, 4 parts of EFKA-46 as a dispersant (in terms of solid content), and 75 parts of propylene glycol monomethyl ether acetate as a solvent were treated with a bead mill to prepare a pigment dispersion.
Next, 99 parts of the obtained pigment dispersion, (B) 8 parts of alkali-soluble resin (B-1) as alkali-soluble resin, (C) 2 parts of dipentaerythritol hexaacrylate and pentaerythritol tetra as polyfunctional monomers 4 parts of acrylate, (D) 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate (3 parts) and 150 parts of propylene glycol monomethyl ether acetate as a solvent were mixed to prepare a liquid composition (BK1).
<Formation of colored layer>
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 μm could be formed.
The main contents are shown in Table 4-1.

Examples 92-95
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK2) to (BK5) were prepared in the same manner as in Example 91, except that the dispersant was changed to that shown in Table 4-1.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK2) to (BK5) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 to 6 μm could be formed.
The main contents are shown in Table 4-1.

Example 96
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (BK6) was prepared in the same manner as in Example 91 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-2).
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK6) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 4-1.

Examples 97-100
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK7) to (BK10) were prepared in the same manner as in Example 96 except that the dispersant was changed to that shown in Table 4-1.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK7) to (BK10) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 to 5 μm could be formed.
The main contents are shown in Table 4-1.

Example 101
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (BK11) was prepared in the same manner as in Example 91 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-3).
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK11) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 4-2.

Examples 102-105
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK12) to (BK15) were prepared in the same manner as in Example 101 except that the dispersant was changed to that shown in Table 4-2.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK12) to (BK15) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5, 8 to 6 μm could be formed. The main contents are shown in Table 4-2.

Example 106
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (BK16) was prepared in the same manner as in Example 91 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-4).
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK16) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 μm could be formed.
The main contents are shown in Table 4-2.

Examples 107-110
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK17) to (BK20) were prepared in the same manner as in Example 106, except that the dispersant was changed to that shown in Table 4-2.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK17) to (BK20) were used in place of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 to 5 μm could be formed.
The main contents are shown in Table 4-2.

Example 111
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (BK21) was prepared in the same manner as in Example 91 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-5).
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK21) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
When the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 6 μm could be formed.
The main contents are shown in Table 4-3.

Examples 112-115
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK22) to (BK25) were prepared in the same manner as in Example 111 except that the dispersant was changed to that shown in Table 4-3.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK22) to (BK25) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8, 6 to 5 μm could be formed. The main contents are shown in Table 4-3.

Example 116
<Preparation of liquid composition and formation of colored layer>
(B) A liquid composition (BK26) was prepared in the same manner as in Example 91 except that the alkali-soluble resin was changed to the alkali-soluble resin (B-6).
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (BK26) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 5 μm could be formed.
The main contents are shown in Table 4-3.

Examples 117-120
<Preparation of liquid composition and formation of colored layer>
Liquid compositions (BK27) to (BK30) were prepared in the same manner as in Example 116, except that the dispersant was changed to that shown in Table 4-3.
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid compositions (BK27) to (BK30) were used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no chipping was observed on the edge of the pixel pattern.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), no undercut was observed and a pattern with a line width of 8 to 5 μm could be formed.
The main contents are shown in Table 4-3.

Comparative Example 1
<Preparation of liquid composition>
(A) 8 parts of a 80:20 (weight ratio) mixture of CI Pigment Red 254 and CI Pigment Red 177 as a colorant, 4 parts (in terms of solid content) of EFKA-46 as a dispersant, and propylene glycol monomethyl ether acetate as a solvent 75 parts were treated with a bead mill to prepare a pigment dispersion.
Subsequently, 87 parts of the obtained pigment dispersion, a mixture of 2 parts of an alkali-soluble resin (B-7), 3 parts of an alkali-soluble resin (B-8) and 4 parts of an alkali-soluble resin (B-9) as an alkali-soluble resin (C) 2 parts of dipentaerythritol hexaacrylate and 4 parts of pentaerythritol tetraacrylate as polyfunctional monomers, (D) 1- [9-ethyl-6- (2-methylbenzoyl)- 9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate 3 parts, 70 parts of methoxybutyl acetate as a solvent and 96 parts of ethyl-3-ethoxypropionate were mixed to prepare a liquid composition (CR1). did.
(Formation of colored layer)
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CR1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, a development residue was observed on the unexposed substrate.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), an undercut was observed and only a pattern with a line width of 35 μm could be formed.
The main contents are shown in Table 5.

Comparative Example 2
<Preparation of liquid composition>
(A) 11 parts of a 60:40 (weight ratio) mixture of CI Pigment Green 36 and CI Pigment Yellow 150 as a colorant, 4 parts (in terms of solid content) of BYK-2000 as a dispersant, and propylene glycol monomethyl ether acetate as a solvent 75 parts were treated with a bead mill to prepare a pigment dispersion.
Next, a mixture of 90 parts of the obtained pigment dispersion, 2 parts of an alkali-soluble resin (B-7), 3 parts of an alkali-soluble resin (B-8) and 4 parts of an alkali-soluble resin (B-9) as an alkali-soluble resin (C) 2 parts of dipentaerythritol hexaacrylate and 4 parts of pentaerythritol tetraacrylate as polyfunctional monomers, (D) 1- [9-ethyl-6- (2-methylbenzoyl)- 9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate 3 parts, 70 parts of methoxybutyl acetate as a solvent and 96 parts of ethyl-3-ethoxypropionate were mixed to prepare a liquid composition (CG1). did.
(Formation of colored layer)
Next, a green stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CG1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, but when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), an undercut was observed. And only a pattern with a line width of 45 μm was formed. The main contents are shown in Table 5.

Comparative Example 3
<Preparation of liquid composition>
(A) 9 parts of a 95/5 (weight ratio) mixture of CI Pigment Blue 15: 6 and CI Pigment Violet 23 as a colorant, 4 parts (in terms of solid content) of BYK-2001 as a dispersant, and propylene glycol monomethyl as a solvent A pigment dispersion was prepared by treating 75 parts of ether acetate with a bead mill.
Next, 88 parts of the obtained pigment dispersion, a mixture of 2 parts of an alkali-soluble resin (B-7), 3 parts of an alkali-soluble resin (B-8) and 4 parts of an alkali-soluble resin (B-9) as an alkali-soluble resin (C) 2 parts of dipentaerythritol hexaacrylate and 4 parts of pentaerythritol tetraacrylate as polyfunctional monomers, (D) 1- [9-ethyl-6- (2-methylbenzoyl)- 9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate (3 parts), 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxypropionate as a solvent were mixed to prepare a liquid composition (CB1). did.
(Formation of colored layer)
Next, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CB1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, no development residue was observed on the unexposed portion of the substrate, but when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), an undercut was observed. And only a pattern with a line width of 40 μm was formed. The main contents are shown in Table 5.

Comparative Example 4
<Preparation of liquid composition>
(A) A pigment dispersion was prepared by treating 20 parts of carbon black as a colorant, 4 parts (in terms of solid content) of BYK-164 as a dispersant, and 75 parts of propylene glycol monomethyl ether acetate as a solvent by a bead mill.
Next, 99 parts of the obtained pigment dispersion, (B) 8 parts of alkali-soluble resin (B-1) as alkali-soluble resin, (C) 2 parts of dipentaerythritol hexaacrylate and pentaerythritol tetra as polyfunctional monomers 4 parts of acrylate, (D) 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-acetate (3 parts) and 150 parts of propylene glycol monomethyl ether acetate as a solvent were mixed to prepare a liquid composition (CBK1).
(Formation of colored layer)
Next, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CBK1) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, a development residue was observed on the unexposed substrate.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), an undercut was recognized and only a pattern with a line width of 50 μm could be formed.
The main contents are shown in Table 5.

Comparative Example 5
<Preparation of liquid composition and formation of colored layer>
A liquid composition (CR2) was prepared in the same manner as in Comparative Example 1 except that the dispersant was changed to BYK-182.
(Formation of colored layer)
Next, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CR2) was used instead of the liquid composition (R1).

<Evaluation>
When the pixel array on the substrate was observed with an optical microscope, a development residue was observed on the unexposed substrate.
Further, when the cross section of the pixel pattern was observed with a scanning electron microscope (SEM), an undercut was observed and only a pattern with a line width of 45 μm could be formed.
The main contents are shown in Table 5.

Claims (4)

A radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photoradical generator, wherein (B) the alkali-soluble resin , colored layer forming a radiation-sensitive composition characterized by comprising a polyester you express the following formula (1).

[In the formula (1), each X independently represents a divalent group represented by the following formula (2) or (3), and each Y independently represents an organic compound having four carboxyl groups. Each R ¹ independently represents a hydrogen atom or a methyl group, each R ² independently represents a hydrogen atom or a carboxyl group-blocking residue, and n is 1 It is an integer of ~ 40. However, the two bonds marked with * in the formula are directly connected to each other.

] (D) The radiation-sensitive composition for forming a colored layer according to claim 1, wherein the photoradical generator contains a compound represented by the following formula (4) or formula (5) as an essential component.

[In the formulas (4) and (5), each R ³ independently represents a linear, branched or cyclic alkyl group or phenyl group having 1 to 12 carbon atoms, and each R ⁴ is independent from each other. Represents a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or a phenyl group, and each R ⁵ is independently a hydrogen atom or a linear or branched chain having 1 to 12 carbon atoms. Alternatively, it represents a cyclic alkyl group, and each R ⁶ , each R ⁷ and each R ⁸ each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms. However, the alkyl groups of R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ⁸ are each a group of straight, branched or cyclic alkoxyl groups having 1 to 6 carbon atoms, phenyl groups and halogen atoms. Each of the phenyl groups of R ³ and R ⁴ may be a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, or a linear group having 1 to 6 carbon atoms. Further, it may be substituted with a substituent selected from the group consisting of a branched or cyclic alkoxyl group, a phenyl group and a halogen atom. ] The color filter which has a colored layer formed from the radiation sensitive composition for colored layer formation of Claim 1 or Claim 2 . A color liquid crystal display device comprising the color filter according to claim 3 .